JPS61182942A - Substrate for heat-resistant flexible printed wiring and manufacture thereof - Google Patents

Substrate for heat-resistant flexible printed wiring and manufacture thereof

Info

Publication number
JPS61182942A
JPS61182942A JP60024974A JP2497485A JPS61182942A JP S61182942 A JPS61182942 A JP S61182942A JP 60024974 A JP60024974 A JP 60024974A JP 2497485 A JP2497485 A JP 2497485A JP S61182942 A JPS61182942 A JP S61182942A
Authority
JP
Japan
Prior art keywords
heat
flexible printed
printed wiring
insulating film
silicone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60024974A
Other languages
Japanese (ja)
Inventor
鈴木 仁一郎
大串 芳美
聖 今井
太田 順博
進 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP60024974A priority Critical patent/JPS61182942A/en
Publication of JPS61182942A publication Critical patent/JPS61182942A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Laminated Bodies (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は耐熱性フレキシブルプリント配線用基板および
その製造方法に関するものであり、特には耐熱性絶縁フ
ィルムと金属箔とをシリコーン系接着剤層を介して積層
一体化した構成からなり、無機ガスの低温プラズマ処理
を用いることにより耐熱性絶縁フィルムとシリコーン系
接着剤との間の接着強さを大幅に向上させた該基板の提
供を目的とする。
Detailed Description of the Invention (Industrial Application Field) The present invention relates to a heat-resistant flexible printed circuit board and a method for manufacturing the same, and particularly relates to a heat-resistant insulating film and a metal foil with a silicone adhesive layer. The purpose of the present invention is to provide a substrate having an integrated laminated structure through which the adhesive strength between the heat-resistant insulating film and the silicone adhesive is significantly improved by using low-temperature plasma treatment of an inorganic gas. .

(従来の技術) 電子機器の多様化、小型化にともなって、軽量で立体的
に実装できるフレキシブルプリント配線板の使用が増加
している。このフレキシブルプリント配線板はプラスチ
ックフィルムに張り合せた金属箔をエツチングし回路を
形成した後、抵抗、コンデンサー、コイル、IC(ホー
ルダー)、個別トランジスター、スイッチ端子等をハン
ダで取付はフレキシブルプリント回路とする。このフレ
キシブルプリント回路に使用されるフレキシブルプリン
(〜配線用基板は、絶縁フィルムと金属箔(主として銅
箔)とを接着剤を用いて積層一体化したものであり、絶
縁フィルムとしては、ポリエチレンテレフタレートフィ
ルムとポリイミドフィルムが主体であるが、ポリエチレ
ンテレフタレートフィルムは耐熱性が不足し、ハンダ付
けを必要とするフレキシブルプリント回路ではポリイミ
ドフィルム等の耐熱性のあるフィルムに限られている。
(Prior Art) With the diversification and miniaturization of electronic devices, the use of flexible printed wiring boards that are lightweight and can be mounted three-dimensionally is increasing. This flexible printed wiring board is made by etching metal foil pasted onto a plastic film to form a circuit, and then attaching resistors, capacitors, coils, ICs (holders), individual transistors, switch terminals, etc. with solder to form a flexible printed circuit. . The flexible printed circuit (~ wiring board) used in this flexible printed circuit is made by laminating an insulating film and metal foil (mainly copper foil) together using an adhesive, and the insulating film is a polyethylene terephthalate film. However, polyethylene terephthalate film lacks heat resistance, and flexible printed circuits that require soldering are limited to heat-resistant films such as polyimide film.

