JP2533431Y2 - IC wafer test probe - Google Patents

IC wafer test probe

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Publication number
JP2533431Y2
JP2533431Y2 JP1990104309U JP10430990U JP2533431Y2 JP 2533431 Y2 JP2533431 Y2 JP 2533431Y2 JP 1990104309 U JP1990104309 U JP 1990104309U JP 10430990 U JP10430990 U JP 10430990U JP 2533431 Y2 JP2533431 Y2 JP 2533431Y2
Authority
JP
Japan
Prior art keywords
contact
insulating film
wafer
wiring board
elastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990104309U
Other languages
Japanese (ja)
Other versions
JPH0463135U (en
Inventor
勝三郎 川口
忠男 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Priority to JP1990104309U priority Critical patent/JP2533431Y2/en
Publication of JPH0463135U publication Critical patent/JPH0463135U/ja
Application granted granted Critical
Publication of JP2533431Y2 publication Critical patent/JP2533431Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)

Description

【考案の詳細な説明】 「産業上の利用分野」 この考案は半導体ウエーハの状態の半導体集積回路の
試験に用いられ、半導体ウエーハの電極(パッド)に接
触させてその電極を配線基板の配線に接続するためのIC
ウエーハ試験用プローブに関する。
[Detailed description of the invention] "Industrial application field" This invention is used for testing a semiconductor integrated circuit in a state of a semiconductor wafer, and is brought into contact with an electrode (pad) of the semiconductor wafer to connect the electrode to a wiring of a wiring board. IC to connect
The present invention relates to a wafer test probe.

「従来の技術」 従来のICウエーハ試験用プローブを有するプローブカ
ードは第4図に示すように配線基板11の一面にタングス
テン線の針状のプローブ12の一端が多数固定され、これ
らプローブ12の他端は例えば方形の各辺上に配列され
て、配線基板11と反対側に直角に折り曲げられて接触端
とされ、これら接触端は、ICウエーハ13の一つのチップ
上の複数のパッド(電極)14の配置と同一とされてあ
り、配線基板11をICウエーハ13上に平行接近させて選択
したチップのパッド14の各対応するものにプローブ12の
接触端をそれぞれ弾性的に接触して、これらパッド14を
プローブ12を通じ、更に配線基板11上の配線を通じて試
験装置と接触し、試験をするようにされている。この場
合、配線基板11とICウエーハ13との平行度が多少ずれて
も、プローブ12のたわみにより各プローブ12とパッド14
との良好な接触が得られている。
[Prior Art] In a conventional probe card having a probe for IC wafer test, as shown in FIG. 4, one end of a needle-like probe 12 of tungsten wire is fixed to one surface of a wiring board 11, The ends are arranged on each side of a square, for example, and are bent at right angles to the side opposite to the wiring board 11 to be contact ends. These contact ends are formed by a plurality of pads (electrodes) on one chip of the IC wafer 13. The wiring board 11 is brought close to the IC wafer 13 in parallel and the contact end of the probe 12 is elastically contacted with each corresponding one of the pads 14 of the selected chip. The pad 14 is brought into contact with a test device through the probe 12 and further through the wiring on the wiring board 11 to perform a test. In this case, even if the parallelism between the wiring board 11 and the IC wafer 13 is slightly deviated, each probe 12 and the pad 14
Good contact has been obtained.

「考案が解決しようとする課題」 従来のICウエーハ試験用プローブカードはプローブが
針状体であるため、高速信号の伝送に適せず、信号波形
がなまったりするため、高速度の半導体集積回路の試験
を正しく行うことが困難であった。
"Problems to be solved by the invention" Conventional probe cards for IC wafer testing are not suitable for high-speed signal transmission because the probes are needle-shaped, and signal waveforms are distorted, resulting in high-speed semiconductor integrated circuits. It was difficult to perform the test correctly.

このような点から絶縁フイルムの一面に、ICウエーハ
のパッド配置と同一配置で複数の接点を形成し、これら
接点に一端が接続されたマイクロストリップラインをそ
の絶縁フイルムに形成し、その絶縁フイルムを配線基板
に保持するとともに、その配線にマイクロストリップラ
インの対応するものを接続し、絶縁フイルムを介してそ
の接点をICウエーハ上のパッドに弾性的に押さえ、その
パッドをマイクロストリップラインを通じて配線基板の
配線に接続することが考えられる。
From such a point, a plurality of contacts are formed on one surface of the insulating film in the same arrangement as the pad arrangement of the IC wafer, a microstrip line having one end connected to these contacts is formed on the insulating film, and the insulating film is formed. While holding it on the wiring board, connect the corresponding one of the microstrip lines to the wiring, elastically press the contacts to the pads on the IC wafer through the insulating film, and press the pads on the wiring board through the microstrip lines. Connection to wiring is conceivable.

