JPS63191313A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS63191313A JPS63191313A JP2295987A JP2295987A JPS63191313A JP S63191313 A JPS63191313 A JP S63191313A JP 2295987 A JP2295987 A JP 2295987A JP 2295987 A JP2295987 A JP 2295987A JP S63191313 A JPS63191313 A JP S63191313A
- Authority
- JP
- Japan
- Prior art keywords
- film layer
- protective film
- layer
- thickness
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 48
- 230000001681 protective effect Effects 0.000 claims abstract description 51
- 239000000314 lubricant Substances 0.000 claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 19
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 17
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 16
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 11
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 8
- 239000000956 alloy Substances 0.000 claims abstract description 8
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 239000010408 film Substances 0.000 claims description 56
- 239000010409 thin film Substances 0.000 claims description 23
- 239000002245 particle Substances 0.000 claims description 4
- 230000007797 corrosion Effects 0.000 abstract description 27
- 238000005260 corrosion Methods 0.000 abstract description 27
- 238000006243 chemical reaction Methods 0.000 abstract description 13
- 238000000151 deposition Methods 0.000 abstract description 9
- 235000021355 Stearic acid Nutrition 0.000 abstract description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 8
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 abstract description 8
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 abstract description 8
- 239000001301 oxygen Substances 0.000 abstract description 8
- 239000008117 stearic acid Substances 0.000 abstract description 8
- 229920006267 polyester film Polymers 0.000 abstract description 7
- 230000008021 deposition Effects 0.000 abstract description 6
- 229910018487 Ni—Cr Inorganic materials 0.000 abstract description 5
- 229910017052 cobalt Inorganic materials 0.000 abstract description 4
- 239000010941 cobalt Substances 0.000 abstract description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 4
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 abstract description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 abstract description 3
- 230000002542 deteriorative effect Effects 0.000 abstract description 3
- 238000001704 evaporation Methods 0.000 abstract description 3
- 238000001771 vacuum deposition Methods 0.000 abstract description 3
- 230000008020 evaporation Effects 0.000 abstract 2
- 239000011651 chromium Substances 0.000 description 21
- 239000007789 gas Substances 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 8
- 229930195729 fatty acid Natural products 0.000 description 8
- 239000000194 fatty acid Substances 0.000 description 8
- -1 chromium oxyhydroxide Chemical compound 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 6
- 150000004665 fatty acids Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 229920006255 plastic film Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 229910000599 Cr alloy Inorganic materials 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 230000001050 lubricating effect Effects 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910001004 magnetic alloy Inorganic materials 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- PRAKJMSDJKAYCZ-UHFFFAOYSA-N squalane Chemical compound CC(C)CCCC(C)CCCC(C)CCCCC(C)CCCC(C)CCCC(C)C PRAKJMSDJKAYCZ-UHFFFAOYSA-N 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- LFMIQNJMJJKICW-UHFFFAOYSA-N 1,1,2-trichloro-2-fluoroethene Chemical group FC(Cl)=C(Cl)Cl LFMIQNJMJJKICW-UHFFFAOYSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RZRNAYUHWVFMIP-KTKRTIGZSA-N 1-oleoylglycerol Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-KTKRTIGZSA-N 0.000 description 1
- SPSPIUSUWPLVKD-UHFFFAOYSA-N 2,3-dibutyl-6-methylphenol Chemical compound CCCCC1=CC=C(C)C(O)=C1CCCC SPSPIUSUWPLVKD-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- UFTSQCNNAHWXNC-UHFFFAOYSA-N C(CCCCCCCCCCC)N.N1N=NC2=C1C=CC=C2 Chemical compound C(CCCCCCCCCCC)N.N1N=NC2=C1C=CC=C2 UFTSQCNNAHWXNC-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- GHKOFFNLGXMVNJ-UHFFFAOYSA-N Didodecyl thiobispropanoate Chemical compound CCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCC GHKOFFNLGXMVNJ-UHFFFAOYSA-N 0.000 description 1
- 239000003508 Dilauryl thiodipropionate Substances 0.000 description 1
- ORAWFNKFUWGRJG-UHFFFAOYSA-N Docosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCC(N)=O ORAWFNKFUWGRJG-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 229910003310 Ni-Al Inorganic materials 0.000 description 1
- 229910003286 Ni-Mn Inorganic materials 0.000 description 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- VBIIFPGSPJYLRR-UHFFFAOYSA-M Stearyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[N+](C)(C)C VBIIFPGSPJYLRR-UHFFFAOYSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 159000000009 barium salts Chemical class 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N beta-monoglyceryl stearate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- TUTWLYPCGCUWQI-UHFFFAOYSA-N decanamide Chemical compound CCCCCCCCCC(N)=O TUTWLYPCGCUWQI-UHFFFAOYSA-N 0.000 description 1
- 235000019304 dilauryl thiodipropionate Nutrition 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 235000019197 fats Nutrition 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- FEEPBTVZSYQUDP-UHFFFAOYSA-N heptatriacontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O FEEPBTVZSYQUDP-UHFFFAOYSA-N 0.000 description 1
- RNYJXPUAFDFIQJ-UHFFFAOYSA-N hydron;octadecan-1-amine;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCCCC[NH3+] RNYJXPUAFDFIQJ-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- SFIHQZFZMWZOJV-HZJYTTRNSA-N linoleamide Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(N)=O SFIHQZFZMWZOJV-HZJYTTRNSA-N 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 159000000003 magnesium salts Chemical class 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- RZRNAYUHWVFMIP-UHFFFAOYSA-N monoelaidin Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-UHFFFAOYSA-N 0.000 description 1
- 229940043348 myristyl alcohol Drugs 0.000 description 1
- JXTPJDDICSTXJX-UHFFFAOYSA-N n-Triacontane Natural products CCCCCCCCCCCCCCCCCCCCCCCCCCCCCC JXTPJDDICSTXJX-UHFFFAOYSA-N 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- GNMQOUGYKPVJRR-UHFFFAOYSA-N nickel(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Ni+3].[Ni+3] GNMQOUGYKPVJRR-UHFFFAOYSA-N 0.000 description 1
- UPHWVVKYDQHTCF-UHFFFAOYSA-N octadecylazanium;acetate Chemical compound CC(O)=O.CCCCCCCCCCCCCCCCCCN UPHWVVKYDQHTCF-UHFFFAOYSA-N 0.000 description 1
- QWPNJOHZHSJFIY-UHFFFAOYSA-N octyl tetradecanoate Chemical compound CCCCCCCCCCCCCC(=O)OCCCCCCCC QWPNJOHZHSJFIY-UHFFFAOYSA-N 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- PZFKDUMHDHEBLD-UHFFFAOYSA-N oxo(oxonickeliooxy)nickel Chemical compound O=[Ni]O[Ni]=O PZFKDUMHDHEBLD-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229940032094 squalane Drugs 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- QQBLOZGVRHAYGT-UHFFFAOYSA-N tris-decyl phosphite Chemical compound CCCCCCCCCCOP(OCCCCCCCCCC)OCCCCCCCCCC QQBLOZGVRHAYGT-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は強磁性金属薄膜層を磁気記録層とする磁気記
録媒体に関し、さらに詳しくは、耐久性および耐食性に
優れた前記の磁気記録媒体に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a magnetic recording medium having a ferromagnetic metal thin film layer as a magnetic recording layer, and more particularly relates to the above-mentioned magnetic recording medium having excellent durability and corrosion resistance. .
