JP2017172917A - Substrate processing device and substrate processing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technology that suppresses generation of wrinkle in a substrate after drying to process the substrate in a preferable state.SOLUTION: In a substrate processing device, a transportation part includes a transportation element that is provided downstream from a drying part along a transportation route and transports a substrate via a gas layer, thereby reducing a contact area between the substrate after being heated by the drying part and the transportation element having room temperature. As a result, the substrate is suppressed in generation of a wrinkle therein.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a technique for processing a substrate whose main surface is supplied with a coating liquid.

  For example, in the manufacture of a lithium secondary battery, after supplying a coating liquid such as an electrode solution to one main surface of a base material such as an aluminum foil, the coating liquid on the base material is transferred while the base material is conveyed. Techniques for drying are known.

  Patent Document 1 discloses a technique for drying a coating liquid supplied to a main surface of a base material in a drying unit while transporting the base material in a roll-to-roll manner. Here, the drying unit has a first part that blows hot air against the base material on the upstream side of the transport path, and a second part that blows dry air on the base material on the downstream side of the transport path. . For this reason, when the conveyed base material passes the 1st part, hot air is sprayed on a base material, and evaporation of the solvent in a coating liquid is accelerated | stimulated on the main surface of a base material. Thereafter, when the substrate to be conveyed passes through the second portion, dry air is blown onto the substrate, and the temperature of the substrate is lowered. And the base material which passed the drying part is cooled by contact with the surrounding atmosphere, and is collect | recovered with a winding roller.

JP2012-202600A

  Generally, the temperature of the base material after passing through the drying section is higher than room temperature. For this reason, when a normal temperature roller located on the downstream side of the transport path from the drying unit and a substrate having a higher temperature contact with each other, the substrate contracts due to a temperature difference, and the substrate does not shrink. May occur.

  This invention is made | formed in view of such a subject, Comprising: It suppresses generation | occurrence | production of the wrinkle in the base material after drying, and it aims at providing the technique which processes a base material in a favorable state.

  In order to solve the above-described problem, the substrate processing apparatus according to the first aspect includes a conveyance unit that conveys a substrate with a coating liquid supplied to a main surface along a conveyance path, and the conveyance unit that conveys the substrate. A drying unit that dries the coating liquid supplied to the main surface by performing a process including a heat treatment on the base material, and the transport unit is configured by the drying unit along the transport path. Is also provided on the upstream side, and is provided on the downstream side of the drying unit along the transport path, and transports the base material via a gas layer. A second conveying element.

  A substrate processing apparatus according to a second aspect is the substrate processing apparatus according to the first aspect, wherein the transport unit is provided downstream of the drying unit along the transport path and A third conveying element that has a larger contact area with the substrate than that of the second conveying element, and the third conveying element is located downstream of the second conveying element along the conveying path. To position.

  The base material processing apparatus according to the third aspect is the base material processing apparatus according to the first aspect or the second aspect, wherein the second transport element is parallel to the main surface and of the base material. Including a roller rotatable about an axis extending in a crossing direction intersecting the transport direction, and rotating the roller so that a peripheral speed of the roller is faster than a transport speed of the base material transported by the transport unit And a drive unit for causing the device to move.

  The base material processing apparatus according to the fourth aspect is the base material processing apparatus according to any one of the first to third aspects, wherein the transport unit is downstream of the drying unit and the crossing direction. A plurality of rollers that are capable of transporting each of the base materials by being rotated about an axis extending in the direction and are arranged in one section of the transport path, and extending the transport path before and after the one section. The difference in the angle in the current direction is the total value of the holding angles of the plurality of rollers with respect to the base material.

  A substrate processing apparatus according to a fifth aspect is the substrate processing apparatus according to any one of the first to fourth aspects, wherein the second transport element is parallel to the main surface and the base An air supply roller that is rotatable about an axis that extends in a crossing direction that intersects the conveying direction of the material, and that has an outer peripheral part in which an air supply port is arranged and an air supply path connected to the air supply port, A gas supply unit configured to supply gas to the air supply path;

  The base material processing apparatus according to the sixth aspect is the base material processing apparatus according to the fifth aspect, wherein the temperature of the gas is higher than the temperature of the portion of the base material that is conveyed by the air supply roller. Low.

  The base material processing apparatus according to the seventh aspect is the base material processing apparatus according to any one of the first to sixth aspects, wherein the drying unit is applied to the base material transported by the transport unit. After the heat treatment is performed, a cooling treatment for cooling the base material heated by the heat treatment is performed, and the coating liquid supplied to the main surface is dried.

  The base material processing apparatus according to the eighth aspect includes a transport unit that transports a base material supplied with a coating liquid to a main surface along a transport path, and a heat treatment for the base material transported by the transport unit. A drying unit that dries the coating liquid supplied to the main surface, and the transport unit is provided downstream of the drying unit along the transport path, A roller that is rotatable about an axis that is parallel to the main surface and that extends in a crossing direction that intersects the transport direction of the base material, and the circumferential speed of the roller is transported by the transport unit. And a drive unit that rotates the roller so as to be faster than the conveyance speed.

