JPH01312894A - Manufacture of al plate for use with printed circuit board - Google Patents
Manufacture of al plate for use with printed circuit boardInfo
- Publication number
- JPH01312894A JPH01312894A JP14410888A JP14410888A JPH01312894A JP H01312894 A JPH01312894 A JP H01312894A JP 14410888 A JP14410888 A JP 14410888A JP 14410888 A JP14410888 A JP 14410888A JP H01312894 A JPH01312894 A JP H01312894A
- Authority
- JP
- Japan
- Prior art keywords
- aluminum plate
- phosphoric acid
- bath
- printed circuit
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims description 42
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 42
- 239000010407 anodic oxide Substances 0.000 claims description 9
- 239000008151 electrolyte solution Substances 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 abstract description 10
- 238000007254 oxidation reaction Methods 0.000 abstract description 10
- 238000009413 insulation Methods 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 8
- 239000003792 electrolyte Substances 0.000 abstract description 7
- 230000004888 barrier function Effects 0.000 abstract description 4
- 230000035515 penetration Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 abstract 5
- 239000002075 main ingredient Substances 0.000 abstract 2
- 239000002344 surface layer Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 238000007743 anodising Methods 0.000 description 8
- 239000011888 foil Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000004744 fabric Substances 0.000 description 4
- 239000003365 glass fiber Substances 0.000 description 4
- 229920005992 thermoplastic resin Polymers 0.000 description 4
- 229920001187 thermosetting polymer Polymers 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000010292 electrical insulation Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000009719 polyimide resin Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000012779 reinforcing material Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- -1 but among these Polymers 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 230000035936 sexual power Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は、プリント回路基板に用いられるアルミニウ
ム板の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION FIELD OF INDUSTRIAL APPLICATION This invention relates to a method for manufacturing aluminum plates used for printed circuit boards.
この明細書において、「アルミニウム」という語には純
アルミニウムの他にアルミニウム合金も含むものとする
。In this specification, the term "aluminum" includes not only pure aluminum but also aluminum alloys.
従来の技術
プリント回路基板としては、アルミニウム板の片面に、
熱硬化性樹脂、熱可塑性樹脂等からなる絶縁層を介して
銅、アルミニウムなどからなる回路用金属箔が接合され
たものがある。従来、上記回路基板用アルミニウム板と
しては、絶縁層との接着力を高めるために、その表面を
研摩などの機械的方法により粗面化したり、あるいは化
学的もしくは電気化学的方法により粗面化したものを用
いていた。そして、このアルミニウム板の粗面に、プリ
プレグや熱可塑性合成樹脂フィルムを用いて金属箔を接
合し、プリント回路基板を製造していた。Conventional technology printed circuit boards include one side of an aluminum plate,
Some circuit metal foils made of copper, aluminum, etc. are bonded via an insulating layer made of thermosetting resin, thermoplastic resin, etc. Conventionally, the above-mentioned aluminum plates for circuit boards have been roughened by mechanical methods such as polishing, or by chemical or electrochemical methods in order to increase the adhesion with the insulating layer. I was using something. A printed circuit board was then manufactured by bonding metal foil to the rough surface of this aluminum plate using prepreg or thermoplastic synthetic resin film.
発明が解決しようとする課題
しかしながら、上記プリント回路基板は、近年の苛酷な
使用条件下においては、種々の要求特性を十分に満足す
るものとはいえなかった。Problems to be Solved by the Invention However, the above-mentioned printed circuit boards have not been able to fully satisfy various required characteristics under the severe usage conditions of recent years.
これは上記回路゛基板用アルミニウム板の絶縁層を形成
すべき表面が電気絶縁性を持たないこと、および上記回
路基板用アルミニウム板と絶縁層との密着性が十分では
ないことに起因すると考えられる。This is thought to be due to the fact that the surface of the aluminum plate for circuit boards on which the insulating layer is to be formed does not have electrical insulation properties, and the adhesion between the aluminum plate for circuit boards and the insulating layer is not sufficient. .
この発明は上記実情に鑑みてなされたものであって、そ
の目的は、絶縁層を形成すべき表面が優れた電気絶縁性
を存すること、および絶縁層との密着性に優れたプリン
ト回路基板用アルミニウム板の製造方法を提供すること
にある。This invention was made in view of the above circumstances, and its purpose is to provide a surface on which an insulating layer is to be formed, which has excellent electrical insulation properties, and a printed circuit board with excellent adhesion to the insulating layer. An object of the present invention is to provide a method for manufacturing an aluminum plate.
