JPS63168072A - Metal base printed circuit substrate - Google Patents
Metal base printed circuit substrateInfo
- Publication number
- JPS63168072A JPS63168072A JP31418086A JP31418086A JPS63168072A JP S63168072 A JPS63168072 A JP S63168072A JP 31418086 A JP31418086 A JP 31418086A JP 31418086 A JP31418086 A JP 31418086A JP S63168072 A JPS63168072 A JP S63168072A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- printed circuit
- insulating layer
- film
- phosphoric acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 13
- 239000002184 metal Substances 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 title description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 32
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 239000011347 resin Substances 0.000 description 10
- 239000000853 adhesive Substances 0.000 description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 239000011888 foil Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 239000003365 glass fiber Substances 0.000 description 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920001342 Bakelite® Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 101150046432 Tril gene Proteins 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 229940001007 aluminium phosphate Drugs 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、アルミニウム板(以下、Al板という)をベ
ースとする印刷回路用基板において、看
A1板と絶縁層とが強固に接−するためにAl板の表面
を燐酸アルマイト処理することを特徴とするものである
。[Detailed Description of the Invention] [Industrial Application Field] The present invention provides a printed circuit board based on an aluminum plate (hereinafter referred to as an Al plate), in which an A1 board and an insulating layer are in strong contact with each other. For this purpose, the surface of the Al plate is treated with phosphoric acid alumite.
(従来技術)
従来Al板をベースとする印刷回路用基板は第2図に示
す如く、へ1板(4)に、銅、アルミニウム等の回路用
金属箔(6)をプリプレグ等の絶縁層(5)を介して一
体化したものである。(Prior art) As shown in Fig. 2, a conventional printed circuit board based on an Al board is made of a first board (4), a circuit metal foil (6) made of copper, aluminum, etc., and an insulating layer (such as prepreg). 5).
更に詳しくみれば、Al板は接着力を得るために、その
表面を研摩等の物理的な方法により粗化したり、あるい
は硫酸アルマイト処理、蓚酸アルマイト処理して多孔質
化したものを用い、絶縁層はエポキシ樹脂、フェノール
樹脂、シリコーン樹脂等の熱硬化性樹脂をガラス繊維布
等の基材に含浸したプリプレグ、あるいは熱可塑性樹脂
フィルム等を用いていた。In more detail, in order to obtain adhesive strength, the surface of the Al plate is roughened by physical methods such as polishing, or made porous by sulfuric acid alumite treatment or oxalate alumite treatment, and the insulating layer is They used prepreg, which is a base material such as glass fiber cloth, impregnated with thermosetting resin such as epoxy resin, phenol resin, or silicone resin, or thermoplastic resin film.
このようなAl板をベースとする回路基板は、近年の過
酷な使用条件下においては、種々の要求特性を十分に満
足するものとは言えず、より一層の向上が望まれている
。Circuit boards based on such Al plates cannot be said to fully satisfy various required characteristics under harsh usage conditions in recent years, and further improvements are desired.
特に、Al板と絶縁層間の接着性についてはAl板、絶
縁層両面から種々検討されているが、未だ十分なものが
得られていない。In particular, various studies have been made regarding the adhesion between the Al plate and the insulating layer from both sides of the Al plate and the insulating layer, but no satisfactory results have been obtained yet.
(発明の目的)
本発明は、Al板をベースとする印刷回路用基板におい
て、A1板と絶縁層の接着性を改良し、これにより耐熱
性、耐電圧がすぐれ、過酷な加工・使用条件にも耐えう
る印刷回路用基板を提供することを目的とするものであ
る。(Object of the invention) The present invention improves the adhesion between the A1 board and the insulating layer in a printed circuit board based on an Al board, which has excellent heat resistance and withstand voltage, and is resistant to harsh processing and usage conditions. The purpose of this invention is to provide a printed circuit board that can withstand
本発明は、Al板とその表面に設けられた絶縁層からな
る金属ベース印刷回路用基板において、第1図に示すよ
うに、Al板(1)の表面に0.1〜1.5μmの燐酸
アルマイト皮膜(1a)が設けられ、これに絶縁層(2
)及び必要により金属箔層(3)を順次設けてなる印刷
回路用基板に関するものである。The present invention provides a metal-based printed circuit board consisting of an Al plate and an insulating layer provided on the surface thereof, as shown in FIG. An alumite film (1a) is provided on which an insulating layer (2
) and, if necessary, a metal foil layer (3) in this order.