  In the substrate processing method according to the ninth aspect, drying is performed to dry the coating liquid supplied to the main surface by performing a treatment including heat treatment on the base material supplied with the coating liquid on the main surface. And a transporting step of transporting the base material subjected to the treatment in the drying step through a gas layer by a transport element.

  According to any of the substrate processing apparatus according to the first to eighth aspects and the substrate processing method according to the ninth aspect, the contact area between the element responsible for transporting the substrate after drying and the substrate becomes small, Occurrence of wrinkles can be suppressed.

1 is a diagram illustrating an overall configuration of a substrate processing apparatus 1. It is a figure which shows the schematic internal structure of the heating part. FIG. 4 is a view showing a peripheral portion of a second roller and a third roller 83. It is a figure which shows a mode at the time of the 2nd roller 82 conveying the base material 5. FIG. It is a figure which shows a mode at the time of the roller 821 in a comparative example conveying the base material 5. FIG. It is a figure which shows the roller 822 which concerns on a modification. It is a figure which shows a mode at the time of the roller 822 in a modification conveying the base material 5. FIG.

  Hereinafter, embodiments will be described with reference to the drawings. In the drawings, parts having similar configurations and functions are denoted by the same reference numerals, and redundant description is omitted. In addition, the following embodiment is an example which actualized this invention, and is not an example which limits the technical scope of this invention. In the drawings, the size and number of each part may be exaggerated or simplified. In the drawings, XYZ orthogonal coordinate axes may be attached to explain directions. The + Z direction on the coordinate axis is a vertically upward direction, and the XY plane is a horizontal plane.

<1 embodiment>
<1.1 Configuration of Substrate Processing Apparatus 1>
FIG. 1 is a diagram illustrating an overall configuration of a substrate processing apparatus 1 according to the present embodiment.

  The substrate processing apparatus 1 forms a coating film on the substrate 5 by supplying the coating solution to one main surface of the substrate 5 that is a metal foil and then drying the coating solution. Thereby, for example, an electrode of a lithium ion secondary battery is manufactured.

  The base material 5 is comprised with the material which functions as a collector of a lithium ion secondary battery, for example. When the substrate processing apparatus 1 manufactures a positive electrode of a lithium ion secondary battery, an aluminum foil (Al) can be used as the substrate 5. Moreover, when the base material processing apparatus 1 manufactures the negative electrode of a lithium ion secondary battery, copper foil (Cu) may be used as the base material 5.

  The base material 5 is a long sheet-like (long belt-like) metal foil, and the width and thickness thereof are not particularly limited. For example, a substrate having a width of about 600 mm to 700 mm and a thickness of about 10 μm to 20 μm can be used. In the present specification, among the two main surfaces of the substrate 5, the main surface to which the coating liquid is supplied may be particularly referred to as a main surface S <b> 1.

  The substrate processing apparatus 1 mainly performs drying for drying a coating unit 80 that transports the substrate 5 along the transport path, a coating unit that includes the coating nozzle 11, and a coating solution on the substrate 5 that is transported. Unit 40 and a control unit 90 that controls each unit of the apparatus.

  The conveyance unit 80 includes an unwinding roller 88 for unwinding the base material 5 and a winding roller 89 for winding the base material 5, and transports the base material 5 from the unwinding roller 88 toward the winding roller 89. To do. In addition, the conveyance unit 80 includes three first rollers 81, a second roller 82, a third roller 83, and a backup roller 87 between the unwinding roller 88 and the winding roller 89.

  In this specification, the conveyance path means a passage path of the base material 5 conveyed by the conveyance unit 80. The unwinding roller 88 side in the transport path may be referred to as a transport upstream side, and the take-up roller 89 side in the transport path may be referred to as a transport downstream side. Further, the conveyance direction means a direction in which the base material 5 moves in a section having a conveyance path. For example, in the section between the unwinding roller 88 and the first roller 81 located on the upstream side of conveyance, the conveyance direction is the direction of the arrow shown in FIG.

  Each roller included in the transport unit 80 is configured to be rotatable about an axis that is parallel to the main surface S <b> 1 of the substrate 5 and extends in an intersecting direction that intersects the transport direction of the substrate 5. In the present embodiment, the intersecting direction coincides with the Y direction, but the intersecting direction may be slightly inclined with respect to the Y direction.

  At least a part (for example, the second roller 82, the unwinding roller 88, and the take-up roller 89) of the rollers included in the conveyance unit 80 is provided with a driving unit that drives these rollers. On the other hand, other rollers (for example, the first roller 81 and the third roller 83) included in the transport unit 80 are not provided with a driving unit. For this reason, the base material 5 is conveyed along a conveyance path | route because the said one part roller rotates mainly by the drive force of a drive part. The other rollers are also rotated by the frictional force with the substrate 5. By rotating each roller of the transport unit 80, the base material 5 is transported in the X direction and the Z direction along the transport path.

  Moreover, in this specification, each conveyance element (this embodiment each roller) which the conveyance part 80 has may be distinguished conceptually.

