JPS6314322B2 - - Google Patents

Info

Publication number
JPS6314322B2
JPS6314322B2 JP18907681A JP18907681A JPS6314322B2 JP S6314322 B2 JPS6314322 B2 JP S6314322B2 JP 18907681 A JP18907681 A JP 18907681A JP 18907681 A JP18907681 A JP 18907681A JP S6314322 B2 JPS6314322 B2 JP S6314322B2
Authority
JP
Japan
Prior art keywords
etching
diffraction grating
single crystal
silicon single
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18907681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5891407A (ja
Inventor
Tsuneaki Oota
Michiharu Hosoya
Yoshio Kawai
Takaaki Myashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP18907681A priority Critical patent/JPS5891407A/ja
Publication of JPS5891407A publication Critical patent/JPS5891407A/ja
Publication of JPS6314322B2 publication Critical patent/JPS6314322B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP18907681A 1981-11-27 1981-11-27 シリコン回折格子の製造方法 Granted JPS5891407A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18907681A JPS5891407A (ja) 1981-11-27 1981-11-27 シリコン回折格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18907681A JPS5891407A (ja) 1981-11-27 1981-11-27 シリコン回折格子の製造方法

Publications (2)

Publication Number Publication Date
JPS5891407A JPS5891407A (ja) 1983-05-31
JPS6314322B2 true JPS6314322B2 (zh) 1988-03-30

Family

ID=16234899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18907681A Granted JPS5891407A (ja) 1981-11-27 1981-11-27 シリコン回折格子の製造方法

Country Status (1)

Country Link
JP (1) JPS5891407A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6180822A (ja) * 1984-09-27 1986-04-24 Nec Corp ブレ−ズド回折格子の作成方法
EP0620201A3 (en) * 1993-04-12 1995-01-25 Hughes Aircraft Co Process for the preparation of microoptical elements.
US6517734B1 (en) * 2000-07-13 2003-02-11 Network Photonics, Inc. Grating fabrication process using combined crystalline-dependent and crystalline-independent etching

Also Published As

Publication number Publication date
JPS5891407A (ja) 1983-05-31

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