本発明は、A1板として表面に厚さ、0.1〜1.5μ
mの燐酸アルマイト皮膜を設けたものを用いることに主
なる特徴がある。The present invention has a thickness of 0.1 to 1.5μ on the surface as an A1 plate.
The main feature is that a phosphoric acid alumite film of m is used.
燐酸アルマイト皮膜を設ける方法について説明する。燐
酸濃度50〜200g/j!の処理液を使用する。液温
を常温〜45℃とし、電流密度30〜100A/TIt
、時間2〜15分電解を行うことにより、Al板に0.
1〜1.5μmの燐酸アルマイ1〜皮膜を設けることが
できる。A method for providing a phosphoric acid alumite film will be explained. Phosphoric acid concentration 50-200g/j! Use a treatment solution of The liquid temperature is room temperature to 45℃, and the current density is 30 to 100A/TIt.
, by performing electrolysis for 2 to 15 minutes, the Al plate was coated with 0.
A film of aluminium phosphate 1 to 1 to 1.5 μm thick can be provided.
燐酸アルマイト皮膜は他のアルマイト、例えば200人
程度であるのに対し、300人程度である。従って、接
着される絶縁層が燐酸アルマイトの孔の中への浸透が良
く、絶縁層とAl板との密着性が向上する。The phosphoric acid alumite film has a strength of about 300, compared to other alumites, for example, about 200. Therefore, the insulating layer to be bonded can easily penetrate into the pores of the phosphoric acid alumite, and the adhesion between the insulating layer and the Al plate is improved.
また、硫酸アルマイトや蓚酸アルマイトは水分によって
水和されやすく、皮膜がもろくなり、密着性が阻害され
るが、燐酸アルマイトは皮膜が水和されにくいため、密
着性が良好である。In addition, sulfuric acid alumite and oxalic acid alumite are easily hydrated by water, making the film brittle and inhibiting adhesion, but phosphoric acid alumite has a film that is difficult to hydrate, so it has good adhesion.
燐酸アルマイトの膜厚が0.1μm未満では孔が浅く、
十分な密着力が得られない。一方1.5μmを超えると
密着力は0.1〜1.5μmの場合と同程度で、より高
い密着力は得られない。また成形された基板を曲げ加工
した場合、アルマイト皮膜にクラックが入り、密着性の
低下、絶縁性の低下が起こる。更に穴開は加工する場合
、ドリル摩耗が大ぎく、ドリル寿命を縮めると同時に、
アルマイト皮膜にクラックが入り、密着性、絶縁性を低
下させるので好ましくない。When the film thickness of phosphoric acid alumite is less than 0.1 μm, the pores are shallow;
Sufficient adhesion cannot be obtained. On the other hand, if the thickness exceeds 1.5 μm, the adhesion force is comparable to that of 0.1 to 1.5 μm, and higher adhesion force cannot be obtained. Furthermore, when a molded substrate is bent, cracks occur in the alumite film, resulting in a decrease in adhesion and insulation. Furthermore, when drilling holes, the wear of the drill is large, which shortens the life of the drill.
This is not preferable because it will cause cracks in the alumite film, reducing adhesion and insulation.
次に、絶縁層に用いられる材料は熱硬化性樹脂を繊維質
基材に含浸したプリプレグ、熱可塑性樹脂フィルムの他
に、Al板に塗布される熱硬化性樹脂、熱可塑性樹脂等
である。Next, the materials used for the insulating layer include a prepreg in which a fibrous base material is impregnated with a thermosetting resin, a thermoplastic resin film, a thermosetting resin applied to an Al plate, a thermoplastic resin, and the like.
熱硬化性樹脂はフェノール樹脂、エポキシ樹脂、不飽和
ポリエステル樹脂、ポリイミド樹脂等であるが、前記A
l板表面の燐酸アルマイトのすぐれた接着特性を十分に
発揮させるためには、エポキシ樹脂、ポリイミド樹脂が
好ましい。Thermosetting resins include phenol resins, epoxy resins, unsaturated polyester resins, polyimide resins, etc.
Epoxy resins and polyimide resins are preferred in order to fully exhibit the excellent adhesive properties of the phosphoric acid alumite on the surface of the plate.
更に、好ましくは該アルマイト処理の上にアラ熱硬化性
樹脂を繊維質基材に含浸してプリプレグとする場合に使
用する繊維質塞材としては紙、合成繊維布、ガラス繊維
布等があるが、電気特性等がすぐれているEガラスから
なるガラス繊維織布又はガラス繊維不織布が好ましい。Furthermore, preferably, the fibrous plugging material used when impregnating a fibrous base material with a fibrous base material on the alumite treatment to form a prepreg includes paper, synthetic fiber cloth, glass fiber cloth, etc. A glass fiber woven fabric or a glass fiber nonwoven fabric made of E glass, which has excellent electrical properties and the like, is preferable.
熱硬化性樹脂含浸繊維質基材中の樹脂の割合は通常30
〜60重母%であるが、熱伝導性、耐熱性の点から、各
層間の接着力など後の加工工程上必要な特性を満足する
限り、小さい方が望ましい。The proportion of resin in the thermosetting resin-impregnated fibrous base material is usually 30
The content is 60% by weight, but from the viewpoint of thermal conductivity and heat resistance, the smaller the content is, the more desirable it is, as long as it satisfies the properties required for subsequent processing steps, such as the adhesive strength between each layer.
また、同様の理由からAl板とプリプレグの間に接着剤
を使用しない方が好ましいが、本発明では、Al板が多
孔質の燐酸アルマイト皮膜を有しているので、前記接着
剤の不使用が実現できる。Further, for the same reason, it is preferable not to use an adhesive between the Al plate and the prepreg, but in the present invention, since the Al plate has a porous phosphoric acid alumite film, it is possible to avoid using the adhesive. realizable.
AIと所定枚数のプリプレグと必要により金属箔を積層
して加熱加圧成形する。AI, a predetermined number of prepreg sheets, and metal foil if necessary are laminated and molded under heat and pressure.
熱硬化性樹脂をAl板に塗布する場合、通常液状の樹脂
を直接Al板に塗布、乾燥後、必要により金属箔を重ね
、加熱加圧成形する。When a thermosetting resin is applied to an Al plate, usually a liquid resin is directly applied to the Al plate, and after drying, a metal foil is layered if necessary, and the resin is heated and press-molded.
熱可塑性樹脂を絶縁層として用いる場合、架橋ポリオレ
フィン、高融点ポリオレフィン、ポリエーテルサルホン
、ポリエーテルイミド、フッ素樹脂等が一般的であり、
フィルム状でAl板に積層されるか、エマルジョンとし
、Al板に塗布、乾燥される。この場合も必要により金
属箔を積層し、また各層間に必要により接着剤を用いる
。その後、樹脂軟化点以上の温度で、加熱加圧成形され
る。When thermoplastic resin is used as an insulating layer, crosslinked polyolefin, high melting point polyolefin, polyether sulfone, polyetherimide, fluororesin, etc. are commonly used.