接着剤としては可どう性を有するものが必要で、N 1
3 R系接着剤、ポリアミド系接着剤、アクリルゴム系
接着剤などが使用されているが、比較的耐熱性のよいア
クリルゴム系接着剤を使用しても基板とした場合の耐熱
性は250℃1分程度で実装作業を安定に行なうには不
充分である。たとえば回路を補修する場合は必要時間の
加熱に耐えられないため不良個所の修理が困難であり、
さらに常3払または一時的に、高温下で使用される配線
用材料に対する需要が増大しており、フレキシブルプリ
ント回路の耐熱性の向上が要望されている。接着剤とし
て、耐熱性の優れたシリコーン樹脂またはシリコーンゴ
ムを使用することにより、このような耐熱性の問題は解
決できると考えられるが、シリコーン樹脂またはシリコ
ーンゴムの一般的な性質として接着性に欠けることであ
り、充分な接着強度を得るためには被接着体の前処理や
プラズマ処理が必要で、フレキシブルプリント配線用基
板としては実用化に至っていない。
The adhesive must have flexibility, and N 1
3 R-based adhesives, polyamide-based adhesives, acrylic rubber-based adhesives, etc. are used, but even if acrylic rubber-based adhesives, which have relatively good heat resistance, are used, the heat resistance when used as a substrate is only 250°C. About one minute is not enough to stably perform mounting work. For example, when repairing a circuit, it is difficult to repair the defective part because it cannot withstand the required heating time.
Furthermore, there is an increasing demand for wiring materials that are used under high temperatures, either permanently or temporarily, and there is a demand for improved heat resistance of flexible printed circuits. It is thought that such heat resistance problems can be solved by using silicone resin or silicone rubber with excellent heat resistance as an adhesive, but silicone resins or silicone rubber generally lack adhesive properties. Therefore, in order to obtain sufficient adhesive strength, pretreatment or plasma treatment of the adherend is required, and it has not been put to practical use as a flexible printed wiring board.

(発明の構成) 本発明は耐熱性絶縁フィルムに対して無機ガスの低温プ
ラズマ処理を施こすことにより、シリコーン系接着剤に
よる接着強さを大幅に改善し耐熱性の優れた高接着強度
のフレキシブルプリント配線用基板を提供するものであ
る。特にシリコーン系接着剤として自己接着性シリコー
ンを用いることにより接着強さの点で注目すべき改善が
達成され、高耐熱性でしかも戴燃性のものとすることが
できる機械的強度にすぐれたフレキシブルプリント配線
用基板の製造に成功した。
(Structure of the Invention) The present invention significantly improves the adhesive strength of silicone adhesives by subjecting heat-resistant insulating films to low-temperature plasma treatment using inorganic gas. The present invention provides a printed wiring board. In particular, by using self-adhesive silicones as silicone adhesives, remarkable improvements in adhesive strength have been achieved, and flexible adhesives with excellent mechanical strength can be made highly heat resistant and flammable. Succeeded in manufacturing printed wiring boards.

すなわち本発明は、無機ガスの低温プラズマで表面処理
した耐熱性絶縁フィルムと金属箔とをシリコーン系接着
剤層を介して積層一体化してなる耐熱性フレキシブルプ
リント配線用基板およびその製造方法に関するものであ
る。
That is, the present invention relates to a heat-resistant flexible printed wiring board formed by laminating a heat-resistant insulating film whose surface has been treated with low-temperature plasma of an inorganic gas and a metal foil through a silicone adhesive layer, and a method for manufacturing the same. be.

以下本発明の詳細な説明する。The present invention will be explained in detail below.

本発明で使用される耐熱性絶縁フィルムとしては、ポリ
イミドフィルム、ポリフェニレンスルフィドフィルム、
ポリバラジン酸フィルム、耐熱性ポリエステルフィルム
、ポリエーテルスルホンフィルム、ポリエーテル・エー
テルケトンフィルムなどが例示される。厚さは12〜1
35μm程度のものが多用されている。また金属箔とし
ては、電解銅箔および圧延鋼箔が一般に使用されるが、
アルミ箔も使用される。
The heat-resistant insulating film used in the present invention includes polyimide film, polyphenylene sulfide film,
Examples include polyvaradic acid film, heat-resistant polyester film, polyether sulfone film, and polyether/ether ketone film. Thickness is 12-1
Thicknesses of about 35 μm are often used. Electrolytic copper foil and rolled steel foil are generally used as metal foils, but
Aluminum foil is also used.

