JPS63206671A - Inspection apparatus - Google Patents
Inspection apparatusInfo
- Publication number
- JPS63206671A JPS63206671A JP62039138A JP3913887A JPS63206671A JP S63206671 A JPS63206671 A JP S63206671A JP 62039138 A JP62039138 A JP 62039138A JP 3913887 A JP3913887 A JP 3913887A JP S63206671 A JPS63206671 A JP S63206671A
- Authority
- JP
- Japan
- Prior art keywords
- contact
- spring material
- electrodes
- inspected
- semiconductor element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 title claims description 11
- 239000000523 sample Substances 0.000 claims abstract description 21
- 239000000463 material Substances 0.000 abstract description 14
- 239000004065 semiconductor Substances 0.000 abstract description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 238000000059 patterning Methods 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 239000011889 copper foil Substances 0.000 abstract description 2
- 239000011295 pitch Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Measuring Leads Or Probes (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は、検査装置に関し、特に微細ピッチで多電極を
有する半導体素子の検査に好適な検査装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to an inspection apparatus, and particularly to an inspection apparatus suitable for inspecting a semiconductor element having multiple electrodes at a fine pitch.
(従来の技術)
一般に、IC,LSI等の半導体素子の電気的特性を検
査する検査装置として、第3図に示すように、半導体素
子1に設けられた電極パッド2に接触するプローブ針3
を多数個備えたものが使用されている。(Prior Art) In general, a probe needle 3 that contacts an electrode pad 2 provided on a semiconductor element 1 is used as an inspection apparatus for inspecting the electrical characteristics of a semiconductor element such as an IC or LSI, as shown in FIG.
A device with a large number of is used.
ところが、IC,LSI等の高集積化に伴って半導体素
子の電極パッドが増加し、かつ微細化されると、これら
の電極パッドに接触させるプローブ針も必然的に微細化
密集化する必要があり、プローブ針の製作調整が難しく
、信頼性が低い等の問題が生じている。However, as the number of electrode pads on semiconductor devices increases and becomes smaller due to higher integration of ICs, LSIs, etc., the probe needles that come into contact with these electrode pads must also be made smaller and denser. However, there are problems such as difficulty in manufacturing and adjusting the probe needle and low reliability.
特に、例えば液晶テレビ画面等の基板のように微細ピッ
チで多電極を有するものを検査しようとする場合、従来
のプローブ針を使用する検査装置では対応するのが極め
て困難である。In particular, when attempting to inspect a substrate having multiple electrodes at a fine pitch, such as a substrate such as a liquid crystal television screen, it is extremely difficult to do so with a conventional inspection apparatus using a probe needle.
上記の事情を考慮した技術として、例えば特開昭61−
2338号公報、特公昭61−14659号公報等によ
り開示された技術がある。As a technique that takes the above circumstances into consideration, for example, JP-A-61-
There are techniques disclosed in Japanese Patent Publication No. 2338, Japanese Patent Publication No. 61-14659, etc.
前者は、軟質プラスチック等の弾力性の絶縁フィルムの
表面にアルミニウム、銅等の導電性の金属膜を複数本並
列にパターニング配線したものをプローブ針とする構成
のものであり、また後者は基板の端部にマイクロストリ
ップラインを突出して設け、これをプローブ針として使
用する構成のものである。The former has a configuration in which the probe needle is made by patterning and wiring multiple conductive metal films such as aluminum or copper in parallel on the surface of an elastic insulating film made of soft plastic, etc. A microstrip line is provided protruding from the end and is used as a probe needle.
(発明が解決しようとする問題点)
しかしながら、上述の開示された技術には、次に述べる
ような問題点がある。(Problems to be Solved by the Invention) However, the above disclosed technology has the following problems.
すなわち、前者においては、半導体素子の電極パッドと
絶縁フィルム上の接触部とが接触する圧力は絶縁フィル
ム自身の弾性力を利用しているので、絶縁フィルムが軟
らかいと接触圧が弱く、固いと接触圧は強いが折れやす
い。In other words, in the former case, the contact pressure between the electrode pad of the semiconductor element and the contact part on the insulating film uses the elastic force of the insulating film itself, so if the insulating film is soft, the contact pressure is weak, and if the insulating film is hard, the contact pressure is weak. The pressure is strong, but it breaks easily.
