JPS63175213A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPS63175213A JPS63175213A JP62004820A JP482087A JPS63175213A JP S63175213 A JPS63175213 A JP S63175213A JP 62004820 A JP62004820 A JP 62004820A JP 482087 A JP482087 A JP 482087A JP S63175213 A JPS63175213 A JP S63175213A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- alloy
- layer
- thin film
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 26
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 40
- 239000000956 alloy Substances 0.000 claims abstract description 40
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 239000010408 film Substances 0.000 claims description 31
- 239000000758 substrate Substances 0.000 claims description 7
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 229910052720 vanadium Inorganic materials 0.000 claims description 2
- 229910017082 Fe-Si Inorganic materials 0.000 claims 1
- 229910017112 Fe—C Inorganic materials 0.000 claims 1
- 229910017133 Fe—Si Inorganic materials 0.000 claims 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims 1
- 229910003271 Ni-Fe Inorganic materials 0.000 claims 1
- 229910001004 magnetic alloy Inorganic materials 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 230000004907 flux Effects 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 abstract description 8
- 229910000640 Fe alloy Inorganic materials 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 229920001721 polyimide Polymers 0.000 abstract description 2
- 239000009719 polyimide resin Substances 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 2
- 229910052593 corundum Inorganic materials 0.000 abstract 2
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000004299 exfoliation Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 45
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910000929 Ru alloy Inorganic materials 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910001339 C alloy Inorganic materials 0.000 description 1
- 206010011732 Cyst Diseases 0.000 description 1
- 229910000656 Lu alloy Inorganic materials 0.000 description 1
- 229910000711 U alloy Inorganic materials 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 208000031513 cyst Diseases 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
- G11B5/3133—Disposition of layers including layers not usually being a part of the electromagnetic transducer structure and providing additional features, e.g. for improving heat radiation, reduction of power dissipation, adaptations for measurement or indication of gap depth or other properties of the structure
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高密度磁気記録に適した薄膜磁気ヘッドに関す
る。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head suitable for high-density magnetic recording.
従来薄膜ヘッドの磁極？１１１！成する磁性体としては
飽和磁束密度〜ＩＴのＮｌＦｅ合金が使われてきたが、
記録密度向上のため飽和磁束密度をよシ高める要求が強
くなっている。たとえば、垂直記録用薄膜ヘッドの磁極
を構成する磁性体として飽和磁束密度〜１．７ＴのＦｅ
−”３ｉ−３層合金を使用したものが、 ［アイ・イー
・イー・イー、トランザクションズ、ｔ−ｙ −ｒｆ
：＊ｆツクｘ （ＩＥＥＥ ＴＲＡＮＳ、ＯＮ ＭＡ
Ｇ、）。Magnetic pole of conventional thin film head? 111! NlFe alloy with a saturation magnetic flux density of ~IT has been used as the magnetic material to form the
In order to improve recording density, there is an increasing demand for higher saturation magnetic flux density. For example, Fe with a saturation magnetic flux density of ~1.7T is used as a magnetic material constituting the magnetic pole of a thin film head for perpendicular recording.
-"3i-Three layer alloy is used [IEE, Transactions, ty-rf
:*ftsukux (IEEE TRANS, ON MA
G.).
ボリューム エム エイ ジー２０．す７バー５）。Volume MG 20. 7 bar 5).
（ＶＯＬ、 ＭＡＧ−２０，ム５）、 １９８４年９月
第８３９〜８４１頁」に示されている。しかし、上部磁
性膜と下部磁性膜とを電気的、磁気的に絶縁する絶縁層
としてホトレジスト、ＰＩＱ（日立化成）などの有機樹
脂を用い、またギャップ層にＳｌｈ。(VOL, MAG-20, M5), September 1984, pp. 839-841. However, an organic resin such as photoresist or PIQ (Hitachi Chemical) is used as an insulating layer that electrically and magnetically insulates the upper magnetic film and the lower magnetic film, and Slh is used as the gap layer.
人ｔ２０３など無機材料を用いる薄膜磁気ヘッドにＦｅ
系合金膜を応用した場合におけるとくに工業的規模での
加工プロセス上の問題点については配慮されていなかっ
た。Fe is used in thin film magnetic heads using inorganic materials such as t203.
No consideration was given to problems in the processing process, especially on an industrial scale, when the system alloy film is applied.
