JPS63206347A - Manufacture of ceramic sintered body - Google Patents
Manufacture of ceramic sintered bodyInfo
- Publication number
- JPS63206347A JPS63206347A JP62037527A JP3752787A JPS63206347A JP S63206347 A JPS63206347 A JP S63206347A JP 62037527 A JP62037527 A JP 62037527A JP 3752787 A JP3752787 A JP 3752787A JP S63206347 A JPS63206347 A JP S63206347A
- Authority
- JP
- Japan
- Prior art keywords
- sintered body
- ceramic sintered
- weight
- firing
- coating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000919 ceramic Substances 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000010304 firing Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 10
- 239000012752 auxiliary agent Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 239000007791 liquid phase Substances 0.000 claims description 3
- 239000011247 coating layer Substances 0.000 description 14
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 238000005245 sintering Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 241001071944 Cyta Species 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Ceramic Products (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、セラミックス焼結体の製造方法に関する。更
に詳しくは、セラミックス形成材料に助剤を添加し、焼
成するセラミックス焼結体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a ceramic sintered body. More specifically, the present invention relates to a method for producing a ceramic sintered body by adding an auxiliary agent to a ceramic forming material and firing the mixture.
従来、セラミックス焼結体の表面を改質しようとする場
合、まずセラミックス焼結体を焼成し、それを別の装置
１例えば化学的真空蒸着装置などを用いて表面処理して
おり、従って工程数が多い、厚いコーティング層の形成
が難しい、形成されたコーテイング膜の強度が低い、複
雑な形状の物体に均一にコーティングすることが難しい
などの欠点がみられた。Conventionally, when attempting to modify the surface of a ceramic sintered body, the ceramic sintered body is first fired, and then the surface is treated using another device such as a chemical vacuum evaporation device, which reduces the number of steps. The disadvantages were that it was difficult to form a thick coating layer, the strength of the formed coating film was low, and it was difficult to uniformly coat objects with complex shapes.
一方、セラミックス焼結材料１例えば窒化けい素Ｃ５ｘ
３Ｎ４ ）またはＳｉ、Ｎ、、ＡＩＮ、 Ａｌ□０．お
よびＳｉＯ□からなる化合物（商品名サイアロン）など
に酸化イツトリウムＣＹｔ ａｓ ）、酸化マグネシウ
ム（ＭｇＯ）、酸イｅアルミニウム（Ａｌｉｏａ）など
の焼結助剤を約１０重量％程度迄添加してこれを成形し
、約６００〜１２００℃の温度で約０．５〜３時間仮焼
する方法なども知られているが（特開昭６１−８６４６
９号公報）、これらの金属酸化物の働きはあく迄も焼結
助剤としての作用であって、製造された焼結体の表面特
性を改善させるものではない。On the other hand, ceramic sintered material 1 such as silicon nitride C5x
3N4) or Si, N, AIN, Al□0. A sintering aid such as yttrium oxide (CYtas), magnesium oxide (MgO), or aluminum oxide (Alioa) is added to a compound consisting of SiO□ (trade name: Sialon) to about 10% by weight. A method of molding and calcining at a temperature of about 600 to 1200°C for about 0.5 to 3 hours is also known (Japanese Patent Laid-Open No. 61-8646).
No. 9), the function of these metal oxides is strictly as a sintering aid, and does not improve the surface characteristics of the produced sintered body.
本発明者は、焼結体焼成後の表面処理法によるのではな
く、焼結体の焼成時に同時に焼結体の表面特性を改善せ
しめるような方法を求めて種々検討を行なった結果、助
剤としてＺｒＯ２またはＴｉＯ２を用い、これを添加し
て焼成すると、これらの金属酸化物は焼成過程において
表面に拡散する性質を有しているので焼結体表面にコー
ティング層を形成し、焼結体の表面特性を改善し得るこ
とを見出した。The present inventor conducted various studies in search of a method that would improve the surface characteristics of a sintered body at the same time as the sintering process, instead of using a surface treatment method after firing the sintered body. When ZrO2 or TiO2 is used as a sintered body and is added and fired, these metal oxides have the property of diffusing to the surface during the firing process, so a coating layer is formed on the surface of the sintered body, and the sintered body is heated. It has been found that surface properties can be improved.
〔問題点を解決するための手段〕および〔作用〕従って
、本発明はセラミックス焼結体の製造方法に係り、セラ
ミックス焼結体の製造は、セラミックス形成材料にＺｒ
Ｏ□またはＴｉＯ２を助剤として添加し、該添加助剤の
液相生成温度以上で焼成することにより行われる。[Means for Solving the Problems] and [Operation] Therefore, the present invention relates to a method for producing a ceramic sintered body, and the production of the ceramic sintered body includes adding Zr to the ceramic forming material.
This is carried out by adding O□ or TiO2 as an auxiliary agent and firing at a temperature higher than the liquid phase formation temperature of the added auxiliary agent.
セラミックス形成材料としては、前述の如く窒化けい素
、サイアロンまたはこれらに約１０重量％以下の焼結助
剤を添加したものなどが用いられる。As the ceramic forming material, as mentioned above, silicon nitride, sialon, or a material to which about 10% by weight or less of a sintering aid is added is used.
これらに更に添加されるＺｒＯ，またはＴｉＯ２は、一
般にセラミックス形成材料に対し約５〜４０重量％、好
ましくは約１０〜３０重量％の割合で用いられる。ZrO or TiO2, which is further added to these materials, is generally used in an amount of about 5 to 40% by weight, preferably about 10 to 30% by weight, based on the ceramic forming material.
これ以下の添加割合では、本発明の目的とする所期の効
果が得られず、一方これ以上の割合で用いられると、セ
ラミックス形成材料の特性が失われるようになる。If the addition ratio is less than this, the desired effect aimed at by the present invention cannot be obtained, while if the addition ratio is more than this, the characteristics of the ceramic forming material will be lost.
焼成体の製造は、これらの混合物を一旦所望形状に成形
した後、ＺｒＯ□またはＴｉＯ□の液相生成温度以上、
即ち約１６００℃以上に約１〜１０時間焼成することに
より行われる。The production of the fired body involves once forming these mixtures into a desired shape, and then heating the mixture to a temperature higher than the liquid phase formation temperature of ZrO□ or TiO□.
That is, it is carried out by firing at a temperature of about 1600° C. or higher for about 1 to 10 hours.
従来用いられている焼結助剤は、焼成中に焼成体の表面
に拡散するような現象はみられず、ＺｒＯ２またはＴｉ
Ｏ□を助剤として用い、焼成した場合にのみ、焼成体の
表面に拡散によるコーティング層の形成という特有の現
象がみられる。Conventionally used sintering aids do not diffuse to the surface of the fired product during firing, and do not contain ZrO2 or Ti.
Only when firing is performed using O□ as an auxiliary agent, a unique phenomenon of formation of a coating layer by diffusion on the surface of the fired product is observed.
本発明によれば、次のような効果が奏せられる。 According to the present invention, the following effects can be achieved.
（１）焼成と同時に、焼成体の表面にコーティング層が
形成される。(1) At the same time as firing, a coating layer is formed on the surface of the fired body.
（２）比較的厚い（約１０〜５０μｍ）コーティング層
が簡単に形成される。(2) Relatively thick (approximately 10-50 μm) coating layers are easily formed.
（３）焼成体内部からの拡散物質でコーティング層が形
成されるため、内部とコーティング層とが連続した構造
となり、コーティング強度が高くなる。(3) Since the coating layer is formed by the diffused substance from inside the fired body, the interior and the coating layer form a continuous structure, increasing the coating strength.
（４）複雑な形状の焼成体であっても、均一なコーティ
ング層が形成される。(4) A uniform coating layer is formed even if the fired body has a complicated shape.
（５）焼成体表面に形成されるコーティング層は。(5) The coating layer formed on the surface of the fired product.
ＺｒＮまたはＴｉＮの化学的構造を有するため、金属に
対する摩擦摩耗特性が良好である。Since it has a chemical structure of ZrN or TiN, it has good friction and wear characteristics against metals.
（６）このＺｒＮまたはＴｉＮは導電性があり、絶縁体
であるＳｉ、Ｎ、などの焼成体表面に導電性膜を形成さ
せる６
（７）コーテイング膜が金色で、装飾性に富んでいる。(6) This ZrN or TiN is conductive and forms a conductive film on the surface of the fired body of insulators such as Si and N.6 (7) The coating film is gold in color and highly decorative.
次に、実施例について本発明を説明する。 Next, the present invention will be explained with reference to examples.
実施例Ｉ
Ｓｉ、 Ｎ、に助剤としてＺｒＯ，７，５重量％、Ｙ、
０，０．５重量％およびＡｌ２Ｏ，２重量％を添加、成
形し、１気圧の窒素雰囲気中、１８５０℃で５時間焼成
したところ、焼結体の表面に厚さ約３０μｍの強固に結
合されたＺｒＮコーティング層が形成された。形成され
たＺｒＮコーティング層の抵抗率は約０．２Ω・ｃｍ、
また摩擦係数は０．１以下であった。Example I Si, N, ZrO, 7.5% by weight as an auxiliary agent, Y,
When 0.0.5% by weight and 2% by weight of Al2O were added, molded, and fired at 1850°C for 5 hours in a nitrogen atmosphere of 1 atm, a solid bond with a thickness of about 30 μm was formed on the surface of the sintered body. A ZrN coating layer was formed. The resistivity of the formed ZrN coating layer is approximately 0.2Ω·cm,
Moreover, the friction coefficient was 0.1 or less.
