JPS63158979U - - Google Patents

Info

Publication number
JPS63158979U
JPS63158979U JP4764887U JP4764887U JPS63158979U JP S63158979 U JPS63158979 U JP S63158979U JP 4764887 U JP4764887 U JP 4764887U JP 4764887 U JP4764887 U JP 4764887U JP S63158979 U JPS63158979 U JP S63158979U
Authority
JP
Japan
Prior art keywords
raw material
vapor deposition
chemical vapor
chamber
evaporating section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4764887U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4764887U priority Critical patent/JPS63158979U/ja
Publication of JPS63158979U publication Critical patent/JPS63158979U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP4764887U 1987-04-01 1987-04-01 Pending JPS63158979U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4764887U JPS63158979U (enrdf_load_stackoverflow) 1987-04-01 1987-04-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4764887U JPS63158979U (enrdf_load_stackoverflow) 1987-04-01 1987-04-01

Publications (1)

Publication Number Publication Date
JPS63158979U true JPS63158979U (enrdf_load_stackoverflow) 1988-10-18

Family

ID=30868450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4764887U Pending JPS63158979U (enrdf_load_stackoverflow) 1987-04-01 1987-04-01

Country Status (1)

Country Link
JP (1) JPS63158979U (enrdf_load_stackoverflow)

Similar Documents

Publication Publication Date Title
JPH03500667A (ja) 多重平行充てんカラム気化器
JP2001323374A (ja) 気相反応物を反応室内へ供給するための方法および装置
JP2001507757A (ja) フラッシュ気化器
WO1998010116A1 (en) Ultrasonic nozzle feed for plasma deposited film networks
DE60005712D1 (de) Verfahren und vorrichtung zum zuführen von vorläufern zu mehreren epitaxialreaktoren
KR960701235A (ko) 화학적 증착(cvd) 반응기에 반응제를 증기 형태로 공급하는 방법 및 장치(apparatus and method for delivering reagents in vapor form to a cvd reactor)
CN209989463U (zh) 用于汽化和递送经汽化源材料的汽化器组合件
JPS63158979U (enrdf_load_stackoverflow)
JPS61209005A (ja) 分離膜及びその製造方法
CN213835530U (zh) 一种固态源瓶
CN213596460U (zh) 一种前体源气体输送装置
JP2003013233A (ja) 液体原料気化供給装置
CN217997318U (zh) 克级粉末表面均匀镀膜的原子层沉积装置
JPS5741367A (en) Chemical vapor deposition device
KR20010077002A (ko) 액체원료 기화장치
CN217997319U (zh) 克级粉末表面均匀镀膜的原子层沉积装置
CN214572214U (zh) 原子层沉积设备
JPS6293367U (enrdf_load_stackoverflow)
JPS61243176A (ja) Cvd処理方法
JPH0296723U (enrdf_load_stackoverflow)
CN208554243U (zh) 非均相多功能反应瓶
JPS62218576A (ja) プラズマcvd法
JPH11104468A (ja) 緻密質膜の保持構造体およびその製造方法
JPH02138421U (enrdf_load_stackoverflow)
JPS63149521U (enrdf_load_stackoverflow)