強磁性金属i膜層を磁気記録層とする磁気記録媒体は、
通常、金属もしくはそれらの合金などを真空蒸着、スパ
ッタリング等によって基体フィルム上に被着してつくら
れ、高密度記録に適した特性を有するが、反面磁気ヘッ
ドとの摩擦係数が大きくて摩耗や損傷を受は易く、また
大気中の水分や、S02ガス、’N O2ガスなどの腐
食性ガスによって腐食され、飽和磁化量が減少したり、
さらには腐食生成物によって走行性に支障が生じるなど
の難点がある。A magnetic recording medium whose magnetic recording layer is a ferromagnetic metal i-film layer is
It is usually made by depositing metals or their alloys on a base film by vacuum deposition, sputtering, etc., and has characteristics suitable for high-density recording, but on the other hand, the coefficient of friction with the magnetic head is high, causing wear and damage. It is easily susceptible to corrosion, and is corroded by moisture in the atmosphere and corrosive gases such as SO2 gas and NO2 gas, resulting in a decrease in saturation magnetization.
Furthermore, there are other drawbacks such as corrosion products that impede running performance.
このため、従来から強磁性金属薄膜層上に種々の保護膜
層を設けるなどして、耐久性および耐食性を改善するこ
とが行われており、たとえば、Ti、Cr、Nlなどか
らなる金属薄膜層を形成したり(特開昭58−2632
0号、特開昭58−108030号、特開昭53−72
05号)、またNi−Crの非磁性合金薄膜層を形成し
たり(特開昭53−73108号)、さらにCoのアモ
ルファスの3価以上の含水酸化物層を形成したり(特開
昭60−78562号)、水和オキシ水酸化クロム層を
形成したり(特開昭61−17356号)して、耐久性
および耐食性を改善することが試みられている。For this reason, various protective film layers have been conventionally provided on the ferromagnetic metal thin film layer to improve durability and corrosion resistance. For example, metal thin film layers made of Ti, Cr, Nl, etc. (Japanese Unexamined Patent Publication No. 58-2632)
No. 0, JP-A-58-108030, JP-A-53-72
05), a non-magnetic alloy thin film layer of Ni-Cr (Japanese Patent Application Laid-Open No. 73108/1982), and an amorphous hydrated oxide layer of trivalent or higher Co (Japanese Patent Application Laid-Open No. 60/1989). Attempts have been made to improve durability and corrosion resistance by forming a hydrated chromium oxyhydroxide layer (Japanese Unexamined Patent Publication No. 17356/1983).
ところが、TiやCrからなる金属薄膜層を形成したも
のは、耐久性を充分に改善することができず、金属薄膜
層の厚みを厚くすると電磁変換特性が劣化するという問
題があり、Niからなる金属薄膜層を形成したものは、
磁性を有するため電磁変換特性の劣化は生じなしζが、
耐久性および耐食性を充分に改善することができない。However, those with a metal thin film layer made of Ti or Cr cannot sufficiently improve durability, and there is a problem that electromagnetic conversion characteristics deteriorate when the thickness of the metal thin film layer is increased. Those with a metal thin film layer are
Since it has magnetism, there is no deterioration of electromagnetic conversion characteristics ζ,
Durability and corrosion resistance cannot be sufficiently improved.
さらにNi−Crの非磁性合金薄膜層を形成したものは
、非磁性であるため電磁変換特性が劣化するという問題
があり、また耐食性を向上させるためCrの含有率を高
くすると耐久性が劣化するという難点がある。さらにC
oのアモルファスの3価以上の含水酸化物層や、水和オ
キシ水酸化クロム層を強磁性金属薄膜層の表面に形成し
たものは、大気中の水分による腐食は有効に防止できて
も、S02ガスやNO2ガスなどの腐食性ガスに対する
耐食性を充分に改善することができない。Furthermore, products with Ni-Cr non-magnetic alloy thin film layers have the problem of deteriorating electromagnetic conversion characteristics because they are non-magnetic, and if the Cr content is increased to improve corrosion resistance, durability deteriorates. There is a drawback. Further C
Although corrosion due to moisture in the atmosphere can be effectively prevented by forming an amorphous hydrated oxide layer with a valence of 3 or higher or a hydrated chromium oxyhydroxide layer on the surface of a ferromagnetic metal thin film layer, S02 Corrosion resistance against corrosive gases such as gas and NO2 gas cannot be sufficiently improved.
