KR100250211B1 - Vacuum chamber for deposition - Google Patents

Abstract

PURPOSE: A multipurpose vacuum chamber for deposition is provided to improve the quality of a thin film by forming a rotary circle including a target holder, a substrate holder, and a gauge for measuring a thickness of a thin film located on a concentric circle. CONSTITUTION: A lock chamber(5) is connected directly to a vacuum chamber(4) in order to prevent the pollution of the vacuum chamber(4) from evaporated organic molecules by using an exhaust pump. The vacuum chamber(4) is combined with a flange(4a) in order to adhere an evaporator to a lower end of the vacuum chamber(4). A target holder(6), a substrate holder(7), a gauge for measuring a thickness of a thin film(8), and an optical glass(9) are located on a concentric circle of a rotary axis of a rotary circle(1).

Description

Multi-Purpose Vacuum Chamber for Deposition

1 is an overall perspective view showing a multi-purpose vacuum chamber for vapor deposition of the present invention

2 is an exploded perspective view showing a multi-purpose vacuum chamber for deposition of the present invention

3 is a front view showing the multipurpose vacuum chamber for vapor deposition of the present invention.

4 is an exploded perspective view showing the stick holder and the stick of the present invention

5 is a front view showing the geometric arrangement of each component during laser deposition of the present invention.

6 is a front view showing the geometrical arrangement of the rotating circle during substrate exchange after the deposition of the present invention is completed.

7 is a front view showing the geometrical arrangement of the rotating circle at the target exchange of the present invention

* Explanation of symbols for main parts of the drawings

1: rotating circle 2: rotating support

3a: handle 3: rotating mechanism

4: vacuum chamber 4a: flange

5: Lock chamber 6: Target holder

7: substrate holder 8: thin film thickness measuring gauge

9: optical glass 10: balancer

11: spur gear 12: manipulator

13: Worm Driver 14: Gate Valve

15 stick 16: stick holder

16a: locking rod 17: holder coupler

17a: locking groove 20: tungsten filament

30,32: side plate

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multi-purpose vacuum chamber for vapor deposition, and more particularly, to a multi-purpose vacuum chamber for easily producing a high quality thin film in ultra high vacuum by irradiating a laser onto a target or by evaporating a material to be deposited.

Sputtering, evaporation, and molecular beam epitaxy are mainly used for vacuum evaporation to produce thin films. Recently, due to the rapid development of laser application technology, the characteristics of laser are also active in material science. Various vacuum deposition techniques have been developed and spread.

For example, a laser applied physical vapor deposition method that combines a laser application technology with a conventional vapor deposition technology, and a pulsed laser deposition method that improves on the conventional deposition technology, and the like, may be one example, among which a pulse laser deposition method (KL Saenger; Processing of advanced Materials, 2, pl, 1993) is a technology that can produce all metal and nonmetal materials including oxides in the form of a thin film, and the interest in the technology is increasing recently.

The reason for the active research on thin film fabrication using laser deposition is that it is possible to manufacture various thin film materials including high temperature superconductor, dielectric thin film, superlattice, diamond thin film and so on.

In general, the advantages of laser deposition technology can be the same material as the stoichiometric ratio of the first target, and second, because it does not use the inert gas required for the discharge, such as sputtering method, it is possible to prevent the incorporation of gas atoms in the thin film. Since there is no restriction on the shape or size of the target, it has the advantage of using an expensive target economically.

However, in the laser deposition method, the deposition is performed by generating a plume (a collection of atoms, theory, free electrons, etc. separated from the target material) by injecting a target in which the laser beam is installed in the vacuum chamber. It has different characteristics from the conventional vacuum deposition method such as the optimum condition of target position and substrate position (JT Cheung, G. Niizawa, J. Moyle, NP Ong, BM Paine and T. Vreeland, Jr.: J of Vacc.Sci. and Tech.A, 4, 1986, p2086, D. Lubben, SA Barnett, K. Suzuki, S. Gorbatkin and JE Green: J. of Vace.Sci. and Tech.B, 3, 1985. , p968, T. Venkatesan, XD Wu, A. Inam and J. Watchman: Appl. Phys. Lett., 52, 1988, p. 1193).

Therefore, in order to make a high quality thin film utilizing the advantages of the laser deposition method to the maximum, the chamber design that satisfies the laser beam incident angle, the relative geometric conditions between the substrate and the target in the vacuum chamber while maintaining the ultra-high vacuum state must be preceded. Because of the frequent exchange of targets and substrates, an efficient vacuum chamber is required to maintain the vacuum chamber in an ultra-vacuum state.