問題点を解決するための手段
この発明によるプリント回路基板用アルミニウム板の製
造方法は、アルミニウム板に、リン酸濃度が50〜15
0 g / / 、浴温か25〜35℃の電解液中で、
浴電圧を10〜30Vの範囲の一定電圧に保って5〜1
5分間陽極酸化処理を施し、少なくとも片面に膜厚0.
2〜1゜0−の陽極酸化皮膜を形成することを特徴とす
るものである。Means for Solving the Problems In the method of manufacturing an aluminum plate for printed circuit boards according to the present invention, the aluminum plate has a phosphoric acid concentration of 50 to 15.
0 g / / in an electrolyte with a bath temperature of 25-35 °C,
5 to 1 while keeping the bath voltage at a constant voltage in the range of 10 to 30 V.
Anodic oxidation treatment was performed for 5 minutes to create a film thickness of 0.000 mm on at least one side.
It is characterized by forming an anodic oxide film of 2 to 1°0.
上記において、電解液におけるリン酸濃度が50 g
/ /未満では電解電圧が上昇し、均一で安定した皮膜
を形成することが困難であり、150 g / /を越
えると電解液への皮膜の溶解速度が大きくなって皮膜形
成に長時間を要し、コストが高くなる。したがって、電
解液中のりン酸濃度は50〜150g//の範囲内で選
ぶべきであるが、特に90〜110g//の範囲内が好
ましい。In the above, the phosphoric acid concentration in the electrolyte is 50 g
If it is less than 150 g / /, the electrolytic voltage will increase and it will be difficult to form a uniform and stable film, and if it exceeds 150 g / /, the dissolution rate of the film in the electrolyte will increase and it will take a long time to form the film. However, the cost increases. Therefore, the phosphoric acid concentration in the electrolytic solution should be selected within the range of 50 to 150 g//, particularly preferably within the range of 90 to 110 g//.
浴温が25℃未満であれば電解電圧が上昇し、均一で安
定した皮膜を形成することが困難であり、35℃をこえ
ると電解液への皮膜の溶解速度が大きくなって皮膜形成
に長時間を要し、コストが高くなる。したがって、浴温
は25〜35℃の範囲内で選ぶべきであるが、特に28
〜32℃の範囲内が好ましい。If the bath temperature is less than 25°C, the electrolytic voltage will increase and it will be difficult to form a uniform and stable film. If the bath temperature exceeds 35°C, the dissolution rate of the film in the electrolyte will increase and the film formation will take longer. This is time consuming and costly. Therefore, the bath temperature should be selected within the range of 25 to 35°C, especially 28°C.
It is preferably within the range of ~32°C.
浴電圧が10V未満では皮膜の形成速度が低下し、30
Vを越えると高電流となって均一で安定した皮膜を形成
することが困難である。したがって、浴電圧は10〜3
0Vの範囲内で選ぶべきであるが、特に15〜25Vの
範囲内が好ましい。When the bath voltage is less than 10 V, the film formation rate decreases, and 30
If it exceeds V, the current becomes high and it is difficult to form a uniform and stable film. Therefore, the bath voltage is 10-3
Although it should be selected within the range of 0V, it is particularly preferably within the range of 15 to 25V.
陽極酸化処理時間が5分未満では0,2p以上の膜厚の
皮膜を得ることはできず、15分を越えても効果は変ら
ずコストが高くなるだけである。したがって、陽極酸化
処理時間は5〜10分の範囲内で選ぶべきであるが、特
に8〜12分の範囲内が好ましい。If the anodic oxidation treatment time is less than 5 minutes, a film with a thickness of 0.2p or more cannot be obtained, and if the anodization treatment time exceeds 15 minutes, the effect will not change and the cost will only increase. Therefore, the anodizing treatment time should be selected within the range of 5 to 10 minutes, and particularly preferably within the range of 8 to 12 minutes.
陽極酸化皮膜の膜厚が0.2p1未満であれば皮膜表面
の孔が浅く、絶縁層との十分な密着性が得られず、1.