この発明はかかる現状に鑑み種々検討を行った結果なさ
れたもので、強磁性金属薄膜層上に、Cr、Mnx A
lから選ばれるいずれか一種と、Niと、0とからなる
保護膜層を設けることによって、電磁変換特性を劣化さ
せることなく、耐久性を充分に向上させ、大気中の水分
や、S02ガス、N02ガスなどの腐食性ガスに対する
耐食性を充分に向上させたものである。また、これらの
保護膜層上にさらに潤滑剤層を設けることによって、耐
摩耗性をさらに改善し、耐久性および耐食性をさらに向
上させたものである。This invention was made as a result of various studies in view of the current situation.
By providing a protective film layer consisting of any one selected from 1, Ni, and 0, the durability is sufficiently improved without deteriorating the electromagnetic conversion characteristics, and it is able to withstand moisture in the atmosphere, S02 gas, It has sufficiently improved corrosion resistance against corrosive gases such as N02 gas. Further, by further providing a lubricant layer on these protective film layers, wear resistance is further improved, and durability and corrosion resistance are further improved.
この発明において、強磁性金属薄膜層上に形成する保護
膜層は、Ni−Cr合金、N i −Mn合金、Ni−
Al合金などを、酸素ガス存在下で、斜め入射蒸着法に
より強磁性金属薄膜層上に被着して形成され、CrSM
n5Alから選ばれるいずれか一種と、Niと、0とか
らなる斜めに傾斜した柱状粒子の集合体で構成された保
護膜層が形成される。In this invention, the protective film layer formed on the ferromagnetic metal thin film layer is made of Ni-Cr alloy, Ni-Mn alloy, Ni-
CrSM is formed by depositing Al alloy etc. on a ferromagnetic metal thin film layer by oblique incidence evaporation method in the presence of oxygen gas.
A protective film layer is formed of an aggregate of diagonally inclined columnar particles made of one selected from n5Al, Ni, and 0.
このようにして形成されるこの種の保護膜層は、保護膜
層の全構成原子に対する酸素原子の原子比(0/ (N
i +Cr +O) 、O/ (N i +Mn+O
) 、O/ (Ni+Al+O))が、いずれも0.2
〜0.45の範囲内にあって、かつCrのNiに対する
原子比(Cr/Ni)が0.05〜0.5の範囲内、M
nのNiに対する原子比(Mn/Ni)が0.05〜0
.3の範囲内、AlのNiに対する原子比(Al/Ni
)が0.01〜0.3の範囲内にあることが好ましく、
保護膜層の全構成原子に対する酸素原子の原子比が0.
2より小さいと耐久性を充分に向上させることができず
、0.45より大きいと非磁性成分が多くなりすぎて電
磁変換特性の劣化を防止することができなくなる。また
、CrのNtに対する原子比が0.05より小さいと充
分な耐食性が得られず、0.5より大きくなると耐久性
が劣化する。同様にMnのNiに対する原子比が0.0
5より小さいと充分な耐食性が得られず、0.3より大
きくなると耐食性とともに耐久性が劣化し、さらにAl
のNiに対する原子比が、0.01より小さいと充分な
耐食性が得られず、0.3より大きくなると耐食性とと
もに耐久性が劣化する。またこの保護膜層は、保磁力が
100エルステッド以上となるようにするのが好ましく
、NiのCr * M n + Alに対する原子比を
前記の範囲より少なくすると、保護膜層の非磁性成分が
多くなりすぎて電磁変換特性の劣化を防止することがで
きな(なる。This type of protective film layer formed in this way has an atomic ratio of oxygen atoms to all constituent atoms of the protective film layer (0/(N
i +Cr +O), O/ (Ni +Mn+O
), O/ (Ni+Al+O)) are both 0.2
~0.45, and the atomic ratio of Cr to Ni (Cr/Ni) is within the range of 0.05 to 0.5, M
The atomic ratio of n to Ni (Mn/Ni) is 0.05 to 0
.. Within the range of 3, the atomic ratio of Al to Ni (Al/Ni
) is preferably within the range of 0.01 to 0.3,
The atomic ratio of oxygen atoms to all constituent atoms of the protective film layer is 0.
If it is smaller than 2, durability cannot be sufficiently improved, and if it is larger than 0.45, there will be too much non-magnetic component, making it impossible to prevent deterioration of electromagnetic conversion characteristics. Further, if the atomic ratio of Cr to Nt is smaller than 0.05, sufficient corrosion resistance cannot be obtained, and if it is larger than 0.5, durability deteriorates. Similarly, the atomic ratio of Mn to Ni is 0.0
If it is smaller than 5, sufficient corrosion resistance cannot be obtained, and if it is larger than 0.3, corrosion resistance and durability deteriorate, and furthermore, Al
If the atomic ratio of Ni to Ni is less than 0.01, sufficient corrosion resistance will not be obtained, and if it is greater than 0.3, both corrosion resistance and durability will deteriorate. The protective film layer preferably has a coercive force of 100 Oe or more, and if the atomic ratio of Ni to Cr*Mn+Al is lower than the above range, the nonmagnetic component of the protective film layer will increase. If this happens too much, it becomes impossible to prevent deterioration of the electromagnetic conversion characteristics.