このようにすれば高速度の半導体集積回路に対し、正
しくウエーハ試験を行うことができる。しかし、絶縁フ
イルムの接点形成面をICウエーハと正確に平行にして接
触させないと、すべてのパッドに各接点を良好に接触さ
せることができず、この接点形成面をICウエーハに正確
に平行とさせる問題があり、また各接点の高さにバラツ
キがあると、接触不良のものが生じる問題もある。
In this way, a wafer test can be correctly performed on a high-speed semiconductor integrated circuit. However, if the contact forming surface of the insulating film is not exactly parallel to the IC wafer and is not in contact with the IC wafer, all the contacts cannot be brought into good contact with all the pads, and the contact forming surface must be exactly parallel to the IC wafer. There is a problem, and if there is a variation in the height of each contact, there is also a problem that a contact failure occurs.

「課題を解決するための手段」 この考案によるICウエーハ試験用プローブは、 一つの面の中央部に凹部を有する剛体よりなるコンタ
クト保持体と、 そのコンタクト保持体の上記一つの面側に取り付けら
れ、上記凹部と対向する外面にICウエーハのパッドとそ
れぞれ接触されるべき複数の接点が形成され、かつその
各接点とそれぞれ一端が接続されたマイクロストリップ
ラインが形成された絶縁フイルムと、 その絶縁フイルムの上記接点が形成された部分の内面
と接して設けられた弾性板と、 その弾性板の上記絶縁フイルムと反対側において上記
凹部内に配され、上記弾性板と平面で接触し、その面と
反対側にこれと平行した平面を有する剛体よりなる加圧
体と、 上記凹部の底面に取り付けられ、上記加圧体の上記平
面の中心部と点状接触している突起体を有し、上記弾性
板よりも硬い弾性体と、 上記コンタクト保持体と一体に形成され、このコンタ
クト保持体を配線基板に取り付けるための固定具とを具
備する。
[Means for Solving the Problems] The probe for IC wafer testing according to the present invention includes a contact holder made of a rigid body having a concave portion in the center of one surface, and a probe attached to the one surface side of the contact holder. An insulating film in which a plurality of contacts to be respectively contacted with the pads of the IC wafer are formed on an outer surface facing the concave portion, and a microstrip line is formed in which one end is connected to each of the contacts; and an insulating film thereof. An elastic plate provided in contact with the inner surface of the portion where the contact is formed, and the elastic plate is disposed in the recess on the opposite side of the insulating film from the insulating film, and comes into contact with the elastic plate in a plane, and A pressurizing body made of a rigid body having a plane parallel to the opposite side, attached to the bottom surface of the recess, and in point contact with the center of the plane of the pressurizing body An elastic body having a protrusion that is harder than the elastic plate; and a fixture formed integrally with the contact holder and for attaching the contact holder to a wiring board.

「実施例」 第1図にこの考案の実施例を示す。配線基板21は通常
は円形であり、その中心部に中心孔22が形成されてお
り、配線基板21の一面に配線23が形成されている。配線
基板21の配線23側にプローブ24が取り付けられる。
FIG. 1 shows an embodiment of the present invention. The wiring board 21 is usually circular, has a central hole 22 formed in the center thereof, and has a wiring 23 formed on one surface of the wiring board 21. The probe 24 is attached to the wiring 23 of the wiring board 21.

プローブ24は剛体よりなるコンタクト保持体25を備
え、コンタクト保持体25は耐熱性を持たせる点から、例
えばガラス樹脂で作られ、配線基板21側はほゞ平面状と
され、その中心部に固定部26が一体に突出形成され、固
定部26は中心孔22を通じて配線基板21の他面より突出し
ている。コンタクト保持体25の配線基板21側の面におい
て固定部26の周辺部は、一段と突出した接触面27とさ
れ、この接触面27はコンタクト保持体25の軸心と垂直で
あり、配線基板21と対接している。コンタクト保持体25
の配線基板21と反対の面は外側にわずか膨出したゆるい
弯曲面28とされている。この弯曲面28の中央部に凹部29
が形成されている。
The probe 24 is provided with a contact holding body 25 made of a rigid body, and the contact holding body 25 is made of, for example, glass resin in order to impart heat resistance, and the wiring board 21 side is almost flat and fixed to the center thereof. The part 26 is integrally formed so as to protrude, and the fixing part 26 protrudes from the other surface of the wiring board 21 through the center hole 22. On the surface of the contact holding body 25 on the wiring board 21 side, the periphery of the fixing portion 26 is a contact surface 27 that protrudes further, and this contact surface 27 is perpendicular to the axis of the contact holding body 25 and Are in contact. Contact holder 25
The surface opposite to the wiring board 21 is a loose curved surface 28 slightly swelling outward. A concave portion 29 is formed at the center of the curved surface 28.
Are formed.

