JPS6320454A - Vapor deposition device - Google Patents
Vapor deposition deviceInfo
- Publication number
- JPS6320454A JPS6320454A JP16374586A JP16374586A JPS6320454A JP S6320454 A JPS6320454 A JP S6320454A JP 16374586 A JP16374586 A JP 16374586A JP 16374586 A JP16374586 A JP 16374586A JP S6320454 A JPS6320454 A JP S6320454A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- chamber
- deposition material
- cylindrical
- electron gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 35
- 239000000463 material Substances 0.000 claims abstract description 27
- 238000010894 electron beam technology Methods 0.000 claims abstract description 11
- 230000008020 evaporation Effects 0.000 abstract description 13
- 238000001704 evaporation Methods 0.000 abstract description 13
- 238000001816 cooling Methods 0.000 abstract description 7
- 230000010355 oscillation Effects 0.000 abstract 1
- 230000008021 deposition Effects 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は蒸着装置に関するものである・〔従来の技術
〕
従来蒸着処理室でルツボに入れられた蒸着材料を、電子
銃からの電子ビームを電子銃に組込まれた揺動コイルに
より、Ｘ軸、Ｙ軸の２軸に揺動させ、ルツボ表面から均
一に蒸発させ被処理材に蒸着することが行なわれている
。[Detailed Description of the Invention] [Industrial Field of Application] This invention relates to a vapor deposition apparatus. [Prior Art] Conventionally, a vapor deposition material placed in a crucible in a vapor deposition processing chamber is exposed to an electron beam from an electron gun. An oscillating coil built into the electron gun is used to oscillate the electron gun along two axes, the X-axis and the Y-axis, to uniformly evaporate from the surface of the crucible and deposit it onto the material to be processed.
しかし従来、ルツボが熱変形により破損する事故がしば
しばあっ九。また、ルツがの耐熱性が低いのでルツボ全
体を冷却してやる必要があシ、電子ビームにより入射さ
れた熱エネルギーがルツボを通って、冷却によりうばわ
れてしまい、熱効率が悪かつ九。However, in the past, there were often accidents where crucibles were damaged due to thermal deformation. In addition, since the crucible has low heat resistance, it is necessary to cool the entire crucible, and the thermal energy incident by the electron beam passes through the crucible and is dissipated by cooling, resulting in poor thermal efficiency.
この発明は上記のような問題点を解消できるようにした
蒸着装置全提供することを目的とするものである。The object of the present invention is to provide a vapor deposition apparatus that can solve the above-mentioned problems.
〔問題点全解決するための手段２作用〕蒸着処理室に円
筒形に成形し次蒸着材料を駆動装置により回転可能に設
けると共に電子銃からの電子ビームを上記蒸着材料の軸
方向に揺動させる。[Means for solving all the problems 2 actions] A cylindrical-shaped material for subsequent evaporation is provided in the evaporation processing chamber so that it can be rotated by a drive device, and the electron beam from the electron gun is swung in the axial direction of the evaporation material. .
こうして、蒸着材料をルツボに入れることなく蒸着させ
るのでルツ？の破損事故は無くなり、また熱効率が向上
する。電子銃のビーム揺動が単一軸方向のみとなシ構造
が簡単になる。In this way, the vapor deposition material is vapor-deposited without putting it into the crucible. Damage accidents will be eliminated, and thermal efficiency will be improved. The beam swing of the electron gun is only in a single axis direction, which simplifies the structure.
本発明の一実施例を鋼帯Ｓに連続的に蒸着する場合につ
いて、第１図、第２図により説明する。An embodiment of the present invention in which continuous vapor deposition is performed on a steel strip S will be described with reference to FIGS. 1 and 2.
蒸着処理室１に予備室２がｆ−）パルプ３を介して接続
されている。図中１０は、パイ≠シャフト１１０周夛に
円筒状に成形された蒸着材料である。A preliminary chamber 2 is connected to the vapor deposition chamber 1 via f-) pulp 3. In the figure, 10 is a vapor deposition material formed into a cylindrical shape so that pi≠shaft 110 circumferences.
ノ［：：１
蒸着処理室ｌには、電動機Ｊ４により且転駆動される冷
却軸１３が設けられ、この冷却軸１３にはめられ九蒸着
材料ＩＱを回転するようになっている。また蒸着処理室
１に電子銃λ６が設けられ、電子ビーム１ｒＦｉ偏向磁
界１８により蒸着材料１０に向けられると共に、電子ビ
ームは蒸着材料１０の軸方向に揺動されるようになって
いる。A cooling shaft 13 rotatably driven by an electric motor J4 is provided in the vapor deposition processing chamber 1, and is fitted onto the cooling shaft 13 to rotate the vapor deposition material IQ. Further, an electron gun λ6 is provided in the vapor deposition processing chamber 1, and the electron beam 1rFi is directed toward the vapor deposition material 10 by a deflecting magnetic field 18, and the electron beam is oscillated in the axial direction of the vapor deposition material 10.
こうして、蒸着材料は、蒸着材料の回転と電子ビームの
軸方向揺動とによって、表面から一様に局部蒸発され、
良好な蒸着全行うことができる。In this way, the vapor deposition material is locally evaporated uniformly from the surface by the rotation of the vapor deposition material and the axial swing of the electron beam.
A good deposition can be carried out in all cases.
また蒸着材料を殆んど完全に蒸発きせることかできる。Furthermore, the deposition material can be almost completely evaporated.
また蒸着材料、予備室、電動機、ｒ−）パルプ等を複数
配貨し、交互に切換えることで連続蒸着が可能でおる。Furthermore, continuous vapor deposition is possible by distributing a plurality of vapor deposition materials, preliminary chambers, electric motors, r-pulp, etc., and switching them alternately.
第１図、第２図で、ビーム偏向磁界を１８から１９に切
換え、蒸着材料１０から２０へ蒸発を切換える。蒸発の
終了した残りの蒸着材料１０は、ｒ−）パルプを通って
ふたたび、予備室にもどされる。ダートパルプを閉じ、
蒸着材を新しいものと取換え、ｒ−トパルツを開け、蒸
着処理室内に装入されて、切換準備が完了する。In FIGS. 1 and 2, the beam deflection magnetic field is switched from 18 to 19, and the evaporation is switched from 10 to 20. The remaining vapor deposition material 10 that has been evaporated is returned to the preliminary chamber through the r-) pulp. Close the dirt pulp,
The vapor deposition material is replaced with a new one, the r-topart is opened, and the material is placed into the vapor deposition processing chamber, completing preparations for switching.
このようにして、連続蒸着を行なうことができる。In this way, continuous deposition can be performed.
この方式によれば必要に応じて冷却軸のみを冷却すれば
よくルツボを使う場合に比べ冷却必要面積が少なくなる
ので、冷却により蒸着処理室から持出される熱エネルギ
ーが少なくてすみ、電子ビームにより入射され比熱の大
部分が蒸発に使われるので熱効率が向上する。With this method, only the cooling shaft needs to be cooled as needed, and the area required for cooling is smaller than when using a crucible, so less thermal energy is taken out of the deposition chamber by cooling, and the electron beam Most of the incident specific heat is used for evaporation, improving thermal efficiency.
この発明は上記のようなもので、ルツボを用いない構成
であるのでルツボの破損事故が皆無になることは勿論、
蒸発の熱効率も向上し、電子銃のビーム揺動コイルが回
転軸方向の１つだけですみ、構造が簡単になシ、信頼性
も向上する。This invention is as described above, and since it has a structure that does not use a crucible, it goes without saying that there will be no accidents of crucible damage.
The thermal efficiency of evaporation is also improved, and the electron gun requires only one beam swinging coil in the direction of the rotation axis, simplifying the structure and improving reliability.
蒸発は、線蒸発であり、ルツがのよりに面蒸発による蒸
発むらがなく良好な蒸着を行なうことができる。The evaporation is a line evaporation, and the evaporation is smooth and there is no evaporation unevenness due to surface evaporation, and good evaporation can be performed.
第１図は本発明製電の一実施例を示す縦断面図、第２図
は第１図のｎ−ｎ線矢視図である。
１・・・蒸着処理室、１０．２０・・・円筒形蒸着材料
、１６・・・電子銃、１７・・・電子ビーム。FIG. 1 is a longitudinal cross-sectional view showing an embodiment of electrical production according to the present invention, and FIG. 2 is a view taken along the line nn in FIG. 1. 1... Vapor deposition processing chamber, 10.20... Cylindrical vapor deposition material, 16... Electron gun, 17... Electron beam.
Claims (1)
り回転可能に設けると共に、電子銃からの電子ビームを
上記蒸着材料の軸方向に揺動させるように設けてなる蒸
着装置。A vapor deposition apparatus in which a cylindrical vapor deposition material is rotatably provided in a vapor deposition processing chamber by a drive device, and an electron beam from an electron gun is oscillated in the axial direction of the vapor deposition material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16374586A JPS6320454A (en) | 1986-07-14 | 1986-07-14 | Vapor deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16374586A JPS6320454A (en) | 1986-07-14 | 1986-07-14 | Vapor deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6320454A true JPS6320454A (en) | 1988-01-28 |
Family
ID=15779875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16374586A Pending JPS6320454A (en) | 1986-07-14 | 1986-07-14 | Vapor deposition device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6320454A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0284575A (en) * | 1988-08-30 | 1990-03-26 | Teijin Ltd | Surface-modified wholly aromatic polyamide fiber |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6059064A (en) * | 1983-08-20 | 1985-04-05 | ライボルト・アクチエンゲゼルシャフト | Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process |
| JPS60194067A (en) * | 1984-03-16 | 1985-10-02 | Agency Of Ind Science & Technol | Formation of hard film |
-
1986
- 1986-07-14 JP JP16374586A patent/JPS6320454A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6059064A (en) * | 1983-08-20 | 1985-04-05 | ライボルト・アクチエンゲゼルシャフト | Method and device for controlling local evaporation power of evaporator on manufacturing thin layer on substrate by vacuum evaporation process |
| JPS60194067A (en) * | 1984-03-16 | 1985-10-02 | Agency Of Ind Science & Technol | Formation of hard film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0284575A (en) * | 1988-08-30 | 1990-03-26 | Teijin Ltd | Surface-modified wholly aromatic polyamide fiber |
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