  The element that is provided on the upstream side of the drying unit 40 along the transport path and transports the base material 5 may be referred to as a first transport element. In the present embodiment, three first rollers 81, a backup roller 87, and an unwinding roller 88 are included in the first transport element.

  In addition, the element that is provided on the downstream side of the drying unit 40 along the transport path and transports the base material 5 through the gas layer may be referred to as a second transport element. In the present embodiment, the second roller 82 is included in the second transport element.

  Moreover, the element which is provided in the downstream rather than the drying part 40 along the conveyance path | route, and has a larger contact area with the base material 5 than the case of a 2nd conveyance element. It may be called a 3rd conveyance element. In the present embodiment, the third roller 83 and the take-up roller 89 are included in the third transport element.

  The coating nozzle 11 is a slit nozzle having a slit opening along the width direction of the substrate 5 (Y-axis direction in FIG. 1). The coating nozzle 11 discharges the coating liquid fed from the pump unit 15 from the slit opening and supplies it to the main surface S <b> 1 of the substrate 5.

  A backup roller 87 is provided on the opposite side of the coating nozzle 11 across the transport path. As described above, since the coating liquid is supplied to the portion of the base material 5 that is supported by the backup roller 87, the undulation of the base material 5 due to the liquid pressure at the time of supplying the coating liquid is prevented. In parallel with the operation in which the coating nozzle 11 supplies the coating liquid to the main surface S1, the substrate 5 is transported along the transport path. Thereby, the liquid film (coating film) of the coating liquid is applied onto the main surface S1.

As the coating liquid, a liquid (electrode paste) containing an active material that is an electrode material is used. When the positive electrode is manufactured by the substrate processing apparatus 1, for example, lithium cobaltate (LiCoO ₂ ) which is a positive electrode active material, carbon (C) which is a conductive additive, and polyfluoride which is a binder are used as a coating liquid. A mixed liquid of vinylidene chloride (PVDF) and an organic solvent N-methyl-2-pyrrolidone (NMP) can be used. In addition, the specific kind of coating liquid is not limited to this. For example, lithium nickelate (LiNiO ₂ ), lithium manganate (LiMn ₂ O ₄ ), or lithium iron phosphate (LiFePO ₄ ) may be used as the positive electrode active material instead of lithium cobaltate.

On the other hand, when the negative electrode is produced by the substrate processing apparatus 1, for example, a mixed liquid of graphite (graphite) as the negative electrode active material, PVDF as the binder, and NMP as the organic solvent is used as the coating liquid. Can be. In addition, the specific kind of coating liquid is not limited to this. For example, instead of graphite, hard carbon, lithium titanate (Li ₄ Ti ₅ O ₁₂ ), a silicon alloy, a tin alloy, or the like may be used as the negative electrode active material. In both the positive electrode material and the negative electrode material coating liquid, styrene-butadiene rubber (SBR) or the like may be used as a binder instead of PVDF.

  The drying unit 40 includes a preheating unit 41, a heating unit 42, and a cooling unit 43 in series along the conveyance path. The base material 5 passes through the inside of the preheating part 41, the heating part 42, and the cooling part 43 in order in the process of being conveyed along a conveyance path | route. The drying unit 40 is a part that dries the coating liquid supplied to the main surface S <b> 1 by performing a process including a heating process on the base material 5 transported by the transport unit 80.

  The preheating unit 41, the heating unit 42, and the cooling unit 43 are common in that the supply liquid on the substrate 5 is dried by supplying and exhausting air in the chamber. Below, the heating part 42 is first demonstrated in detail. Then, the preheating part 41 and the cooling part 43 are demonstrated, omitting a common part with the heating part 42.

  FIG. 2 is an XZ side view showing a schematic internal configuration of the heating unit 42. In FIG. 2, the airflow in the chamber 410 is schematically represented by arrows.

  The heating unit 42 mainly includes a gas supply unit 45, a gas supply unit 55, an intake unit 46, and an intake unit 56 inside the chamber 410.

  The chamber 410 is a housing in which a carry-in port 411 is formed on the transport upstream side and a carry-out port 412 is formed on the transport downstream side, and is indicated by a one-dot chain line in FIG. The conveyance path is a path that passes through the chamber 410 through the carry-in port 411 and the carry-out port 412. The length of the chamber 410 is not particularly limited, but is about 3000 mm in this embodiment. Further, the sizes of the carry-in port 411 and the carry-out port 412 are not particularly limited, but in the present embodiment, an interval of about 5 mm can be secured above and below the conveyance path (that is, the size in the vertical direction). Is about 10 mm).

  Inside the chamber 410, a plurality (five in the present embodiment) of gas supply units 45 and a plurality (six in the present embodiment) of air intake units 46 are alternately arranged along the transport path on the upper side of the transport path. Has been placed. A rectifying plate 47 is disposed below each of the five gas supply units 45. The rectifying plate 47 is a plate-like member provided so as to be parallel to the conveyance path. The rectifying plate 47 is provided with a slit-like air supply port extending along the width direction (Y direction) of the base material 5, and the air supply port faces the main surface S <b> 1 of the base material 5 to be conveyed. It is open.