一方、後者においては、上記接触圧は緩衝材により保持
されるため、マイクロストリップラインに弾性力は要求
されないものの、検査のたびに基板の端部において折り
曲げられるため、折れやすいという懸念がある。On the other hand, in the latter case, the contact pressure is maintained by a cushioning material, so the microstrip line does not require elastic force, but there is a concern that it may easily break because it is bent at the edge of the substrate every time it is inspected.
本発明は、上述の事情に対処してなされたもので、高精
度で接触が良く、信頼性に優れた検査装置を提供しよう
とするものである。The present invention has been made in response to the above-mentioned circumstances, and aims to provide an inspection device with high precision, good contact, and excellent reliability.
(問題点を解決するための手段)
すなわち本発明は、被検査体の電極に複数のプローブ針
を接触させて検査する検査装置において、絶縁性フィル
ムに形成した導電性配線からなるプローブ針と、このプ
ローブ針に弾力性を持たせるバネ材とを備え、上記被検
査体の電極に接触する上記プローブ針の接触部を上記被
検査体の電極方向に凸の彎曲状に構成したことを特徴と
する。(Means for Solving the Problems) That is, the present invention provides an inspection device for testing an object by bringing a plurality of probe needles into contact with the electrodes of the object to be inspected, which includes: probe needles made of conductive wiring formed on an insulating film; The probe needle is provided with a spring material that imparts elasticity, and the contact portion of the probe needle that contacts the electrode of the object to be inspected is configured to have a convex curved shape in the direction of the electrode of the object to be inspected. do.
(作 用)
本発明の検査装置では、絶縁性フィルム上に複数本並列
にパターニング形成された導電性配線でプローブ針を構
成し、このプローブ針の弾力性をバネ材で保持する構成
であるため、多数のプローブ針を高精度で配設でき、ま
た電極パッドとの接触が良好で、破損しにくく信頼性が
高いという特徴がある。(Function) In the inspection device of the present invention, the probe needle is composed of a plurality of conductive wirings patterned in parallel on an insulating film, and the elasticity of the probe needle is maintained by a spring material. , it is possible to arrange a large number of probe needles with high precision, has good contact with electrode pads, is difficult to break, and is highly reliable.
(実施例)
以下、本発明の検査装置の実施例を図面を参照して説明
する。(Example) Hereinafter, an example of the inspection apparatus of the present invention will be described with reference to the drawings.
=3−
第1図において、取付板11例えばガラスエポキシ基板
の下面には弾力性のある部材例えば薄板状の鋼板等のバ
ネ材12が取着されている。このバネ材12の取付板1
1端部より右方向に突出した部分は下方向に適度に曲げ
られ、その先端部付近の接触部13にて被検査体例えば
半導体素子14の電極15方向に凸の彎曲状に曲げられ
ている。=3- In FIG. 1, a resilient member such as a spring material 12 such as a thin steel plate is attached to the lower surface of a mounting plate 11 such as a glass epoxy board. Mounting plate 1 for this spring material 12
A portion protruding rightward from one end is moderately bent downward, and a contact portion 13 near the tip thereof is bent into a curved shape convex in the direction of the electrode 15 of the object to be inspected, for example, a semiconductor element 14. .
また、前記バネ材12の下面全体に渡り、パターニング
形成された銅泊等からなりプローブ針として用いる導電
性配線16を有する絶縁性フィルム17例えばF、P、
Cが接着剤その他の手段により固着されている。Further, over the entire lower surface of the spring material 12, an insulating film 17 made of patterned copper foil or the like and having conductive wiring 16 used as a probe needle, such as F, P, etc.
C is fixed by adhesive or other means.
そして、被検査体である半導体素子14上に設けられた
電極15と前記導電性配線16の先端接触部13とを接
触させて電気的特性の検査を行う。Then, the electrode 15 provided on the semiconductor element 14, which is the object to be inspected, is brought into contact with the tip contact portion 13 of the conductive wiring 16, and the electrical characteristics are inspected.
この時、導電性配線16の先端部13は、フォトリソグ
ラフィー技術等によりパターニング形成されているので
寸法位置は非常に正確である。したがって、この接触部
13と電極15との相対的位置合せは、導電性配線J6
の多少にかがねらず高精度にしかも簡単に行うことがで
きる。At this time, since the tip portion 13 of the conductive wiring 16 is patterned by photolithography or the like, the dimensional position is very accurate. Therefore, the relative alignment between the contact portion 13 and the electrode 15 is determined by the conductive wiring J6.
