JPS63148201A - Production of reflection type color filter - Google Patents
Production of reflection type color filterInfo
- Publication number
- JPS63148201A JPS63148201A JP61296101A JP29610186A JPS63148201A JP S63148201 A JPS63148201 A JP S63148201A JP 61296101 A JP61296101 A JP 61296101A JP 29610186 A JP29610186 A JP 29610186A JP S63148201 A JPS63148201 A JP S63148201A
- Authority
- JP
- Japan
- Prior art keywords
- films
- thin film
- film
- production
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 230000003647 oxidation Effects 0.000 claims abstract description 14
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 14
- 239000003086 colorant Substances 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000011521 glass Substances 0.000 claims abstract description 8
- 239000010409 thin film Substances 0.000 claims description 43
- 239000002184 metal Substances 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 24
- 239000010408 film Substances 0.000 claims description 19
- 239000000126 substance Substances 0.000 claims description 4
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 abstract description 2
- 239000003792 electrolyte Substances 0.000 abstract 1
- 238000010030 laminating Methods 0.000 abstract 1
- 239000000428 dust Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- 238000007743 anodising Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
Description
【発明の詳細な説明】
〔概 要〕
本発明は、干渉効果を利用した反射型カラーフィルタを
、陽極酸化時の印加電圧により化成速度が異なることを
利用して、３原色の各色対応に電気的に分離して設けた
金属薄膜に、所望膜厚に対応する電圧を印加して同時に
陽極酸化を行い、一工程で膜厚の異なる透明薄膜と金属
反射膜とが積層された反射型カラーフィルタを作製する
。[Detailed Description of the Invention] [Summary] The present invention utilizes the fact that the formation rate differs depending on the applied voltage during anodic oxidation to produce a reflective color filter that utilizes interference effects. A reflective color filter in which a transparent thin film and a metal reflective film with different thicknesses are laminated in one process by applying a voltage corresponding to the desired film thickness to the metal thin films that have been separately provided and simultaneously anodizing them. Create.
本発明は、透明薄膜と金属反射膜とからなり、透明薄膜
における干渉効果を利゛用した反射型カラーフィルタの
製造方法に関する。The present invention relates to a method for manufacturing a reflective color filter, which is composed of a transparent thin film and a metal reflective film, and utilizes interference effects in the transparent thin film.
反射型液晶表示装置に用いられるカラーフィルタは、着
色剤として顔料や染料を用い、ガラ“大基板の画素対応
領域を着色して作製される。Color filters used in reflective liquid crystal display devices are manufactured by using pigments or dyes as colorants to color the pixel-corresponding regions of a large glass substrate.
カラーフィルタの作製時には、上記着色工程中で、塵埃
等が付着し易く、この塵埃によって、反射型液晶表示装
置の電極やパスライン等にクラックを生じたり、或いは
セル厚のバラツキを生じたりする場合があり、表示欠陥
発生の一因となる。When manufacturing color filters, dust is likely to adhere during the coloring process, and this dust may cause cracks in the electrodes, pass lines, etc. of the reflective liquid crystal display device, or may cause variations in cell thickness. This is one of the causes of display defects.
またかかる構成のフィルタは長時間にわたる光照射によ
り、色あいの劣化を生じ、表示品質が低下するという欠
点がある。Further, a filter having such a structure has the disadvantage that the color tone deteriorates due to long-term light irradiation, resulting in a decrease in display quality.
そこで本発明者らは、かかる欠点を解消した反射型カラ
ーフィルタを、特願昭６１〜２２２５６９号により提案
した。Accordingly, the present inventors proposed a reflective color filter that overcomes these drawbacks in Japanese Patent Application No. 61-222569.
その反射型カラーフィルタとその製造方法を第２図（ａ
）〜ｆｅｌにより説明する。The reflective color filter and its manufacturing method are shown in Figure 2 (a
) to fel.
同図（ａｌに示すように、まずガラス基板１上に共通電
極を兼ねる金属薄膜２を成膜する。As shown in the same figure (al), first, a metal thin film 2 which also serves as a common electrode is formed on a glass substrate 1.