  The gas supply unit 45 is connected to the air guide pipe 35, and jets hot air supplied through the air guide pipe 35 from the air supply port of the rectifying plate 47 toward the base material 5 in the conveyance path. The proximal end side of the air guide pipe 35 is connected to the gas supply source 34, and the distal end side is branched into five and each is connected to the gas supply unit 45 in communication. A flow rate adjusting valve 36 is inserted in each of the five air guide pipes 35 branched. The gas supply source 34 includes a heater and a blower, and supplies the heated air to the gas supply unit 45 as hot air. The flow rate of hot air supplied to each gas supply unit 45 is individually adjusted by the corresponding flow rate adjustment valve 36. And the hot air sent to the gas supply part 45 through the air guide pipe 35 is ejected from the air supply port of the baffle plate 47 toward the liquid film P (coating film) of the coating liquid on the main surface S1.

  Further, six intake portions 46 are provided for the five gas supply portions 45, and the gas supply portions 45 are provided between the intake portions 46 arranged adjacent to each other in the X direction. An intake port extending along the width direction of the base material 5 is provided on the lower surface of each intake portion 46. Each intake section 46 is connected to an exhaust section 58 through an exhaust pipe 57. That is, the proximal end side of the exhaust pipe 57 is connected to the exhaust part 58, and the distal end side is branched into six and each is connected to the intake part 46. A flow rate adjusting valve 91 is inserted in each of the exhaust pipes 57 branched into six. The exhaust unit 58 includes a suction blower and applies a negative pressure to the intake unit 46 via the exhaust pipe 57. As a result, the intake section 46 sucks the atmosphere around the intake port and discharges it to the exhaust pipe 57. The flow rate of each intake section 46 is individually adjusted by the corresponding flow rate adjustment valve 91.

  On the other hand, inside the chamber 410, a plurality (five in this embodiment) of gas supply units 55 and a plurality (two in this embodiment) of air intakes 56 are arranged below the conveyance path.

  Each of the five gas supply units 55 includes a plurality of ejection holes (not shown) facing upward. The gas supply unit 55 is connected to the gas supply source 53 through the air guide tube 52. That is, the proximal end side of the air guide tube 52 is connected to the gas supply source 53, and the distal end side is branched into five and each is connected to the gas supply unit 55. A flow rate adjusting valve 54 is inserted in each of the five air guide tubes 52 branched. The gas supply source 53 includes a heater and a blower, and supplies the heated air to the gas supply unit 55 as hot air. The flow rate of hot air supplied to each gas supply unit 55 is individually adjusted by the corresponding flow rate adjustment valve 54. And the hot air sent to the gas supply part 55 through the wind guide pipe 52 is ejected toward the lower main surface of the base material 5 conveyed from the ejection hole.

  Further, two intake parts 56 are provided for the five gas supply parts 55. An intake port extending along the width direction of the base material 5 is provided on the upper surface of each intake portion 56. Each intake section 56 is connected to an exhaust section 93 through an exhaust pipe 92. That is, the proximal end side of the exhaust pipe 92 is connected to the exhaust part 93, and the distal end side is branched into two and each is connected to the intake part 56. A flow rate adjusting valve 94 is inserted in each of the two branched exhaust pipes 92. The exhaust unit 93 includes a suction blower, and applies a negative pressure to the intake unit 56 via the exhaust pipe 92. As a result, the intake section 56 sucks the atmosphere around the upper intake port and discharges it to the exhaust pipe 92. The flow rate that each intake section 56 intakes is individually adjusted by the corresponding flow rate adjustment valve 94.

  When the gas supply unit 45 blows hot air from above the substrate 5, the liquid film P applied to the main surface S <b> 1 of the substrate 5 is directly heated. As shown in FIG. 2, the hot air blown from the gas supply unit 45 to the upper surface of the base material 5 flows along the X direction between the rectifying plate 47 and the base material 5 provided in parallel with the transport path, The gas is collected in the intake section 46 provided on both sides of the gas supply section 45. Since hot air flows between the rectifying plate 47 and the base material 5, the liquid film P on the base material 5 continues to be in contact with hot air with low humidity, and the liquid film P is efficiently dried. Further, the gas supply unit 55 blows hot air from below the base material 5, whereby the base material 5 is directly heated, and the liquid film P is heated by heat conduction from the base material 5. Hot air blown from the gas supply unit 55 to the lower surface of the substrate 5 is collected by the intake unit 56.

  Moreover, the five gas supply parts 55 spraying hot air toward the upper direction from the lower side of the base material 5 causes the base material 5 to face upward by the wind pressure of the hot air in addition to the function of indirectly heating the liquid film P. There is a work to surface. For this reason, even if an inherent roller is not provided in the chamber 410, the base material 5 is prevented from being greatly bent.