本発明は上記した絶縁フィルムと金属箔とをシリコーン
系接着剤層を用いて積層一体化するのであるが、該絶縁
フィルムについてはあらかじめ無機ガスの低温プラズマ
による表面処理を施こす。
In the present invention, the above-described insulating film and metal foil are laminated and integrated using a silicone adhesive layer, and the insulating film is previously subjected to surface treatment using low-temperature plasma of an inorganic gas.

この低温プラズマ処理の方法としては、減圧可能な低温
プラズマ処理装置内に前記絶縁フィルムを入れ、装置内
を無機ガスの雰囲気として圧力を0.001〜10トル
好ましくは0.01〜1トルに保持した状態で電極間に
0.1〜5kV前後の直流あるいは交流を印加してグロ
ー放電させることにより無機ガスの低温プラズマを発生
させ、絶縁フィルムを順次移動させながら表面を連続的
にプラズマ処理する。プラズマ処理時間はおおむね10
〜100秒とすることが好ましい。
In this low-temperature plasma treatment method, the insulating film is placed in a low-temperature plasma treatment device that can reduce the pressure, and the pressure is maintained at 0.001 to 10 Torr, preferably 0.01 to 1 Torr, with the inside of the device being an atmosphere of inorganic gas. In this state, a direct current or alternating current of about 0.1 to 5 kV is applied between the electrodes to cause a glow discharge, thereby generating low-temperature plasma of an inorganic gas, and continuously plasma-treating the surface while sequentially moving the insulating film. Plasma treatment time is approximately 10
It is preferable to set it as 100 seconds.

無機ガスとしては、ヘルウム、ネオン、アルゴン等の不
活性ガス、酸素、窒素、−酸化炭素、二酸化炭素、アン
モニア、空気等が使用されるが、これらは1種に限られ
ず2種以上混合して使用することも行なわれる。
Inorganic gases used include inert gases such as helium, neon, and argon, oxygen, nitrogen, carbon oxide, carbon dioxide, ammonia, and air, but these are not limited to one type, but two or more types can be mixed. It is also done to use.

次にシリコーン系接着剤としては、柔軟性、接着性にす
ぐれた粘稠液状のもの、あるいは固形状物を溶剤で希釈
されたもので被着体に連続塗布、乾燥し、積層して10
0〜200℃の温度で数秒〜数十分加熱することにより
充分な接着強度が得られるものが好ましい。この目的に
合致するものとしては液状シリコーンゴム(RTV、L
TVシリコーンゴムとも呼称される)、熱加流型シリコ
ーンゴムとして市販されている自己接着性シリコーンゴ
ム系のものが最適であり、シリコーンレジン系接着剤も
包含される。
Next, as a silicone adhesive, a viscous liquid with excellent flexibility and adhesive properties, or a solid material diluted with a solvent is continuously applied to the adherend, dried, and laminated for 10 minutes.
It is preferable that sufficient adhesive strength can be obtained by heating at a temperature of 0 to 200° C. for several seconds to several tens of minutes. Liquid silicone rubber (RTV, L
The most suitable adhesives are self-adhesive silicone rubbers commercially available as heat-cured silicone rubbers (also referred to as TV silicone rubbers), and silicone resin adhesives are also included.