上記従来技術は、薄膜磁気ヘッドの加工プロセス上の問
題点についての配慮がされておらず、高温プロセスにお
けるＦｅ系合金膜とＰＩＱ間の反応、Ｆｅ系合金膜上に
形成される３ ｉＱ２ 、 Ａｔｚ Ｏｓ等の膜に剥離
が生じる等の問題があった。The above-mentioned conventional technology does not take into account problems in the processing of thin-film magnetic heads, and does not take into account the reaction between the Fe-based alloy film and PIQ in the high-temperature process, and the 3 iQ2 , Atz formed on the Fe-based alloy film. There were problems such as peeling of the Os film.
本発明の目的は、上述した問題点を解決し、記録再生効
率にすぐれた薄膜磁気ヘッドを歩留シよく製造すること
にある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and to manufacture a thin film magnetic head with excellent recording and reproducing efficiency at a high yield.
上記問題点を解決し、記録再生効率の高い薄膜磁気ヘッ
ド製造を可能とするには、上部磁性層および下部磁性層
をＦｅ系結晶質合金膜とし、との上層又は下層又は両層
を金属あるいは合金膜とし、Ｆｅ系合金膜とホ）Ｌ／シ
スト膜やＰＩＱ膜、あるいは３ｉαｔ ｅ Ａｔｚ Ｏ
ｓ膜とが直接接触しないようにすることによシ達成され
る。In order to solve the above problems and make it possible to manufacture a thin film magnetic head with high recording and reproducing efficiency, the upper magnetic layer and the lower magnetic layer are made of Fe-based crystalline alloy films, and the upper layer, the lower layer, or both layers are made of metal or alloy film, Fe-based alloy film, e) L/cyst film, PIQ film, or 3iαt e Atz O
This is achieved by preventing direct contact with the S film.
本発明は、薄膜磁気ヘッドの上部磁極および下部磁極を
それぞれ高飽和磁束密度材料であるＦｅ系合金とし、そ
の上層または下層または両層を金属あるいは合金とする
ことにより、加工プロセス中に発生する諸問題を解決し
たものである。ここで、上部磁極および下部磁極に設け
られた金属あるいは合金膜は ｐ ｅ系結晶質合金が直
接絶縁層であるポリイミド系樹脂層（ＰＩＱ）、あるい
はギャップ層を形成するＳ ｉＯｘ 、 Ａｔｚ Ｏｓ
等と接することをさけるためのものであり、高温プロセ
スにおけるＰＩＱとＦｅ系合金との反応ｓ Ｆ ｅ系合
金上に形成されるＳ ｉ Ｏ２Ａ／４０Ｓ 等の剥離
を防止する働きがある。よって、高飽和磁束密度材料で
あるＦｅ系合金膜を磁極の主成分とする薄膜磁気ヘッド
を歩留りよく製造することができるようになる。In the present invention, the upper magnetic pole and the lower magnetic pole of the thin film magnetic head are each made of an Fe-based alloy, which is a high saturation magnetic flux density material, and the upper layer, the lower layer, or both layers are made of metal or an alloy. It is a problem solved. Here, the metal or alloy film provided on the upper magnetic pole and the lower magnetic pole is a polyimide resin layer (PIQ) in which the PE-based crystalline alloy is directly an insulating layer, or SiOx or AtzOs that forms a gap layer.
This is to avoid contact with PIQ and Fe-based alloys during high-temperature processes, and has the function of preventing peeling of SiO2A/40S, etc. formed on Fe-based alloys. Therefore, a thin film magnetic head whose magnetic pole is mainly composed of an Fe-based alloy film, which is a high saturation magnetic flux density material, can be manufactured with high yield.
以下１本発明の実施例を第１図により説明する。 An embodiment of the present invention will be described below with reference to FIG.
第１図は薄膜磁気ヘッドの断面を示す模式的な図である
。なお１本発明と直接関係しない従来公知の部分、たと
えば保農層や磁気コア後部を２層として厚くする等の構
造については省略して示しである。上下磁性層１，２は
Ｆｅ−８ｉ −ｆｌ、ｕ未結晶質合金膜をスパッタ法に
より作製したもので。FIG. 1 is a schematic diagram showing a cross section of a thin film magnetic head. Note that conventionally known parts that are not directly related to the present invention, such as structures such as a protective layer and a structure in which the rear part of the magnetic core is made thicker with two layers, are omitted from illustration. The upper and lower magnetic layers 1 and 2 are made of Fe-8i-fl and u amorphous alloy films made by sputtering.