  The preheating unit 41 is provided upstream of the heating unit 42 in terms of conveyance. Similarly to the heating unit 42, the preheating unit 41 also promotes drying of the liquid film P on the substrate 5 by supplying gas into the chamber. In the preheating unit 41, for example, the temperature of the gas supplied to the base material 5 is set to be higher than the normal temperature and lower than the temperature of hot air supplied from the heating unit 42. As another example, in the preheating unit 41, as described in Patent Document 1, the base material 5 may be heated by infrared irradiation. In any case, the substrate 5 is preheated by the preheating unit 41 prior to heating the substrate 5 by the heating unit 42, thereby drying the coating liquid on the substrate 5 not only to the surface layer but also to the inside. It becomes possible.

  The cooling unit 43 is provided on the transport downstream side of the heating unit 42. Similarly to the heating unit 42, the cooling unit 43 also promotes drying of the liquid film P on the substrate 5 by supplying gas into the chamber. In the cooling unit 43, for example, normal temperature dry air is supplied to the base material 5.

  Although the base material 5 is cooled by supplying dry air, the base material 5 does not need to be cooled to room temperature inside the cooling unit 43. It is sufficient that the base material 5 reaches room temperature by the timing finally collected by the take-up roller 89, and the cooling unit 43 heats the base material 5 at a specific temperature (heating unit 42) in order to achieve this purpose. It plays a role of cooling to a temperature lower than that immediately after being performed and higher than normal temperature).

  And the base material 5 which passed the drying part 40 and was given the drying process is conveyed by the 2nd conveyance element and the 3rd conveyance element which were provided in the downstream from the drying part 40 along the conveyance path | route. Transport process).

  Specifically, the base material 5 that has passed through the drying unit 40 is transported through the second roller 82 and the third roller 83 and then collected by the take-up roller 89. The collected base material 5 is conveyed to a processing unit (not shown) outside the base material processing apparatus 1, cut into a desired size by the processing unit, and then processed as an electrode plate.

  The control unit 90 controls the mechanism of each unit provided in the substrate processing apparatus 1, and the hardware configuration is the same as that of a general computer. That is, the control unit 90 stores a CPU that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a readable and writable memory that stores various information, control software, data, and the like. It is configured with a magnetic disk. The processing in the substrate processing apparatus 1 proceeds by the CPU of the control unit 90 executing a predetermined processing program.

<1.2 Relationship between apparatus size and generation of wrinkles in substrate 5>
Here, the relationship between the apparatus size and the occurrence of wrinkles in the substrate 5 is organized.

  As described above, the cooling unit 43 plays a role of cooling the base material 5 to the specific temperature, but does not play a role of cooling the base material 5 to room temperature. This is because if the cooling unit 43 plays a role of cooling the substrate 5 to room temperature, the size of the cooling unit 43 in the transport direction is increased, and the size of the substrate processing apparatus 1 is increased.

  However, in the aspect in which the cooling unit 43 cools the base material 5 only to a specific temperature, wrinkles are more likely to occur in the base material 5 than in other modes in which the cooling unit 43 cools the base material 5 to room temperature.

  This is considered to be the following principle. When the high temperature base material 5 is cooled, a shrinkage force acts on the base material 5 due to the temperature change. Since the tension | tensile_strength by the conveyance part 80 is provided to the extension direction of the base material 5 at this time, the base material 5 shrink | contracts especially in the width direction. For example, in a situation where the base material 5 is flow-conveyed as in the cooling unit 43, the base material 5 bends due to the contraction force acting on the base material 5. In this case, if a force for extending the base material 5 in the width direction is applied in a later step, the base material 5 can return to the state before bending. On the other hand, as another example, in a situation where the substrate 5 is in contact with a roller at normal temperature and conveyed, the frictional force acting between the roller and the substrate 5 against the contracting force acting on the substrate 5 is resisted. Wrinkles can occur in the substrate 5. In this case, even if a force for extending the base material 5 in the width direction is applied in a subsequent process, the base material 5 does not return to the state before bending, and a crease may remain on the base material 5.

  Thus, in this specification, wrinkle means a crease that is difficult to remove even if tension is applied in the width direction after the occurrence. The base material 5 in which wrinkles are generated is often a defective product in the product stage, and it is required to suppress the generation of wrinkles from the viewpoint of yield.

  In addition, the generation of soot due to the cooling of the base material 5 is particularly in the upstream side of the section downstream of the drying unit 40 (that is, the section after the base material 5 is heated) (that is, the base material 5). Is likely to occur at a high temperature immediately after heating).

  Below, the technique which suppresses generation | occurrence | production of a wrinkle by a base material conveyance process is demonstrated in detail.

<1.3 Details of substrate transport processing>
FIG. 3 is an XZ side view schematically showing the periphery of the second roller 82 and the third roller 83. FIG. 4 is a YZ side view schematically showing how the second roller 82 transports the substrate 5. FIG. 5 is a YZ side view schematically showing a state when the roller 821 in the comparative example conveys the substrate 5.