これら市販の自己接着性シリコーンゴムとしては縮合型
液状シリコーンゴムとしてのKE45、KE67、KE
68等(いずれも信越化学工業製商品名)、付加型液状
シリコーンゴムとしてのKE1212A、B、C,KE
1800A、B、C,KE1251(いずれも信越化学
工業製商品名)、有機過酸化物加流型KE701Bu(
信越化学工業製商品名)等が例示される。これらは必要
に応じ溶剤で希釈し、塗布容易な粘度に調節して使用さ
れるが、そのための1容剤としては、アセトン、トルエ
ン、メチルエチルケトン、メチルセロソルブ、テトラヒ
ドロフラン、ジメチルホルムアミドまたはジオキサンお
よびそれらの混合したのもが例示される。
These commercially available self-adhesive silicone rubbers include KE45, KE67 and KE as condensation type liquid silicone rubbers.
68 etc. (all product names manufactured by Shin-Etsu Chemical Co., Ltd.), KE1212A, B, C, KE as addition type liquid silicone rubber
1800A, B, C, KE1251 (all trade names manufactured by Shin-Etsu Chemical), organic peroxide flow type KE701Bu (
(trade name manufactured by Shin-Etsu Chemical Co., Ltd.), etc. are exemplified. These are diluted with a solvent as necessary and adjusted to a viscosity that is easy to apply.One-volume preparations for this purpose include acetone, toluene, methyl ethyl ketone, methyl cellosolve, tetrahydrofuran, dimethylformamide, dioxane, and mixtures thereof. The following is an example.

フレキシブルプリント配線用基板を製造する方法として
は、具体的に次の1)〜1ii)の方法があげられる。
Specific examples of methods for manufacturing a flexible printed wiring board include the following methods 1) to 1ii).

1)耐熱性絶縁フィルムを無機ガスの低温プラズマで処
理し、このプラズマ処理面にシリコーン系接着剤層を設
け、ついで金属箔を高温または常温にて圧着し、接着剤
層を硬化させ基板とする方法 ii)金属箔にシリコーン系接着剤層を設け、これに無
機ガスの低温プラズマで表面処理した耐熱性絶縁フィル
ムを高温または常温にて圧着し、接着剤層を硬化させ基
板とする方法1ii)耐熱性絶縁フィルムを無機ガスの
低温プラズマで処理し、このプラズマ処理面にシリコー
ン系接着剤層を設け、さらに金属箔にも同種または異種
のシリコーン系接着剤層を設けて、両者を高温または常
温で圧着し、接着剤層を硬化させ基板とする方法 これらの方法を主としてi)の方法を中心にしてさらに
詳しく説明すると、前記シリコーンゴム組成物を必要に
より溶剤に溶解した接着剤組成物を塗布乾燥機を用いて
耐熱性絶縁フィルムの低温プラズマ処理面に10〜15
0μmの厚みで塗布し、常温〜120℃前後で0.5〜
20分加熱する。この接着剤付耐熱性絶縁フィルムの接
着剤面に銅箔、アルミ箔等の金属箔を重ね合せ熱プレス
で加圧加熱するか、ラミネーターのロール間で加圧加熱
し接着するが、さらに必要によってはアフターキュアー
する。圧着条件は80〜170℃、圧力1〜100kg
f/a#、加熱時間0.2秒〜60分が好ましい。また
アフターキュアーが必要な場合は50〜200℃、時間
1〜30時間、無加圧またはロール圧着状態で所定温度
まで徐々に昇温することが好ましい。上記した方法は、
絶縁フィルムにシリコーン系接着剤を塗布し、これに金
属箔をラミネートする構成であるが、このシリコーン系
接着剤の塗布はii)〜1ii)の方法で述べたように
金属箔面に塗布してもよいし、あるいはまた絶縁フィル
ムと金属箔の両方に塗布し、接着剤層を中間層として両
者をラミネートする方法で行ってもよい。
1) A heat-resistant insulating film is treated with low-temperature plasma of inorganic gas, a silicone adhesive layer is provided on the plasma-treated surface, and a metal foil is then pressure-bonded at high or room temperature to harden the adhesive layer to form a substrate. Method ii) Method 1ii) A silicone adhesive layer is provided on metal foil, and a heat-resistant insulating film surface-treated with low-temperature plasma of inorganic gas is bonded to this at high temperature or room temperature, and the adhesive layer is cured to form a substrate. A heat-resistant insulating film is treated with low-temperature plasma of inorganic gas, a silicone adhesive layer is provided on the plasma-treated surface, and a silicone adhesive layer of the same or different type is also provided on the metal foil, and both are heated at high temperature or room temperature. These methods will be explained in more detail, mainly focusing on the method i), by applying an adhesive composition in which the silicone rubber composition is dissolved in a solvent if necessary. 10 to 15% on the low temperature plasma treated surface of the heat resistant insulating film using a dryer.
Apply with a thickness of 0μm, and apply at room temperature to around 120℃ from 0.5~
Heat for 20 minutes. A metal foil such as copper foil or aluminum foil is placed on the adhesive side of this adhesive-coated heat-resistant insulating film and bonded by pressing and heating with a heat press or by pressing and heating between the rolls of a laminator. After cure. Crimping conditions are 80-170℃, pressure 1-100kg
f/a# and heating time of 0.2 seconds to 60 minutes are preferred. If after-curing is required, it is preferable to gradually raise the temperature to a predetermined temperature at 50 to 200° C. for 1 to 30 hours without applying pressure or under roll pressure. The above method is
The structure is such that a silicone adhesive is applied to an insulating film and a metal foil is laminated thereon, but the silicone adhesive is applied to the metal foil surface as described in methods ii) to 1ii). Alternatively, a method may be used in which the insulating film and the metal foil are both coated and the two are laminated using an adhesive layer as an intermediate layer.