次に同図（ｂｌに見られるように、金属薄膜２上の単位
画素領域を開口部とするレジスト膜５−１を形成し、こ
れをマスクとして上記金属薄膜２に陽極酸化法を施し、
金属薄膜２の一部を化成して透明薄膜３−１を形成する
。なお、カラー表示装置の１画素は、Ｒ，Ｇ、Ｂの３原
色のそれぞれに対し１ドツトずつから構成されるので、
上記陽極酸化工程において化成する面積は、３ドツト分
の面積とする。Next, as shown in the same figure (bl), a resist film 5-1 having an opening in the unit pixel area on the metal thin film 2 is formed, and using this as a mask, the metal thin film 2 is subjected to anodic oxidation.
A transparent thin film 3-1 is formed by chemically converting a part of the metal thin film 2. Note that one pixel of a color display device is composed of one dot for each of the three primary colors R, G, and B.
The area to be chemically formed in the anodic oxidation step is the area of three dots.
次いで同図（Ｃ）に示すように、上記３ドツト分に相当
する透明薄膜３−１のうち、２ドツト分を開口部とする
レジスト膜５−２を形成し、これをマスクとして再び陽
極酸化法を施して、先に形成した透明薄膜３−１の表面
を露出している部分の膜厚を増大させ、図示の如く透明
薄膜３−２を形成する。Next, as shown in the same figure (C), a resist film 5-2 having two dots as openings in the transparent thin film 3-1 corresponding to the three dots is formed, and using this as a mask, anodic oxidation is carried out again. The thickness of the exposed surface of the previously formed transparent thin film 3-1 is increased by applying a method to form a transparent thin film 3-2 as shown in the figure.
次いで同図（ｄ）に示すように、透明薄膜３−２のうち
１ドツト分を開口部とするレジスト膜５−３を形成し、
これをマスクとして再度陽極酸化法を施して、最も大な
る膜厚を有する透明薄膜３−３を形成する。Next, as shown in FIG. 3(d), a resist film 5-3 having an opening corresponding to one dot in the transparent thin film 3-2 is formed,
Using this as a mask, anodic oxidation is performed again to form a transparent thin film 3-3 having the largest thickness.
上記金属薄膜２と透明薄膜３−１．３−２．３−３から
の反射光強度は、互いに干渉しである波長域で大きくな
る。従って透明薄膜３−１．３−２．３−３の膜厚を変
えることにより、光の反射波長域を変えることができ、
即ち反射型カラーフィルタとして用いることができる。The intensity of reflected light from the metal thin film 2 and the transparent thin film 3-1.3-2.3-3 interferes with each other and becomes large in a certain wavelength range. Therefore, by changing the thickness of the transparent thin film 3-1.3-2.3-3, the reflected wavelength range of light can be changed.
That is, it can be used as a reflective color filter.
以上により同図（ｅｌに見られるように、３原色を構成
する各色対応に異なる膜厚を有するカラーフィルタが作
製される。Through the above steps, as shown in FIG.
かかる構成の反射型カラーフィルタは、有機色素を用い
ていないので、褪色することなく長時間の使用が可能で
あり、またカラーフィルタ作製時にゴミの付着がなく、
従って、電極やパスラインにクラックを生じたり、セル
厚が変化したりすることがなく、従って表示欠陥が発生
する虞もない。Since a reflective color filter with such a configuration does not use organic dyes, it can be used for a long time without fading, and there is no dust attached during the production of the color filter.
Therefore, cracks do not occur in the electrodes or pass lines, and the cell thickness does not change, so there is no possibility of display defects occurring.
しかし、上記従来の反射型カラーフィルタは、３原色の
各色対応に陽極酸化を３回行い、各色ごとにフィルタの
膜厚を制御することが必要であるため、製造工程が煩雑
となる難点がある。However, the conventional reflective color filter described above has the disadvantage that the manufacturing process is complicated because it is necessary to perform anodization three times for each of the three primary colors and to control the film thickness of the filter for each color. .