  In FIG. 3, the conveyance direction of the base material 5 and the rotation directions of the second roller 82 and the third roller 83 are indicated by arrows. Further, in FIG. 3, fan-shaped regions expressing the holding angles of the second roller 82 and the third roller 83 with respect to the base material 5 are shown by thin lines, respectively.

  The substrate processing apparatus 1 includes a drive unit 820 (for example, a motor) that rotates the second roller 82. Further, the control unit 90 controls the driving unit 820 so that the peripheral speed V2 of the second roller 82 is faster than the conveyance speed V of the base material 5. Here, the relationship between the conveyance speed V and the peripheral speed V2 is set to V <V2 ≦ 1.03V, for example. Therefore, as a specific example, when the conveyance speed V is 10 (m / min), 10 <V2 ≦ 10.3 (m / min). The transport speed of each transport element other than the second roller 82 (specifically, the peripheral speed of each roller) is substantially the same as the transport speed V of the substrate 5. For example, the peripheral speed of the third roller 83 is substantially the same as the transport speed V. Hereinafter, the control for rotating the second roller 82 relatively fast in this way may be referred to as draw control.

  As a result, slip occurs between the outer peripheral surface of the second roller 82 that moves relatively fast and the back surface of the base material 5 that moves relatively slowly (the surface opposite to the main surface S1). Such slipping occurs because an air boundary layer is generated near the outer peripheral surface of the second roller 82 as the second roller 82 rotates, and the boundary layer imparts buoyancy to the substrate 5. It is thought to do. As a result, as shown in FIG. 4, the second roller 82 conveys the base material 5 through the gas layer 100.

  On the other hand, in the comparative example shown in FIG. 5, it is assumed that a roller 821 that rotates at the same peripheral speed as the conveyance speed V is provided instead of the second roller 82 in the present embodiment. In this case, slipping is unlikely to occur between the outer peripheral surface of the second roller 82 moving at a constant speed and the back surface of the substrate 5. In addition, it is considered that the buoyancy of the boundary layer to the base material 5 is also small because the peripheral speed of the roller 821 is smaller than the peripheral speed V2 of the second roller 82. As a result, in the comparative example shown in FIG. 5, the roller 821 is in the state where the contact area between the outer peripheral surface of the roller 821 and the back surface of the base material 5 is larger than in the case of the present embodiment shown in FIG. 4. 5 will be conveyed.

  In the present embodiment, the second transport element (specifically, the second roller 82) that transports the base material 5 through the gas layer 100 is provided on the downstream side of the drying unit 40. For this reason, the contact area between the substrate 5 heated by the drying unit 40 and the second roller 82 at room temperature is reduced, and the frictional force is also reduced. As a result, generation of wrinkles in the substrate 5 is suppressed.

  When the draw control is performed (FIG. 4), the contact area between the base material 5 and the second roller 82 is smaller than when the draw control is not performed (FIG. 5). In this specification, the gas layer generated by such a reduction in the contact area is referred to as a gas layer 100. Therefore, the gas layer 100 includes not only a layer (FIG. 7 to be described later) formed on the entire back surface side of the base material 5 but also a layer (FIG. 4) formed on a part of the back surface side of the base material 5. It is a concept. In the example shown in FIG. 4, the gas layer 100 includes a wide portion on the −Y side and a narrow portion on the + Y side.

  In the present embodiment, the third transport element is located downstream of the second transport element along the transport path. Thereby, the base material 5 can be conveyed via the gas layer 100 in the location where the generation of wrinkles is particularly likely to occur (the portion immediately after the base material 5 is heated in the section after the base material 5 is heated). And the generation of wrinkles is effectively suppressed.

  Moreover, in this embodiment, the conveyance part 80 can each convey the base material 5 by rotating centering | focusing on the axis | shaft extended in a cross direction, and the some roller (lined in the one section of the conveyance path | route) ( Specifically, it includes a second roller 82 and a third roller 83). The holding angle θ2 of the second roller 82 with respect to the base material 5 and the holding angle θ3 of the third roller 83 with respect to the base material 5 are set to a threshold value (for example, 30 degrees) or less. Further, the difference in the angle in the extending direction of the transport path before and after the one section is the total value (θ2 + θ3) of the holding angle in each of the second roller 82 and the third roller 83.

  As described above, when the high temperature base material 5 is cooled, the contraction force acts on the base material 5 due to the temperature change, and the base material 5 is likely to wrinkle. In the present embodiment, by holding the holding angle by a plurality of rollers arranged in parallel to the downstream side of the drying unit 40, the holding angle at each roller with respect to the high temperature substrate 5 can be reduced (as a result, The contact area between the high temperature base material 5 and each roller can be reduced), and the generation of wrinkles is suppressed.

  In the present embodiment, the upstream transport element (that is, the element that transports the hottest substrate 5) in the set of transport elements that share the holding angle is the second transport element. For this reason, the base material 5 can be conveyed via the gas layer 100 in the place where generation | occurrence | production of soot is easy to produce due to the temperature difference of the base material 5 and a conveyance element, and generation | occurrence | production of soot is suppressed effectively. The Moreover, in this embodiment, the downstream conveyance element (namely, element which conveys the relatively low temperature base material 5) among the collection of conveyance elements which share a holding angle is a 3rd conveyance element. For this reason, a 3rd conveyance element will convey the base material 5 in the location where the temperature difference of the base material 5 and a conveyance element is small, and the 3rd conveyance element conveyed the base material 5 without passing through the gas layer 100. However, wrinkles are less likely to occur.