本発明のフレキシブルプリント配線用基板は、耐熱性の
上昇を目的とするものであるが、シリコーン系接着剤は
一般的に難燃性にもすぐれており、必要によってはさら
に高い難燃性を付与することも容易であり、憲燃性向上
手段としては、不燃性無機物、二酸化けい素、酸化チタ
ン等の粉末、含フロム化合物、フェノール誘導体と二酸
化アンチモン等の添加が適当である。
The purpose of the flexible printed wiring board of the present invention is to increase heat resistance, but silicone adhesives generally have excellent flame retardancy, and if necessary, even higher flame retardance can be imparted. It is also easy to do so, and suitable means for improving flammability include the addition of nonflammable inorganic substances, powders such as silicon dioxide and titanium oxide, frome-containing compounds, phenol derivatives, and antimony dioxide.

次に具体的実施例をあげる。Next, a specific example will be given.

実施例1 低温プラズマ処理装置内に、25■角、厚み25μmの
ポリイミドフィルム(商品名カプトン)を入れ、真空度
0.1トルで酸素を導入し、110kHz、2.5kV
の交流電圧を電極に印加してグロー放電を生じせしめ6
0秒間低温プラズマ処理を行った。ポリイミドフィルム
は上下対向電極の下方電極上に置き、電極間は120と
した。同様にo、1トル圧のHa、Ar、 N2、co
、co□、NH,の単独ガス又は混合ガス(02とAr
)あるいは空気雰囲気下で低温プラズマ処理を行った。
Example 1 A polyimide film (trade name: Kapton) of 25 mm square and 25 μm thick was placed in a low-temperature plasma processing apparatus, oxygen was introduced at a vacuum level of 0.1 Torr, and the temperature was 110 kHz and 2.5 kV.
Apply an alternating current voltage to the electrode to generate a glow discharge 6
Low temperature plasma treatment was performed for 0 seconds. The polyimide film was placed on the lower electrode of the upper and lower opposing electrodes, and the distance between the electrodes was 120. Similarly o, 1 Torr pressure Ha, Ar, N2, co
, co□, NH, alone or mixed gas (02 and Ar
) Alternatively, low-temperature plasma treatment was performed in an air atmosphere.