コンタクト保持体25の弯曲面28側に絶縁フイルム31が
配され、絶縁フイルム31の凹部29と対向する部分の外面
に、第2図、第3図に示すように、ICウエーハ13のパッ
ド14と接触すべき複数の接点(いわゆるバンプ)32が例
えばメッキにより形成される。接点32の配置はICウエー
ハ13のパッド14の配置と同一とされてある。第2図では
接点32は方形の各辺に沿って配列されている。これら各
接点32に一端が接続されたマイクロストリップライン33
が絶縁フイルム31に形成される。つまり、絶縁フイルム
31の内面のほゞ全面にわたって導電性接地層33gが形成
され、外面に各接点32と一端が接続された信号線33sが
形成される。各信号線33sは接点32の方形配列に対し外
側に延長されている。絶縁フイルム31は接点32の方形配
列の各辺と対応して四方に折り返し部31aがそれぞれ一
体に延長され、これら各折り返し部31aにマイクロスト
リップライン33が分配延長されている。
An insulating film 31 is disposed on the curved surface 28 side of the contact holding body 25, and a pad 14 of the IC wafer 13 is provided on an outer surface of a portion of the insulating film 31 facing the concave portion 29, as shown in FIGS. A plurality of contacts (so-called bumps) 32 to be contacted are formed, for example, by plating. The arrangement of the contacts 32 is the same as the arrangement of the pads 14 of the IC wafer 13. In FIG. 2, the contacts 32 are arranged along each side of the square. A microstrip line 33 having one end connected to each of the contacts 32
Is formed on the insulating film 31. In other words, insulating film
A conductive grounding layer 33g is formed over almost the entire inner surface of 31, and a signal line 33s having one end connected to each contact 32 is formed on the outer surface. Each signal line 33s extends outward with respect to the rectangular arrangement of the contacts 32. Insulating film 31 has folded portions 31a integrally extending in four directions corresponding to the respective sides of the rectangular arrangement of contacts 32, and microstrip lines 33 are distributed and extended to each folded portion 31a.

第1図に示すように、この絶縁フイルム31はその接地
層33gをコンタクト保持体25の弯曲面28に対接させ、折
り返し部31aをコンタクト保持体25の配線基板21側の面
に折り返して対接される。この折り返された折り返し部
31aと配線基板21との間にプラスチックコネクタ34が介
在される。プラスチックコネクタ34は弾性絶縁層に多数
の細い導電線が互いに絶縁されて両端がそれぞれ両面に
達するように埋め込まれ、絶縁層の両面間に接した導体
を細い導電線を通じて互いに電気的に接続するものであ
る。プラスチックコネクタ34によりマイクロストリップ
ライン33とこれと対応する配線23とがそれぞれ接続され
る。
As shown in FIG. 1, this insulating film 31 has its ground layer 33g in contact with the curved surface 28 of the contact holder 25, and the folded portion 31a is folded back to the surface of the contact holder 25 on the wiring board 21 side. Touched. This folded part
A plastic connector 34 is interposed between 31a and wiring board 21. The plastic connector 34 has a large number of thin conductive wires embedded in an elastic insulating layer so as to be insulated from each other and both ends reach both surfaces, and electrically connects conductors in contact between both surfaces of the insulating layer to each other through the thin conductive wires. It is. The microstrip line 33 and the corresponding wiring 23 are connected by the plastic connector 34, respectively.

固定具35により固定部26の部分でコンタクト保持体25
が配線基板21に取外し自在に取り付けられる。この例で
は固定具35はナットであり、固定部26の外周に形成され
たねじに固定具35で締め付けられる。この時、接触面27
が配線基板21に対接される。この例では接触面27にピン
36が突出して立てられ、ピン36が配線基板21に形成され
た小孔に挿入されて、コンタクト保持体25が配線基板21
に対して位置決めされる。
The contact holder 25 is fixed at the fixing part 26 by the fixing tool 35.
Are detachably attached to the wiring board 21. In this example, the fixing tool 35 is a nut, and is fastened to the screw formed on the outer periphery of the fixing portion 26 by the fixing tool 35. At this time, the contact surface 27
Are brought into contact with the wiring board 21. In this example, a pin is
The pin 36 is protruded and erected, and the pin 36 is inserted into a small hole formed in the wiring board 21 so that the contact holder 25 is
Is positioned with respect to