膜厚は１μｍ前後である。ここでａ Ｆ ｅ −８を−
Ｒｕ合金の軟磁気特性を改善するため基板温度３５０Ｃ
でスパッタを行ない、保磁力ｅｌＯｅ以下に低減した。The film thickness is around 1 μm. Here a F e -8 -
To improve the soft magnetic properties of Ru alloy, the substrate temperature is 350C.
Sputtering was carried out to reduce the coercive force to below elOe.
上部磁性層の下地金属層７．および下部磁性層の上層の
金属層８はＣｒ膜であり、やはシスバッタ法により作製
され、膜厚は２０人から１０００人までの範囲で変化さ
せたものである。Base metal layer for upper magnetic layer7. The metal layer 8 above the lower magnetic layer is a Cr film, manufactured by the cis-butter method, and the film thickness is varied in the range of 20 to 1000 layers.
ギャップ層３はＳ １０ ｚ ＊絶縁層４はＰＩＱ、基
板５はＺ ｒ Ｏｚ ＋コイル６は銅である。Gap layer 3 is S 10 z *insulating layer 4 is PIQ, substrate 5 is Z r Oz + coil 6 is copper.
第２図、第３図は保磁力６０００ｅａ厚み０．１６μｍ
Ｏ：） Ｃｏ −ｒＰｅ２ Ｑ３ スパッタディスクを
用いて記録再生評価を行ない５本発明の効果を示したも
のである。第２図はヘッドの浮上量０．２μｍとした時
２ＫＰＣＩでの再生出力と上部磁性層、下部磁性層に設
けられたＣｒ膜厚との関係を示したものである。この実
施例では、上下両磁性層の後部コンタクトは金属層７，
８を通して行なわれるため、上下両磁性層に設けられた
Ｃｒ膜厚の和が後部コンタクト部におけるキャップ長と
なる。Figures 2 and 3 show a coercive force of 6000ea and a thickness of 0.16μm.
O:) Co-rPe2 Q3 A recording/reproducing evaluation was conducted using a sputter disk to demonstrate the effects of the present invention. FIG. 2 shows the relationship between the reproduction output at 2KPCI and the thickness of the Cr film provided in the upper and lower magnetic layers when the flying height of the head is 0.2 μm. In this embodiment, the rear contacts of both the upper and lower magnetic layers are metal layers 7,
8, the sum of the Cr film thicknesses provided on both the upper and lower magnetic layers becomes the cap length at the rear contact portion.
第２図よシ、このＣｒＮ淳が１００Å以下であれば再生
出力の低下は起こらず、５００人でもＣｒＮＩＪを設け
ない場合の８０ｔｌＩの再生出力が得られることがわか
る。一方ｓ Ｆ ｅ −８ｔ ｌ’ｌ ｕ合金とＰＩ
Ｑ間に設ける（’ｒ層の厚みは２０Å以上であれば、高
温プロセス時に起こるＦｅ−８ｉ −Ｒｕ合金、ＰＩＱ
間の反応を抑えることができ、また下部磁性層の上の金
属層８は、金属Ｊｆｉ ７を形成する前にスパッタエッ
チ等によシ取シ除くことができる。以上のことから、上
部磁性層の下にある金属層７の厚みは、２０人〜１００
人程度が望ましい。As shown in FIG. 2, if the CrN layer is 100 Å or less, the reproduction output does not decrease, and even with 500 people, a reproduction output of 80 tlI can be obtained without CrNIJ. On the other hand, s Fe -8t l'lu alloy and PI
(If the thickness of the 'r layer is 20 Å or more, Fe-8i-Ru alloy, PIQ
In addition, the metal layer 8 above the lower magnetic layer can be removed by sputter etching or the like before forming the metal Jfi 7. From the above, the thickness of the metal layer 7 under the upper magnetic layer is 20 to 100 mm.
Approximately 1 person is preferable.
また、下部磁性層と基板との間に金属層を設けたシ、上
部磁性層の上に金属層を設け、この上に形成される保護
層との密着性を向上させることもできる。Ｃｒの他にＮ
ｂ、 Ｔｉ、 Ｔａ、 Ｖ、 Ｒｈ、ｐｔ。Further, it is also possible to provide a metal layer between the lower magnetic layer and the substrate, or to provide a metal layer on the upper magnetic layer to improve the adhesion with the protective layer formed thereon. In addition to Cr, N
b, Ti, Ta, V, Rh, pt.
Ｐｄ、Ｗ、Ｍｏ等を用いることもできるが、Ｃｒは４０
０Ｃ程度の高温プロセスでもＰＩＱと反応したシ、Ｆｅ
−３ｉ−Ｒｕ合金と反応して磁気特性を劣化させること
がないのでとくに望ましい。他の金属を用いる場合は、
プロセス経験温度を下げる必要があった。Ｎｉ−Ｆｅ合
金は現在薄膜ヘッドの磁極材に用いられておシ、これを
金属層７゜８として用いることもできる。この場合上下
両磁性層間の後部コンタクト部はＮｉ−ＦｅＫよって磁
気的に完全にコンタクトされるので磁気特性上望ましい
が、プロセスの経験温度は若干低めにする必要がある。Pd, W, Mo, etc. can also be used, but Cr is 40
Fe reacted with PIQ even in a high temperature process of around 0C.
It is particularly desirable because it does not react with the -3i-Ru alloy and deteriorate its magnetic properties. When using other metals,
It was necessary to lower the process experience temperature. Ni--Fe alloys are currently used for the magnetic pole material of thin film heads, and can also be used as the metal layer 7.8. In this case, the rear contact portion between the upper and lower magnetic layers is completely magnetically contacted by Ni--FeK, which is desirable in terms of magnetic properties, but the process temperature must be slightly lower.
第３図は２Ｆｔ−２５ＫＰＣＩ、ＩＦｔ−５ＫＰＣＩと
した時のオーバーライ）８／Ｎとヘッド浮上量（スペー
シング）との関係を示したものである。FIG. 3 shows the relationship between override (8/N) and head flying height (spacing) when 2Ft-25KPCI and IFt-5KPCI are used.
直線１１は本発明により作製した薄膜磁気ヘッドで％
Ｃｒ膜厚は５０人である。直＠１２はパーマロイを磁極
材に用いた従来の薄膜磁気ヘッドである。このように、
本発明の実施により作製した薄膜磁気ヘッドは浮上量増
大にともなうオーバーライドＳ／Ｎの低下が少なく、浮
上量０．３μｍでもオーバーライドＳ／Ｎ２６ｄＢ以上
であり、明らかに飽和磁束密度の大きなＦｅ系合金を磁
極材に用いた効果があられれている。Straight line 11 is a thin film magnetic head manufactured according to the present invention.
The Cr film thickness is 50. Direct@12 is a conventional thin film magnetic head using permalloy as the magnetic pole material. in this way,
The thin-film magnetic head manufactured according to the present invention has a small drop in override S/N as the flying height increases, and has an override S/N of 26 dB or more even with a flying height of 0.3 μm, which clearly shows that Fe-based alloys with high saturation magnetic flux density are used. The effect of using it as a magnetic pole material is remarkable.
Ｆｅ系合金としてはＦｅ−８ｔ−３ｕ合金の他１１ＣＦ
ｅ−８ｔ、 Ｆｅ−Ｒｌｕ、 Ｆｅ −Ｎ ｉ、 Ｆ
ｅ −Ｃ合金を用いることができる。また他の合金と積
層構造とした合金も用いることができる。これらの合金
はいずれも磁歪零近傍の組成で飽和磁束密度が１，０１
以上あり、従来磁極材料として用いられてきたＮ １−
ＦｅＣ合金飽和磁束密度１、ＯＴよシも高いので、高い
記録再生効率が得られる。Fe-based alloys include Fe-8t-3u alloy and 11CF
e-8t, Fe-Rlu, Fe-N i, F
e-C alloy can be used. Further, alloys having a laminated structure with other alloys can also be used. All of these alloys have a composition near zero magnetostriction and a saturation magnetic flux density of 1.01.
N1-, which has been conventionally used as a magnetic pole material.
Since the FeC alloy has a saturation magnetic flux density of 1, which is higher than that of OT, high recording and reproducing efficiency can be obtained.
以上の実施例では、上部磁極および下部磁極をＦｅ系合
金層と金属層よりなる多層構造として試作した＃膜磁気
ヘッドの効果を示した。In the above examples, the effects of a # film magnetic head prototyped with a multilayered structure consisting of an Fe-based alloy layer and a metal layer for the upper magnetic pole and the lower magnetic pole were shown.
一方、上部磁極および下部磁極に金属層を設けずＦｅ−
５１−１ｕ合金膜単層として薄膜磁気ヘッドを試作した
結果、ＰＩＱをベークする高温プロセス中、ＰＩＱとＦ
ｅ−３ｉ−几Ｕ合金膜間に反応が起こシ反応性生成物が
Ｆｅ−８ｉ−ｋＬｕ膜上に付着した。この反応のため５
Ｆｅ−８ｉ−几Ｕ合金膜の磁気特性が劣化し、記録再生
出力は本発明の１／３以下であった。またＦｅ−３ｉ−
ＦＬｕ膜上に形成される８ｉ０ｓ膜が剥離するという問
題が発生したため、ヘッドの作製歩留りが極端に低下し
た。On the other hand, Fe-
As a result of prototyping a thin film magnetic head using a single layer of 51-1u alloy film, it was found that during the high temperature process of baking PIQ, PIQ and F
A reaction occurred between the e-3i-KLu alloy film and reactive products were deposited on the Fe-8i-kLu film. For this reaction 5
The magnetic properties of the Fe-8i-U alloy film deteriorated, and the recording and reproducing output was 1/3 or less of that of the present invention. Also Fe-3i-
Since a problem occurred in which the 8i0s film formed on the FLu film peeled off, the manufacturing yield of the head was extremely reduced.
本発明によれば、高飽和磁束密度を有し、かつ透磁率の
高いＦ ｅ系合金を、薄膜磁気ヘッドの上部磁極および
下部磁極を構成する磁極材料として使用しても加工プロ
セス上の問題が発生しないため１％に記録能力にすぐれ
た薄膜磁気ヘッドを歩留シよ〈製造することが可能とな
る。According to the present invention, even if an Fe-based alloy having high saturation magnetic flux density and high magnetic permeability is used as the magnetic pole material constituting the upper and lower magnetic poles of a thin-film magnetic head, there are no problems in the processing process. Since this phenomenon does not occur, it becomes possible to manufacture thin film magnetic heads with excellent recording performance at a yield of 1%.
第１図は本発明の実施例である薄膜磁気ヘッド主要部の
断面図、第２図および第３図は本発明の詳細な説明する
ための図である。
１・・・上部磁性層、２・・・下部磁性層、３・・・磁
気ギャップ、４・・・絶縁層、５・・・基板、６・・・
銅コイル、７・・・金属層、８・・・金属層。
、、、−２，。
代理人 弁理士 小川勝男＼ 。
６、。FIG. 1 is a sectional view of the main part of a thin film magnetic head which is an embodiment of the present invention, and FIGS. 2 and 3 are diagrams for explaining the present invention in detail. DESCRIPTION OF SYMBOLS 1... Upper magnetic layer, 2... Lower magnetic layer, 3... Magnetic gap, 4... Insulating layer, 5... Substrate, 6...
Copper coil, 7...metal layer, 8...metal layer.
,,,-2,. Agent: Patent attorney Katsuo Ogawa. 6.
Claims (1)
を形成して下部磁極とし、該下部磁極と上部磁極とより
成る磁気コア、両磁極を構成する上下磁性層を電気的、
磁気的に分離する絶縁層、該絶縁層内にあつて信号の入
出力を行なうコイル、および該基板上にあつて該コイル
と外部からの配線とを電気的に接続する２本の引き出し
線などを形成した薄膜磁気ヘツドにおいて、該上部磁性
層および下部磁性層の少なくとも一方がＦｅ系結晶質合
金膜からなり、該Ｆｅ結晶質合金の上層または下層また
は上下両層がＦｅ以外の金属あるいは合金膜であること
を特徴とする薄膜磁気ヘツド。 ２、特許請求の範囲第１項における薄膜磁気ヘツドにお
いて、上部磁極および下部磁極を構成するＦｅ系合金膜
は、Ｆｅを主成分とする結晶質合金であり、Ｆｅ−Ｓｉ
、Ｆｅ−Ｒｕ、Ｆｅ−Ｎｉ、Ｆｅ−Ｃ、Ｆｅ−Ｓｉ−Ｒ
ｕのいずれかを生成分とすることを特徴とする薄膜磁気
ヘツド。 ３、特許請求の範囲第１項における薄膜磁気ヘツドにお
いて、Ｆｅ系合金の上層または下層を構成する金属ある
いは合金は、Ｃｒ、Ｎｂ、Ｔｉ、Ｔａ、Ｖ、Ｒｈ、Ｐｔ
、ＰｄあるいはＷ、Ｍｏ等の高融点金属およびこれらを
主成分とする合金、あるいはＮｉ−Ｆｅ等の軟磁性合金
であることを特徴とする薄膜磁気ヘツド。 ４、特許請求の範囲第１項記載の薄膜磁気ヘツドにおい
て、Ｆｅ系合金の上層または下層を構成する金属あるい
は合金はＣｒであることを特徴とする薄膜磁気ヘツド。 ５、特許請求の範囲第１項記載の薄膜磁気ヘツドにおい
て、上部磁性層の下層を構成する金属はＣｒであり、そ
の厚みが０．０７μｍ以下であることを特徴とする薄膜
磁気ヘツド。[Claims] 1. A magnetic layer formed on a magnetic substrate or a non-magnetic substrate to form a lower magnetic pole, a magnetic core consisting of the lower magnetic pole and an upper magnetic pole, and upper and lower magnetic layers constituting both magnetic poles. electrically,
An insulating layer that magnetically separates, a coil located within the insulating layer for inputting and outputting signals, and two lead wires located on the substrate electrically connecting the coil and external wiring, etc. In the thin film magnetic head formed with the above, at least one of the upper magnetic layer and the lower magnetic layer is made of an Fe-based crystalline alloy film, and the upper or lower layer or both the upper and lower layers of the Fe crystalline alloy are made of a metal other than Fe or an alloy film. A thin film magnetic head characterized by: 2. In the thin-film magnetic head according to claim 1, the Fe-based alloy film constituting the upper magnetic pole and the lower magnetic pole is a crystalline alloy mainly composed of Fe, and is made of Fe-Si.
, Fe-Ru, Fe-Ni, Fe-C, Fe-Si-R
A thin film magnetic head characterized in that one of u is used as a generated component. 3. In the thin film magnetic head according to claim 1, the metal or alloy constituting the upper or lower layer of the Fe-based alloy is Cr, Nb, Ti, Ta, V, Rh, Pt.
, Pd, W, Mo, or other high-melting point metals, alloys containing these as main components, or soft magnetic alloys such as Ni-Fe. 4. A thin film magnetic head according to claim 1, wherein the metal or alloy constituting the upper or lower layer of the Fe-based alloy is Cr. 5. A thin film magnetic head according to claim 1, wherein the metal forming the lower layer of the upper magnetic layer is Cr, and the thickness thereof is 0.07 μm or less.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62004820A JPS63175213A (en) | 1987-01-14 | 1987-01-14 | Thin film magnetic head |
| US07/085,719 US4943879A (en) | 1986-08-22 | 1987-08-17 | Thin film magnetic head including magnetic layers having high saturation magnetic flux density and metal film for avoiding deterioration during manufacturing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62004820A JPS63175213A (en) | 1987-01-14 | 1987-01-14 | Thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63175213A true JPS63175213A (en) | 1988-07-19 |
Family
ID=11594355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62004820A Pending JPS63175213A (en) | 1986-08-22 | 1987-01-14 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63175213A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02149105U (en) * | 1989-05-19 | 1990-12-19 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51127154A (en) * | 1975-04-28 | 1976-11-05 | Toyoda Gosei Kk | Method of making synthetic resin joint with orifice |
| JPS60159616U (en) * | 1984-04-02 | 1985-10-23 | トヨタ自動車株式会社 | mold |
-
1987
- 1987-01-14 JP JP62004820A patent/JPS63175213A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51127154A (en) * | 1975-04-28 | 1976-11-05 | Toyoda Gosei Kk | Method of making synthetic resin joint with orifice |
| JPS60159616U (en) * | 1984-04-02 | 1985-10-23 | トヨタ自動車株式会社 | mold |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02149105U (en) * | 1989-05-19 | 1990-12-19 |
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