Conventional vacuum chambers exchange targets and substrates in the atmosphere, so once the vacuum chamber is opened in the atmosphere, it takes considerable time and energy to create ultra-high vacuum when re-starting deposition, and the vacuum chamber itself is By contacting, impurities such as organic gas components in the atmosphere are adsorbed on the inner wall of the vacuum chamber and re-emitted during the exhausting process, which makes it difficult to produce a high quality thin film in an ultra-high vacuum state.

The present invention has been invented to solve the above-mentioned disadvantages of the conventional vacuum chamber, and the object of the present invention is to produce a vacuum by rotating the circle so that the target holder, the substrate holder, the thickness gauge, and the like are all located on the concentric circles. An object of the present invention is to provide a multi-purpose vacuum chamber installed in a chamber.

The multipurpose vacuum chamber for vapor deposition of the present invention for achieving the above object comprises a vacuum chamber equipped with a rotating circle, a rotating support and a rotating mechanism, and a lock chamber used for holder replacement, and the lock chamber is a vacuum in which deposition is performed. Directly connected to the chamber, in the rotating circle, the target holder, the substrate holder, the thin film thickness measuring gauge and the optical glass are located on the concentric circle of the rotation axis.

The rotating circle has a load balancing balancer for smooth rotation thereof, and the rotating support is configured to support and couple the rotating mechanism, the spur gear and the rotating circle, and the rotating mechanism manipulator and worm driver. And rotating the handle of the manipulator clockwise or counterclockwise, thereby driving the spur gear of the rotary support engaged with the worm driver attached to the manipulator so that the rotating circle rotates. The chamber has a flange for attaching the evaporator to the bottom, and the lock chamber is exhausted by using an oil-free exhaust pump, it is preferable that a holder stick and a stick holder having a holder coupling.

The holder coupler is provided with a locking groove for engaging the stick rod of the stick holder, and the target holder maintains the incident angle of the laser beam incident through the optical glass 9 at the time of deposition to 45 degrees. The substrate holder is positioned in the vertically upward direction of the plume generated at the target, and the thin film thickness measurement gauge is positioned close to the substrate holder side to measure the deposition rate. It is possible to change the left and right by 45 degrees in the center, the rod length can be adjusted to adjust the deposition rate, the tungsten filament is attached to the back of the substrate holder to be deposited while heating the substrate, the rotating circle Is formed in a semi-circular shape to effectively use the space in the lock chamber, and the optical glass It is preferable that the optical glass holder further includes a holder for preventing the self-exchange and the beam energy deterioration upon incident.

Therefore, the incident angle of the laser beam irradiated to the target at the time of deposition is constantly maintained at 45 degrees, and the substrate holder is deposited by geometric arrangement so as to be located on the vertical portion of the target.

In addition, the rotation circle is designed to rotate 360 degrees around the axis of the rotation support has the effect of easy replacement of the substrate or target through the lock chamber on the side of the chamber.

In addition, by designing and manufacturing a rotating circle, a rotating mechanism, and the like in the vacuum chamber, it is possible to easily change the target or the substrate using the lock chamber without opening the vacuum chamber in the air, and maintain the ultra-high vacuum state. By making high quality thin film, it solves the shortcomings of the conventional vacuum chamber. By attaching an evaporator to the bottom of the vacuum chamber, a multi-purpose vacuum chamber capable of vacuum deposition and crystal growth not only by laser deposition but also by evaporation method is provided. Providing is another feature.

EXAMPLE

EMBODIMENT OF THE INVENTION Hereinafter, the multipurpose vacuum chamber for vapor deposition of this invention is demonstrated in detail with reference to an accompanying drawing.

1 is an overall perspective view showing a multipurpose vacuum chamber for vapor deposition of the present invention, FIG. 2 is an exploded perspective view of a multipurpose vacuum chamber for vapor deposition of the present invention, and FIG. 3 is a front view showing a multipurpose vacuum chamber for vapor deposition of the present invention.

The present invention largely consists of a vacuum chamber (4) equipped with a rotating circle (1), a rotating support (2) and a rotating mechanism (3), and a lock chamber (5) used for holder replacement.

Since the lock chamber 5 is directly connected to the vacuum chamber 4 in which the deposition is performed, the vacuum chamber 4 is designed so that the vacuum chamber 4 is not contaminated by vaporized organic molecules by exhausting it using an oil-free exhaust pump. have.