  In the present embodiment, the second transport element is a portion that applies a force to the base material 5 in the transport direction. Therefore, in the aspect of this embodiment, it replaces with the 2nd roller 82, compared with the aspect (not shown) of the comparative example which has the floating support part which supplies air to the back surface side of the base material 5 and supports this base material 5. Thus, the apparatus size can be reduced. Providing the floating support portion downstream of the cooling unit 43 as in this comparative example is synonymous with expanding the size of the cooling unit 43 in the transport direction, and causes an increase in the size of the apparatus. .

<2 Modification>
Although the embodiment of the present invention has been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention.

  FIG. 6 is a perspective view schematically showing a roller 822 according to a modification. FIG. 7 is a YZ side view schematically showing a state in which the roller 822 in the modified example transports the base material 5.

  The roller 822 includes a cylindrical main body portion 823, an outer peripheral portion 824 provided with an air supply port for supplying air to the substrate 5, and an inner peripheral portion having an opening connected to the air supply port of the outer peripheral portion 824. 825. 6 and 7, a large number of air supply ports in the outer peripheral portion 824 and a large number of openings in the inner peripheral portion 825 are represented by dot patterns.

  Therefore, when a gas is supplied from a gas supply unit (not shown) to the cylinder space of the roller 822, the gas flows from a large number of openings in the inner peripheral part 825 toward a large number of air supply ports in the outer peripheral part 824, Gas is supplied from the large number of air supply ports toward the back surface of the substrate 5. Thus, the roller 822 functions as an air supply roller having an outer peripheral portion 824 in which an air supply port is disposed and an air supply path connected to the air supply port.

  In this modification, the substrate processing apparatus 1 is provided with a roller 822 instead of the second roller 82 of the above embodiment. More specifically, the roller 822 is provided in the substrate processing apparatus 1 so as to be rotatable about an axis that is parallel to the main surface S1 and extends in an intersecting direction that intersects the conveying direction of the substrate 5. And the roller 822 is rotated in the direction which conveys the base material 5 by the drive part which is not shown in figure. As a result, as shown in FIG. 7, the roller 822 conveys the base material 5 through the gas layer 101 by supplying air. Unlike the gas layer 100 of the above embodiment, the gas layer 101 is a layer formed on the entire back surface side of the substrate 5.

  In this modification, the roller 822 functions as the second transport element, so that the contact area between the substrate 5 and the roller 822 after being heated by the drying unit 40 is reduced, and the generation of wrinkles in the substrate 5 is suppressed. . Thus, in addition to the draw control according to the above-described embodiment, various mechanisms can be used as the second transport element. Further, a plurality of types of second transport elements (for example, the second roller 82 and the roller 822) having different principles for transporting the base material 5 through the gas layer may be combined and provided in the base material processing apparatus 1.

  Further, in the present modification, the temperature of the supplied gas is set lower than the temperature of the portion of the base material 5 that is conveyed by the roller 822. In this case, the cooling process of the base material 5 can be executed together with the transport process of the base material 5, and the apparatus can be downsized.

  Moreover, although the said embodiment demonstrated the aspect in which a 3rd conveyance element is located in a conveyance downstream rather than a 2nd conveyance element, the aspect in which a 2nd conveyance element is located in a conveyance downstream rather than a 3rd conveyance element may be sufficient. Absent.

  In the above embodiment, the conveyance unit 80 includes the third roller 83 provided on the downstream side of the second roller 82 in one section of the conveyance path, and the second roller 82 and the third roller 83 serve as the base material 5. Although the aspect which shares the holding angle with respect to was demonstrated, it is not restricted to this. As an aspect in which the holding angle is shared by a plurality of rollers arranged in parallel in a section downstream from the drying unit 40, three or more rollers (for example, one second roller 82 and two or more third rollers). 83) may be used. In addition, a plurality of transport elements other than the rollers may be arranged in parallel in one section on the downstream side of the drying unit 40, and the holding angle of the substrate 5 may be shared by these transport elements. Further, such a sharing technique may not be used.

  Moreover, although the said embodiment demonstrated the aspect which performs the cooling process which cools the base material 5 heated by the heat processing in the cooling part 43 after performing the heat processing to the base material 5 in the heating part 42, it does not restrict to this. It is not something that can be done. For example, the drying unit 40 may not include the cooling unit 43 and may not perform the cooling process.

  Moreover, although the said embodiment demonstrated the aspect by which a coating liquid was applied to one main surface S1 of the base material 5, the aspect by which a coating liquid is applied to both the main surfaces of the base material 5 may be sufficient.