このようにしてCr s M n SA lから選ばれ
るいずれか一種と、Niと、0とで形成されるこの種の
保護膜層は、未酸化のNiを含むため磁性を有し電磁変
換特性を劣化させることもない、またNiとCrと0と
からなる保護膜層は、保護膜層中に存在するNiの酸化
物により耐久性を充分に向上させることができ、Crの
酸化物により充分な耐食性が得られる。同様にNiとM
nと0とからなる保護膜層は、保護膜層中に存在するN
iの酸化物により耐久性を充分に向上させることができ
、同時にMnによりNiの酸化が助長されてNi酸化物
の一部が2価より高次であるNi2O3またはNi30
4となり、NiOの腐食性ガスに対する耐食性が改善さ
れるため、腐食性ガスに対する耐食性が向上される。ま
たNiとAlと0とからなる保護膜層は、保護膜層中に
存在するNiの酸化物により耐久性を充分に向上させる
ことができ、同時にAlはAl2O3として存在しNi
Oとスピネル型構造の緻密な被膜を形成するため、腐食
性ガスによるNiOの還元を防止して、耐食性を充分に
向上することができる。In this way, this type of protective film layer formed of one selected from Cr s M n SA l, Ni, and 0 has magnetism and electromagnetic conversion characteristics because it contains unoxidized Ni. The protective film layer made of Ni, Cr, and 0 will not deteriorate, and the durability can be sufficiently improved by the Ni oxide present in the protective film layer, and the durability can be sufficiently improved by the Cr oxide. Provides corrosion resistance. Similarly, Ni and M
The protective film layer consisting of n and 0 is composed of N present in the protective film layer.
The durability can be sufficiently improved by the oxide of i, and at the same time, the oxidation of Ni is promoted by Mn, so that some of the Ni oxides have higher valence than Ni2O3 or Ni30.
4, and the corrosion resistance of NiO to corrosive gases is improved, so the corrosion resistance to corrosive gases is improved. Furthermore, the durability of the protective film layer consisting of Ni, Al, and 0 can be sufficiently improved by the Ni oxide present in the protective film layer, and at the same time, Al exists as Al2O3 and Ni
Since a dense film with a spinel structure is formed with O, reduction of NiO by corrosive gas can be prevented and corrosion resistance can be sufficiently improved.
また、この保護膜層は、Cr 、M n SA 1から
選ばれるいずれか一種と、Niと、0とからなる斜めに
傾斜した柱状粒子の集合体で構成することにより、前述
した耐久性をさらに向上させるとともに、電磁変換特性
の劣化を防ぐことができる。In addition, this protective film layer further improves the durability described above by being composed of an aggregate of diagonally inclined columnar particles consisting of one selected from Cr, Mn SA 1, Ni, and 0. At the same time, deterioration of electromagnetic conversion characteristics can be prevented.
このような保護膜層の膜厚は、50〜1000人の範囲
内にするのが好ましく、50人より薄くては所期の効果
が得られず、1000人より厚くするとスペーシングロ
スが大きくなって電磁変換特性が劣化するおそれがある
。The thickness of such a protective film layer is preferably within the range of 50 to 1,000 layers; if it is thinner than 50 layers, the desired effect will not be obtained, and if it is thicker than 1,000 layers, the spacing loss will increase. There is a risk that the electromagnetic conversion characteristics will deteriorate.
このように、強磁性金属薄膜層上にCr s M n、
Alから選ばれるいずれか一種と、Niと、0とからな
る保護膜層を形成すると、電磁変換特性が劣化すること
もなく、耐久性および耐食性が充分に向上されるが、こ
の保護膜層上に、さらに潤滑剤層を形成すると、潤滑剤
層の潤滑効果が充分に発揮され、摩擦係数が充分に低減
されて、耐摩耗性が一段と向上される。In this way, Cr s M n,
If a protective film layer is formed of one selected from Al, Ni, and 0, the electromagnetic conversion characteristics will not deteriorate and the durability and corrosion resistance will be sufficiently improved. In addition, when a lubricant layer is further formed, the lubricating effect of the lubricant layer is fully exhibited, the coefficient of friction is sufficiently reduced, and the wear resistance is further improved.
このような潤滑剤層は、潤滑剤を、トルエン、メチルイ
ソブチルケトン、メチルエチルケトン、シクロヘキサノ
ン、酢酸エチル、テトラヒドロフラン、ジメチルホルム
アミド、ジオキサン等の適当な溶剤に溶解し、溶解によ
って得られた溶液中に前記の保護膜層を浸漬するか、あ
るいはこの溶液を前記の保護膜層上に塗布または噴霧す
るなどの方法で形成され、この他、潤滑剤を前記の保護
膜層上に真空蒸着するなどの方法でも形成される。この
ようにして前記の保護膜層上に、潤滑剤層が形成される
と、潤滑剤層の潤滑効果が充分に発揮されて、摩擦係数
が充分に低減され、耐摩耗性が一段と向上される。Such a lubricant layer is prepared by dissolving a lubricant in a suitable solvent such as toluene, methyl isobutyl ketone, methyl ethyl ketone, cyclohexanone, ethyl acetate, tetrahydrofuran, dimethylformamide, dioxane, etc., and adding the above-mentioned lubricant to the solution obtained by dissolving it. The lubricant can be formed by dipping the protective film layer, or by coating or spraying this solution on the protective film layer, or by vacuum-depositing a lubricant onto the protective film layer. It is formed. When a lubricant layer is formed on the above-mentioned protective film layer in this way, the lubricating effect of the lubricant layer is fully exhibited, the coefficient of friction is sufficiently reduced, and the wear resistance is further improved. .