It is laminated in the form of a film on an Al plate, or it is made into an emulsion, applied to the Al plate, and dried. In this case as well, metal foils are laminated as necessary, and an adhesive is used between each layer as necessary. Thereafter, it is heated and press-molded at a temperature equal to or higher than the resin softening point.
金属箔は、銅、アルミニウム、ニッケル等であるが、接
着面は接着性改良のため化学的おるいは物理的処理を行
っておくのが好ましい。また、油膜が設けられていて、
プリプレグとの接着に接着剤を必要としないので、熱伝
導性をよりよくするために、本発明においては金属箔へ
接着剤の塗ffiは行わない方が好ましい。The metal foil is made of copper, aluminum, nickel, etc., and the adhesive surface is preferably chemically or physically treated to improve adhesion. In addition, an oil film is provided,
Since no adhesive is required for adhesion to the prepreg, in order to improve thermal conductivity, it is preferable not to apply adhesive to the metal foil in the present invention.
本発明により得られた金属ベース印刷回路用基板は、A
l板と絶縁図との接着性、熱伝導性、及び耐熱性、耐電
圧等の特性がすぐれているので、過酷な条件で加工・使
用されるのに好適である。The metal-based printed circuit board obtained according to the present invention is A
It has excellent properties such as adhesion between the l-plate and the insulation diagram, thermal conductivity, heat resistance, and voltage resistance, so it is suitable for processing and use under harsh conditions.
(実施例及び比較例)
実施例1〜3、比較例1〜3
エポキシ樹脂ワニスを樹脂分41重間%になるようにガ
ラス繊維織@(日東紡WEA−106[)に含浸乾燥し
てプリプレグを(ワだ。(Examples and Comparative Examples) Examples 1 to 3, Comparative Examples 1 to 3 Glass fiber woven @ (Nittobo WEA-106 [)] was impregnated with epoxy resin varnish to a resin content of 41% by weight and dried to produce prepreg. (Wa-da.
エポキシ樹脂ワニスの処方は次の通りである。The formulation of the epoxy resin varnish is as follows.
臭素化エポキシ樹脂(エピコートEP1035 )10
000重
間シアンジアミド 4 u2エヂル
ー4メチルイミダゾール 0.15 N溶 剤
100 、/
前記プリプレグ1枚と、その−面に以下の各側に示すA
l板(厚さ1m)と、他の面に片面粗化された電解銅箔
(35μTrL)を重ね合わせ、175℃、9ONff
/cffl、130分間加熱加圧成形してAI!板ベー
ス積層板を得た。Brominated epoxy resin (Epicote EP1035) 10
000 hydrogen cyandiamide 4 u2 4-methylimidazole 0.15 N solvent 100, /
One sheet of the prepreg and the A shown below on each side on its - side.
1 plate (thickness 1m) and electrolytic copper foil (35μTrL) with one side roughened on the other side, heated at 175℃, 9ONff.
/cffl, heated and pressure molded for 130 minutes and AI! A board-based laminate was obtained.
(比較例1〕
Al板(J I S 1−(4000,A1050P、
H−24)の片面をボール研摩により粗面化した。表面
アラリ−Rmaxは15μmであった。(Comparative Example 1) Al plate (JIS 1-(4000, A1050P,
One side of H-24) was roughened by ball polishing. The surface roughness Rmax was 15 μm.
(比較例2〕
Al板(JISH4000、A1050P、1−1−2
4 >の片面を以下の条件により硫酸アルマイト処理し
、厚さ1.5μmの皮膜を設けた。(Comparative Example 2) Al plate (JISH4000, A1050P, 1-1-2
4> was treated with sulfuric acid alumite under the following conditions to form a film with a thickness of 1.5 μm.