これらのプラズマ処理フィルムに液状シリコーンゴム接
着剤溶液(信越シリ:I−ンKE1212A、B、C)
をテスト塗工機を使用して塗布し、次で80’C5分間
加熱して溶剤を揮発、半硬化状態とした。塗布厚みは乾
、@@25μ用となるよう調節した。このフィルムに2
5■角、厚み35μmの電解銅箔を重ねてロール方式で
加熱圧着し、アフターキュアーして銅張り板とした。圧
着条件は温度170℃、圧力5 kgf/d、アフター
キュアー条件は150℃1時間行った。150°Cまで
1時間当り20℃で昇温した。このようにして得た各フ
レキシブルプリント配線用基板の特性を第1表に示す。
A liquid silicone rubber adhesive solution (Shin-Etsu Siri: I-N KE1212A, B, C) was applied to these plasma-treated films.
was applied using a test coater, and then heated at 80'C for 5 minutes to volatilize the solvent and bring it into a semi-cured state. The coating thickness was adjusted so that it was dry and @@25μ. 2 for this film
Electrolytic copper foils of 5 cm square and 35 μm thick were layered and heat-pressed using a roll method, and after-cured to form a copper-clad board. The pressure bonding conditions were a temperature of 170°C and a pressure of 5 kgf/d, and the after-cure conditions were 150°C for 1 hour. The temperature was increased to 150°C at a rate of 20°C per hour. Table 1 shows the characteristics of each flexible printed wiring board thus obtained.

なお、この実験で作成した銅張り板はいずれもUL−9
4−V−(5相当の難燃性であった。
In addition, all the copper clad boards created in this experiment were UL-9.
4-V- (flame retardancy equivalent to 5).

第1表 1*1  メタノール、アセトンまたは塩化メチレンに
25℃で5分浸漬 実施例2 低温プラズマ処理装置内に、 25cm巾厚み25μ−
ポリイミドフィルム(商品名カプトン)を入れ、真空度
0.05トルで酸素ガスを導入、電極に110kHz。
Table 1 1*1 Immersion in methanol, acetone or methylene chloride for 5 minutes at 25°C Example 2 In a low temperature plasma processing apparatus, a 25cm width 25μ-
A polyimide film (trade name: Kapton) was inserted, oxygen gas was introduced at a vacuum level of 0.05 torr, and the frequency of 110 kHz was introduced into the electrode.

3 kVの交流電圧を印加してグロー放電させ、生成す
る低温プラズマで45秒間処理を行なった。フィルムは
上下対向電極の下方電極上に置き、電極間は12印とし
た。
An alternating current voltage of 3 kV was applied to cause glow discharge, and treatment was performed for 45 seconds with the generated low-temperature plasma. The film was placed on the lower electrode of the upper and lower opposing electrodes, and there were 12 marks between the electrodes.

この処理のよってポリイミドフィルムの水に対する接触
角は35度より55度に上昇した。無酸素圧延銅箔(酸
素濃度0.001%以下)に下記の組成のシリコーンゴ
ム接着剤A−Dをリバースコーターを有するテスト塗工
機を使用して塗布し、次で80℃で5分間加熱し半硬化
条件とした。シリコーンゴムの塗布厚は乾燥後25μm
となるよう調節した。
This treatment increased the contact angle of the polyimide film to water from 35 degrees to 55 degrees. Silicone rubber adhesives A-D with the following composition were applied to oxygen-free rolled copper foil (oxygen concentration 0.001% or less) using a test coater equipped with a reverse coater, and then heated at 80°C for 5 minutes. The conditions were set to semi-cure. The coating thickness of silicone rubber is 25 μm after drying.
It was adjusted so that

なお、下記のKE68SB、KE1800A、B、C1
K E 1251およびKE701Buはいずれも信越
化学工業層の自己接着型シリコーンゴムである。
In addition, the following KE68SB, KE1800A, B, C1
KE 1251 and KE701Bu are both self-adhesive silicone rubbers manufactured by Shin-Etsu Chemical Co., Ltd.

