JPS63219599A - Formation of cermet layer on surface of member - Google Patents
Formation of cermet layer on surface of memberInfo
- Publication number
- JPS63219599A JPS63219599A JP5239887A JP5239887A JPS63219599A JP S63219599 A JPS63219599 A JP S63219599A JP 5239887 A JP5239887 A JP 5239887A JP 5239887 A JP5239887 A JP 5239887A JP S63219599 A JPS63219599 A JP S63219599A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- layer
- plating
- composite
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011195 cermet Substances 0.000 title claims abstract description 11
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000007747 plating Methods 0.000 claims abstract description 37
- 239000002184 metal Substances 0.000 claims abstract description 36
- 229910052751 metal Inorganic materials 0.000 claims abstract description 36
- 239000000919 ceramic Substances 0.000 claims abstract description 17
- 239000002131 composite material Substances 0.000 claims abstract description 16
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 239000002245 particle Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 14
- 239000010949 copper Substances 0.000 abstract description 9
- 229910052802 copper Inorganic materials 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 4
- 229910003460 diamond Inorganic materials 0.000 abstract description 4
- 239000010432 diamond Substances 0.000 abstract description 4
- 229910000831 Steel Inorganic materials 0.000 abstract description 3
- 150000004767 nitrides Chemical class 0.000 abstract description 3
- 239000010959 steel Substances 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 229910052758 niobium Inorganic materials 0.000 abstract description 2
- 229910052715 tantalum Inorganic materials 0.000 abstract description 2
- 229910052720 vanadium Inorganic materials 0.000 abstract description 2
- 229910052726 zirconium Inorganic materials 0.000 abstract description 2
- 229910052582 BN Inorganic materials 0.000 abstract 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract 1
- 239000010419 fine particle Substances 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000002905 metal composite material Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 238000005245 sintering Methods 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 24
- 239000000843 powder Substances 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 150000004678 hydrides Chemical class 0.000 description 4
- 229910001092 metal group alloy Inorganic materials 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910017945 Cu—Ti Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910000521 B alloy Inorganic materials 0.000 description 1
- 229910021407 M-carbon Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- -1 for example 1' i Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は、金属あるいはセラミックから4jる部Hの表
面に、いわゆる複合メッキの手法を用いてサーメットの
焼結層を形成する方法に係わる乙のである。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to a method of forming a sintered layer of cermet on the surface of a portion H made of metal or ceramic using a so-called composite plating method. It is.
〈従来の技術〉
部材の表面に駿−メットの焼結層を形成する方法として
次の方法がある。<Prior Art> The following method is available for forming a sintered layer of Shun-Met on the surface of a member.
1、゛サーメットの焼結体その乙のをロー付けにょつて
部材に接合Vる方法。1. A method of joining a cermet sintered body to a component by brazing.
2、部材表面に溶射によってサーメットあるいはセラミ
ックの層を形成したのら、該溶射層の空孔に、N1−P
、Ni −B合金の様な低融点の溶融金属を含浸させて
も密化する方法。2. After forming a cermet or ceramic layer on the surface of the component by thermal spraying, fill the pores of the sprayed layer with N1-P.
, a method of densification even when impregnated with a low melting point molten metal such as Ni-B alloy.
前者の方法は、複雑形状の%Jい層の形成は困難であり
、後者の方法では、溶射の困難な形状や材料、例えば、
パイプ内面あるいはダイ(7モンドや)J−ボンの様な
材料は困難である上に、ら密化された層はもろく、表面
9さの調整が難しい欠点がある。With the former method, it is difficult to form a thin layer with a complex shape, and with the latter method, it is difficult to form a thin layer with a complex shape, and with the latter method, it is difficult to form a thin layer with a complex shape, and with the latter method, it is difficult to form a thin layer with a complex shape.
It is difficult to use materials such as pipe inner surface or die (J-bond), and the densified layer is brittle, making it difficult to adjust the surface roughness.
〈発明が解決しようとする問題点〉
本発明は、かb%る問題点に鑑みてなされたもので、複
雑形状の部材の表面に、均一な厚さで靭性に優れ、しか
もダイA?モンド、BN、M化ケイ木、アルミナ、ジル
コニア等のほと/、どのヒラミックのサーメットの焼結
層を形成できる新規な方法を提供ulνとするらのであ
る。<Problems to be Solved by the Invention> The present invention has been made in view of the above problems, and it is possible to coat the surface of a member with a complex shape with a uniform thickness and excellent toughness, and also with die A? The present invention provides a new method for forming a sintered layer of cermets made of carbon dioxide, BN, M-carbon silica, alumina, zirconia, etc., and any ceramic.
〈問題を解決するための手段〉 本発明の手段は次の構成から成る。<Means to solve the problem> The means of the present invention consists of the following configuration.
メッキ金属の素地にセラミック粒子の分散した複合メッ
キ層を部材表面に形成し、該メッキ金属素地に、活性金
属あるいは活性金属の合金を拡散、合金化させて該ヒラ
ミック粒子と素地のメッキ金属を焼結さVることから成
る。A composite plating layer in which ceramic particles are dispersed on a plated metal base is formed on the surface of the member, an active metal or an alloy of active metal is diffused and alloyed into the plated metal base, and the Hiramic particles and the base plated metal are sintered. It consists of tying V.