OJmを越えても絶縁層との密着性はそれ以上向上せず
、しかもこのアルミニウム板を備えたプリント回路基板
に曲げ加工を施した場合に皮膜にクラックが発生して密
着性および絶縁性が低下することがある。また、孔明は
加工を施す場合にはドリルの摩耗が太き(なってドリル
の寿命を縮めるとともに皮膜にクラックが発生して密着
性および絶縁性が低下する。したがって、陽極酸化皮膜
の膜厚は0.2〜1.0pの範囲内で選ぶべきであるが
、特に0.5〜0.7pの範囲内が好ましい。If the thickness of the anodic oxide film is less than 0.2p1, the pores on the surface of the film will be shallow and sufficient adhesion with the insulating layer will not be obtained;
Even if the OJm is exceeded, the adhesion with the insulating layer does not improve any further, and when a printed circuit board equipped with this aluminum plate is bent, cracks occur in the film and the adhesion and insulation properties deteriorate. There are things to do. In addition, when drilling holes, the drill wears out (which shortens the life of the drill, and cracks occur in the film, reducing adhesion and insulation. Therefore, the thickness of the anodic oxide film is It should be selected within the range of 0.2 to 1.0 p, particularly preferably within the range of 0.5 to 0.7 p.
また、上記において、浴電圧を一定電圧に保つのは次の
理由による。すなわち、浴電圧を一定電圧に保つと均一
なバリア層を有する陽極酸化皮膜を得ることができ、絶
縁性が向上するからである。Further, in the above, the reason why the bath voltage is kept constant is as follows. That is, if the bath voltage is maintained at a constant voltage, an anodic oxide film having a uniform barrier layer can be obtained, and the insulation properties will be improved.
また、リン酸を含む電解液中で陽極酸化処理を行うのは
次の理由による。すなわち、硫酸陽極酸化処理やしゅう
酸陽極酸化処理など他の方法で陽極酸化処理を行った場
合、形成された皮膜表面の孔の孔径は120〜200人
程度である変色対し、リン酸を主成分とする電解液中で
陽極酸化処理を行った場合には上記孔径は300人程変
色なって、絶縁層を構成する物質の上記孔内への浸透が
良くなり、絶縁層とアルミニウム板との密着性が向上す
るからである。また、硫酸陽極酸化処理やしゅう陽極酸
化処理など他の方法で陽極酸化処理を行った場合、形成
された皮膜は、水分によって水和され易く、皮膜が脆く
なり、密着性が阻害されるのに対し、リン酸を主成分と
する電解液中で陽極酸化処理を行って得られた皮膜は水
和されにくいため、密着性が良好であるからである。Further, the reason why the anodic oxidation treatment is performed in an electrolytic solution containing phosphoric acid is as follows. In other words, when anodizing treatment is performed using other methods such as sulfuric acid anodizing treatment or oxalic acid anodizing treatment, the pore diameter of the formed film surface is about 120 to 200 mm. When anodic oxidation treatment is performed in an electrolytic solution, the diameter of the pores changes color by about 300 mm, which improves the penetration of the substance that makes up the insulating layer into the pores, and improves the adhesion between the insulating layer and the aluminum plate. This is because it improves sexual performance. In addition, when anodizing is performed using other methods such as sulfuric acid anodizing or pre-anodizing, the formed film is easily hydrated by moisture, making the film brittle and hindering its adhesion. On the other hand, a film obtained by anodizing in an electrolytic solution containing phosphoric acid as a main component is less likely to be hydrated and therefore has good adhesion.
上記方法で製造されたアルミニウム板の陽極酸化皮膜面
に金属箔を接合するための絶縁層として用いられる材料
には、プリプレグ、熱可塑性樹脂フィルム、熱硬化性樹
脂塗膜、熱可塑性樹脂塗膜などがある。Materials used as the insulating layer for bonding metal foil to the anodized film surface of the aluminum plate manufactured by the above method include prepreg, thermoplastic resin film, thermosetting resin coating, thermoplastic resin coating, etc. There is.
熱硬化性樹脂としては、フェノール樹脂、エポキシ樹脂
、不飽和ポリエステル樹脂、ポリイミド樹脂などが用い
られるが、この中でもリン酸陽極酸化皮膜の優れた接着
特性を発揮させるためには、エポキシ樹脂またはポリイ
ミド樹脂を用いることが好ましい。Phenol resins, epoxy resins, unsaturated polyester resins, polyimide resins, etc. are used as thermosetting resins, but among these, epoxy resins or polyimide resins are used in order to exhibit the excellent adhesive properties of the phosphoric acid anodized film. It is preferable to use
プリプレグの補強材には紙、合成繊維布、ガラス繊維布
などがあるが、電気特性などが優れているEガラスから
なるガラス繊維織布またはガラス繊維不織布が補強材と
して用いられているものを使用するのが好ましい。また
、プリプレグ中の樹脂の割合は通常30〜60重量%で
あるが、熱伝導性、耐熱性の点から、各層間の接管力な
ど後の加工工程上必要な特性を満足するかぎり、少ない
ほうが好ましい。そして、アルミニウム板と所定数のプ
リプレグと必要により金属箔を積層して加熱加圧成形し
てプリント回路用基板を製造する。Reinforcing materials for prepreg include paper, synthetic fiber cloth, glass fiber cloth, etc., but we use glass fiber woven cloth or glass fiber non-woven cloth made of E-glass, which has excellent electrical properties, as a reinforcing material. It is preferable to do so. In addition, the proportion of resin in prepreg is usually 30 to 60% by weight, but from the viewpoint of thermal conductivity and heat resistance, less is better as long as it satisfies the properties required for subsequent processing steps such as the contact force between each layer. preferable. Then, an aluminum plate, a predetermined number of prepregs, and, if necessary, metal foil are laminated and molded under heat and pressure to produce a printed circuit board.
熱硬化性樹脂をアルミニウム板に塗布する場合、通常液
状の樹脂を直接アルミニウム板に塗布し乾燥させた後、
必要により金属箔を重ねて加熱加圧成形する。When applying thermosetting resin to an aluminum plate, usually the liquid resin is applied directly to the aluminum plate, dried, and then
If necessary, metal foils are overlapped and molded under heat and pressure.
熱可塑性樹脂としては、架橋ポリオレフィン、高融点ポ
リオレフィン、ポリエーテルイミド、ポリエーテルサル
ホン、フッ素樹脂などが一般的であり、フィルム状でア
ルミニウム板に積層されるか、エマルジョンとしアルミ
ニウム板に塗布の後乾燥される。この場合も必要により
金属箔を積層し、また各層間に必要により接着剤を用い
る。その後、樹脂軟化点以上の温度で加熱加圧成形する
。Common thermoplastic resins include cross-linked polyolefins, high-melting point polyolefins, polyetherimides, polyethersulfones, and fluororesins, which are either laminated to aluminum plates in the form of a film, or made into an emulsion and coated on the aluminum plate. dried. In this case as well, metal foils are laminated as necessary, and an adhesive is used between each layer as necessary. Thereafter, it is heated and press-molded at a temperature equal to or higher than the resin softening point.
金属箔としては、銅、アルミニウム、ニッケルなどが用
いられるが、その絶縁層との接着面には予め機械的また
は化学的に表面処理を施しておくのがよい。金属箔の絶
縁層との接着面には、通常接着剤が塗布されているが、
熱伝導性を向上させるために上記接着面には接着剤を塗
布しないほうが好ましい。Copper, aluminum, nickel, etc. are used as the metal foil, and it is preferable that the surface to be bonded to the insulating layer is subjected to a mechanical or chemical surface treatment in advance. Adhesive is usually applied to the adhesive surface of the metal foil to the insulating layer, but
In order to improve thermal conductivity, it is preferable that no adhesive be applied to the adhesive surface.
作 用
この発明の方法によれば、絶縁層を形成すべき表面に、
均一なバリア層を有するとともに300人程変色孔径を
有する陽極酸化皮膜を備えたアルミニウム板を製造する
ことができる。Function: According to the method of the present invention, on the surface on which the insulating layer is to be formed,
Aluminum plates with a uniform barrier layer and an anodized coating with a discoloration pore size of about 300 can be produced.
実 施 例 以下、この発明の実施例を、比較例とともに説明する。Example Examples of the present invention will be described below along with comparative examples.
実施例I
JIS A1050 H24材からなる厚さ0.5mm
のアルミニウム板に、下記の条件で陽極酸化処理を施し
てその片面に膜厚0.5贋の陽極酸化皮膜を形成した。Example I Made of JIS A1050 H24 material, thickness 0.5 mm
An aluminum plate was anodized under the following conditions to form an anodic oxide film with a thickness of 0.5 on one side.
浴 組 成 1 00 g /
/(リン酸濃度)
浴 温 度 30℃浴
電 圧 20V処理時間
10分
実施例2
JIS A3052 H34材からなる厚さ1mmのア
ルミニウム板に、下記の条件で陽極酸化処理を施してそ
の片面に膜厚0.5/ffの陽極酸化皮膜を形成した。Bath composition 100 g/
/(phosphoric acid concentration) Bath temperature 30℃ bath
Voltage 20V processing time
10 minutes Example 2 An aluminum plate made of JIS A3052 H34 material and having a thickness of 1 mm was anodized under the following conditions to form an anodic oxide film having a thickness of 0.5/ff on one side thereof.
浴 組 成 1 00 g /
/(リン酸濃度)
浴 温 度 30℃浴 電
圧 25V処理時間
10分
実施例3
JIS A3052 )134材からなる厚さ1mmの
アルミニウム板に、下記の条件で陽極酸化処理を施して
その片面に膜厚0.6贋の陽極酸化皮膜を形成した。Bath composition 100 g/
/(phosphoric acid concentration) Bath temperature: 30℃ bath Voltage: 25V Treatment time
10 minutes Example 3 A 1 mm thick aluminum plate made of JIS A3052) 134 material was anodized under the following conditions to form an anodic oxide film with a thickness of 0.6 on one side.
浴 組 成 90 g/
l(リン酸濃度)
浴 温 度 28℃浴 電
圧 15V処理時間
12分
実施例4
JIS A3052 H34材からなる厚さ1mmのア
ルミニウム板に、下記の条件で陽極酸化処理を施してそ
の片面に膜厚0.77mの陽極酸化皮膜を形成した。Bath composition 90 g/
l (phosphoric acid concentration) Bath temperature 28℃ bath Voltage 15V Treatment time
12 minutes Example 4 A 1 mm thick aluminum plate made of JIS A3052 H34 material was anodized under the following conditions to form an anodic oxide film with a thickness of 0.77 m on one side.
浴 組 成 1 1 0 g
/ l(リン酸1度)
浴 温 度 32℃浴
電 圧 25V処理時間
12分
比較例I
JIS A3052 +134材からなる厚さ1mmの
アルミニウム板に下記の条件で硫酸陽極酸化処理を施し
てその片面に膜厚20切の陽極酸化皮膜を形成した。Bath composition 1 10 g
/ l (phosphoric acid 1 degree) Bath temperature 32℃ bath
Voltage 25V processing time
12 minutes Comparative Example I A 1 mm thick aluminum plate made of JIS A3052 +134 material was subjected to sulfuric acid anodic oxidation treatment under the following conditions to form an anodized film with a thickness of 20 mm on one side.
浴 組 成 150g//(硫
酸濃度)
浴 温 度 20℃浴
電 圧 16V処理時間
60分
比較例2
JIS A1050 H24材からなる厚さ1mmのア
ルミニウム板の片面をボール研摩により粗面化した。表
面粗さRは15/ffiであった。Bath composition 150g//(sulfuric acid concentration) Bath temperature 20℃ bath
Voltage 16V processing time
60 minutes Comparative Example 2 One side of a 1 mm thick aluminum plate made of JIS A1050 H24 material was roughened by ball polishing. The surface roughness R was 15/ffi.
aX
評価試験
この発明の方法で製造されたアルミニウム板の性能を評
価するために次の評価試験を行った。aX Evaluation Test In order to evaluate the performance of the aluminum plate manufactured by the method of the present invention, the following evaluation test was conducted.
すなわち、上記実施例1〜4および比較例1〜2の全て
のアルミニウム板の粗面に、エポキシ樹脂ワニスを樹脂
分が41重量%になるようにガラス繊維織布(日東紡W
EA−106E)に含浸乾燥させたプリプレグを1枚重
ね合わせ、その上に片面を粗面化した厚さ35切の電解
銅箔を、粗面がプリプレグを向くように重ね合わせ、加
熱温度175℃、加圧力90kg/c−で130分間加
熱加圧成形して、図面に示すように陽極酸化皮膜(2)
を有する、または有しないアルミニウム板(1)と絶縁
層(3)と電解銅箔(4)とよりなるプリント回路基板
を製造した。That is, on the rough surfaces of all the aluminum plates of Examples 1 to 4 and Comparative Examples 1 to 2, epoxy resin varnish was applied to glass fiber woven fabric (Nittobo W) so that the resin content was 41% by weight.
