JPS6317524A - 半導体パタ−ン露光装置 - Google Patents

半導体パタ−ン露光装置

Info

Publication number
JPS6317524A
JPS6317524A JP61162272A JP16227286A JPS6317524A JP S6317524 A JPS6317524 A JP S6317524A JP 61162272 A JP61162272 A JP 61162272A JP 16227286 A JP16227286 A JP 16227286A JP S6317524 A JPS6317524 A JP S6317524A
Authority
JP
Japan
Prior art keywords
information
original
inputted
keyboard
original image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61162272A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0482174B2 (enExample
Inventor
Ikutarou Wakao
育太朗 若生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP61162272A priority Critical patent/JPS6317524A/ja
Publication of JPS6317524A publication Critical patent/JPS6317524A/ja
Publication of JPH0482174B2 publication Critical patent/JPH0482174B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP61162272A 1986-07-09 1986-07-09 半導体パタ−ン露光装置 Granted JPS6317524A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61162272A JPS6317524A (ja) 1986-07-09 1986-07-09 半導体パタ−ン露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61162272A JPS6317524A (ja) 1986-07-09 1986-07-09 半導体パタ−ン露光装置

Publications (2)

Publication Number Publication Date
JPS6317524A true JPS6317524A (ja) 1988-01-25
JPH0482174B2 JPH0482174B2 (enExample) 1992-12-25

Family

ID=15751308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61162272A Granted JPS6317524A (ja) 1986-07-09 1986-07-09 半導体パタ−ン露光装置

Country Status (1)

Country Link
JP (1) JPS6317524A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434777A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Mask aligner

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434777A (en) * 1977-08-24 1979-03-14 Hitachi Ltd Mask aligner

Also Published As

Publication number Publication date
JPH0482174B2 (enExample) 1992-12-25

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