JPS63158979U - - Google Patents
Info
- Publication number
- JPS63158979U JPS63158979U JP4764887U JP4764887U JPS63158979U JP S63158979 U JPS63158979 U JP S63158979U JP 4764887 U JP4764887 U JP 4764887U JP 4764887 U JP4764887 U JP 4764887U JP S63158979 U JPS63158979 U JP S63158979U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- vapor deposition
- chemical vapor
- chamber
- evaporating section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005229 chemical vapour deposition Methods 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 2
- 239000012808 vapor phase Substances 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims 6
- 238000001704 evaporation Methods 0.000 claims 4
- 239000012159 carrier gas Substances 0.000 claims 1
- 230000008020 evaporation Effects 0.000 claims 1
- 239000012495 reaction gas Substances 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000000919 ceramic Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4764887U JPS63158979U (enrdf_load_stackoverflow) | 1987-04-01 | 1987-04-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4764887U JPS63158979U (enrdf_load_stackoverflow) | 1987-04-01 | 1987-04-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63158979U true JPS63158979U (enrdf_load_stackoverflow) | 1988-10-18 |
Family
ID=30868450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4764887U Pending JPS63158979U (enrdf_load_stackoverflow) | 1987-04-01 | 1987-04-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63158979U (enrdf_load_stackoverflow) |
-
1987
- 1987-04-01 JP JP4764887U patent/JPS63158979U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH03500667A (ja) | 多重平行充てんカラム気化器 | |
JP2001323374A (ja) | 気相反応物を反応室内へ供給するための方法および装置 | |
JP2001507757A (ja) | フラッシュ気化器 | |
WO1998010116A1 (en) | Ultrasonic nozzle feed for plasma deposited film networks | |
DE60005712D1 (de) | Verfahren und vorrichtung zum zuführen von vorläufern zu mehreren epitaxialreaktoren | |
KR960701235A (ko) | 화학적 증착(cvd) 반응기에 반응제를 증기 형태로 공급하는 방법 및 장치(apparatus and method for delivering reagents in vapor form to a cvd reactor) | |
CN209989463U (zh) | 用于汽化和递送经汽化源材料的汽化器组合件 | |
JPS63158979U (enrdf_load_stackoverflow) | ||
JPS61209005A (ja) | 分離膜及びその製造方法 | |
CN213835530U (zh) | 一种固态源瓶 | |
CN213596460U (zh) | 一种前体源气体输送装置 | |
JP2003013233A (ja) | 液体原料気化供給装置 | |
CN217997318U (zh) | 克级粉末表面均匀镀膜的原子层沉积装置 | |
JPS5741367A (en) | Chemical vapor deposition device | |
KR20010077002A (ko) | 액체원료 기화장치 | |
CN217997319U (zh) | 克级粉末表面均匀镀膜的原子层沉积装置 | |
CN214572214U (zh) | 原子层沉积设备 | |
JPS6293367U (enrdf_load_stackoverflow) | ||
JPS61243176A (ja) | Cvd処理方法 | |
JPH0296723U (enrdf_load_stackoverflow) | ||
CN208554243U (zh) | 非均相多功能反应瓶 | |
JPS62218576A (ja) | プラズマcvd法 | |
JPH11104468A (ja) | 緻密質膜の保持構造体およびその製造方法 | |
JPH02138421U (enrdf_load_stackoverflow) | ||
JPS63149521U (enrdf_load_stackoverflow) |