In addition, since the multi-purpose vacuum chamber 4 is fastened by a flange 4a so that an evaporator is attached to the lower end, the multipurpose vacuum chamber 4 focuses on making it easy to detach.

In the rotating circle 1, a target holder 6, a substrate holder 7, a thin film thickness measuring gauge 8 and an optical glass 9 are located on the concentric circle of the rotation axis.

The rotary chamber 1 may be designed in consideration of the load in a semicircle in order to effectively use the space in the vacuum chamber 4.

The target holder 6 maintains the incidence angle of the laser beam incident through the optical glass 9 at the time of deposition to 45 degrees, and the substrate holder 7 is located in the vertical upward direction of the plume generated at the target. In order to measure the deposition rate, the thin film thickness measuring gauge 8 may be positioned close to the substrate holder 7 side.

Further, a tungsten filament 20 is attached to the back surface of the substrate holder 7 so that the substrate can be deposited while heating.

In the case of prolonged deposition, the optical glass 9 becomes cloudy, which lowers the beam energy at the time of incidence. Thus, in order to prevent the optical glass 9, the optical glass 9 may be arbitrarily exchanged.

The target holder 6 can change the direction of the target to the left and right 45 degrees around the rod axis of the target and was manufactured to adjust the length of the rod to adjust the deposition rate.

The rotary support 2 is configured to support and couple the rotary mechanism 3, the spur gear 11, and the rotary circle 1, and in the rotary mechanism 3 and the vacuum chamber 4 of the rotary circle 1. It is better to design in consideration of space.

The rotating mechanism 3 is composed of a manipulator 12 and a worm driver 13, and by rotating the handle 3a of the manipulator 12 clockwise or counterclockwise, the manipulator The rotating circle 1 is rotated by driving the spur gear 11 of the rotation support 2 engaged with the worm driver 13 attached to the rotor 12.

When rotating only the rotating circle 1, the optical glass holder, the thickness measuring gauge 8, and the substrate holder 7 are arranged in one place on the rotating circle 1 so that the torque applied to the manipulator 12 is increased. It becomes large and becomes difficult to rotate.

Accordingly, in the present invention, in order to distribute the load applied to the rotating circle 1 in order to smoothly rotate the rotating circle 1, a balancer 10 in consideration of the load of the rotating circle 1 is manufactured, It is attached to the rotating circle 1 by geometric arrangement.

4 is an exploded perspective view showing the cylindrical stick holder 16 and the stick 15 of the present invention.

A holder coupler 17 is formed at an end of the holder stick 15. The holder coupler 17 is formed with a locking groove 17a for engaging with the locking rod 16a of the stick holder 16.

The locking groove 17a has a function of preventing the holder from being detached once the holder to be replaced is inserted into the holder stick 15.

Next, the effect | action of the multipurpose vacuum chamber 4 for vapor deposition of this invention is demonstrated.

When exchanging the substrate or the target where deposition is completed, the process proceeds as follows.

5 is a front view showing the geometrical arrangement of each component during laser deposition of the present invention, FIG. 6 is a front view showing the geometrical arrangement of the rotating circle when the substrate is replaced after completion of the deposition of the present invention, and FIG. The front view which shows the geometrical arrangement of the rotating circle at the time of target replacement.

First, after fully evacuating the lock chamber 5 to 10 ⁻³ torr or less, the gate valve 14 is opened and the holder stick 15 is inserted into the vacuum chamber 4.

The holder (substrate or target holder) 16 is separated from the rotating circle 1 by using the holder coupling hole 17 formed at the end of the holder stick 15 to be coupled to the holder coupling hole 17 and the holder stick ( After 15) is pulled out to the lock chamber 5, the gate valve 14 of the lock chamber 5 is contained. The lock chamber 5 is leaked in the air, and the holder stick 15 is taken out to replace the target or the substrate.

When charging the holder into the vacuum chamber 4, the work may be performed in the reverse order as when the holder is taken out of the vacuum chamber 4 using the lock chamber 5. That is, after the holder stick 15 is sealed in the lock chamber 5, the lock chamber 5 is exhausted to 10 ^-3 torr by a suction pump, and then the gate valve 14 is opened to open the substrate holder. Is charged in the vacuum chamber 4.