実施例２
ＳＬ、Ａｌ０Ｎ、の組成になるように、α−Ｓｉ、 Ｎ
いＡｌ、０３およびＡＩＮをそれぞれ秤量し、それに助
剤としてＺｒ０，７．５重量％、Ｙ２Ｏ，０，５重量％
を添加、成形し、１気圧の窒素雰囲気中、１７００℃で
１．５時間焼成したところ、焼結体の表面に厚さ１０μ
ｍのＺｒＮコーティング層が形成された。Example 2 α-Si, N so that the composition of SL, Al0N
Weighed Al, 03 and AIN, respectively, and added 0.7.5% by weight of Zr and 0.5% by weight of Y2O as auxiliaries.
was added, molded, and fired at 1,700°C for 1.5 hours in a nitrogen atmosphere of 1 atm. As a result, a thickness of 10μ was formed on the surface of the sintered body.
A ZrN coating layer of m was formed.
実施例３ 実施例１において、助剤としてＴｉＯ□１３重量％。Example 3 In Example 1, 13% by weight of TiO□ was used as an auxiliary agent.
Ｙ、 ０．５重量％およびＡｌ、０．２重量％を用いる
と、焼結体の表面に厚さ約１０μｍのＴｉＮコーティン
グ層が形成された。When 0.5% by weight of Y and 0.2% by weight of Al were used, a TiN coating layer with a thickness of about 10 μm was formed on the surface of the sintered body.
比較例
実施例１において、ＺｒＯ□を用いないで焼成を行なう
と、焼結体の表面にはコーティング層が形成されなかっ
た。Comparative Example In Example 1, when firing was performed without using ZrO□, no coating layer was formed on the surface of the sintered body.
手続補正書（自制 昭和６２年８月２８日Procedural amendment (self-restraint) August 28, 1986
Claims (1)
２を助剤として添加し、該添加助剤の液相生成温度以上
で焼成することを特徴とするセラミックス焼結体の製造
方法。 ２、セラミックス形成材料に対し約５〜４０重量％の助
剤が用いられる特許請求の範囲第１項記載のセラミック
ス焼結体の製造方法。 ３、約１６００℃以上で焼成が行われる特許請求の範囲
第１項記載のセラミックス焼結体の製造方法。[Claims] 1. ZrO_2 or TiO_ in the ceramic forming material
1. A method for producing a ceramic sintered body, characterized in that 2 is added as an auxiliary agent, and firing is performed at a temperature higher than the liquid phase formation temperature of the added auxiliary agent. 2. The method for manufacturing a ceramic sintered body according to claim 1, wherein about 5 to 40% by weight of the auxiliary agent is used based on the ceramic forming material. 3. The method for producing a ceramic sintered body according to claim 1, wherein the firing is performed at a temperature of about 1600° C. or higher.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62037527A JPH0811713B2 (en) | 1987-02-20 | 1987-02-20 | Manufacturing method of ceramics sintered body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62037527A JPH0811713B2 (en) | 1987-02-20 | 1987-02-20 | Manufacturing method of ceramics sintered body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63206347A true JPS63206347A (en) | 1988-08-25 |
| JPH0811713B2 JPH0811713B2 (en) | 1996-02-07 |
Family
ID=12500014
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62037527A Expired - Fee Related JPH0811713B2 (en) | 1987-02-20 | 1987-02-20 | Manufacturing method of ceramics sintered body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0811713B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021031751A1 (en) * | 2019-08-16 | 2021-02-25 | Oppo广东移动通信有限公司 | Zirconia ceramic and preparation method therefor, housing, and electronic device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57166370A (en) * | 1981-04-02 | 1982-10-13 | Sumitomo Electric Industries | Manufacture of non-oxide ceramics |
| JPS6221750A (en) * | 1985-07-18 | 1987-01-30 | 株式会社日本触媒 | Manufacture of ceramic sintered body |
-
1987
- 1987-02-20 JP JP62037527A patent/JPH0811713B2/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57166370A (en) * | 1981-04-02 | 1982-10-13 | Sumitomo Electric Industries | Manufacture of non-oxide ceramics |
| JPS6221750A (en) * | 1985-07-18 | 1987-01-30 | 株式会社日本触媒 | Manufacture of ceramic sintered body |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021031751A1 (en) * | 2019-08-16 | 2021-02-25 | Oppo广东移动通信有限公司 | Zirconia ceramic and preparation method therefor, housing, and electronic device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0811713B2 (en) | 1996-02-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |