JPS63173634A - Substrate for flexible printed wiring - Google Patents
Substrate for flexible printed wiringInfo
- Publication number
- JPS63173634A JPS63173634A JP676287A JP676287A JPS63173634A JP S63173634 A JPS63173634 A JP S63173634A JP 676287 A JP676287 A JP 676287A JP 676287 A JP676287 A JP 676287A JP S63173634 A JPS63173634 A JP S63173634A
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- weight
- parts
- flexible printed
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title description 4
- 230000001070 adhesive effect Effects 0.000 claims description 54
- 239000000853 adhesive Substances 0.000 claims description 51
- 239000011888 foil Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229920005989 resin Polymers 0.000 claims description 12
- 239000011347 resin Substances 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 11
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 10
- 239000000539 dimer Substances 0.000 claims description 10
- 239000003822 epoxy resin Substances 0.000 claims description 9
- 229920000647 polyepoxide Polymers 0.000 claims description 9
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 8
- 229920000459 Nitrile rubber Polymers 0.000 claims description 8
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 18
- 238000000034 method Methods 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 238000009413 insulation Methods 0.000 description 8
- 238000009832 plasma treatment Methods 0.000 description 8
- 229910001872 inorganic gas Inorganic materials 0.000 description 7
- 239000011889 copper foil Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 5
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 229920001721 polyimide Polymers 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000002788 crimping Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229920003244 diene elastomer Polymers 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は電気特性特には絶縁性に優れたフレキシブルプ
リント配線用基板に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a flexible printed wiring board with excellent electrical properties, particularly insulation properties.
(従来の技術)
近年、電気、電子機器の多様化、小型化にともなって、
フレキシブルプリント配線板の需要が増加している。(Conventional technology) In recent years, with the diversification and miniaturization of electrical and electronic equipment,
Demand for flexible printed wiring boards is increasing.
フレキシブルプリント配線板は絶縁フィルムに張り合せ
た金属箔をエツチングし、回路を形成した後、抵抗、コ
ンデンサー、コイル、1.Il:。A flexible printed wiring board is made by etching metal foil pasted on an insulating film to form a circuit, then attaching resistors, capacitors, coils, etc. Il:.
(ホルダー)、個別トランジスター、スイッチ端子等を
ハンダで取付はフレキシブルプリント回路とするもので
ある。このフレキシブルプリント回路に使用されるフレ
キシブルプリント配線用基板は絶縁フィルムと金属箔(
主として銅箔)とを接着剤を用いて積層一体化したもの
であり、絶縁フィルムとしてはポリエチレンテレフタレ
ートフィルム、ポリイミドフィルム、ポリエーテル・エ
ーテルケトンフィルム、ポリエーテルスルホンフィルム
が主に用いられている。(Holder), individual transistors, switch terminals, etc. are attached with solder to form a flexible printed circuit. The flexible printed wiring board used for this flexible printed circuit is an insulating film and metal foil (
The insulating film used is mainly polyethylene terephthalate film, polyimide film, polyether/ether ketone film, or polyether sulfone film.
接着剤としは可撓性を有するものが必要であり、ニトリ
ルゴム系接着剤、ポリアミド系接着剤、ポリエステル系
接着剤、ポリアクリル系接着剤、エポキシ系接着剤、フ
ェノール系接着剤等が数多く提案されている。Adhesives need to be flexible, and we have many suggestions including nitrile rubber adhesives, polyamide adhesives, polyester adhesives, polyacrylic adhesives, epoxy adhesives, and phenolic adhesives. has been done.
しかしながらこれら従来の接着剤は電気、電子機器の高
密度化、軽薄短小化に伴いフレキシブルプリント配線板
に強く要求される配線間の高絶縁性と絶縁フィルム回路
(銅箔)間の高接着性を与えるうえから満足できるもの
がなく、絶縁性、耐熱性に優れたポリイミド樹脂でも接
着性に問題があり、柔軟性、可撓性に不足しているため
これら問題を解決することが緊急課題とされていた。However, these conventional adhesives do not meet the requirements of high insulation between wiring and high adhesion between insulating film circuits (copper foil), which are strongly required for flexible printed wiring boards as electric and electronic devices become denser, lighter, thinner, and smaller. Even polyimide resin, which has excellent insulation and heat resistance, has problems with adhesion and lacks flexibility and flexibility, so solving these problems is an urgent issue. was.
(発明の構成)
本発明者等は上記した難点を解決するために鋭意検討し
た結果、絶縁性、接着性、耐熱性、柔軟性に優れたフレ
キシブルプリント配線基板を提供することに成功し、本
発明に至ったのであって、本発明は低温プラズマ処理さ
れた絶縁フィルムに、ダイマー酸系エポキシ樹脂100
重量部、ビスマレイミド・トリアジン樹脂50〜150
重量部、アクリロニトリル・ブタジエンゴム5〜80重
量部からなる接着剤を介して金属箔を積層一体化させて
なるフレキシブルプリント配線用基板を要旨とするもの
である。(Structure of the Invention) As a result of intensive studies to solve the above-mentioned difficulties, the present inventors succeeded in providing a flexible printed wiring board with excellent insulation, adhesive properties, heat resistance, and flexibility. This invention has led to the invention, and the present invention is to apply dimer acid-based epoxy resin 100% to an insulating film that has been subjected to low-temperature plasma treatment.
Part by weight, bismaleimide triazine resin 50-150
The gist of the invention is a flexible printed wiring board formed by laminating and integrating metal foils via an adhesive consisting of 5 to 80 parts by weight of acrylonitrile-butadiene rubber.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明で使用される絶縁フィルムとしてはポリイミドフ
ィルム、ポリフェニレンスルフィドフィルム、ポリパラ
バン酸フィルム、ポリエステルフィルム、ポリエーテル
スルホンフィルム、ポリエーテル・エーテルケトンフィ
ルム等が例示され、厚さは12〜135μm程度のもの
が多用される。また、金属箔としては、電解銅箔および
圧延銅箔が一般に使用されるが、アルミ箔も使用される
。Examples of the insulating film used in the present invention include polyimide film, polyphenylene sulfide film, polyparabanic acid film, polyester film, polyether sulfone film, and polyether/ether ketone film, with a thickness of about 12 to 135 μm. Frequently used. Further, as the metal foil, electrolytic copper foil and rolled copper foil are generally used, but aluminum foil is also used.
本発明は上記した絶縁フィルムと金属箔とを上記の接着
剤を用いて積層一体化するのであるが、該絶縁フィルム
についてはあらかじめ無機ガスの低温プラズマによる表
面処理を施すことにより、フィルムと接着剤層の密着性
を向上せしめることが必要である。In the present invention, the above-mentioned insulating film and metal foil are laminated and integrated using the above-mentioned adhesive.The insulating film is previously subjected to surface treatment using low-temperature plasma of an inorganic gas, so that the film and the adhesive can be bonded together. It is necessary to improve the adhesion of the layers.
この低温プラズマ処理の方法としては、減圧可能な低温
プラズマ処理装置内に前記絶縁フィルムを入れ、装置内
を無機ガスの霊囲気として圧力を0.001〜10トル
好ましくは0601〜1トルに保持した状態で電極間に
0.1〜l0KV前後の直流あるいは交流を印加してグ
ロー放電させることにより無機ガスの低温プラズマを発
生させ、絶縁フィルムを順次穆動させながら表面を連続
的にプラズマ処理する。プラズマ処理時間はおおむね0
.1〜100秒とするのがよい。In this low-temperature plasma treatment method, the insulating film is placed in a low-temperature plasma treatment device capable of reducing pressure, and the pressure is maintained at 0.001 to 10 Torr, preferably 0.601 to 1 Torr, with an aether atmosphere of inorganic gas inside the device. In this state, a direct current or alternating current of about 0.1 to 10 KV is applied between the electrodes to cause glow discharge, thereby generating low-temperature plasma of an inorganic gas, and continuously plasma-treating the surface while sequentially moving the insulating film. Plasma treatment time is approximately 0
.. The time is preferably 1 to 100 seconds.
無機ガスとしてはヘリウム、ネオン゛、アルゴン等の不
活性ガス、酸素、窒素、−酸化炭素、二酸化炭素、アン
モニア、空気等が使用されるが、これらは1種に限られ
ず2f1以上混合して使用することも任意性なわれる。Inorganic gases used include inert gases such as helium, neon, and argon, oxygen, nitrogen, carbon oxide, carbon dioxide, ammonia, and air, but these are not limited to one type, but are used in a mixture of 2f1 or more. It is also considered optional.
次に本発明に使用する接着剤はダイマー酸系エポキシ樹
脂100重量部、ビスマレイミド・トリアジン樹脂50
〜150重量部、アクリロニトリル・ブタジエンゴム5
〜80重量部を必須成分とするが、ダイマー酸系エポキ
シ樹脂としてダイマー酸のもつカルボキシル基をエピク
ロルヒドリンでエポキシ化したもの、もしくはダイマー
酸にエポキシ樹脂を反応させたものであり、単独または
2種以上混合して用いる。Next, the adhesive used in the present invention is 100 parts by weight of dimer acid epoxy resin and 50 parts by weight of bismaleimide triazine resin.
~150 parts by weight, acrylonitrile-butadiene rubber 5
~80 parts by weight is an essential component, and as a dimer acid-based epoxy resin, the carboxyl group of dimer acid is epoxidized with epichlorohydrin, or the dimer acid is reacted with an epoxy resin, and it can be used alone or in combination of two or more. Mix and use.
ビスマレイミド、トリアジン樹脂としてはビスマレイミ
ドの混合比率が5〜100%の範囲のものである。また
好ましくはウレタン変性もしくはアクリル変性したもの
を含む樹脂であり、これらは単独または2種以上混合し
て用いる。The bismaleimide and triazine resins have a blending ratio of bismaleimide of 5 to 100%. Further, resins containing urethane-modified or acrylic-modified resins are preferred, and these are used alone or in combination of two or more.
アクリロニトリル・ブタンジエンゴムとしてはアミノ基
、ビニル基、エポキシ基、カルボキシル基から選ばれた
1種または2種以上の官能基を有するものが好ましく、
これらは単独または2種以上混合して用いる。The acrylonitrile-butane diene rubber preferably has one or more functional groups selected from amino groups, vinyl groups, epoxy groups, and carboxyl groups,
These may be used alone or in combination of two or more.
本発明に使用する接着剤を得るには上述したダイマー酸
系エポキシ樹脂100重量部、ビスマレイミド・トリア
ジン樹脂50〜150重量部、好ましくは60〜120
重量部、アクリロニトリル・ブタンジエンゴム5〜80
重量部、好ましくは20〜50重量部を単に混合するか
、加熱混合すればよい。To obtain the adhesive used in the present invention, 100 parts by weight of the above-mentioned dimer acid type epoxy resin, 50 to 150 parts by weight of bismaleimide triazine resin, preferably 60 to 120 parts by weight,
Parts by weight, acrylonitrile/butane diene rubber 5-80
Parts by weight, preferably 20 to 50 parts by weight, may be simply mixed or heated and mixed.
この混合割合の規定はビスマレイミド・トリアジン樹脂
の量が50重量部以下では本発明で使用する接着剤に絶
縁性を満足に付与できず、150重量部以上では柔軟性
を失なうからであり、アクリロニトリル・ブタンジエン
ゴムの量が5重量部以下では本発明で使用する接着剤に
柔軟性と接着性を満足に付与できず、80重量部以上で
は絶縁性を失なうからである。This mixing ratio is specified because if the amount of the bismaleimide triazine resin is less than 50 parts by weight, the adhesive used in the present invention cannot be provided with satisfactory insulation properties, and if it is more than 150 parts by weight, it will lose its flexibility. If the amount of acrylonitrile-butanediene rubber is less than 5 parts by weight, the adhesive used in the present invention cannot be provided with satisfactory flexibility and adhesive properties, and if it is more than 80 parts by weight, it will lose its insulation properties.
なお、混合に際して加熱する場合には加熱温度としては
40〜80℃で1〜30時間の加熱を行なえばよい。ま
た、混合に際し必要に応じて有機溶媒が使用でき、この
場合の溶媒としては上記成分に対して比較的溶解性の高
いものがよく、これには例えば1.4−ジオキサン等の
エーテル類、メチルエチルケトン等のケトン類、トルエ
ン等の芳香族炭化水素類、N−メチル2−ピロリドン等
が例示され、これらは単独または2種以上混合して使用
できる。In addition, in the case of heating during mixing, heating may be performed at a heating temperature of 40 to 80° C. for 1 to 30 hours. In addition, an organic solvent can be used if necessary during mixing, and in this case, the solvent is preferably one that has relatively high solubility for the above components, such as ethers such as 1,4-dioxane, methyl ethyl ketone, etc. Examples include ketones such as, aromatic hydrocarbons such as toluene, N-methyl 2-pyrrolidone, etc., and these can be used alone or in a mixture of two or more.
接着剤は溶媒に溶解し、溶液状態で塗布されるが、溶媒
としては上記有機溶媒が使用できる。また溶液濃度とし
ては10〜70wt%に調整することが好ましい。The adhesive is dissolved in a solvent and applied in a solution state, and the above-mentioned organic solvents can be used as the solvent. Further, the solution concentration is preferably adjusted to 10 to 70 wt%.
本発明で使用する接着剤はアクリロニトリル・ブタジエ
ンゴム成分によって可撓性、柔軟性を、ダイマー酸系エ
ポキシ樹脂成分によって接着性を、ビスマレイミド・ト
リアジン樹脂によって絶縁性、耐熱性を付与されたもの
で、各成分が相互に特色を出しており、特に絶縁性に優
れている。The adhesive used in the present invention has flexibility and softness provided by an acrylonitrile-butadiene rubber component, adhesive properties provided by a dimer acid-based epoxy resin component, and insulation and heat resistance provided by a bismaleimide-triazine resin. , each component has its own characteristics, and it has particularly excellent insulation properties.
フレキシブルプリント配線用基板を得る方法としては、
具体的に次のi)〜1ii)の方法があげられる。As a method of obtaining a flexible printed wiring board,
Specifically, the following methods i) to 1ii) can be mentioned.
i)絶縁フィルムを無機ガスの低温プラズマで処理し、
このプラズマ処理面に接着剤を設け、ついで金属箔を高
温または常温にて圧着し、接着剤を硬化させ基板とする
方法。i) Treating the insulating film with low-temperature plasma of inorganic gas,
A method in which an adhesive is applied to this plasma-treated surface, and then a metal foil is pressure-bonded at high temperature or room temperature to harden the adhesive and form a substrate.
if)金属箔に接着剤を設け、これに無機ガスの低温プ
ラズマで表面処理した絶縁フィルムを高温または常温に
て圧着し、接着剤を硬化させ基板とする方法。if) A method of applying an adhesive to a metal foil, pressing an insulating film whose surface has been treated with low-temperature plasma of an inorganic gas at high temperature or room temperature, and curing the adhesive to form a substrate.
Li1)絶縁フィルム無機ガスの低温プラズマで処理し
、このプラズマで処理面に接着剤を設け、さらに金属箔
にも同種または異種接着剤を設けて、両者を高温または
常温で圧着し、接着剤を硬化させ基板とする方法。Li1) Treat the insulating film with low-temperature plasma of inorganic gas, apply an adhesive to the treated surface using this plasma, apply the same or different adhesive to the metal foil, press the two together at high temperature or room temperature, and apply the adhesive. A method of curing and making it into a substrate.
これらの方法を主としてi)の方法を中心にしてさらに
詳しく説明すると、前記接着剤を必要により溶剤に溶解
したものを塗布乾燥機を用いて絶縁フィルムの低温プラ
ズマ処理面に5〜150μmの厚みで塗布し、常温〜1
50℃前後で0.5〜30分加熱する。この接着剤付絶
縁フィルムの接着剤面に銅箔、アルミ箔等の金属箔を重
ね合せ熱プレスで加圧加熱するか、ラミネーターのロー
ル間で加圧加熱するが、さらに必要によってはアフター
キュアーする。圧着条件は80〜170℃、圧力1〜1
00 Kgf/cm” 、加熱時間0.2〜60分が好
ましい。またアフターキュアーが必要な場合は50〜2
00℃、1〜100時間、無加圧またはロール圧着状態
で所定温度まで徐々に昇温することが好ましい。上記し
た方法は絶縁フィルムに接着剤を塗布し、これに金属箔
をラミネートする構成であるが、この接着剤の塗布はi
l)〜1ii)の方法で述べたように金属箔面に塗布あ
るいは絶縁フィルムと金属箔の両方に塗布し、接着剤層
を中間層として両者をラミネートする方法で行なっても
よ
い。To explain these methods in more detail, mainly focusing on method i), the above-mentioned adhesive, dissolved in a solvent if necessary, is applied to the low temperature plasma treated surface of the insulating film using a coating dryer to a thickness of 5 to 150 μm. Apply and store at room temperature ~1
Heat at around 50°C for 0.5 to 30 minutes. Metal foil such as copper foil or aluminum foil is placed on the adhesive side of this adhesive-backed insulating film and heated under pressure with a heat press, or heated under pressure between the rolls of a laminator, and if necessary, after-cured. . Crimping conditions are 80-170℃, pressure 1-1
00 Kgf/cm", heating time is preferably 0.2 to 60 minutes. Also, if after-cure is required, 50 to 2
It is preferable to gradually raise the temperature to a predetermined temperature at 00° C. for 1 to 100 hours without applying pressure or under roll pressure bonding. The method described above involves applying an adhesive to an insulating film and laminating metal foil on it, but the application of this adhesive is i.
As described in methods 1) to 1ii), it may be applied to the surface of the metal foil, or it may be applied to both the insulating film and the metal foil, and then the two are laminated using an adhesive layer as an intermediate layer.
以下実施例をあげ、本発明を説明する。The present invention will be explained below with reference to Examples.
実施例1
低温プラズマ処理装置内に25cm角、厚み25μlの
カプトフィルム(Dupont社製、ポリイミドフィル
ム商品名)を入れ、真空度0.1トルで酸素を導入し、
110kHz、2.5KVの交流電圧を電極に印加して
グロー放電を生じせしめ、60秒間低温プラズマ処理を
行なった。カプトンフィルムは上下対向電極の下方電極
上に置き、電極間は12cmとした。このプラズマ処理
フィルムに下記に示す接着剤A、B、Cをテスト塗工機
を使用して塗布し、次いで80℃15分間加熱して溶剤
を揮発、半硬化状態とした。Example 1 A 25 cm square, 25 μl thick capto film (manufactured by DuPont, trade name of polyimide film) was placed in a low temperature plasma processing apparatus, and oxygen was introduced at a vacuum degree of 0.1 torr.
An AC voltage of 110 kHz and 2.5 KV was applied to the electrodes to generate glow discharge, and low-temperature plasma treatment was performed for 60 seconds. The Kapton film was placed on the lower electrode of the upper and lower opposing electrodes, and the distance between the electrodes was 12 cm. Adhesives A, B, and C shown below were applied to this plasma-treated film using a test coater, and then heated at 80° C. for 15 minutes to volatilize the solvent and bring the film into a semi-cured state.
塗布厚みは乾燥機25μmとなるよう調節した。このフ
ィルムに25cm角、厚み35μmの電解銅箔を重ねて
ロール方式で加熱圧着し、アフターキュアーして銅張り
板とした。圧着条件は温度100℃、圧力5kgf/c
m2、アフターキュアーは150℃、3時間の条件で行
なった。このようにして得た各フレキシブルプリント配
線用基板の特性を第1表に示す。The coating thickness was adjusted to 25 μm using a dryer. An electrolytic copper foil of 25 cm square and 35 μm thick was layered on this film and hot-pressed using a roll method, followed by after-curing to form a copper-clad board. Crimping conditions are temperature 100℃, pressure 5kgf/c
m2, and after-cure was performed at 150°C for 3 hours. Table 1 shows the characteristics of each flexible printed wiring board thus obtained.
接着剤A; エピコート871(油化シェルエポキシ社
製、ダイマー酸系エポキシ樹脂商品名)20重量部、B
T−2170(三菱瓦斯化学社製、ビスマレイミド・ト
リアジン樹脂商品名)をメチルエチルケトンに溶解した
50%溶液10重量部、BT−2164(三菱瓦斯化学
社製、ウレタン変性ビスマレイミド・トリアミン樹脂商
品名)をメチルエチルケトンに溶解した50%溶液10
重量部、BT−A135に−A(三菱瓦斯化学社製、ア
クリル変性ビスマレイミド・トリアジン樹脂商品名)t
o!l量部、HYCARATBN(B、F、 Good
rich社製、変性アクリロニトリル・ブタジエンゴム
商品名)をメチルケトンに溶解した6%溶液100重量
部、メチルエチルケトン70重量部をそれぞれ秤量、加
えたのち、60℃で約4時間混合、次いで濾過したもの
。Adhesive A: 20 parts by weight of Epicoat 871 (manufactured by Yuka Shell Epoxy Co., Ltd., trade name of dimer acid-based epoxy resin), B
10 parts by weight of a 50% solution of T-2170 (manufactured by Mitsubishi Gas Chemical Company, trade name of bismaleimide triazine resin) dissolved in methyl ethyl ketone, BT-2164 (manufactured by Mitsubishi Gas Chemical Company, trade name of urethane-modified bismaleimide triamine resin) 50% solution of dissolved in methyl ethyl ketone 10
Part by weight, BT-A135 to -A (manufactured by Mitsubishi Gas Chemical Co., Ltd., acrylic modified bismaleimide triazine resin trade name) t
o! l quantity, HYCARATBN (B, F, Good
Weighed and added 100 parts by weight of a 6% solution of modified acrylonitrile-butadiene rubber (trade name manufactured by Rich Corporation) dissolved in methyl ketone and 70 parts by weight of methyl ethyl ketone, mixed at 60°C for about 4 hours, and then filtered.
B: 接着剤Aにおいてエピコート871(前出)20
!量部の代りにエボトートYD−171(東部化成社製
、ダイマー酸系エポキシ樹脂商品名)を用いると共にB
T−A135に−A(前出)10重量部を除いた以外は
接着剤Aと同一条件で作成したもの。B: Epicoat 871 (mentioned above) 20 in adhesive A
! Using Evotot YD-171 (manufactured by Tobu Kasei Co., Ltd., dimer acid-based epoxy resin trade name) instead of the amount, and
This was prepared under the same conditions as Adhesive A except that 10 parts by weight of -A (described above) was removed from T-A135.
C: 接着剤AにおいてHYCARATBN (前出)
の6%メチルエチルケトン溶液100重量部の代りにH
YCARATBN (前出)の6%トルエン溶液50重
量部と、HYCARVTBN(B、F、 Goodri
ch社製、変性アクリロニトリル−ブタジェンゴム商品
名)の6%トルエン溶液50重量部の混合物を用いた以
外は接着剤Aと同一条件で作製したもの。C: HYCARATBN in adhesive A (mentioned above)
H instead of 100 parts by weight of a 6% methyl ethyl ketone solution of
50 parts by weight of a 6% toluene solution of YCARATBN (described above) and HYCARVTBN (B, F, Goodri
Adhesive A was prepared under the same conditions as Adhesive A except that a mixture of 50 parts by weight of a 6% toluene solution of modified acrylonitrile-butadiene rubber (trade name, manufactured by CH Corporation) was used.
比較例1
実施例において接着剤A、B、Cを塗布する代りに下記
に示す接着剤り、E、Fを塗布する以外は実施例1と同
一条件で作製した各フレキシブルプリント配線用基板の
特性を第1表に示す。Comparative Example 1 Characteristics of each flexible printed wiring board produced under the same conditions as Example 1 except that instead of applying adhesives A, B, and C in Example, adhesives E and F shown below were applied. are shown in Table 1.
接着剤D= 実施例1の接着剤AにおいてBT−217
0(前出)、BT−2184(前出)、BT−A135
に−A (前出)を除いた以外は接着剤Aと同一条件で
作製したもの。Adhesive D = BT-217 in Adhesive A of Example 1
0 (mentioned above), BT-2184 (mentioned above), BT-A135
- A was produced under the same conditions as Adhesive A except for excluding A-A (described above).
E: 実施例1の接着剤AにおいてHYCARATBN
(前出)を除いた以外は接着剤Aと同一条件で作製した
もの。E: HYCARATBN in adhesive A of Example 1
Produced under the same conditions as Adhesive A, except for (mentioned above).
F: 実施例1の接着剤Aにおいてエピコート871(
前出)を除いた以外は接着剤Aと同一条件で作製したも
の。F: Epicoat 871 (
Produced under the same conditions as Adhesive A except for the above).
G: 実施例1の接着剤Aにおいてエピコート871(
前出)20重量部を100重量部に増やす以外は接着剤
Aと同一条件で作製したもの。G: Epicoat 871 (
Previous) Produced under the same conditions as Adhesive A except that the 20 parts by weight was increased to 100 parts by weight.
H: 実施例1の接着剤Aにおいて)IYCARATB
N(前出)の6%メチルエチルケトン溶液100重量部
の代りにHYCARCTBN(B、F、 Goodri
ch社製、変性アクリロニトリル・ブタジエンゴム商品
名)の50%メチルエチルケトン溶液100重量部を用
いた以外は接着剤Aと同一条件で1作製したもの。H: In adhesive A of Example 1) IYCARATB
HYCARCTBN (B, F, Goodri
One was prepared under the same conditions as Adhesive A except that 100 parts by weight of a 50% methyl ethyl ketone solution of modified acrylonitrile-butadiene rubber (trade name, manufactured by CH Corporation) was used.
実施例2
低温プラズマ処理装置内に、25cm角、厚み25μm
のカプトンフィルム(Dupont社製、ポリイミドフ
ィルム商品名)を入れ真空度0.2トルで酸素を導入し
、110k)lz、1.5KVの交流電圧を電極に印加
してグロー放電を生じせしめ20秒間低温プラズマ処理
を行なった。カプトンフィルムは上下対向電極の下方電
極上に置き電極間は10cmとした。同様に0.2トル
圧のHe、Ar%N2、Co、C02、NH3の単独ガ
スまたは混合ガス(02とAr)あるいは空気雰囲気下
で低温プラズマ処理を行なった。Example 2 Inside the low temperature plasma processing equipment, a 25 cm square, 25 μm thick
A Kapton film (manufactured by Dupont, trade name of polyimide film) was introduced, oxygen was introduced at a vacuum level of 0.2 torr, and an alternating current voltage of 110 kV and 1.5 kV was applied to the electrodes to generate a glow discharge for 20 seconds. Low temperature plasma treatment was performed. The Kapton film was placed on the lower electrode of the upper and lower opposing electrodes, with a distance of 10 cm between the electrodes. Similarly, low-temperature plasma treatment was performed in a single gas or mixed gas (02 and Ar) of He, Ar%N2, Co, CO2, and NH3 (02 and Ar) or air atmosphere at a pressure of 0.2 Torr.
これらのプラズマIA3!!フィルムに実施例1におけ
る接着剤Aをテスト塗工機を使用して塗布し、次いで8
0℃15分間加熱して溶剤を揮発、半硬化状態とした。These plasma IA3! ! Adhesive A in Example 1 was applied to the film using a test coater, and then 8
It was heated at 0° C. for 15 minutes to volatilize the solvent and bring it into a semi-cured state.
塗布厚みは乾燥後25μmとなるよう調節した。このフ
ィルムに25cm角、厚み35μmの電解銅箔を重ねて
ロール方式で加熱圧着し、アフターキュアーして銅張り
板とした。圧着条件は温度110℃、圧力10 Kgf
/cm’、アフターキュア条件は130℃4時間で行な
フた。このようにして得た各フレキシブルプリント配線
用基板の特性を第2表に示す。The coating thickness was adjusted to 25 μm after drying. An electrolytic copper foil of 25 cm square and 35 μm thick was layered on this film and hot-pressed using a roll method, followed by after-curing to form a copper-clad board. Crimping conditions are temperature 110℃, pressure 10Kgf
/cm', and the after-cure conditions were 130° C. for 4 hours. Table 2 shows the characteristics of each flexible printed wiring board thus obtained.
比較例2
実施例2において低温プラズマ処理したフィルムの代り
に未処理フィルムに接着剤Aを塗布した以外は実施例2
と同一条件で作製したフレキシブルプリント配線用基板
の特性を第2表に示す。Comparative Example 2 Example 2 except that adhesive A was applied to an untreated film instead of the low temperature plasma treated film in Example 2.
Table 2 shows the characteristics of the flexible printed wiring board manufactured under the same conditions as above.
実施例3
厚さ25μm巾508mmのカプトンフィルム(前出)
の50mロールを連続プラズマ処理装置により毎分60
Ilの速度でプラズマ処理を行なった。Example 3 Kapton film with a thickness of 25 μm and a width of 508 mm (described above)
50m roll of 60m per minute by continuous plasma processing equipment
Plasma treatment was performed at a rate of Il.
条件は真空度0.3トルにてヘリウムを0.51/1I
Iinで供給、印加電圧2KV、110kHzで入力2
0KWとし、装置は電極数4木を円筒状に配置し、電極
の外側4cmの距離でフィルム電極群の外周にそって移
動させ処理を行なった。上記プラズマ処理を行なったフ
ィルムに実施例1の接着剤Aを小型連続ラミネーターで
連続的に塗布、乾燥し、一方金属箔としては接着剤Aを
用い、ロールコータ−にて連続塗布乾燥した圧延銅箔を
使用し、両者をロール圧着積層した。Conditions are 0.51/1I helium at vacuum level 0.3 torr.
Supplied by Iin, applied voltage 2KV, input 2 at 110kHz
At 0 KW, the device had four electrodes arranged in a cylindrical shape and was moved along the outer periphery of the film electrode group at a distance of 4 cm from the outside of the electrodes for processing. Adhesive A of Example 1 was continuously applied to the above plasma-treated film using a small continuous laminator and dried.Meanwhile, Adhesive A was used as the metal foil, and rolled copper was continuously applied and dried using a roll coater. Using foil, both were laminated by roll pressure bonding.
なお、塗布接着剤の厚みが25μmとなるよう調節した
0次にロール状に巻き取った銅張り板を循環式乾燥機に
装入し、6時間130℃に保持した後放冷した。このフ
レキシブルプリント配線用基板を切断し、試験片を採取
して特性を測定した結果を第3表に示す。The copper clad plate, which had been wound up into a zero-order roll and the thickness of the applied adhesive was adjusted to 25 μm, was placed in a circulating dryer, kept at 130° C. for 6 hours, and then allowed to cool. This flexible printed wiring board was cut, test pieces were taken, and characteristics were measured. Table 3 shows the results.
(発明の効果)
以上説明したように本発明の製造方法によって作製され
るフレキシブルプリント配線用基板は電気絶縁性、接着
性、耐熱性、可撓性に優れたものであり、特に高絶縁性
であるため、高密度フレキシブルプリント回路板として
好適である。(Effects of the Invention) As explained above, the flexible printed wiring board produced by the manufacturing method of the present invention has excellent electrical insulation, adhesiveness, heat resistance, and flexibility, and is particularly highly insulating. Therefore, it is suitable as a high-density flexible printed circuit board.
Claims (1)
酸系エポキシ樹脂100重量部、ビスマレイミド・トリ
アジン樹脂50〜150重量部、アクリロニトリル・ブ
タジエンゴム5〜80重量部からなる接着剤を介して金
属箔を積層一体化させてなるフレキシブルプリント配線
用基板。1. Metal foil is attached to the low-temperature plasma-treated insulating film via an adhesive consisting of 100 parts by weight of dimer acid epoxy resin, 50 to 150 parts by weight of bismaleimide triazine resin, and 5 to 80 parts by weight of acrylonitrile butadiene rubber. A flexible printed wiring board made by integrating layers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP676287A JPH0661896B2 (en) | 1987-01-14 | 1987-01-14 | Flexible printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP676287A JPH0661896B2 (en) | 1987-01-14 | 1987-01-14 | Flexible printed wiring board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63173634A true JPS63173634A (en) | 1988-07-18 |
JPH0661896B2 JPH0661896B2 (en) | 1994-08-17 |
Family
ID=11647186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP676287A Expired - Lifetime JPH0661896B2 (en) | 1987-01-14 | 1987-01-14 | Flexible printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0661896B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04207097A (en) * | 1990-11-30 | 1992-07-29 | Nitto Denko Corp | Flexible wiring board |
CN107099070A (en) * | 2017-06-22 | 2017-08-29 | 河北科技大学 | Puncture resistant nitrile rubber/resinification aramid fiber reinforced composite and preparation method thereof |
-
1987
- 1987-01-14 JP JP676287A patent/JPH0661896B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04207097A (en) * | 1990-11-30 | 1992-07-29 | Nitto Denko Corp | Flexible wiring board |
CN107099070A (en) * | 2017-06-22 | 2017-08-29 | 河北科技大学 | Puncture resistant nitrile rubber/resinification aramid fiber reinforced composite and preparation method thereof |
CN107099070B (en) * | 2017-06-22 | 2018-09-07 | 河北科技大学 | Puncture resistant nitrile rubber/resinification aramid fiber reinforced composite and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
JPH0661896B2 (en) | 1994-08-17 |
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