JPS63234158A - 鉄(3)イオン分析方法 - Google Patents
鉄(3)イオン分析方法Info
- Publication number
- JPS63234158A JPS63234158A JP6948787A JP6948787A JPS63234158A JP S63234158 A JPS63234158 A JP S63234158A JP 6948787 A JP6948787 A JP 6948787A JP 6948787 A JP6948787 A JP 6948787A JP S63234158 A JPS63234158 A JP S63234158A
- Authority
- JP
- Japan
- Prior art keywords
- metal ions
- solution
- column
- soln
- metal ion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910021645 metal ion Inorganic materials 0.000 title claims abstract description 52
- 238000004458 analytical method Methods 0.000 title abstract description 9
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 20
- 238000010521 absorption reaction Methods 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 16
- 239000012488 sample solution Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 16
- 239000007788 liquid Substances 0.000 abstract description 14
- 238000011088 calibration curve Methods 0.000 abstract description 8
- 239000013522 chelant Substances 0.000 abstract description 7
- 239000003795 chemical substances by application Substances 0.000 abstract description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 38
- 239000000243 solution Substances 0.000 description 38
- 229910052742 iron Inorganic materials 0.000 description 18
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 16
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- -1 iron ions Chemical class 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000010828 elution Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000002798 spectrophotometry method Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000003729 cation exchange resin Substances 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N iron (II) ion Substances [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000002516 radical scavenger Substances 0.000 description 2
- RNMCCPMYXUKHAZ-UHFFFAOYSA-N 2-[3,3-diamino-1,2,2-tris(carboxymethyl)cyclohexyl]acetic acid Chemical compound NC1(N)CCCC(CC(O)=O)(CC(O)=O)C1(CC(O)=O)CC(O)=O RNMCCPMYXUKHAZ-UHFFFAOYSA-N 0.000 description 1
- YGDVXSDNEFDTGV-UHFFFAOYSA-N 2-[6-[bis(carboxymethyl)amino]hexyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCCCCN(CC(O)=O)CC(O)=O YGDVXSDNEFDTGV-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000000975 co-precipitation Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 229910021655 trace metal ion Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Investigating Or Analyzing Non-Biological Materials By The Use Of Chemical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6948787A JPS63234158A (ja) | 1987-03-23 | 1987-03-23 | 鉄(3)イオン分析方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6948787A JPS63234158A (ja) | 1987-03-23 | 1987-03-23 | 鉄(3)イオン分析方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63234158A true JPS63234158A (ja) | 1988-09-29 |
JPH0515227B2 JPH0515227B2 (enrdf_load_stackoverflow) | 1993-03-01 |
Family
ID=13404110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6948787A Granted JPS63234158A (ja) | 1987-03-23 | 1987-03-23 | 鉄(3)イオン分析方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63234158A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03248060A (ja) * | 1990-02-27 | 1991-11-06 | Hitachi Ltd | 不溶解性微粒子を含む金属不純物の分析方法および装置 |
US5578829A (en) * | 1994-05-23 | 1996-11-26 | Texas Instruments Incorporated | On-line monitor for moisture contamination in HCL gas and copper contamination in NH4 OH solutions |
JP2004294205A (ja) * | 2003-03-26 | 2004-10-21 | Kurabo Ind Ltd | 酸溶液の金属含有量の測定方法及び測定装置 |
JP2019116328A (ja) * | 2019-04-26 | 2019-07-18 | 大日本印刷株式会社 | 液体収納容器 |
-
1987
- 1987-03-23 JP JP6948787A patent/JPS63234158A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03248060A (ja) * | 1990-02-27 | 1991-11-06 | Hitachi Ltd | 不溶解性微粒子を含む金属不純物の分析方法および装置 |
US5578829A (en) * | 1994-05-23 | 1996-11-26 | Texas Instruments Incorporated | On-line monitor for moisture contamination in HCL gas and copper contamination in NH4 OH solutions |
JP2004294205A (ja) * | 2003-03-26 | 2004-10-21 | Kurabo Ind Ltd | 酸溶液の金属含有量の測定方法及び測定装置 |
JP2019116328A (ja) * | 2019-04-26 | 2019-07-18 | 大日本印刷株式会社 | 液体収納容器 |
Also Published As
Publication number | Publication date |
---|---|
JPH0515227B2 (enrdf_load_stackoverflow) | 1993-03-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |