JPS63141064A - 印刷版用修正剤 - Google Patents
印刷版用修正剤Info
- Publication number
- JPS63141064A JPS63141064A JP28963986A JP28963986A JPS63141064A JP S63141064 A JPS63141064 A JP S63141064A JP 28963986 A JP28963986 A JP 28963986A JP 28963986 A JP28963986 A JP 28963986A JP S63141064 A JPS63141064 A JP S63141064A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- ferric
- soluble
- correction
- correcting material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts
- G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28963986A JPS63141064A (ja) | 1986-12-03 | 1986-12-03 | 印刷版用修正剤 |
| DE19873740709 DE3740709C2 (de) | 1986-12-02 | 1987-12-01 | Verfahren zum Korrigieren von entwickelten Silberbildern auf Offsetdruckformen |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28963986A JPS63141064A (ja) | 1986-12-03 | 1986-12-03 | 印刷版用修正剤 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63141064A true JPS63141064A (ja) | 1988-06-13 |
| JPH046943B2 JPH046943B2 (https=) | 1992-02-07 |
Family
ID=17745841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28963986A Granted JPS63141064A (ja) | 1986-12-02 | 1986-12-03 | 印刷版用修正剤 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63141064A (https=) |
-
1986
- 1986-12-03 JP JP28963986A patent/JPS63141064A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH046943B2 (https=) | 1992-02-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |