JPS6316624A - プラズマ処理装置 - Google Patents

プラズマ処理装置

Info

Publication number
JPS6316624A
JPS6316624A JP15964886A JP15964886A JPS6316624A JP S6316624 A JPS6316624 A JP S6316624A JP 15964886 A JP15964886 A JP 15964886A JP 15964886 A JP15964886 A JP 15964886A JP S6316624 A JPS6316624 A JP S6316624A
Authority
JP
Japan
Prior art keywords
sample
plasma
discharge chamber
processing apparatus
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15964886A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055370B2 (enrdf_load_html_response
Inventor
Katsuyoshi Kudo
勝義 工藤
Yoshinao Kawasaki
義直 川崎
Minoru Soraoka
稔 空岡
Tsunehiko Tsubone
恒彦 坪根
Hironori Kawahara
川原　博宣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15964886A priority Critical patent/JPS6316624A/ja
Publication of JPS6316624A publication Critical patent/JPS6316624A/ja
Publication of JPH055370B2 publication Critical patent/JPH055370B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP15964886A 1986-07-09 1986-07-09 プラズマ処理装置 Granted JPS6316624A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15964886A JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15964886A JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS6316624A true JPS6316624A (ja) 1988-01-23
JPH055370B2 JPH055370B2 (enrdf_load_html_response) 1993-01-22

Family

ID=15698301

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15964886A Granted JPS6316624A (ja) 1986-07-09 1986-07-09 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS6316624A (enrdf_load_html_response)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599726A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Method and device for plasma treatment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5599726A (en) * 1979-01-26 1980-07-30 Hitachi Ltd Method and device for plasma treatment

Also Published As

Publication number Publication date
JPH055370B2 (enrdf_load_html_response) 1993-01-22

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