コンタクト保持体25と絶縁フイルム31との間に弾性加
圧手段37が介在され、接点32をICウエーハ13のパッド14
に弾性接触させることができるようにされる。弾性加圧
手段37は第3図に上下方向において各部を離して示して
あるが、これは順次互いに接触している。絶縁フイルム
31の接点32が形成されている部分の内面にシリコンゴム
などの弾性板38が対接され、その弾性板38の絶縁フイル
ム31と反対の面に剛体よりなる加圧体39が平面41で対接
される。加圧体39の平面41と反対の面は平面41と平行な
平面42とされている。加圧体39は例えばガラスプレート
で構成される。加圧体39の平面42の中心と点状接触させ
て弾性体43が凹部29内でその底面に接着固定される。弾
性体43は例えばシリコンゴムで構成され、先端が半球状
となっている突起43aが突出し、突起43aが加圧体39と弾
性接触している。弾性体43の平面42との対向面の全体を
平面42側に凸の球面状としてもよい。弾性板38を弾性体
43より軟らかにすることが好ましい。
An elastic pressing means 37 is interposed between the contact holder 25 and the insulating film 31, and the contact 32 is connected to the pad 14 of the IC wafer 13.
So that it can be elastically contacted. FIG. 3 shows the elastic pressing means 37 separated from each other in the vertical direction, but they are sequentially in contact with each other. Insulating film
An elastic plate 38 made of silicon rubber or the like is in contact with the inner surface of the portion where the contact point 32 of 31 is formed, and a pressing body 39 made of a rigid body is opposed on a flat surface 41 on the surface of the elastic plate 38 opposite to the insulating film 31. Touched. The surface of the pressing body 39 opposite to the plane 41 is a plane 42 parallel to the plane 41. The pressing body 39 is formed of, for example, a glass plate. The elastic body 43 is adhered and fixed to the bottom surface of the pressing body 39 in the recess 29 in a point-like contact with the center of the flat surface 42 of the pressing body 39. The elastic body 43 is made of, for example, silicone rubber, and a protrusion 43a having a hemispherical tip protrudes, and the protrusion 43a is in elastic contact with the pressing body 39. The entire surface of the elastic body 43 facing the flat surface 42 may be formed into a spherical shape convex toward the flat surface 42. Elastic plate 38 elastic
It is preferable to make it softer than 43.

このプローブ24をその接点32がICウエーハ13のパッド
14の対応するものに接触するようにICウエーハ13に押さ
えると弾性板38の弾性により、接点32の高さのバラツキ
を吸収し、かつ弾性体43によりコンタクト保持体25とIC
ウエーハ13との傾きを吸収し、またコンタクト保持体25
をICウエーハ13にある程度近づけ過ぎても、そのオーバ
ードライブ量が弾性体43で吸収される。加圧体39は平面
度を出し、つまり、その平面41がICウエーハ13と正しく
平行するようにし、かつ弾性板38と弾性体43の各役割を
分離している。
The probe 24 is connected to the pad 32 of the IC wafer 13
When the IC wafer 13 is pressed against the corresponding one of the IC wafers 13, the elasticity of the elastic plate 38 absorbs the variation in the height of the contact 32, and the elastic body 43 and the contact holder 25 and the IC
Absorbs the inclination of the wafer 13 and the contact holder 25
Is too close to the IC wafer 13 to some extent, the overdrive amount is absorbed by the elastic body 43. The pressing body 39 provides flatness, that is, the plane 41 is correctly parallel to the IC wafer 13, and the roles of the elastic plate 38 and the elastic body 43 are separated.

