JPS63162872A - 硬質非晶質炭素膜 - Google Patents
硬質非晶質炭素膜Info
- Publication number
- JPS63162872A JPS63162872A JP31032586A JP31032586A JPS63162872A JP S63162872 A JPS63162872 A JP S63162872A JP 31032586 A JP31032586 A JP 31032586A JP 31032586 A JP31032586 A JP 31032586A JP S63162872 A JPS63162872 A JP S63162872A
- Authority
- JP
- Japan
- Prior art keywords
- amorphous carbon
- carbon film
- hard amorphous
- gaseous
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910003481 amorphous carbon Inorganic materials 0.000 title claims abstract description 20
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 11
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 8
- 239000010937 tungsten Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 abstract description 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract description 2
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 27
- 239000007789 gas Substances 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 7
- 239000002184 metal Substances 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- -1 cadrinium Chemical compound 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Lubricants (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31032586A JPS63162872A (ja) | 1986-12-25 | 1986-12-25 | 硬質非晶質炭素膜 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31032586A JPS63162872A (ja) | 1986-12-25 | 1986-12-25 | 硬質非晶質炭素膜 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63162872A true JPS63162872A (ja) | 1988-07-06 |
| JPH0572472B2 JPH0572472B2 (enrdf_load_stackoverflow) | 1993-10-12 |
Family
ID=18003875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31032586A Granted JPS63162872A (ja) | 1986-12-25 | 1986-12-25 | 硬質非晶質炭素膜 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63162872A (enrdf_load_stackoverflow) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01311408A (ja) * | 1988-06-09 | 1989-12-15 | Victor Co Of Japan Ltd | 磁気ヘッド |
| JPH02158690A (ja) * | 1988-12-09 | 1990-06-19 | Ricoh Co Ltd | 摺動部材 |
| AU631037B2 (en) * | 1989-12-28 | 1992-11-12 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Hard and lubricant thin film of amorphous carbon-hydrogen-silicon, iron base metallic material coated therewith, and the process for producing the same |
| EP0643385A3 (en) * | 1993-09-12 | 1996-01-17 | Fujitsu Ltd | Magnetic recording medium, magnetic head and magnetic recording device. |
| JPH08203069A (ja) * | 1995-01-31 | 1996-08-09 | Nec Corp | 磁気記憶媒体 |
-
1986
- 1986-12-25 JP JP31032586A patent/JPS63162872A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01311408A (ja) * | 1988-06-09 | 1989-12-15 | Victor Co Of Japan Ltd | 磁気ヘッド |
| JPH02158690A (ja) * | 1988-12-09 | 1990-06-19 | Ricoh Co Ltd | 摺動部材 |
| AU631037B2 (en) * | 1989-12-28 | 1992-11-12 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Hard and lubricant thin film of amorphous carbon-hydrogen-silicon, iron base metallic material coated therewith, and the process for producing the same |
| EP0643385A3 (en) * | 1993-09-12 | 1996-01-17 | Fujitsu Ltd | Magnetic recording medium, magnetic head and magnetic recording device. |
| US6132875A (en) * | 1993-09-12 | 2000-10-17 | Fujitsu Limited | Magnetic recording medium and magnetic head having carbon protective layers |
| JPH08203069A (ja) * | 1995-01-31 | 1996-08-09 | Nec Corp | 磁気記憶媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0572472B2 (enrdf_load_stackoverflow) | 1993-10-12 |
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