液組成 硫酸15%
液温度 25℃
電解条件 1 A/d TIi、2分間〔比較例3
〕
Af板(JIS4000、A1050P、 H−24>
の片面を以下の条件により燐酸アルマイト処理し、厚さ
10μmの皮膜を設けた。Liquid composition 15% sulfuric acid Liquid temperature 25°C Electrolysis conditions 1 A/d TIi, 2 minutes [Comparative Example 3
] Af plate (JIS4000, A1050P, H-24>
One side of the sample was treated with phosphoric acid alumite under the following conditions to form a film with a thickness of 10 μm.
液組成 燐酸100g#
液温度 30℃
電解条件 1A/dゴ、45分7間(実施例1及び
2)
AJ2板(J I 34000. A1050P、 H
−24>の片面を以下の条件により燐酸アルマイト処理
し、それぞれ1.5μm、、0.5μmの皮膜を得た。Liquid composition: Phosphoric acid 100g# Liquid temperature: 30°C Electrolysis conditions: 1A/d for 45 minutes and 7 hours (Examples 1 and 2) AJ2 plate (J I 34000. A1050P, H
-24> was subjected to phosphoric acid alumite treatment under the following conditions to obtain films of 1.5 μm and 0.5 μm, respectively.
液組成 燐酸100g#
液温度 30℃
電解条件 0.5A/d洸、15分間0.5A/d
Trt、 5分間
(実施例3)
Al板(J I 54000. A3052P、l−1
−34>の片面を実施例1と同じ条件により燐酸アルマ
イ1〜処理し、1.5μmの皮膜を19だ。Liquid composition: Phosphoric acid 100g# Liquid temperature: 30°C Electrolysis conditions: 0.5A/d for 15 minutes 0.5A/d
Trt, 5 minutes (Example 3) Al plate (J I 54000. A3052P, l-1
-34> was treated with phosphoric acid aluminium 1 to 19 under the same conditions as in Example 1 to form a 1.5 μm film.
に含浸し乾燥してプリプレグを得た。A prepreg was obtained by impregnating and drying.
以下、前記のエポキシ樹脂の場合と同様にしてΔ)板ベ
ース積層板を得た。Thereafter, a Δ) board-based laminate was obtained in the same manner as in the case of the epoxy resin described above.
〔実施例4〕 を使用した。[Example 4] It was used.
〔比較例4〕 を使用した。[Comparative example 4] It was used.
これら実施例及び比較例で得られたAl板ベース積層板
の特性を第1表に示す。Table 1 shows the properties of the Al plate-based laminates obtained in these Examples and Comparative Examples.
第1表から明らかなように、各実施例で得られたAll
ll−ス積層板はAl板とプリプレグ(絶縁層)の接着
性、熱伝導性及び耐熱性、耐電圧等の特性がすぐれてい
る。また、ドリル摩耗が小さく、曲げ加工性も良好であ
る。As is clear from Table 1, All obtained in each example
The II-S laminate has excellent properties such as adhesion between the Al plate and the prepreg (insulating layer), thermal conductivity, heat resistance, and voltage resistance. In addition, drill wear is small and bending workability is good.
なお、第1表において、各項目の測定方法は次の通りで
ある。In addition, in Table 1, the measurement method for each item is as follows.
接着強度:得られた積層板を沸騰水中で2時間処理し、
絶縁層とAl板の間で剥離するか否かをみた。Adhesive strength: The obtained laminate was treated in boiling water for 2 hours,
It was examined whether or not there was peeling between the insulating layer and the Al plate.
剥離せず絶縁層が破壊する。 Q剥離する。
X熱伝導性:昭和電IE製QTM
型迅速熱伝導率計を用い、熱線式熱伝導率を測定した。The insulating layer is destroyed without peeling. Q Peel off.
X Thermal conductivity: Showa Den IE QTM
Hot wire thermal conductivity was measured using a type rapid thermal conductivity meter.
トリル磨耗ニトリル径1.1簡、回転数60.000r
ptn 、送り速度3TrL/分の条件でドリル加工し
た。Tril wear nitrile diameter 1.1, rotation speed 60.000r
Drilling was performed under the conditions of ptn and feed rate of 3 TrL/min.