〈作用〉
活性金属の合金は、ダイVモンド、BN、窒化物、炭化
物、酸化物等のはとlνど全てのセラミックに結合する
性質を右する。<Function> The active metal alloy has the property of bonding to all ceramics such as diamond, BN, nitrides, carbides, oxides, etc.
\しかして複合メッキでは、セラミック粒子はメッキ金
属の素地に甲にうめこまれたにずぎないものであり、ま
た、これをたとえ熱処理してもほとんどの場合、素地の
メッキ金属とヒラミック粒子は結合しない。\However, in composite plating, the ceramic particles are embedded in the base plating metal, and even if they are heat-treated, in most cases the base plating metal and the ceramic particles do not bond. .
メッキ素地とセラミック粒子を結合さけるためには、メ
ッキ素地の成分組成をセラミックに結合ザる成分に変え
る必要がある。In order to avoid bonding between the plating base and ceramic particles, it is necessary to change the composition of the plating base to a component that will bond to the ceramic.
そこで本発明では、メッキ金属素地の組成を活性金属の
合金組成に変化させてセラミック粒子と結合させるもの
である。Therefore, in the present invention, the composition of the plated metal base is changed to an alloy composition of active metal, and the plated metal base is combined with ceramic particles.
メッキ金属の素地を活性金属の合金組成に変える方法と
して、本発明では、次の方法を用いる。In the present invention, the following method is used to change the plating metal base to an active metal alloy composition.
1、活性金属あるいは活性金属の化合物の粉末を複合メ
ッキ[165、メッキ素地に同時に共析さU、熱処理に
よってメッキ素地に拡散合金化させる。1. Composite plating of active metal or active metal compound powder [165] Simultaneously eutectoid on the plating base, U, and diffusion alloying on the plating base by heat treatment.
2、メッキ前、予め部材の表面に活性金属の層を液留し
ておき、メッキ後、拡散熱処理を行なって活性金属層と
メッキ素地を拡散合金化させる。2. Before plating, a layer of active metal is deposited on the surface of the member, and after plating, a diffusion heat treatment is performed to form a diffusion alloy between the active metal layer and the plating base.
36メツキ後、メッキ被膜表面に活性金属層を被覆、塗
fりあるいは重ね合わせ、熱処理によってメッキ素地と
合金化さける。After plating, the active metal layer is coated, painted or overlaid on the surface of the plating film, and alloyed with the plating base by heat treatment.
以上の方法でメッキ素地を活性金属の合金に変化させる
。The above method transforms the plating base into an active metal alloy.
合金化さlるI!度は、固体状態あるいは融液が生ずる
温度いずれでもかまわないが、融液の生ずる温度が最も
好ましい。゛
複合メッキの素地金属は、Ni、Cu、Aa、Au、S
n、In・・・等々を、単体あるいは合金メッキの形で
使用でき、特に制約はない。Alloyed I! The temperature may be either a temperature at which a solid state or a melt is formed, but a temperature at which a melt is formed is most preferable.゛Base metals for composite plating include Ni, Cu, Aa, Au, and S.
n, In, etc. can be used alone or in the form of alloy plating, and there are no particular restrictions.
また、拡散後の最終的な合金成分が多元系になる場合、
この複合メッキ層の素地金属を合金メッキにしたり、あ
るいはメッキ層の上あるいは下地に更に、他の金属の層
をメッキあるいは伯の手段(たとえば被覆、塗付、mね
合せ等)で設ける。In addition, if the final alloy component after diffusion becomes a multi-component system,
The base metal of this composite plating layer is alloy-plated, or another metal layer is provided on or under the plating layer by plating or other means (for example, coating, painting, m-laying, etc.).
例えば最終組成がA(J−Cu−Tiの場合、複合メッ
キ素地にAUを使った場合、この複合メッキ層の上ある
いは下地に更にCuの層をメッキあるいは他の手段によ
って設ける。For example, when the final composition is A (J-Cu-Ti) and AU is used as the composite plating base, a Cu layer is further provided on or under the composite plating layer by plating or other means.
拡散後の成分組成の調整は、メッキ層あるいは被覆層の
厚さ、あるいは共析mによってコントロールVる。Adjustment of the component composition after diffusion is controlled by the thickness of the plating layer or coating layer, or the eutectoid m.
活性金属は、いわゆる通常の活性金属、例えば1’ i
、Zr、V、Nb、Ta、、S i 、−等々をjf
lj体あるいはこれらの合金、あるいは熱処理中に金属
に変化する化合物(たとえば水素化物)の形で使用でき
る。The active metal is a so-called conventional active metal, for example 1' i
, Zr, V, Nb, Ta, , S i , - etc. as jf
It can be used in the form of a lj form, an alloy thereof, or a compound (for example, a hydride) that converts into a metal during heat treatment.
〈実施例〉・
実施例1(ダイ−7モンドサーメット)40×40×1
0jwIの鋼の板の片面に、#80のダイヤモンド粉末
と325メツシコアンダーの■1の水素化物を混合した
粉末をA(Jをメッキの素地金属として100ミク0ン
複合メッキした。<Example>・ Example 1 (Die-7 Mondo Cermet) 40 x 40 x 1
On one side of a 0jwI steel plate, a 100 μm composite plating was applied with a powder mixture of #80 diamond powder and 325 mesh under hydride (1) using A (J as the base metal for plating).
次に、この複合メッキ層の上に更にCuを20ミクロン
メッキし、これを真空炉で850℃に10分熱処理した
。Next, 20 micrometers of Cu was further plated on this composite plating layer, and this was heat-treated at 850° C. for 10 minutes in a vacuum furnace.
ダイヤモンド粉末はAo−CI−Tiの合金によって鋼
の板に融着されていた。The diamond powder was fused to the steel plate by an Ao-CI-Ti alloy.
実施例2(窒化ケイ素のサーメッ1−)30X30X1
0mの銅の根に平均10ミクロンの窒化ケイ素の粉末を
AUで約20ミクロン複合メッキした。Example 2 (Silicon nitride cermet 1-) 30X30X1
A 0 m copper root was composite plated with about 20 microns of silicon nitride powder with an average thickness of 10 microns using AU.
つぎに、このメッキ層の上に5ミクロンの−「iの箔を
かさねあわせ、これを真空炉で850’Cに5分加熱し
た。Next, a 5 micron -1 foil was placed on top of this plating layer, and this was heated in a vacuum oven to 850'C for 5 minutes.
窒化クイ累の粉末は銅の扱に融着された。The nitride powder was fused to the copper handle.
合金組成は一部溶融した銅とAG、TiBら成っていた
。The alloy composition consisted of partially molten copper, AG, and TiB.
実施例3(アルミナサーメット)
10X50X1#(7)42%N r 7oイの仮の上
に1’OミクロンアンダーのTiの粉末をNiハ析メッ
キした。Example 3 (Alumina cermet) 10X50X1# (7) 42% Nr On a temporary 70m plate, 1'O micron less Ti powder was plated with Ni plating.
次に、このメッキ層の上に#400のアルミナの研磨粒
子をA(Jで共析メッキした。Next, #400 alumina abrasive particles were eutectoid plated with A (J) on this plating layer.
これを950℃で7分熱処理した。This was heat treated at 950°C for 7 minutes.
アルミナの研磨粒子は42アロイの板に融着されていた
。Alumina abrasive particles were fused to a 42 alloy plate.
実施例4(ジルコニアす−メット)
10×50×2Ml11のコバールの板に1ミクロンア
ンダーのジルコニアの粉末をCuで約10ミクロン複合
メッキした。Example 4 (Zirconia Sumet) A Kovar plate of 10 x 50 x 2 Ml11 was composite plated with about 10 microns of zirconia powder and Cu to a thickness of about 1 micron.
次に、この上に(95Ao : 5T i )の混合割
合いのペーストを塗付し、真空炉で870℃、5分熱処
理した。Next, a paste having a mixing ratio of (95Ao:5T i ) was applied thereon and heat treated at 870° C. for 5 minutes in a vacuum furnace.
ジルコニア粉末は溶融したへ〇−CU−Ti合金によっ
て、コバールの板に融着されていた。The zirconia powder was fused to the Kovar plate by a molten He-Cu-Ti alloy.
〈発明の効果〉
1)活性金属に結合するセラミックであればいかなるヒ
ラミックでもサーメット居を形成することができる。<Effects of the Invention> 1) Any ceramic can be used to form a cermet matrix as long as it is bonded to an active metal.
2)メッキの手法を利用するので、薄くて複雑形状の層
を自在に形成できる。2) Since plating is used, thin layers with complex shapes can be freely formed.
3)結合金属に靭性がある。3) The bonding metal has toughness.
4)宥価である。4) It is affordable.
Claims (1)
層を部材表面に形成し、該メッキ金属素地に、活性金属
あるいは活性金属の合金を拡散、合金化させて該セラミ
ック粒子と素地のメッキ金属を焼結させることを特徴と
する部材表面にサーメット層を形成する方法。A composite plating layer in which ceramic particles are dispersed in a plated metal base is formed on the surface of the member, an active metal or an alloy of active metal is diffused and alloyed into the plated metal base, and the ceramic particles and the base plated metal are sintered. A method for forming a cermet layer on the surface of a member, the method comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5239887A JPS63219599A (en) | 1987-03-06 | 1987-03-06 | Formation of cermet layer on surface of member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5239887A JPS63219599A (en) | 1987-03-06 | 1987-03-06 | Formation of cermet layer on surface of member |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63219599A true JPS63219599A (en) | 1988-09-13 |
Family
ID=12913701
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5239887A Pending JPS63219599A (en) | 1987-03-06 | 1987-03-06 | Formation of cermet layer on surface of member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63219599A (en) |
-
1987
- 1987-03-06 JP JP5239887A patent/JPS63219599A/en active Pending
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