EA-106E) was impregnated with dry prepreg, and then a 35-cut electrolytic copper foil with one side roughened was placed on top of it with the rough surface facing the prepreg, and heated at 175°C. , heat and pressure molded for 130 minutes at a pressure of 90 kg/c- to form an anodized film (2) as shown in the drawing.
A printed circuit board consisting of an aluminum plate (1) with or without an insulating layer (3) and an electrolytic copper foil (4) was manufactured.
そして、これらのプリント回路基板におけるアルミニウ
ム板(1)と絶縁層(3)との密着性、耐熱性、表面抵
抗、および熱伝導率を調べた。Then, the adhesion between the aluminum plate (1) and the insulating layer (3), heat resistance, surface resistance, and thermal conductivity of these printed circuit boards were examined.
その結果を下表にまとめて示す。The results are summarized in the table below.
(以下余白)
上表において、接着強度は、得られたプリント基板を沸
騰水中に2時間浸漬し、アルミニウム板と絶縁層との間
に剥離が発生するか否かを観察した(0・・・剥離せず
、×・・・剥離発生)。(Margin below) In the above table, the adhesive strength was determined by immersing the obtained printed circuit board in boiling water for 2 hours and observing whether or not peeling occurred between the aluminum plate and the insulating layer (0... No peeling, ×...Peeling occurred).
また、熱伝導率は、昭和電工製QTM型迅速熱伝導率計
を使用し、熱線式熱伝導率を測定した。他の特性はJI
S C6481により行った。In addition, the thermal conductivity was measured by hot wire thermal conductivity using a QTM type quick thermal conductivity meter manufactured by Showa Denko. Other characteristics are JI
This was carried out using SC6481.
発明の効果
この発明によるプリント回路基板用アルミニウム板の製
造方法は、上述のように構成されているので、絶縁層を
形成すべき表面に、均一なバリア層を有するとともに3
00人程変色孔径を有する陽極酸化皮膜を備えたアルミ
ニウム板を製造することができる。したがって、この方
法で製造されたアルミニウム板における絶縁層を形成す
べき表面の電気絶縁性が優れたものとなるとともに、こ
のアルミニウム板を備えたプリント回路基板においては
、アルミニウム板とこれに接合された絶縁層との間の密
着性は優れたものとなる。また、上記回路基板の熱伝導
性および耐熱性などの特性も、従来のものに比較して優
れている。その結果、近年の苛酷な使用条件下において
も種々の要求特性を十分に満足する回路基板が得られる
。Effects of the Invention The method for manufacturing an aluminum plate for a printed circuit board according to the present invention is configured as described above, so that a uniform barrier layer is formed on the surface on which an insulating layer is to be formed, and three
It is possible to produce an aluminum plate with an anodized coating having a discoloration pore size of about 0.00 mm. Therefore, in the aluminum plate manufactured by this method, the surface on which the insulating layer is to be formed has excellent electrical insulation properties, and in the printed circuit board equipped with this aluminum plate, the aluminum plate and the The adhesion between the insulating layer and the insulating layer is excellent. Further, the characteristics of the circuit board, such as thermal conductivity and heat resistance, are also superior to those of conventional circuit boards. As a result, a circuit board can be obtained that fully satisfies various required characteristics even under the severe usage conditions of recent years.
図面はこの発明の方法で製造されたアルミニウム板を使
用してつくったプリント回路基板の垂直拡大断面図であ
る。
(1)・・・アルミニウム板。
以 上The drawing is an enlarged vertical cross-sectional view of a printed circuit board made using an aluminum plate manufactured by the method of the present invention. (1)...Aluminum plate. that's all
Claims (1)
、浴温が25〜35℃の電解液中で、浴電圧を10〜3
0Vの範囲の一定電圧に保って5〜15分間陽極酸化処
理を施し、少なくとも片面に膜厚0.2〜1.0μmの
陽極酸化皮膜を形成することを特徴とするプリント回路
基板用アルミニウム板の製造方法。Phosphoric acid concentration is 50-150g/l on aluminum plate
, in an electrolytic solution with a bath temperature of 25 to 35°C, and a bath voltage of 10 to 3
An aluminum plate for printed circuit boards, characterized in that it is anodized at a constant voltage in the range of 0V for 5 to 15 minutes to form an anodic oxide film with a thickness of 0.2 to 1.0 μm on at least one side. Production method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14410888A JPH01312894A (en) | 1988-06-10 | 1988-06-10 | Manufacture of al plate for use with printed circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14410888A JPH01312894A (en) | 1988-06-10 | 1988-06-10 | Manufacture of al plate for use with printed circuit board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01312894A true JPH01312894A (en) | 1989-12-18 |
Family
ID=15354372
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14410888A Pending JPH01312894A (en) | 1988-06-10 | 1988-06-10 | Manufacture of al plate for use with printed circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01312894A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03239390A (en) * | 1990-02-16 | 1991-10-24 | Mitsubishi Electric Corp | Metal cored board and manufacture thereof |
KR101528170B1 (en) * | 2009-04-08 | 2015-06-11 | 후지필름 가부시키가이샤 | Semiconductor device and solar battery using the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57181196A (en) * | 1981-05-01 | 1982-11-08 | Sumitomo Electric Industries | Method of producing metal core circuit board |
JPS59149094A (en) * | 1983-02-15 | 1984-08-25 | イビデン株式会社 | Method of producing board for aluminum core printed circuit |
JPS62193296A (en) * | 1986-02-20 | 1987-08-25 | 日本軽金属株式会社 | Printed circuit board and manufacture of the same |
-
1988
- 1988-06-10 JP JP14410888A patent/JPH01312894A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57181196A (en) * | 1981-05-01 | 1982-11-08 | Sumitomo Electric Industries | Method of producing metal core circuit board |
JPS59149094A (en) * | 1983-02-15 | 1984-08-25 | イビデン株式会社 | Method of producing board for aluminum core printed circuit |
JPS62193296A (en) * | 1986-02-20 | 1987-08-25 | 日本軽金属株式会社 | Printed circuit board and manufacture of the same |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03239390A (en) * | 1990-02-16 | 1991-10-24 | Mitsubishi Electric Corp | Metal cored board and manufacture thereof |
KR101528170B1 (en) * | 2009-04-08 | 2015-06-11 | 후지필름 가부시키가이샤 | Semiconductor device and solar battery using the same |
EP2417636A4 (en) * | 2009-04-08 | 2016-11-09 | Fujifilm Corp | Semiconductor device and solar battery using the same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3984598A (en) | Metal-clad laminates | |
JP5275701B2 (en) | Aluminum material for printed wiring board and method for producing the same | |
EP3224042B1 (en) | Fiber-metal laminate and its manufacturing method | |
CN210157469U (en) | Metal-based copper-clad laminate | |
JP6001573B2 (en) | Surface-treated aluminum material, method for producing the same, and resin-coated surface-treated aluminum material | |
US4434022A (en) | Process for manufacturing copper-clad laminate | |
CN1965618A (en) | Aluminum substrate for printed circuits, manufacturing method thereof, printed circuit board, and manufacturing method thereof | |
JPH09217193A (en) | Non-cyanide brass plating bath mixture, production of metallic foil having brass layer and method for using non-cyanide brass plating bath | |
JPS6031915B2 (en) | Method of manufacturing strippable copper on aluminum support layer | |
JP2006024906A (en) | Aluminum substrate for printed circuit and manufacturing method of the substrate, and printed circuit board and manufacturing method of the board | |
WO2015195639A1 (en) | Anodized metal component | |
JP2009255429A (en) | Composite body of metal alloy and carbon fiber reinforced plastic and electro-corrosion inhibition method thereof | |
JPH01312894A (en) | Manufacture of al plate for use with printed circuit board | |
JP2721632B2 (en) | Processing method of copper circuit of circuit board | |
JPH0318088A (en) | Insulating metallic substrate and manufacture thereof | |
TW201638398A (en) | Method for producing single-sided thin metal clad laminate | |
JP4455192B2 (en) | Thermoplastic resin coated aluminum plate | |
JPH10135593A (en) | Printed circuit substrate | |
JPH0918141A (en) | Production of laminated plate | |
JP2006100395A (en) | Aluminum substrate for printed circuits and its manufacturing method | |
JPS63168072A (en) | Metal base printed circuit substrate | |
JPH0573359B2 (en) | ||
JP7026547B2 (en) | Surface-treated aluminum alloy material and its manufacturing method | |
JPH02155933A (en) | Bonding of stainless steel sheet to thermoplastic polyimide resin | |
JP2003073853A (en) | Surface treated aluminum material superior in corrosion resistance, and manufacturing method therefor |