曲げ加工性:A1板を内側にしてR−2#の曲げ加工を
行った。Bending workability: R-2# bending was performed with the A1 plate facing inside.
層間剥離、アルマイト皮膜にクラック
が牛じたちの ×異常なし
O他の特性はJ l5C
6481により行った。There is delamination between the layers and cracks in the alumite film × No abnormality
OOther characteristics are J l5C
6481.
第1図は本発明で得られたA1板ベースの印刷回路用積
層板の断面図である。
第2図は従来のAI板ベースの印刷回路用積層板の断面
図である。
1.4・・・Al板 1a・・・燐酸アルマイト皮膜
2.5・・・絶縁層 3.6・・・金属籠特許出願人
住友ベークライト株式会社昭和アルミニウム株式
会社FIG. 1 is a sectional view of an A1 board-based printed circuit laminate obtained by the present invention. FIG. 2 is a cross-sectional view of a conventional AI board-based printed circuit laminate. 1.4...Al plate 1a...Phosphate alumite film 2.5...Insulating layer 3.6...Metal cage patent applicant Sumitomo Bakelite Co., Ltd. Showa Aluminum Co., Ltd.
Claims (1)
金属ベース印刷回路用基板において、アルミニウム板が
、絶縁層を設けられる面に0.1〜1.5μmの燐酸ア
ルマイト皮膜を有するものであることを特徴とする金属
ベース印刷回路用基板。In a metal-based printed circuit board consisting of an aluminum plate and an insulating layer provided on its surface, the aluminum plate has a phosphoric acid alumite film of 0.1 to 1.5 μm on the surface on which the insulating layer is provided. Characteristic metal-based printed circuit board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31418086A JPS63168072A (en) | 1986-12-27 | 1986-12-27 | Metal base printed circuit substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31418086A JPS63168072A (en) | 1986-12-27 | 1986-12-27 | Metal base printed circuit substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63168072A true JPS63168072A (en) | 1988-07-12 |
Family
ID=18050218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31418086A Pending JPS63168072A (en) | 1986-12-27 | 1986-12-27 | Metal base printed circuit substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63168072A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03239390A (en) * | 1990-02-16 | 1991-10-24 | Mitsubishi Electric Corp | Metal cored board and manufacture thereof |
JP2002064134A (en) * | 2000-08-16 | 2002-02-28 | Creative Technology:Kk | Electrostatic chuck and manufacturing method thereof |
WO2012118224A1 (en) * | 2011-03-03 | 2012-09-07 | 国立大学法人千葉大学 | Functional laminated composite material and method for producing same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049593A (en) * | 1983-08-29 | 1985-03-18 | 新日本製鐵株式会社 | Heater for molten metal by plasma arc |
JPS62193296A (en) * | 1986-02-20 | 1987-08-25 | 日本軽金属株式会社 | Printed circuit board and manufacture of the same |
-
1986
- 1986-12-27 JP JP31418086A patent/JPS63168072A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049593A (en) * | 1983-08-29 | 1985-03-18 | 新日本製鐵株式会社 | Heater for molten metal by plasma arc |
JPS62193296A (en) * | 1986-02-20 | 1987-08-25 | 日本軽金属株式会社 | Printed circuit board and manufacture of the same |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03239390A (en) * | 1990-02-16 | 1991-10-24 | Mitsubishi Electric Corp | Metal cored board and manufacture thereof |
JP2002064134A (en) * | 2000-08-16 | 2002-02-28 | Creative Technology:Kk | Electrostatic chuck and manufacturing method thereof |
WO2012118224A1 (en) * | 2011-03-03 | 2012-09-07 | 国立大学法人千葉大学 | Functional laminated composite material and method for producing same |
JP2012183678A (en) * | 2011-03-03 | 2012-09-27 | Chiba Univ | Functional laminated composite material, and method for manufacturing the same |
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