JPS63148667A - Manufacture of lead frame - Google Patents
Manufacture of lead frameInfo
- Publication number
- JPS63148667A JPS63148667A JP29707786A JP29707786A JPS63148667A JP S63148667 A JPS63148667 A JP S63148667A JP 29707786 A JP29707786 A JP 29707786A JP 29707786 A JP29707786 A JP 29707786A JP S63148667 A JPS63148667 A JP S63148667A
- Authority
- JP
- Japan
- Prior art keywords
- inner pattern
- lead frame
- lead
- pattern part
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000005530 etching Methods 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 13
- 239000004065 semiconductor Substances 0.000 abstract description 8
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 238000003825 pressing Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- OFLYIWITHZJFLS-UHFFFAOYSA-N [Si].[Au] Chemical compound [Si].[Au] OFLYIWITHZJFLS-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000006023 eutectic alloy Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明はプレス加工とエツチング加工を併用したリー
ドフレームの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for manufacturing a lead frame using a combination of pressing and etching.
(従来の技術)
現在のリードフレームの成形方法は、エツチングによる
方法と、プレス加工による方法がある。(Prior Art) Current lead frame forming methods include etching and press working.
エツチングによるリードフレームの製造方法は、リード
フレーム製造用金属板上にレジストを両面の同位置に形
成したものを、エツチング液で処理して両面のレジスト
のない部分を同時にエツチングして製造している。この
場合、エツチングされた部分がリード間隔となっている
。The method for manufacturing lead frames by etching involves forming a resist at the same position on both sides of a metal plate for lead frame manufacturing, and then treating it with an etching solution to simultaneously etch the areas without resist on both sides. . In this case, the etched portion is the lead spacing.
プレス加工では、帯状のリードフレーム製造用金属板を
金型で順次打ち抜(ものである。In press working, strip-shaped metal plates for lead frame production are sequentially punched out using a die.
これらの加工方法は、それぞれ大きな利点を有している
。Each of these processing methods has significant advantages.
例えば、プレス加工では、リードフレームの加工時の送
りのためのレール部のガイドホールの精度が良い。また
、モールド成形後のリードフレームのダムバーのカット
が容易であり、樹脂モールド部近傍の外部リード部側面
にモールドフラッシュが付着して残ることがない。For example, in press working, the precision of the guide holes in the rail section for feeding during lead frame processing is good. Further, the dam bar of the lead frame after molding can be easily cut, and no mold flash remains attached to the side surface of the external lead portion near the resin molded portion.
一方、エツチング加工では、半導体装置の多ピン化の要
請に伴う内部リードう含むインナーパターン部の細密化
が実現可能である。On the other hand, etching processing can realize miniaturization of inner pattern portions including internal leads in response to the demand for increased pin count in semiconductor devices.
(発明が解決しようとする問題点)
上記プレス加工およびエツチング加工による利点を採用
することにより、プレス加工の欠点であるインナーパタ
ーン部の細密化が困難である点やエツチング加工の欠点
であるエツチング部側面を平坦面に形成できないため、
樹脂モールド部近傍の外部リード部側面にモールドフラ
ッシュが付着してしまい、めっき等の必要な表面処理が
施せないといった点を除くことが可能となる。(Problems to be Solved by the Invention) By adopting the advantages of the above-mentioned press working and etching process, it is possible to overcome the disadvantage of press working, which is that it is difficult to make the inner pattern part fine, and the disadvantage of etching process, which is the etching part. Because the sides cannot be formed into flat surfaces,
It is possible to eliminate the problem of mold flash adhering to the side surface of the external lead part near the resin mold part, making it impossible to perform necessary surface treatments such as plating.
そこで、本発明は、リードフレームの外部リード部をプ
レス加工で、内部リード部をエツチング加工してより精
度が高く、インナーパターン部の高密度化が達成される
リードフレームの製造方法を提供することを目的とする
。SUMMARY OF THE INVENTION Accordingly, the present invention provides a method for manufacturing a lead frame in which the outer lead portion of the lead frame is pressed and the inner lead portion is etched to achieve higher precision and higher density of the inner pattern portion. With the goal.
(問題点を解決するための手段)
本発明は上記問題点を解決するために次の構成を備えて
なる。(Means for Solving the Problems) In order to solve the above problems, the present invention includes the following configuration.
すなわち、内部リード部を含むインナーパターン部以外
をプレス加工により形成した後、前記インナーパターン
部をエツチング加工により形成することを特徴とする。That is, the present invention is characterized in that after forming the parts other than the inner pattern part including the internal lead part by press working, the inner pattern part is formed by etching process.
(実施例)
以下、本発明の好適な実施例を添付図面を参照して詳細
に説明する。(Embodiments) Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
第2図は樹脂封止型半導体装置に用いるリードフレーム
10の一部を示す。FIG. 2 shows a part of a lead frame 10 used in a resin-sealed semiconductor device.
図において、9はステージ部であり、金、銀等の貴金属
めっきが施されており、金−シリコン共晶合金等によっ
て半導体素子が固定される部位である。In the figure, reference numeral 9 denotes a stage portion, which is plated with a noble metal such as gold or silver, and is a portion to which a semiconductor element is fixed using a gold-silicon eutectic alloy or the like.
2はステージ部9を囲んで設けられた内部リード部であ
り、これらの先端には同じく金、銀等の貴金属めっきが
施され、ステージ部9に搭載された半導体素子とワイヤ
ーによって接続される。また、破線で囲まれた部分はイ
ンナーパターン部8である。Reference numeral 2 denotes an internal lead section provided surrounding the stage section 9, the tips of which are similarly plated with a noble metal such as gold or silver, and connected to the semiconductor element mounted on the stage section 9 by wires. Moreover, the part surrounded by the broken line is the inner pattern part 8.
3は内部リード部2に続く外部リード部である。Reference numeral 3 designates an external lead portion following the internal lead portion 2 .
4はダムバーであり、樹脂封止の際の樹脂の堰止めをす
る。A dam bar 4 serves to dam the resin during resin sealing.
5はレール部であり、所定位置にガイドホール6が穿設
されている。Reference numeral 5 denotes a rail portion, in which guide holes 6 are bored at predetermined positions.
まず、インナーパターン部8以外の、外部リード部3、
ダムバー4、レール部5およびガイドホール6をプレス
加工して、第1図(a)のように加工する。First, the external lead part 3 other than the inner pattern part 8,
The dam bar 4, rail portion 5, and guide hole 6 are pressed and processed as shown in FIG. 1(a).
その後、プレス加工により形成したガイドホール6を基
準に位置決めし、インナーパターン部8をエツチング加
工して第1図(b)に示すように所定の形状に形成する
。Thereafter, the inner pattern portion 8 is positioned with reference to the guide hole 6 formed by pressing, and the inner pattern portion 8 is etched to form a predetermined shape as shown in FIG. 1(b).
その後、メッキ処理、曲げ切断等を行う。After that, plating treatment, bending and cutting, etc. are performed.
なお、エツチングによるインナーパターン部8の形状は
異なるが、外部リード部3の形状等が共通するリードフ
レームも存在し、このような場合はプレス加工により共
通部分を加工しておき、インナーパターン部をそれぞれ
エツチングすれば良く、好適に用いることができる。ま
た、低融点ガラス封止型半導体装置に用いられるステー
ジ部がないリードフレームの場合にも、適用することが
できる。Note that although the shapes of the inner pattern portions 8 formed by etching are different, there are also lead frames in which the shapes of the outer lead portions 3, etc. are common, and in such cases, the common portions are processed by pressing, and the inner pattern portions are It is only necessary to etch each of them, and they can be suitably used. Further, the present invention can also be applied to a lead frame without a stage portion used in a low melting point glass-sealed semiconductor device.
(発明の効果)
以上述べたように、この発明は内部リード部を含むイン
ナーパターン部以外をプレス加工により形成し、その後
、インナーパターン部をエツチング加工により形成した
ので、プレス加工とエツチング加工との利点を組み合わ
せることができる。(Effects of the Invention) As described above, in the present invention, parts other than the inner pattern part including the internal lead part are formed by press working, and then the inner pattern part is formed by etching process, so that the press work and the etching process can be combined. Benefits can be combined.
すなわち、レール部の高精度のガイドホールを用いて後
工程であるエツチング加工や半導体装置組立等を高精度
に行うことができるとともに、インナーパターン部の形
状が細密化された多ピンリードフレームを容易に製造す
ることができる。In other words, using the high-precision guide holes in the rail section, post-processes such as etching processing and semiconductor device assembly can be performed with high precision, and it is also possible to easily manufacture multi-pin lead frames with finer inner pattern shapes. can be manufactured.
