JPS63188938U - - Google Patents
Info
- Publication number
- JPS63188938U JPS63188938U JP8132087U JP8132087U JPS63188938U JP S63188938 U JPS63188938 U JP S63188938U JP 8132087 U JP8132087 U JP 8132087U JP 8132087 U JP8132087 U JP 8132087U JP S63188938 U JPS63188938 U JP S63188938U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- exposure apparatus
- light source
- shielding plate
- mounting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8132087U JPS63188938U (no) | 1987-05-28 | 1987-05-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8132087U JPS63188938U (no) | 1987-05-28 | 1987-05-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63188938U true JPS63188938U (no) | 1988-12-05 |
Family
ID=30932952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8132087U Pending JPS63188938U (no) | 1987-05-28 | 1987-05-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63188938U (no) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02278814A (ja) * | 1989-04-20 | 1990-11-15 | Fujitsu Ltd | ウエハの露光方法 |
JP2008258634A (ja) * | 2007-04-05 | 2008-10-23 | Asml Netherlands Bv | 基板をマスクするリソグラフィ装置及び方法 |
-
1987
- 1987-05-28 JP JP8132087U patent/JPS63188938U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02278814A (ja) * | 1989-04-20 | 1990-11-15 | Fujitsu Ltd | ウエハの露光方法 |
JP2008258634A (ja) * | 2007-04-05 | 2008-10-23 | Asml Netherlands Bv | 基板をマスクするリソグラフィ装置及び方法 |
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