そこで本発明においては、上記反射型カラーフィルタを
容易に作製し得る、改良された製造方法を提供すること
を目的とする。Therefore, an object of the present invention is to provide an improved manufacturing method that allows the reflective color filter described above to be easily manufactured.
上記目的は本発明において、ガラス基板上に３原色の各
色対応のドツト領域ごとに金属薄膜を電気的に分離して
形成し、この各ドツト領域にそれぞれ異なる電圧を印加
して同時に陽極酸化を行うことによって達成される。The above object is achieved in the present invention by electrically separating and forming a thin metal film on a glass substrate for each dot region corresponding to each of the three primary colors, and applying different voltages to each dot region to perform anodic oxidation simultaneously. This is achieved by
金属薄膜に陽極酸化法を施した時の化成膜の成長速度は
、陽極酸化時に印加する電圧によって異なる。そこで３
原色の各色対応の金属薄膜に印加する電圧を、それぞれ
の干渉光が所望の波長となる膜厚に対応する電圧に選ん
で陽極酸化することにより、同一工程において、各色対
応の金属３膜表面層が化成されて得られる透明薄膜を、
それぞれ所望の厚さに形成できる。The growth rate of a chemically formed film when a metal thin film is subjected to anodic oxidation differs depending on the voltage applied during anodic oxidation. So 3
By anodizing the voltage applied to the metal thin film corresponding to each primary color by selecting the voltage corresponding to the film thickness at which each interference light has the desired wavelength, three metal film surface layers corresponding to each color can be formed in the same process. The transparent thin film obtained by chemical conversion of
Each can be formed to a desired thickness.
以下本発明の一実施例を第１図（ａｌ〜（ｄｌにより説
明する。An embodiment of the present invention will be described below with reference to FIGS. 1 (al to dl).
先ず同図（ａｌ、 （ｂｌに示す如く、ガラス基板１上
に３原色の各色のドツト対応に金属薄膜２−Ｌ ２−２
゜２−３を分離して形成する。これは、ガラス基板１上
全而に、例えばチタン（Ｔｉ）、タンタル（Ｔａ）のよ
うな金属を、スパッタリング法等により凡そ２０００人
の厚さに被着させた後、所要部分をレジスト膜でマスク
して、不要部を除去する等の方法で実施できる。First, as shown in FIGS.
Separate and form ゜2-3. This is done by depositing a metal such as titanium (Ti) or tantalum (Ta) on the entire surface of the glass substrate 1 to a thickness of about 2,000 wafers by sputtering or the like, and then covering the required portions with a resist film. This can be done by masking and removing unnecessary parts.
次いで同図（Ｃ）に見られる如く、ガラス基板１を酒石
酸アンモニウム（（ＮｔＩ＃） ｚｃＪ４０ａ）のよう
な電解液６中にひたし、各金属薄膜２−１．２−２．２
−３に対してそれぞれ異なる電圧を印加して、陽極酸化
を行う。この時、各金属薄膜２−１．２−２．２−３を
赤色Ｒ９緑色Ｇ、青色Ｂに対するドツト領域とした場合
、各金属薄膜上の化成膜の厚さと印加する電圧ＶＲ、Ｖ
ｒ、、Ｖｍとの関係については後述する。Next, as shown in the same figure (C), the glass substrate 1 is immersed in an electrolytic solution 6 such as ammonium tartrate ((NtI#) zcJ40a), and each metal thin film 2-1.2-2.2
Anodic oxidation is performed by applying different voltages to -3. At this time, when each metal thin film 2-1.2-2.2-3 is used as a dot region for red R9 green G and blue B, the thickness of the chemically formed film on each metal thin film and the applied voltage VR, V
The relationship between r and Vm will be described later.