使用される潤滑剤としては、脂肪族系潤滑剤、フッ素系
潤滑剤、シリコーン系潤滑剤および炭化水素系潤滑剤等
がいずれも好適なものとして使用され、脂肪族系潤滑剤
としては、脂肪酸、脂肪酸の金属塩、脂肪酸エステル、
脂肪酸アミド、脂肪族アルコールなどが使用される。脂
肪酸としては、ラウリン酸、ミリスチン酸、バルミチン
酸、ステアリン酸、ベヘン酸などが好ましく使用され、
脂肪酸の金属塩としては、これらの脂肪−のマグネシウ
ム塩、アルミニウム塩、リチウム塩、ナトリウム塩、カ
ルシウム塩、コバルト塩、亜鉛塩、バリウム塩、鉛塩な
どが、好適に使用される。また脂肪酸エステルとしては
、ステアリン酸ブチル、ミリスチン酸オクチル、ステア
リン酸モノグリセリド、バルミチン酸モノグリセリド、
オレイン酸モノグリセリドなどが好ましく使用され、脂
肪酸アミドとしては、カプロン酸アミド、カプリン酸ア
ミド、ラウリン酸アミド、バルミチン酸アミド、ベヘン
酸アミド、オレイン酸アミド、リノール酸アミド、メチ
レンビスステアリン酸アミドなどが好ましく使用される
。さらに脂肪族アルコールとしては、ステアリルアルコ
ール、ミリスチルアルコールなどが好ましく使用され、
この他、トリメチルステアリルアンモニウムクロライド
、1化ステアロイル等の塩化物、ステアリルアミン、ス
テアリルアミンアセテート、ステアリルアミンハイドロ
クロライド°等のアミンなども使用される。Suitable lubricants used include aliphatic lubricants, fluorine-based lubricants, silicone-based lubricants, and hydrocarbon-based lubricants. Examples of aliphatic lubricants include fatty acids, fatty acid metal salts, fatty acid esters,
Fatty acid amides, aliphatic alcohols, etc. are used. Preferred fatty acids include lauric acid, myristic acid, valmitic acid, stearic acid, and behenic acid.
As metal salts of fatty acids, magnesium salts, aluminum salts, lithium salts, sodium salts, calcium salts, cobalt salts, zinc salts, barium salts, lead salts, etc. of these fats are preferably used. In addition, fatty acid esters include butyl stearate, octyl myristate, stearic acid monoglyceride, valmitic acid monoglyceride,
Oleic acid monoglyceride and the like are preferably used, and as the fatty acid amide, caproic acid amide, capric acid amide, lauric acid amide, valmitic acid amide, behenic acid amide, oleic acid amide, linoleic acid amide, methylene bisstearic acid amide, etc. are preferable. used. Further, as the aliphatic alcohol, stearyl alcohol, myristyl alcohol, etc. are preferably used.
In addition, chlorides such as trimethylstearylammonium chloride and stearoyl monide, and amines such as stearylamine, stearylamine acetate, and stearylamine hydrochloride are also used.
またフッ素系潤滑剤としては、トリクロロフルオロエチ
レン、パーフルオロポリエーテル、パーフルオロアルキ
ルポリエーテル、パーフルオロアルキルカルボン酸など
が好適なものとして使用され、市販品の具体例としては
、ダイキン社製グイフロイル#20、デュポン社製タラ
イトフクスM、クライトフクスH,パイダソクスAR,
モンテジソン社製フォンブリン2等が挙げられる。さら
にシリコーン系潤滑剤としては、シリコーンオイル、変
性シリコーンオイル等が挙げられ、炭化水素系潤滑剤と
しては、パラフィン、スクアラン、ワックス等が好適な
ものとして使用される。In addition, as the fluorine-based lubricant, trichlorofluoroethylene, perfluoropolyether, perfluoroalkyl polyether, perfluoroalkyl carboxylic acid, etc. are preferably used, and specific examples of commercially available products include Guyfroil # manufactured by Daikin Corporation. 20, DuPont Tallite Fuchs M, Kreit Fuchs H, Paida Sox AR,
Examples include Fomblin 2 manufactured by Montegisson. Furthermore, examples of the silicone lubricant include silicone oil and modified silicone oil, and examples of the hydrocarbon lubricant include paraffin, squalane, wax, and the like.
なお、これらの潤滑剤を使用して形成される潤滑剤層は
、これらの潤滑剤のみで構成する他、防錆剤や微粒子を
混在させてもよく、防錆剤としては、ブチルヒドロキシ
アニソール、ジブチルヒドロキシトルエン、ベンゾトリ
アゾール、ベンゾトリアゾールラウリルアミン、ハイド
ロキノン、ジメチルアミノエチルメタクリレート、トリ
フェニルホスファイト、トリデシルホスファイト、トリ
ラウリルチオホスファイト、ブチルホスフェート、ジラ
ウリルチオジプロピオネート、ソルビトール、プロピレ
ングリコール、ヒドロキノンなどの、フェノール系、ア
ミン系、リン系、硫黄系、有機酸系、キノン系の防錆剤
が好適なものとして使用される。また微粒子としては、
A 1203 、ZrO2、Cr203、Fe304、
Fe2 o3、TiO2、SiO□、SnO2などが好
ましく使用される。In addition, the lubricant layer formed using these lubricants may be composed only of these lubricants, or may contain a rust preventive agent and fine particles. As a rust preventive agent, butylhydroxyanisole, butylhydroxyanisole, Dibutylhydroxytoluene, benzotriazole, benzotriazole laurylamine, hydroquinone, dimethylaminoethyl methacrylate, triphenyl phosphite, tridecyl phosphite, trilauryl thiophosphite, butyl phosphate, dilauryl thiodipropionate, sorbitol, propylene glycol, Phenol-based, amine-based, phosphorus-based, sulfur-based, organic acid-based, and quinone-based rust inhibitors such as hydroquinone are preferably used. In addition, as fine particles,
A1203, ZrO2, Cr203, Fe304,
Fe2 o3, TiO2, SiO□, SnO2, etc. are preferably used.