また、このようにして製造したリードフレームを用いて
半導体素子等を樹脂封止した場合には、ダムバーのカッ
トが容易で、樹脂モールド部近傍の外部リード部側面に
も所望の表面処理を施すことができる。Furthermore, when a semiconductor element or the like is resin-sealed using the lead frame manufactured in this way, the dam bar can be easily cut and the desired surface treatment can be applied to the side surface of the external lead part near the resin mold part. I can do it.
さらに、インナーパターン部の形状は異なるが、外部リ
ード部などプレス加工部分が共通している場合の多品種
少量生産にも適している。Furthermore, it is suitable for high-mix, low-volume production where the shapes of the inner pattern parts are different, but the pressed parts, such as the external lead parts, are common.
以上本発明につき好適な実施例を挙げて種々説明したが
、本発明はこの実施例に限定されるものではなく、発明
の精神を逸脱しない範囲内で多くの改変を施し得るのは
もちろんのことである。Although the present invention has been variously explained above with reference to preferred embodiments, the present invention is not limited to these embodiments, and it goes without saying that many modifications can be made without departing from the spirit of the invention. It is.
第1図(a)、(b)はリードフレームの加工工程を示
すリードフレームの部分斜視図、第2図はリードフレー
ムの部分正面図である。
2・・・内部リード部、 3・・・外部リード部、 4
・・・ダムバー、 5・・・レール部、6・・・ガイド
ホール、 8・・・インナーパターン部、 9・・・
ステージ部、 10・・・リードフレーム。FIGS. 1(a) and 1(b) are partial perspective views of a lead frame showing processing steps for the lead frame, and FIG. 2 is a partial front view of the lead frame. 2... Internal lead part, 3... External lead part, 4
...Dam bar, 5...Rail part, 6...Guide hole, 8...Inner pattern part, 9...
Stage part, 10... Lead frame.
Claims (1)
ス加工により形成した後、前記インナーパターン部をエ
ッチング加工により形成することを特徴とするリードフ
レームの製造方法。1. A method for manufacturing a lead frame, which comprises forming parts other than the inner pattern part including the internal lead part by press working, and then forming the inner pattern part by etching process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61297077A JPH0815191B2 (en) | 1986-12-12 | 1986-12-12 | Method for manufacturing lead frame |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61297077A JPH0815191B2 (en) | 1986-12-12 | 1986-12-12 | Method for manufacturing lead frame |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5148797A Division JP2784352B2 (en) | 1997-03-06 | 1997-03-06 | Lead frame manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63148667A true JPS63148667A (en) | 1988-06-21 |
JPH0815191B2 JPH0815191B2 (en) | 1996-02-14 |
Family
ID=17841907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61297077A Expired - Lifetime JPH0815191B2 (en) | 1986-12-12 | 1986-12-12 | Method for manufacturing lead frame |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0815191B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02229457A (en) * | 1989-03-02 | 1990-09-12 | Hitachi Ltd | Lead frame, manufacture thereof and semiconductor device using same |
JPH0314263A (en) * | 1989-06-13 | 1991-01-22 | Nec Corp | Manufacture of lead frame |
JPH05251603A (en) * | 1992-03-05 | 1993-09-28 | Hitachi Cable Ltd | Composite lead frame |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5718342A (en) * | 1980-07-09 | 1982-01-30 | Sumitomo Metal Mining Co Ltd | Manufacture of lead frame |
JPS6123352A (en) * | 1984-07-11 | 1986-01-31 | Fujitsu Ltd | Lead frame and semiconductor device |
JPS62114254A (en) * | 1985-11-13 | 1987-05-26 | Mitsui Haitetsuku:Kk | Manufacture of lead frame |
-
1986
- 1986-12-12 JP JP61297077A patent/JPH0815191B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5718342A (en) * | 1980-07-09 | 1982-01-30 | Sumitomo Metal Mining Co Ltd | Manufacture of lead frame |
JPS6123352A (en) * | 1984-07-11 | 1986-01-31 | Fujitsu Ltd | Lead frame and semiconductor device |
JPS62114254A (en) * | 1985-11-13 | 1987-05-26 | Mitsui Haitetsuku:Kk | Manufacture of lead frame |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02229457A (en) * | 1989-03-02 | 1990-09-12 | Hitachi Ltd | Lead frame, manufacture thereof and semiconductor device using same |
JPH0314263A (en) * | 1989-06-13 | 1991-01-22 | Nec Corp | Manufacture of lead frame |
JPH05251603A (en) * | 1992-03-05 | 1993-09-28 | Hitachi Cable Ltd | Composite lead frame |
Also Published As
Publication number | Publication date |
---|---|
JPH0815191B2 (en) | 1996-02-14 |
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