「考案の効果」 以上述べたように、この考案によれば接点32をパッド
14と接触させ、その接点32をマイクロストリップライン
33で配線基板の配線と接続しているため、高速度の半導
体集積回路に対しても正しく試験をすることができる。
しかも絶縁フイルム31の接点32の形成部に対し、弾性板
38、加圧体39、弾性体43で弾性的にパッド14へ押してい
るため、接点32の高さのバラツキにかゝわらず、またコ
ンタクト保持体25とICウエーハとの平行性のずれにかゝ
わらず、常に各接点32を対応するパッド14に良好に接触
させることができる。このため、この考案のプローブ24
を配線基板21に取り付ける時、その平行度を厳密に保つ
必要がなく、プローブ24を配線基板21に簡単に取り付け
ることができる。また弾性加圧手段37がプローブ24内に
含まれているため、プローブ24を交換しても、調整を必
要としない。
[Effect of the invention] As described above, according to the invention, the contact 32 is padded.
14 and contact 32 to the microstrip line.
Since it is connected to the wiring of the wiring board at 33, it is possible to correctly test even a high-speed semiconductor integrated circuit.
In addition, an elastic plate is used for the portion where the contact 32 of the insulating film 31 is formed.
38, the pressing body 39 and the elastic body 43 are elastically pressed against the pad 14, so that the contact 32 does not vary in height and the contact holding body 25 and the parallelism between the IC wafer are not affected. Nevertheless, each contact 32 can always be brought into good contact with the corresponding pad 14. For this reason, the probe of the present invention 24
When the probe 24 is attached to the wiring board 21, the probe 24 can be easily attached to the wiring board 21 without having to keep the parallelism strict. Further, since the elastic pressing means 37 is included in the probe 24, no adjustment is required even if the probe 24 is replaced.

【図面の簡単な説明】[Brief description of the drawings]

第1図はこの考案の実施例を配線基板に取り付けた状態
を示す断面図、第2図はその絶縁シート31の拡大平面
図、第3図は弾性加圧手段37の分解図、第4図は従来の
プローブカードを示す断面図である。
FIG. 1 is a sectional view showing an embodiment of the present invention mounted on a wiring board, FIG. 2 is an enlarged plan view of the insulating sheet 31, FIG. 3 is an exploded view of the elastic pressing means 37, and FIG. FIG. 2 is a sectional view showing a conventional probe card.

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】一つの面の中央部に凹部を有する剛体より
なるコンタクト保持体と、 そのコンタクト保持体の上記一つの面側に取り付けら
れ、上記凹部と対向する外面にICウエーハのパッドとそ
れぞれ接触されるべき複数の接点が形成され、かつその
各接点とそれぞれ一端が接続されたマイクロストリップ
ラインが形成された絶縁フイルムと、 その絶縁フイルムの上記接点が形成された部分の内面と
接して設けられた弾性板と、 その弾性板の上記絶縁フイルムと反対側において上記凹
部内に配され、上記弾性板と平面で接触し、その面と反
対側にこれと平行した平面を有する剛体よりなる加圧体
と、 上記凹部の底面に取り付けられ、上記加圧体の上記平面
の中心部と点状接触している突起体を有し、上記弾性板
よりも硬い弾性体と、 上記コンタクト保持体と一体に形成され、このコンタク
ト保持体を配線基板に取り付けるための固定具と、 を具備するICウエーハ試験用プローブ。
1. A contact holder made of a rigid body having a concave portion in the center of one surface, and an IC wafer pad attached to an outer surface of the contact holder attached to the one surface side and facing the concave portion. An insulating film on which a plurality of contacts to be contacted are formed, and a microstrip line having one end connected to each of the contacts, and an inner surface of a portion of the insulating film where the contacts are formed; And a rigid body which is disposed in the recess on the opposite side of the elastic film to the insulating film, is in flat contact with the elastic plate, and has a plane parallel to the surface on the opposite side. An elastic body that is attached to the bottom surface of the concave portion and is in point contact with the center of the flat surface of the pressing body, and is harder than the elastic plate; An IC wafer test probe, which is formed integrally with the tact holder and includes a fixture for attaching the contact holder to the wiring board.
JP1990104309U 1990-10-03 1990-10-03 IC wafer test probe Expired - Lifetime JP2533431Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990104309U JP2533431Y2 (en) 1990-10-03 1990-10-03 IC wafer test probe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990104309U JP2533431Y2 (en) 1990-10-03 1990-10-03 IC wafer test probe

Publications (2)

Publication Number Publication Date
JPH0463135U JPH0463135U (en) 1992-05-29
JP2533431Y2 true JP2533431Y2 (en) 1997-04-23

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JP1990104309U Expired - Lifetime JP2533431Y2 (en) 1990-10-03 1990-10-03 IC wafer test probe

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Publication number Priority date Publication date Assignee Title
US5436568A (en) * 1994-01-25 1995-07-25 Hughes Aircraft Company Pivotable self-centering elastomer pressure-wafer probe
JP7336176B2 (en) * 2017-12-18 2023-08-31 株式会社ヨコオ Inspection jig

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Publication number Priority date Publication date Assignee Title
US4906920A (en) * 1988-10-11 1990-03-06 Hewlett-Packard Company Self-leveling membrane probe

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