このような潤滑剤を用いて形成される潤滑剤層の層厚は
、潤滑効果を充分に発揮させて耐摩耗性を充分に向上さ
せるため20Å以上にするのが好ましい。しかし、前記
の強磁性金属薄膜層上に積層形成した保護膜層との合計
厚が1000人より厚くなると、スペーシングロスが大
きくなって、電磁変換特性が劣化するおそれがあるため
、前記保護膜層との合計厚が1000Å以下となるよう
にするのが好ましい。The thickness of the lubricant layer formed using such a lubricant is preferably 20 Å or more in order to sufficiently exhibit the lubricating effect and sufficiently improve wear resistance. However, if the total thickness of the ferromagnetic metal thin film layer and the protective film layer laminated on the ferromagnetic metal thin film layer becomes thicker than 1000, the spacing loss may increase and the electromagnetic conversion characteristics may deteriorate. It is preferable that the total thickness of the layers is 1000 Å or less.
強磁性金属薄膜層の形成材料としては、Co。The material for forming the ferromagnetic metal thin film layer is Co.
F e* N 1等の金属、co−Ni、 Co−Cr
。Metals such as Fe*N1, co-Ni, Co-Cr
.
Fe−Go、Fe−Go−Cr、Co−Pt、C0−T
i等の合金、あるいはこれらの金属および合金の酸化物
、およびCo−P、 Go−Ni −Pなどの強磁性材
が使用され、これらの強磁性材からなる強磁性金属薄膜
層は、真空蒸着、イオンブレーティング、スパッタリン
グ、メッキ等の手段によって基体上に被着形成される。Fe-Go, Fe-Go-Cr, Co-Pt, C0-T
ferromagnetic metal thin film layers made of these ferromagnetic materials are formed by vacuum deposition. , ion blasting, sputtering, plating, etc., on the substrate.
また、基体としては、ポリエステル、ポリイミド、ポリ
アミド、ポリ塩化ビニル、ポリカーボネートなどのプラ
スチックフィルム、またこれらのプラスチックフィルム
中に炭素繊維、Cu sシリコンなどを混入あるいは上
塗りした複合フィルム、Cu t Z nなどの非磁
性金属フィルム、アルミニウム板およびガラス板等、従
来から使用されているものが、いずれも好適なものとし
て使用される。In addition, as a substrate, plastic films such as polyester, polyimide, polyamide, polyvinyl chloride, and polycarbonate, composite films in which carbon fiber, Cu silicon, etc. are mixed or coated with these plastic films, and Cu t Zn etc. Conventionally used materials such as non-magnetic metal films, aluminum plates, and glass plates are all suitable.
磁気記録媒体としては、プラスチックフィルム等を基体
として用いた磁気テープ、プラスチックフィルム、アル
ミニウム板およびガラス板などからなる円盤を基体とし
て用いた磁気ディスクや磁気ドラムなど、磁気ヘッドと
摺接する構造の種々の形態を包含する。Magnetic recording media include various types of magnetic recording media that have a structure that makes sliding contact with a magnetic head, such as magnetic tapes using plastic films as bases, magnetic disks and magnetic drums using disks made of plastic films, aluminum plates, glass plates, etc. as bases. Includes form.
次に、この発明の実施例について説明する。 Next, embodiments of the invention will be described.
実施例1〜10
厚さ9μmのポリエステルフィルムを真空蒸着装置に袈
裟し、5X10=トールに真空排気した後、酸素ガスを
導入して8×10″5)−ルとし、コバルトを加熱蒸発
させて、100人/secの析出速度で斜め入射蒸着し
、ポリエステルフィルム上に厚さ1500人の酸素を含
むコバルトからなる強磁性金属薄膜層を形成した。次い
で、5×10−6トールに真空排気した後、酸素ガスを
導入量を種々に代えて導入し、Ni−Cr合金を加熱蒸
発させて、種々の析出速度で斜め入射蒸着し、厚みが2
00人で、NiとCrと0とからなる種々の組成の保護
膜層を形成した。次ぎに、このNtとCrとOとからな
る保護膜層上に、ステアリン酸の0.1重量%メチルイ
ソブチルケトン溶液を塗布し、乾燥してステアリン酸か
らなる厚さが100人の潤滑剤層を形成した。しかる後
、所定の巾に裁断して第1図に示すようなポリエステル
フィルム1上に、強磁性金属薄膜層2、保護膜層3、潤
滑剤層4を順次に積層形成した磁気テープAをつくった
。Examples 1 to 10 A polyester film with a thickness of 9 μm was placed in a vacuum evaporation device, and after evacuating to 5×10 torr, oxygen gas was introduced to make the film 8×10″5), and cobalt was heated to evaporate. , a ferromagnetic metal thin film layer consisting of cobalt containing oxygen was formed on the polyester film with a thickness of 1500 people/sec by oblique incidence deposition at a deposition rate of 100 people/sec.Then, it was evacuated to 5 x 10-6 Torr. After that, oxygen gas was introduced at various amounts to heat and evaporate the Ni-Cr alloy, and oblique incidence deposition was performed at various deposition rates to obtain a thickness of 2.
00 people formed protective film layers of various compositions consisting of Ni, Cr, and 0. Next, a 0.1% by weight solution of stearic acid in methyl isobutyl ketone is applied onto this protective film layer made of Nt, Cr, and O, and dried to form a lubricant layer of 100% by weight made of stearic acid. was formed. Thereafter, a magnetic tape A was prepared by cutting a predetermined width and sequentially laminating a ferromagnetic metal thin film layer 2, a protective film layer 3, and a lubricant layer 4 on a polyester film 1 as shown in FIG. Ta.