This can be done easily and with high precision without having to worry about the amount of time required.
また、接触部13と電極15との接触圧はバネ材12に
より充分確保でき、また接触部13は彎曲しているので
電極15とは面接触となるので接触不良は生じにくい。In addition, sufficient contact pressure between the contact portion 13 and the electrode 15 can be ensured by the spring material 12, and since the contact portion 13 is curved, it makes surface contact with the electrode 15, so that poor contact is unlikely to occur.
さらに、絶縁性フィルム17は弾力性の点で制限がなく
柔軟性に富んだものでも使用できるので高い信頼性を得
ることができる。Furthermore, since the insulating film 17 has no limitations in terms of elasticity and can be used even if it is highly flexible, high reliability can be obtained.
また、他の一つの実施例として、第2図に示すように、
取付板21の下面に、絶縁性フィルム27に形成された
導電性配線26を上面にし、取付板21と絶縁を保つよ
うに固着し、絶縁性フィルム27を図示のようにバネ材
22例えば絶縁性ゴム等を取り囲むように構成して、接
触部23と電極25を接触させるようにしても前述の実
施例と同等の効果を得ることができる。In addition, as another example, as shown in FIG.
The conductive wiring 26 formed on the insulating film 27 is attached to the lower surface of the mounting plate 21 so as to maintain insulation from the mounting plate 21, with the conductive wiring 26 formed on the insulating film 27 facing upward, and the insulating film 27 is attached to the spring material 22, e.g. Even if the contact portion 23 and the electrode 25 are brought into contact with each other by surrounding rubber or the like, the same effect as in the above embodiment can be obtained.
なお、プローブ針の形状は上記実施例に限定されるもの
ではなく、被検査体に対応して変形してもよいことは言
うまでもなく、また本発明の主旨を逸脱しない範囲内で
種々アレンジしてもよい。It should be noted that the shape of the probe needle is not limited to the above embodiment, and it goes without saying that it may be modified to suit the object to be inspected, and may be arranged in various ways without departing from the spirit of the present invention. Good too.
上述のように本発明によれば、微細ピッチで多電極を有
する半導体素子等をも、簡単に高信頼度で検査できる。As described above, according to the present invention, even semiconductor devices having multiple electrodes at fine pitches can be easily and highly reliably tested.
第1図は本発明の一実施例の説明用斜視図、第2図は第
1図の他の一実施例の説明用斜視図、第3図は従来例の
説明図である。
11.21・・・取付板、 12.22・・・バネ
材、13.23・・・接触部、 14・・・半港体
基板、15.25・・・電 極、 16.26・・
・導電性配線、17.27・・・絶縁性フィルム。
特許出願人 東京エレクトロン株式会社第2図
第3図FIG. 1 is an explanatory perspective view of one embodiment of the present invention, FIG. 2 is an explanatory perspective view of another embodiment shown in FIG. 1, and FIG. 3 is an explanatory diagram of a conventional example. 11.21... Mounting plate, 12.22... Spring material, 13.23... Contact part, 14... Half port board, 15.25... Electrode, 16.26...
- Conductive wiring, 17.27... Insulating film. Patent applicant Tokyo Electron Ltd. Figure 2 Figure 3
Claims (1)
る検査装置において、 絶縁性フィルムに形成した導電性配線からなるプローブ
針と、このプローブ針に弾力性を持たせるバネ材とを備
え、上記被検査体の電極に接触する上記プローブ針の接
触部を上記被検査体の電極方向に凸の彎曲状に構成した
ことを特徴とする検査装置。[Scope of Claims] An inspection device that tests by bringing a plurality of probe needles into contact with electrodes of an object to be inspected, the probe needles being made of conductive wiring formed on an insulating film, and the probe needles having elasticity. An inspection device comprising: a spring member, wherein a contact portion of the probe needle that contacts an electrode of the object to be inspected is configured in a curved shape convex toward the electrode of the object to be inspected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62039138A JPH0810234B2 (en) | 1987-02-24 | 1987-02-24 | Inspection equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62039138A JPH0810234B2 (en) | 1987-02-24 | 1987-02-24 | Inspection equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63206671A true JPS63206671A (en) | 1988-08-25 |
JPH0810234B2 JPH0810234B2 (en) | 1996-01-31 |
Family
ID=12544748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62039138A Expired - Lifetime JPH0810234B2 (en) | 1987-02-24 | 1987-02-24 | Inspection equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0810234B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4998062A (en) * | 1988-10-25 | 1991-03-05 | Tokyo Electron Limited | Probe device having micro-strip line structure |
JPH0360141A (en) * | 1989-07-28 | 1991-03-15 | Tokyo Electron Ltd | Probe equipment |
JPH04233480A (en) * | 1990-09-14 | 1992-08-21 | Internatl Business Mach Corp <Ibm> | Flexible-tape type probe |
JPH04363671A (en) * | 1991-06-10 | 1992-12-16 | Nippon Maikuronikusu:Kk | Manufacture of probe board and probe group |
KR20010076322A (en) * | 2000-01-19 | 2001-08-11 | 가부시키가이샤 어드밴티스트 | Contact structure having contact bumps |
WO2009011201A1 (en) * | 2007-07-13 | 2009-01-22 | Tokyo Electron Limited | Inspecting structure |
JP2009294064A (en) * | 2008-06-05 | 2009-12-17 | Totoku Electric Co Ltd | High frequency measuring probe |
JP2011228215A (en) * | 2010-04-22 | 2011-11-10 | Nhk Spring Co Ltd | Connection terminal, connector, socket and semiconductor package |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5656646A (en) * | 1979-10-15 | 1981-05-18 | Hitachi Ltd | Probing head |
JPS58197835A (en) * | 1982-05-14 | 1983-11-17 | Nec Corp | Prober |
JPS5992584A (en) * | 1982-11-18 | 1984-05-28 | Agency Of Ind Science & Technol | Probe for testing superconductive thin film functional integrated circuit element |
JPS59155769A (en) * | 1983-02-25 | 1984-09-04 | Seiko Epson Corp | Inspecting apparatus for electronic device |
-
1987
- 1987-02-24 JP JP62039138A patent/JPH0810234B2/en not_active Expired - Lifetime
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5656646A (en) * | 1979-10-15 | 1981-05-18 | Hitachi Ltd | Probing head |
JPS58197835A (en) * | 1982-05-14 | 1983-11-17 | Nec Corp | Prober |
JPS5992584A (en) * | 1982-11-18 | 1984-05-28 | Agency Of Ind Science & Technol | Probe for testing superconductive thin film functional integrated circuit element |
JPS59155769A (en) * | 1983-02-25 | 1984-09-04 | Seiko Epson Corp | Inspecting apparatus for electronic device |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4998062A (en) * | 1988-10-25 | 1991-03-05 | Tokyo Electron Limited | Probe device having micro-strip line structure |
JPH0360141A (en) * | 1989-07-28 | 1991-03-15 | Tokyo Electron Ltd | Probe equipment |
JPH04233480A (en) * | 1990-09-14 | 1992-08-21 | Internatl Business Mach Corp <Ibm> | Flexible-tape type probe |
JPH04363671A (en) * | 1991-06-10 | 1992-12-16 | Nippon Maikuronikusu:Kk | Manufacture of probe board and probe group |
KR20010076322A (en) * | 2000-01-19 | 2001-08-11 | 가부시키가이샤 어드밴티스트 | Contact structure having contact bumps |
WO2009011201A1 (en) * | 2007-07-13 | 2009-01-22 | Tokyo Electron Limited | Inspecting structure |
JP5079806B2 (en) * | 2007-07-13 | 2012-11-21 | 東京エレクトロン株式会社 | Inspection structure |
TWI391671B (en) * | 2007-07-13 | 2013-04-01 | Tokyo Electron Ltd | Inspection structure |
JP2009294064A (en) * | 2008-06-05 | 2009-12-17 | Totoku Electric Co Ltd | High frequency measuring probe |
JP2011228215A (en) * | 2010-04-22 | 2011-11-10 | Nhk Spring Co Ltd | Connection terminal, connector, socket and semiconductor package |
Also Published As
Publication number | Publication date |
---|---|
JPH0810234B2 (en) | 1996-01-31 |
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