このように陽極酸化を行うと、同図（ｄ）に見られるよ
うに、金属薄膜２−１．２−２．２−３表面が化成され
て、透明薄膜３−１．３−２．３−３が形成される。各
透明薄膜３−１．３−２．３−３ （７）厚さは、印加
電圧Ｖ、ｌ。When the anodic oxidation is performed in this way, the surface of the metal thin film 2-1.2-2.2-3 is chemically formed and the transparent thin film 3-1.3-2.3 is -3 is formed. Each transparent thin film 3-1.3-2.3-3 (7) The thickness is the applied voltage V, l.
Ｖ、、Ｖ、に対応して制御される。It is controlled according to V,,V,.
このように形成された透明薄膜３−１．３−２．３−３
の下地として残留する金属薄膜２−１．２−２．２−３
は、透明薄膜３−１．３−２．３−３を透過した光を反
射する金属反射膜として働く。ここで反射された光と、
透明薄膜３−１．３−２．３−３表面で反射された光と
の干渉により、透明薄膜３−１．３−２．３−３からの
反射光の波長は、その膜厚に依存する。Transparent thin film 3-1.3-2.3-3 formed in this way
Metal thin film remaining as a base 2-1.2-2.2-3
acts as a metal reflective film that reflects the light that has passed through the transparent thin film 3-1.3-2.3-3. The light reflected here and
Due to interference with the light reflected from the surface of the transparent thin film 3-1.3-2.3-3, the wavelength of the reflected light from the transparent thin film 3-1.3-2.3-3 depends on its film thickness. do.
即ち、透明薄膜の厚さ、屈折率をｄ、ｎとし、反射光の
波長をλとすると、
ｎ−ｄ＝λ／４ −〜−−−−−■の
関係が成立する。従って、金属薄膜２−１．２−２゜２
−３としてＴｉを用いると、透明薄膜３−１．３−２゜
３−３は酸化チタン（Ｔ ｉ Ｏ□）となる。これの屈
折率は可視領域でｎ＃２．３である。That is, if the thickness and refractive index of the transparent thin film are d and n, and the wavelength of the reflected light is λ, then the following relationship holds: nd=λ/4. Therefore, metal thin film 2-1.2-2゜2
When Ti is used as -3, the transparent thin film 3-1.3-2°3-3 becomes titanium oxide (T i O□). Its refractive index in the visible region is n#2.3.
また３原色Ｒ，Ｇ、Ｂの波長は、それぞれ凡そ７．８０
０人、 ５．２００人、 ３８００人であるので、各色
に対する透明薄膜３−１．３−２．３−３の膜厚ｄＲ，
ｄＧ、ｄ。Also, the wavelengths of the three primary colors R, G, and B are approximately 7.80
0 person, 5.200 person, and 3800 person, the film thickness dR of the transparent thin film 3-1.3-2.3-3 for each color,
dG, d.
は、上記０式を変形して
ｄ＝λ／ ４ ｎ −・−−一−−
−−■となるので、
となる。is, by modifying the above equation 0, d=λ/4 n −・−−1−−
−−■, so it becomes .
上述の陽極酸化工程における化成速度は、反応闇値電圧
を越えるとほぼ印加電圧に直線的に比例する。そこで、
各色対応の金属薄膜２−１．２−２．２−３表面がそれ
ぞれ上記厚さに化成されるように、印加電圧Ｖ、、Ｖ、
、Ｖ、を、例えば６０Ｖ、 ３０Ｖ。The rate of chemical formation in the above-mentioned anodic oxidation step is approximately linearly proportional to the applied voltage once the reaction dark voltage is exceeded. Therefore,
Apply voltages V, , V, so that the surfaces of the metal thin films 2-1.2-2.2-3 corresponding to each color are formed to the above-mentioned thickness.
, V, for example 60V, 30V.
２０Ｖに選び、凡そ１０分間の化成を行えばよい。It is sufficient to select 20V and perform chemical conversion for about 10 minutes.
以上により本実施例では３原色各色対応のドツト領域に
、それぞれ所望の膜厚を有する透明薄膜３−１．３−２
．３−３を、一工程で同時に形成することができ、製造
工程が極めて簡単化される。As described above, in this embodiment, transparent thin films 3-1 and 3-2 having desired film thicknesses are formed in the dot areas corresponding to each of the three primary colors.