実施例11〜20
実施例1〜lOにおいて、ステアリン酸からなる潤滑剤
層の形成を省いた以外は、実施例1〜10と同様にして
、第2図に示すようなポリエステルフィルム1上に、強
磁性金属薄膜層2、保護膜層3を順次に積層形成した磁
気テープBをつくった。Examples 11 to 20 In Examples 1 to 1O, the same procedure as Examples 1 to 10 was carried out except that the formation of the lubricant layer made of stearic acid was omitted, and on the polyester film 1 as shown in FIG. 2, A magnetic tape B was prepared by sequentially laminating a ferromagnetic metal thin film layer 2 and a protective film layer 3.
実施例21〜29
実施例1〜10における保護膜層の形成において、Ni
−Cr合金に代えてNi −Mn合金を使用した以外は
実施例1〜10と同様にしてNiとMnとOとからなる
厚さが200人で、酸素の含有量およびNiとMnと0
の組成が種々に異なる保護膜層を形成し、磁気テープA
をつくった。Examples 21 to 29 In the formation of the protective film layer in Examples 1 to 10, Ni
The thickness of Ni, Mn, and O was 200, and the content of oxygen and Ni, Mn, and
A protective film layer having various compositions is formed, and magnetic tape A
I made it.
実施例30〜38
実施例21〜29において、ステアリン酸からなる潤滑
剤層の形成を省いた以外は、実施例21〜29と同様に
して磁気テープBをつくった。Examples 30 to 38 Magnetic tapes B were produced in the same manner as in Examples 21 to 29, except that the formation of the lubricant layer made of stearic acid was omitted.
実施例39〜47
実施例1〜10における保護膜層の形成において、Ni
−Cr合金に代えてNi−Al合金を使用した以外は実
施例1〜10六同様にしてNiとAlと0とからなる厚
さが200人で、酸素の含有量およびNiとAlと0の
組成が種々に異なる保護膜層を形成し、磁気テープAを
つくった。Examples 39 to 47 In the formation of the protective film layer in Examples 1 to 10, Ni
The thickness of Ni, Al and 0 was 200 in the same manner as in Examples 1 to 106 except that a Ni-Al alloy was used instead of the -Cr alloy, and the oxygen content and the content of Ni, Al and 0 were Magnetic tape A was produced by forming protective film layers having various compositions.
実施例48〜56
実施例39〜47において、ステアリン酸からなる潤滑
剤層の形成を省いた以外は、実施例39〜47と同様に
して磁気テープBをつくった。Examples 48-56 Magnetic tape B was produced in the same manner as in Examples 39-47, except that the formation of the lubricant layer made of stearic acid was omitted.
比較例1〜3
実施例1〜10における保護膜層の形成において、Ni
−Cr合金に代えてNiを使用した以外は実施例1〜1
0と同様にしてNiと0とからなる厚さが200人で、
酸素の含有量が種々に異なる保護膜層を形成し、磁気テ
ープをつくった。Comparative Examples 1 to 3 In the formation of the protective film layer in Examples 1 to 10, Ni
-Examples 1 to 1 except that Ni was used instead of the Cr alloy
Similarly to 0, the thickness of Ni and 0 is 200,
Magnetic tapes were produced by forming protective film layers with various oxygen contents.
比較例4〜5
実施例1〜lOにおける保護膜層の形成において、酸素
ガスの導入を省いた以外は実施例1〜10と同様にして
NiとCrからなる厚さが200人で、NiとCrの組
成が異なる保護膜層を形成し、磁気テープをつくった。Comparative Examples 4 to 5 In the formation of the protective film layer in Examples 1 to 1O, the thickness of Ni and Cr was 200, and the thickness of Ni and Cr was 200, except that the introduction of oxygen gas was omitted. A magnetic tape was produced by forming protective film layers with different Cr compositions.
比較例6〜8
実施例11〜20における保護膜層の形成において、N
i−Cr合金に代えてNiを使用した以外は、実施例1
1〜20と同様にしてNiとOとからなる厚さが200
人で、酸素の含有量が種々に異なる保護膜層を形成し、
磁気テープをつくった。Comparative Examples 6-8 In forming the protective film layer in Examples 11-20, N
Example 1 except that Ni was used in place of the i-Cr alloy.
Similarly to 1 to 20, the thickness of Ni and O is 200.
In humans, protective film layers with various oxygen contents are formed,
I made magnetic tape.
比較例9〜10
実施例11〜20における保護膜層の形成において、酸
素ガスの導入を省いた以外は実施例11〜20と同様に
してNiとCrとからなる厚さが200人で、NiとC
rの組成が異なる保護膜層を形成し、磁気テープをつく
った。Comparative Examples 9 to 10 In the formation of the protective film layer in Examples 11 to 20, the thickness of Ni and Cr was 200 mm, except that the introduction of oxygen gas was omitted. and C
Protective film layers having different compositions of r were formed to produce magnetic tapes.
比較例11
実施例1において、保護膜層の形成を省いた以外は、実
施例1と同様にして磁気テープをつ(った。Comparative Example 11 A magnetic tape was produced in the same manner as in Example 1 except that the formation of the protective film layer was omitted.
比較例1,2
実施例1において、保護膜層および潤滑剤層の形成を省
いた以外は、実施例1と同様にして磁気テープをつくっ
た。Comparative Examples 1 and 2 A magnetic tape was produced in the same manner as in Example 1, except that the formation of the protective film layer and lubricant layer was omitted.
各実施例および比較例で得られた磁気テープについて、
保護膜層の組成を測定した。この測定はオージェ電子分
光法により深さ方向の分析を行い、その平均を求めた。Regarding the magnetic tapes obtained in each example and comparative example,
The composition of the protective film layer was measured. For this measurement, analysis in the depth direction was performed using Auger electron spectroscopy, and the average was determined.
また各磁気テープについて保磁力を測定し、さらに市販
のVTRデツキを使用し記録再生して出力を測定し、比
較例12で得られた磁気テープを基準にして評価した。Further, the coercive force of each magnetic tape was measured, and the output was measured by recording and reproducing using a commercially available VTR deck, and evaluation was made using the magnetic tape obtained in Comparative Example 12 as a reference.
また40℃、80%RHの条件下で、再生時のスチル寿
命を測定して耐久性を調べた。又得られた磁気テープを
60℃、90%RHの条件下に1週間放置した場合の高
温多湿試験、1.01)PIIS 02 、0.5pI
)IllHx S、 1.0ppmNO2,35℃、7
5%RHの雰囲気下に24時間静置した場合の腐食ガス
試験を行い、最大磁束密度を測定して、放置前の磁気テ
ープの最大磁束密度に対する劣化率で表した。また光学
顕微鏡により表面を観察し、腐食点が全くない場合を(
O)、わずかに腐食点がある場合を(Δ)、明らかに腐
食が認められる場合を(×)として評価した。Further, the durability was investigated by measuring the still life during playback under conditions of 40° C. and 80% RH. Also, high temperature and humidity test when the obtained magnetic tape was left under conditions of 60 ° C. and 90% RH for one week, 1.01) PIIS 02, 0.5 pI
) IllHx S, 1.0 ppm NO2, 35°C, 7
A corrosive gas test was conducted when the magnetic tape was left standing for 24 hours in an atmosphere of 5% RH, and the maximum magnetic flux density was measured and expressed as a deterioration rate with respect to the maximum magnetic flux density of the magnetic tape before being left standing. In addition, the surface is observed using an optical microscope, and if there are no corrosion points at all (
O), cases where there were slight corrosion points were evaluated as (Δ), and cases where corrosion was clearly observed were evaluated as (×).
下記第1表ないし第3表はその結果である。Tables 1 to 3 below show the results.
上記第1ないし第3表から明らかなように、実施例1な
いし56で得られた磁気テープは、比較例工ないし12
で得られた磁気テープに比し、保磁力がほぼ同等で、ス
チル再生寿命が長く、また劣化率が小さくて観察による
腐食もあまり認められず、このことからこの発明によっ
て得られる磁気記録媒体は、電磁変換特性が良好で、耐
久性および耐食性が充分に向上されていることがわかる
。As is clear from Tables 1 to 3 above, the magnetic tapes obtained in Examples 1 to 56 were
Compared to the magnetic tape obtained by this invention, the coercive force is almost the same, the still playback life is longer, the deterioration rate is small, and corrosion is not observed much by observation. Therefore, the magnetic recording medium obtained by this invention is It can be seen that the electromagnetic conversion characteristics are good, and the durability and corrosion resistance are sufficiently improved.
第1図および第2図はこの発明によって得られた磁気テ
ープの部分拡大断面図である。
l・・・ポリエステルフィルム(基体)、2・・・強磁
性金属薄膜層、3・・・保護膜層、4・・・潤滑剤層、
A、B・・・磁気テープ(磁気記録媒体)特許出願人
日立マクセル株式会社
第1図
第2図
1ポリエステルフイルムFIGS. 1 and 2 are partially enlarged sectional views of a magnetic tape obtained according to the present invention. 1... Polyester film (substrate), 2... Ferromagnetic metal thin film layer, 3... Protective film layer, 4... Lubricant layer,
A, B...Magnetic tape (magnetic recording medium) patent applicant
Hitachi Maxell Ltd. Figure 1 Figure 2 Figure 1 Polyester film
Claims (1)
金属薄膜層を形成し、この強磁性金属薄膜層の表面に、
Cr、Mn、Alから選ばれるいずれか一種と、Niと
、Oとからなる保護膜層を設けたことを特徴とする磁気
記録媒体 2、保護膜層が、Cr、Mn、Alから選ばれるいずれ
か一種と、Niと、Oとからなる斜めに傾斜した柱状粒
子の集合体で構成されてなる特許請求の範囲第1項記載
の磁気記録媒体 3、基体上に金属もしくはそれらの合金からなる強磁性
金属薄膜層を形成し、この強磁性金属薄膜層の表面に、
Cr、Mn、Alから選ばれるいずれか一種と、Niと
、Oとからなる保護膜層を設け、さらにこの保護膜層上
に潤滑剤層を設けたことを特徴とする磁気記録媒体 4、保護膜層が、Cr、Mn、Alから選ばれるいずれ
か一種と、Niと、Oとからなる斜めに傾斜した柱状粒
子の集合体で構成されてなる特許請求の範囲第3項記載
の磁気記録媒体[Claims] 1. A ferromagnetic metal thin film layer made of metal or an alloy thereof is formed on a substrate, and on the surface of this ferromagnetic metal thin film layer,
A magnetic recording medium 2 characterized by having a protective film layer made of one selected from Cr, Mn, and Al, Ni, and O, wherein the protective film layer is one selected from Cr, Mn, and Al. A magnetic recording medium 3 according to claim 1, which is constituted by an aggregate of diagonally inclined columnar particles made of one of the above, Ni, and O; A magnetic metal thin film layer is formed, and on the surface of this ferromagnetic metal thin film layer,
Magnetic recording medium 4, protection, characterized in that a protective film layer made of one selected from Cr, Mn, and Al, Ni, and O is provided, and a lubricant layer is further provided on this protective film layer. The magnetic recording medium according to claim 3, wherein the film layer is composed of an aggregate of diagonally inclined columnar particles made of one selected from Cr, Mn, and Al, Ni, and O.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2295987A JPS63191313A (en) | 1987-02-03 | 1987-02-03 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2295987A JPS63191313A (en) | 1987-02-03 | 1987-02-03 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63191313A true JPS63191313A (en) | 1988-08-08 |
Family
ID=12097137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2295987A Pending JPS63191313A (en) | 1987-02-03 | 1987-02-03 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63191313A (en) |
-
1987
- 1987-02-03 JP JP2295987A patent/JPS63191313A/en active Pending
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