FIG. 5 shows the geometric arrangement of each component during laser deposition. The beam incident through the laser beam guide port 27 irradiates the target holder to generate the plum and deposit the plum on the substrate. .

That is, the angle of incidence of the beam irradiated onto the target is always maintained at 45 degrees, and the rotational circle 1 is considered in consideration of the geometric arrangement of the target holder and the substrate holder so that the position of the substrate is always perpendicular to the direction in which the plume is generated. The position of each holder is fixed on the surface so as to be an integral part of each component.

FIG. 6 shows the geometric arrangement of each component upon exchanging substrates after deposition has finished. In the present invention, the lock chamber 5 is connected to the vacuum chamber 4 so as not to open the vacuum chamber 4 in the air during substrate exchange, and the exchange is performed through the lock chamber 5.

Therefore, when replacing the substrate, the substrate holder is moved to the side surface of the lock chamber 5 by rotating the rotation circle 1 clockwise by 90 degrees at the substrate position of FIG. 5 by using the manipulator handle of the rotation mechanism. (15) shows a step of facilitating exchange of the substrate.

FIG. 7 is a view showing the arrangement of each component when the target holder is replaced. At the position shown in FIG. 5, the rotating circle 1 is rotated 315 degrees clockwise to move the target holder to the side of the lock chamber 5 to hold the holder stick ( 15), one step is shown to facilitate the exchange of the target.

Therefore, unlike the conventional vacuum chamber, the present invention provides a device that enables the exchange of the substrate holders (or target holders) 6 and 7 so as not to open directly to the atmosphere.

Claims (13)

It consists of a vacuum chamber (4) equipped with a rotating circle (1), a rotating support (2) and a rotating mechanism (3), and a lock chamber (5) used for holder replacement. The lock chamber 5 is directly connected to the vacuum chamber 4 is deposited, And a target holder (6), a substrate holder (7), a thin film thickness measuring gauge (8) and an optical glass (9) on the concentric circle of the rotating shaft. The multipurpose vacuum chamber according to claim 1, wherein the rotating circle (1) has a load balancing balancer (10) for smoothing its rotation. 2. The multipurpose vacuum chamber according to claim 1, wherein the rotary support (2) supports and combines the rotary mechanism (3), the spur gear (11) and the rotary circle (1). 2. The rotating mechanism (3) according to claim 1, comprising a manipulator (12) and a worm driver (13), by rotating the handle (3a) of the manipulator (12) clockwise or counterclockwise. , The multipurpose vacuum for vapor deposition, characterized in that the rotating circle 1 is rotated by driving the spur gear 11 of the rotation support 2 engaged with the worm driver 13 attached to the manipulator 12. chamber. 2. The multipurpose vacuum chamber according to claim 1, wherein the vacuum chamber (4) has a flange (4a) to which an evaporator is attached at its lower end. 2. The multipurpose vacuum chamber according to claim 1, wherein the lock chamber (5) is evacuated by using an oil free exhaust pump. 2. The multipurpose vacuum chamber according to claim 1, wherein the lock chamber (5) is provided with a holder stick (15) having a holder coupler (17) and a stick holder (16). 7. The multi-purpose vacuum chamber as claimed in claim 6, wherein the holder coupler has a locking groove (17a) for engaging the locking rod (16a) of the stick holder (16). The target holder (6) according to claim 1, wherein the target holder (6) maintains the incidence angle of the laser beam incident through the optical glass (9) at the time of deposition to 45 degrees, and the substrate holder (in the vertically upward direction of the plume generated at the target). 7) is positioned, the multi-purpose vacuum chamber for deposition, characterized in that the thin film thickness measuring gauge (8) is placed close to the substrate holder (7) side in order to measure the deposition rate. The deposition method of claim 1, wherein the target holder 6 can change the direction of the target by 45 degrees to the left and right about the rod axis of the target, and the length of the rod can be adjusted to adjust the deposition rate. Multipurpose vacuum chamber. 2. The multipurpose vacuum chamber according to claim 1, wherein a tungsten filament (20) is attached to the rear surface of the substrate holder (7) to deposit the substrate while the substrate is heated. 2. The multipurpose vacuum chamber according to claim 1, wherein the rotating circle (1) is formed in a semicircular shape in order to effectively use the space in the vacuum chamber (4). The vapor deposition multipurpose vacuum chamber according to claim 1, wherein the optical glass (9) further comprises a holder for an optical glass for preventing the exchange of beam energy at the time of its arbitrary exchange and incidence thereof.