接着剤A :  KE68S B100部、カタリスト
RC3部、トルエン100部 接着剤B:  KE1800A100部、B10部、C
2部、トルエン100部 II  C:  KE1251100部/7  D :
  KE701Bu100部、カタリストC−3を3部
、トルエン200部 上記各接着剤を塗布乾燥した無酸素圧延銅箔と上記プラ
ズマ処理フィルムとを重ねてロール方式で加熱圧着しア
フターキュアーして銅張り板とした。圧着条件は温度1
70℃、圧力5kgf/ci、アフターキュアー条件は
150℃1時間で行った。このようにして得た各フレキ
シブルプリント配線用基板の特性を第2表に示す。
Adhesive A: 100 parts of KE68S B, 3 parts of Catalyst RC, 100 parts of toluene Adhesive B: 100 parts of KE1800A, 10 parts of B, C
2 parts, toluene 100 parts II C: KE1251100 parts/7 D:
100 parts of KE701Bu, 3 parts of Catalyst C-3, 200 parts of toluene The oxygen-free rolled copper foil coated and dried with each of the above adhesives and the above plasma treated film were stacked together and heat-pressed using a roll method, and after-cured to form a copper-clad board. did. The crimping condition is temperature 1
The after-cure conditions were 70°C, 5 kgf/ci, and 150°C for 1 hour. Table 2 shows the characteristics of each flexible printed wiring board thus obtained.

第2表 実施例3 厚さ25μm巾508rItQのポリイミドフィルムの
50mロールを連続プラズマ処理装置により毎分60m
の速度でプラズマ処理を行なった。条件は真空度0゜5
トルにて酸素をIQ/minで供給、印加電圧2kV。
Table 2 Example 3 A 50m roll of polyimide film with a thickness of 25μm and a width of 508rItQ was processed at a rate of 60m per minute using a continuous plasma processing device.
Plasma treatment was performed at a speed of Conditions are vacuum degree 0°5
Oxygen was supplied at IQ/min in Torr, and the applied voltage was 2 kV.

110kllzで入力20klil、装置は電極数4本
を円筒状に配置し電極の外側40の距離でフィルムを電
極群の外周にそって移動させ処理を行なった。上記プラ
ズマ処理を終わったフィルムは接着剤としてKE 18
00 A 100部、K E 1800 B 10部、
K E 1800G 2部、トルエン50部からなる溶
液を用い、小型連続ラミネーターで連続的に塗布乾燥し
、一方金属箔としては上記と同じ接着剤溶液を用い、ロ
ールコータ−にて連続塗布乾燥した圧延銅箔を使用し。
With an input of 110 kllz and 20 klil, the device had 4 electrodes arranged in a cylindrical shape, and the film was moved along the outer periphery of the electrode group at a distance of 40 points outside the electrodes for processing. The film that has undergone the above plasma treatment is used as an adhesive using KE 18.
00 A 100 parts, K E 1800 B 10 parts,
Using a solution consisting of 2 parts of K E 1800G and 50 parts of toluene, it was continuously coated and dried with a small continuous laminator, while the same adhesive solution as above was used as the metal foil, which was continuously coated and dried with a roll coater. using copper foil.

両者をロール圧着積層した。Both were laminated by roll pressure bonding.

なお、塗布接着剤の厚みは合計で25μmとなるよう調
節した。次にロール状に巻き取った銅張り板を循環式乾
燥機に装入し、1時間150℃に保持した後放冷した。
The thickness of the applied adhesive was adjusted to a total of 25 μm. Next, the copper-clad plate wound up into a roll was placed in a circulating dryer, maintained at 150° C. for 1 hour, and then allowed to cool.

このフレキシブルプリント配線用基板を切断し試験片を
採取して特性を測定したところ、引き剥し強度2.2k
gf/an、半田耐熱性300℃1分以上であり、メタ
ノール、アセトン、メチレンクロライドによる耐溶剤性
も良好であった。
When this flexible printed wiring board was cut and a test piece was taken to measure its characteristics, the peel strength was 2.2k.
gf/an, soldering heat resistance at 300° C. for 1 minute or more, and solvent resistance with methanol, acetone, and methylene chloride was also good.