  Further, the liquid film P to be subjected to the drying process is not limited to the example of the above embodiment (electrode material film of the lithium ion secondary battery). The liquid film to be dried may be, for example, a thin film of a solar cell material, a protective film of an electronic material, or a liquid film of a pigment or an adhesive.

  Moreover, the supply aspect of the coating liquid to main surface S1 of the base material 5 is not specifically limited. In addition to the mode in which the coating liquid is supplied to the main surface S1 using the slit nozzle as in the above embodiment, for example, the mode in which the coating liquid is supplied to the main surface S1 of the substrate 5 using a spray nozzle (so-called spray Application). In addition to the aspect in which the coating liquid is supplied from one slit opening to one region of the main surface S1 as in the above embodiment, for example, a plurality of slits provided at intervals in the width direction of the substrate 5 A mode (so-called stripe coating) may be employed in which the coating liquid is supplied from the opening to a plurality of regions on the main surface S1.

  Further, the types of transport elements, the number of transport elements, and the arrangement of the transport elements included in the transport unit 80 are not limited to the examples of the above embodiments, and can be changed as necessary.

  As mentioned above, although the base material processing apparatus and base material processing method which concern on embodiment and its modification were demonstrated, these are examples of preferable embodiment for this invention, Comprising: The scope of implementation of this invention is not limited. . Within the scope of the invention, the present invention can be freely combined with each embodiment, modified with any component in each embodiment, or increased or decreased with any component in each embodiment.

DESCRIPTION OF SYMBOLS 1 Base material processing apparatus 5 Base material 11 Coating nozzle 40 Drying part 41 Preheating part 42 Heating part 43 Cooling part 80 Conveying part 81 1st roller 82 2nd roller 83 3rd roller 90 Control part 100, 101 Gas layer 820 Drive part 821, 822 Roller S1 Main surface V Transport speed V2 Peripheral speed

Claims (9)

A transport unit that transports the base material supplied with the coating liquid to the main surface along the transport path;
A drying unit that dries the coating liquid supplied to the main surface by performing a process including a heat treatment on the base material transported by the transport unit;
With
The transport unit is
A first transport element that is provided upstream of the drying unit along the transport path and transports the base material;
A second transport element that is provided downstream of the drying unit along the transport path and transports the base material via a gas layer;
A substrate processing apparatus. The substrate processing apparatus according to claim 1,
The transport unit is
A third conveying element that is provided downstream of the drying unit along the conveying path and has a larger contact area with the substrate than that of the second conveying element;
Further comprising
The substrate processing apparatus, wherein the third transport element is located downstream of the second transport element along the transport path. The substrate processing apparatus according to claim 1 or 2, wherein
The second transport element includes a roller that is rotatable about an axis that is parallel to the main surface and extends in an intersecting direction that intersects the transport direction of the base material.
A drive unit that rotates the roller so that a peripheral speed of the roller is faster than a conveyance speed of the base material conveyed by the conveyance unit;
A substrate processing apparatus further comprising: A substrate processing apparatus according to any one of claims 1 to 3, wherein
The transport unit can be transported around the axis extending in the intersecting direction on the downstream side of the drying unit to transport the base materials, and is provided side by side in a section of the transport path. Including multiple rollers,
The difference in the angle in the extending direction of the conveyance path before and after the one section is a substrate processing apparatus, which is a total value of the holding angles of the plurality of rollers with respect to the substrate. A substrate processing apparatus according to any one of claims 1 to 4, wherein
The second transport element is rotatable about an axis that is parallel to the main surface and extends in a crossing direction that intersects the transport direction of the base material, and an outer peripheral portion provided with an air supply port and the air supply An air supply roller having an air supply path connected to the mouth;
A gas supply unit for supplying gas to the air supply path;
A substrate processing apparatus further comprising: The substrate processing apparatus according to claim 5,
The substrate processing apparatus, wherein a temperature of the gas is lower than a temperature of a portion of the substrate that is conveyed by the supply roller. The substrate processing apparatus according to any one of claims 1 to 6, wherein
The drying unit performs the heat treatment on the base material transported by the transport unit, and then performs a cooling process for cooling the base material heated by the heat treatment, and supplies the main surface to the main surface. A substrate processing apparatus for drying the applied coating solution. A transport unit that transports the base material supplied with the coating liquid to the main surface along the transport path;
A drying unit that dries the coating liquid supplied to the main surface by performing a treatment including a heat treatment on the base material conveyed by the conveyance unit;
With
The transport unit is
A roller that is provided on the downstream side of the drying unit along the transport path, is rotatable about an axis that is parallel to the main surface and extends in an intersecting direction that intersects the transport direction of the base material,
Have
A drive unit that rotates the roller so that a peripheral speed of the roller is faster than a conveyance speed of the base material conveyed by the conveyance unit;
A substrate processing apparatus further comprising: A drying step of drying the coating liquid supplied to the main surface by applying a treatment including heat treatment to the base material supplied with the coating liquid on the main surface;
A transporting step of transporting the substrate subjected to the treatment in the drying step via a gas layer by a transporting element;
A substrate processing method comprising:

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