．． 3-3 can be formed simultaneously in one step, and the manufacturing process is extremely simplified.
本発明によれば、有機色素を用いないので色あいの劣化
がなく、またフィルタ作製時のゴミの付着もなく、従っ
て表示欠陥のない良好な表示品質を有する表示パネルが
簡単な製造工程で作製され、製造歩留が向上し、価格も
安価となる。According to the present invention, since no organic dye is used, there is no deterioration in color tone, and there is no adhesion of dust during filter production, and therefore, a display panel with good display quality without display defects can be produced with a simple manufacturing process. , the manufacturing yield is improved and the price is reduced.
第１図は本発明一実施例説明図、
第２図は従来の製造方法説明図である。
図において、１はガラス基板、２．２−１．２−２゜２
−３は金属薄膜、３ 、３−１．３−２．３−３は透明
薄膜を示す。
２′−２
不ネ明−ぢ０・Ｊ謹甥図
’＋７７”ラズ基本（
従禾丙髪涜方莞参Ｈ図FIG. 1 is an explanatory diagram of one embodiment of the present invention, and FIG. 2 is an explanatory diagram of a conventional manufacturing method. In the figure, 1 is a glass substrate, 2.2-1.2-2゜2
-3 indicates a metal thin film, and 3 and 3-1.3-2.3-3 indicate a transparent thin film. 2'-2 Unnemei-ji0・J Bennephew Map'+77" Raz basic
Claims (1)
薄膜を形成した後、該金属薄膜を陽極酸化法により化成
して、３原色の各色対応に異なる膜厚を有する透明薄膜
を形成するに際し、 前記金属薄膜（２−１、２−２、２−３）を３原色の各
色に対応するドット領域ごとに分離して形成し、各金属
薄膜にそれぞれ異なる化成電圧を印加して同時に陽極酸
化を行い、各金属薄膜、表面に透明薄膜（３−１、３−
２、３−３）をそれぞれ所望の膜厚に形成することを特
徴とする反射型カラーフィルタの製造方法。[Claims] After forming a metal thin film capable of forming a transparent chemical film on a glass substrate (11), the metal thin film is chemically formed by an anodic oxidation method to form a film with a different thickness for each of the three primary colors. When forming a transparent thin film having A voltage is applied and anodic oxidation is performed at the same time to form a transparent thin film (3-1, 3-
A method for manufacturing a reflective color filter, comprising forming each of 2 and 3-3) to a desired thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61296101A JPS63148201A (en) | 1986-12-11 | 1986-12-11 | Production of reflection type color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61296101A JPS63148201A (en) | 1986-12-11 | 1986-12-11 | Production of reflection type color filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63148201A true JPS63148201A (en) | 1988-06-21 |
Family
ID=17829144
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61296101A Pending JPS63148201A (en) | 1986-12-11 | 1986-12-11 | Production of reflection type color filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63148201A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01271706A (en) * | 1988-04-25 | 1989-10-30 | Matsushita Electric Works Ltd | Optical filter and photoelectric sensor using same |
| EP0478621A1 (en) * | 1989-06-17 | 1992-04-08 | GLICK, William F. | Color display system using thin film color control |
| JP2001137001A (en) * | 1999-11-11 | 2001-05-22 | Rikio:Kk | Footwear, its manufacturing method, and midsole and insole to be used for the same |
-
1986
- 1986-12-11 JP JP61296101A patent/JPS63148201A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01271706A (en) * | 1988-04-25 | 1989-10-30 | Matsushita Electric Works Ltd | Optical filter and photoelectric sensor using same |
| EP0478621A1 (en) * | 1989-06-17 | 1992-04-08 | GLICK, William F. | Color display system using thin film color control |
| EP0478621A4 (en) * | 1989-06-17 | 1993-02-03 | William F. Glick | Color display system using thin film color control |
| JP2001137001A (en) * | 1999-11-11 | 2001-05-22 | Rikio:Kk | Footwear, its manufacturing method, and midsole and insole to be used for the same |
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