Claims (1)

【特許請求の範囲】 1、無機ガスの低温プラズマで表面処理した耐熱性絶縁
フィルムと金属箔とをシリコーン系接着剤層を介して積
層一体化してなる耐熱性フレキシブルプリント配線用基
板。 2、前記シリコーン系接着剤が自己接着性シリコーンゴ
ムである特許請求の範囲第1項記載の耐熱性フレキシブ
ルプリント配線用基板。 3、無機ガスの低温プラズマで表面処理した耐熱性絶縁
フィルムと金属箔とを、それら絶縁フィルムおよび金属
箔の一方または両方の表面にシリコーン系接着剤層を形
成し、ついでこのシリコーン系接着剤層を中間層として
絶縁フィルムと金属箔とを積層しシリコーン系接着剤層
を硬化させることを特徴とする耐熱性フレキシブルプリ
ント配線用基板の製造方法。
[Claims] 1. A heat-resistant flexible printed wiring board formed by laminating and integrating a heat-resistant insulating film whose surface has been treated with low-temperature plasma of an inorganic gas and a metal foil via a silicone adhesive layer. 2. The heat-resistant flexible printed wiring board according to claim 1, wherein the silicone adhesive is self-adhesive silicone rubber. 3. A heat-resistant insulating film and metal foil that have been surface-treated with low-temperature plasma of an inorganic gas are formed with a silicone adhesive layer on one or both surfaces of the insulating film and metal foil, and then this silicone adhesive layer is A method for producing a heat-resistant flexible printed wiring board, comprising laminating an insulating film and a metal foil as an intermediate layer and curing a silicone adhesive layer.
JP60024974A 1985-02-12 1985-02-12 Substrate for heat-resistant flexible printed wiring and manufacture thereof Pending JPS61182942A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60024974A JPS61182942A (en) 1985-02-12 1985-02-12 Substrate for heat-resistant flexible printed wiring and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60024974A JPS61182942A (en) 1985-02-12 1985-02-12 Substrate for heat-resistant flexible printed wiring and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS61182942A true JPS61182942A (en) 1986-08-15

Family

ID=12152941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60024974A Pending JPS61182942A (en) 1985-02-12 1985-02-12 Substrate for heat-resistant flexible printed wiring and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS61182942A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0245140A (en) * 1988-08-04 1990-02-15 Toray Ind Inc Laminated structure
JPH02134241A (en) * 1988-11-15 1990-05-23 Shin Etsu Chem Co Ltd Manufacture of polyimide film flexible printed circuit board
EP0856400A1 (en) * 1997-01-31 1998-08-05 Dassault Electronique Process for producing an article based on a poly(etheretherketone) polymer
JP2001018330A (en) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd Heat-resistant heat conductive silicone rubber composite sheet and production thereof
WO2002055591A1 (en) * 2001-01-11 2002-07-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for permanently bonding bodies made of chemically incompatible polymers
JP2013128108A (en) * 2011-12-16 2013-06-27 Prologium Holding Inc Pcb structure with silicone layer as adhesive
JP2018109136A (en) * 2017-01-03 2018-07-12 台虹科技股▲分▼有限公司 Adhesive composition and flexible laminate

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0245140A (en) * 1988-08-04 1990-02-15 Toray Ind Inc Laminated structure
JPH02134241A (en) * 1988-11-15 1990-05-23 Shin Etsu Chem Co Ltd Manufacture of polyimide film flexible printed circuit board
EP0856400A1 (en) * 1997-01-31 1998-08-05 Dassault Electronique Process for producing an article based on a poly(etheretherketone) polymer
FR2759019A1 (en) * 1997-01-31 1998-08-07 Dassault Electronique PROCESS FOR PRODUCING AN OBJECT BASED ON A POLYETHER-ETHER-CETONE POLYMER
JP2001018330A (en) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd Heat-resistant heat conductive silicone rubber composite sheet and production thereof
WO2002055591A1 (en) * 2001-01-11 2002-07-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for permanently bonding bodies made of chemically incompatible polymers
JP2013128108A (en) * 2011-12-16 2013-06-27 Prologium Holding Inc Pcb structure with silicone layer as adhesive
JP2018109136A (en) * 2017-01-03 2018-07-12 台虹科技股▲分▼有限公司 Adhesive composition and flexible laminate

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