JPS63140074A - Pretreatment for vacuum deposition of strip - Google Patents

Pretreatment for vacuum deposition of strip

Info

Publication number
JPS63140074A
JPS63140074A JP28589886A JP28589886A JPS63140074A JP S63140074 A JPS63140074 A JP S63140074A JP 28589886 A JP28589886 A JP 28589886A JP 28589886 A JP28589886 A JP 28589886A JP S63140074 A JPS63140074 A JP S63140074A
Authority
JP
Japan
Prior art keywords
strip
tank
vacuum deposition
passed
rinsed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28589886A
Other languages
Japanese (ja)
Inventor
Kiyoshi Awai
清 粟井
Sadahiko Kimura
定彦 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP28589886A priority Critical patent/JPS63140074A/en
Publication of JPS63140074A publication Critical patent/JPS63140074A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To improve the adhesiveness of a metallic strip and vapor deposited layer by preliminarily cleaning the surface of the metallic strip, then electroplating a metal thereto at the time of forming thin films by a vacuum deposition method on the surface of the metallic strip. CONSTITUTION:After the metallic strip 2 to be formed with the thin films on the surface by the vacuum deposition method is precleaned in a tank 3 and is then subjected to an electrolytic degreasing treatment in an electrolytic degreasing tank 4 having anodes 4, 4''. The strip is then passed through a tank 5 and the surface thereof are rinsed and cleaned; in succession thereof, the strip is passed through a pickling tank 6, by which the oxide films on the surfaces are dissolved away. Such strip is passed through a pickling tank 7 and after the pickling soln. on the surfaces is rinsed and removed, the strip is passed through an elecroplating cell 8 and is between anodes 11. Electricity is conducted to said electrodes and the strip 2 as a cathode to form thin plating layers on the surface. The strip is rinsed in a rinse tank 9 and is sent to a vacuum deposition device after heating and drying 10. The stable vapor deposited layers having the excellent adhesive power are thus obtd.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ストリップ(帯鋼板)の真空蒸着における前
処理方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a pretreatment method for vacuum deposition of a strip (steel sheet).

〔従来の技術とその問題点〕[Conventional technology and its problems]

周知のように、ストリップの表面に薄膜を形成する方法
に電気メツキ方法があるが、最近、電気メツキ方法に代
り、真空蒸着や陰極スパッタリングなどの技術が使用さ
れるようになってきた。この真空蒸着方法は、高真空雰
囲気内で金M(例えば亜鉛)・絶縁物などを加熱蒸発さ
せ、その蒸発分子を基板であるストリップ表面に凝固さ
せる方法であることから、その前処理として当該ストリ
ップ表面の洗浄処理は最も重要な処理とされている。前
処理如何によっては、形成された薄膜の強度、ピンホー
ルグレード、薄膜の物理的特性などに大きな影響を与え
る。
As is well known, electroplating is a method for forming a thin film on the surface of a strip, but recently, techniques such as vacuum evaporation and cathode sputtering have been used instead of electroplating. This vacuum evaporation method heats and evaporates gold M (e.g. zinc), an insulator, etc. in a high vacuum atmosphere, and solidifies the evaporated molecules on the surface of the strip, which is the substrate. Surface cleaning treatment is considered the most important treatment. Depending on the pretreatment, the strength of the formed thin film, the pinhole grade, the physical properties of the thin film, etc. are greatly affected.

そのため、従来の真空蒸着の前処理方法は、ノウハウが
多いが、超洗浄面を得る方法としての不純物の除去には
、1)機械的研削、2)イオン衝撃、3)電界蒸発、4
)高温加熱、5)レーザ照射などが試みられている。
Therefore, conventional pretreatment methods for vacuum evaporation require a lot of know-how, but methods for removing impurities to obtain an ultra-clean surface include 1) mechanical grinding, 2) ion bombardment, 3) electric field evaporation, and 4.
) high-temperature heating, and (5) laser irradiation have been attempted.

ところで、ストリップに対する従来の真空蒸着の前処理
方法としては、脱脂および酸化膜の除去が必要であって
、後者については現在、酸化膜の還元(高温加熱)、お
よびスパッタリング(イオン輿撃)または放電(イオン
衝撃)などの方法がとられている。しかしながら、酸化
膜のかかる除去方法では、時間がかかるとか、ストリッ
プを高温にして機械的性質の変化を生ぜしめて好ましく
ないとか、更には連続的に低温でストリップの酸化膜を
除去するには適していない、とかの問題がある、また、
酸化膜の他の除去方法に機械的研削方法が考えられるが
、かかる方法では、真空蒸着における真空雰囲気が酸素
を含む場合、基板であるストリップの再酸化を伴う問題
がある。
By the way, conventional vacuum deposition pretreatment methods for strips require degreasing and removal of oxide films, and the latter is currently achieved by reducing oxide films (high temperature heating) and sputtering (ion bombardment) or electric discharge. (ion bombardment) and other methods are used. However, such methods for removing the oxide film are time-consuming, undesirable as they cause changes in mechanical properties due to the high temperature of the strip, and are not suitable for continuously removing the oxide film from the strip at low temperatures. There is a problem that there is no, or
Mechanical grinding may be considered as another method for removing the oxide film, but such a method has the problem of reoxidation of the strip, which is the substrate, if the vacuum atmosphere during vacuum deposition contains oxygen.

なお、前処理として、酸洗も当然行われており、かかる
酸洗後は大気中で乾燥させるため、ストリップの表面に
酸化膜が再度形成されることから蒸発分子の凝固・密着
性が低下する問題がある。
Note that pickling is naturally performed as a pre-treatment, and since the strip is dried in the air after pickling, an oxide film is formed on the surface of the strip again, which reduces the coagulation and adhesion of evaporated molecules. There's a problem.

〔問題点を解決するための手段〕[Means for solving problems]

そこで本発明は、ストリップの真空薄着の前処理のかか
る問題点を解消するため創作されたもので、殊に、薄膜
の凝固における密着性を向上させることを目的として、
ストリップを脱脂し、酸洗を行った後、蒸着金属となじ
みの良好な金属をストリップ上に薄く電気メッキを施す
ことを特徴とする真空蒸着方法における前処理方法を提
供することにある。
Therefore, the present invention was created in order to solve such problems in the pretreatment of vacuum thinning of strips, and in particular, with the purpose of improving the adhesion during solidification of thin films.
To provide a pretreatment method for a vacuum vapor deposition method, which comprises degreasing the strip, pickling it, and then electroplating the strip with a thin layer of metal that is compatible with the vapor-deposited metal.

〔実施例〕〔Example〕

本発明の構成を作用とともに、添付図面に示す実施例に
より詳細に説明する。添付図面は本発明の実施例の概略
図で、ペイオフリール1からまき出されたストリップ2
は、タンク3により予備洗浄される。この予備洗浄には
温水を用いた0次いで、電解脱脂タンク4で電解脱脂を
行い、ストリップ2の表面の油膜を除去する。4’ 、
4”は陽極を示す0次いでタンク5を通すことにより、
ストリップ2の表面に付着した電解脱脂液をリンスする
DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure and operation of the present invention will be explained in detail with reference to embodiments shown in the accompanying drawings. The accompanying drawing is a schematic illustration of an embodiment of the invention, showing a strip 2 unwound from a payoff reel 1.
is pre-cleaned in tank 3. For this preliminary cleaning, hot water is used.Next, electrolytic degreasing is performed in an electrolytic degreasing tank 4 to remove the oil film on the surface of the strip 2. 4',
4" indicates the anode 0 Then by passing through the tank 5,
The electrolytic degreasing liquid adhering to the surface of the strip 2 is rinsed.

その後、ストリップ2は酸洗タンク6を通過させること
で酸化膜を除去し、リンスタンク7にて水洗する。水洗
後はストリップ2上に水膜をつけたまま電気メンキタン
ク8に導入し、数百オングストローム程度電気メッキ1
を施す。電気メッキされたストリップ2は再度リンスタ
ンク9を通り、過熱装置10にて乾燥し、真空蒸着のた
め真空中に導かれる。電気メツキタンク8内の陽極11
は、例えば亜鉛をストリップ2で蒸着する場合には、そ
れと同一の金属としている。
Thereafter, the strip 2 is passed through a pickling tank 6 to remove the oxide film, and then washed in a rinsing tank 7 with water. After washing with water, the strip 2 is introduced into the electroplating tank 8 with a water film on it, and the electroplating layer 1 is coated with water of about several hundred angstroms.
administer. The electroplated strip 2 passes through the rinsing tank 9 again, is dried in the heating device 10 and is led into a vacuum for vacuum deposition. Anode 11 in electroplated tank 8
For example, when zinc is vapor-deposited in strip 2, it is the same metal as that.

なお、本実施例の電気メッキ金属の厚さは、数百オング
ストロームとしたが、要はストリップ2の表面の酸化を
抑制できる範囲内とすればよい。
The thickness of the electroplated metal in this embodiment was several hundred angstroms, but it should be within a range that can suppress oxidation of the surface of the strip 2.

以上要するに本発明は、特許請求の範囲に記載された構
成を採択したので次の効果を奏する。
In summary, the present invention has the following effects by adopting the configuration described in the claims.

〔発明の効果〕〔Effect of the invention〕

従来技術における問題点を解決することができる。すな
わち、ストリップの脱脂・酸洗の後、真空蒸着させる前
に、ストリップに電気メッキを施すので、低温前処理で
、かつ、短時間に、再酸化抑制膜を形成させるので、ス
トリップに対する真空蒸着前処理が能率よく行われると
ともに、電気メツキ金属が真空蒸着金泥となじみが良好
であるので、凝固による密着性が向上し、とか(真空蒸
着方法は他の方法、例えば陰極スパンタリンク法、イオ
ン化静電メッキ法に比べ密着性が劣るといわれているが
、本発明によればかかる点をも克服できるものである。
Problems in the prior art can be solved. That is, since the strip is electroplated after degreasing and pickling and before vacuum deposition, a reoxidation-inhibiting film is formed in a short period of time with low-temperature pretreatment. In addition to efficient processing, the electroplated metal has good compatibility with the vacuum-deposited gold slurry, which improves adhesion through solidification. Although it is said that the adhesion is inferior to that of electroplating, the present invention can overcome this problem.

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面は本発明の実施例の概略図を示す。 2・・・ストリップ、4・・・電解脱脂タンク、6・・
・酸洗タンク、8・・・電気メツキタンク。
The accompanying drawings show schematic illustrations of embodiments of the invention. 2... Strip, 4... Electrolytic degreasing tank, 6...
- Pickling tank, 8... Electroplated tank.

Claims (1)

【特許請求の範囲】[Claims] ストリップを脱脂し、酸洗を行った後、蒸着金属となじ
みの良好な金属を陽極としてストリップ上に薄く電気メ
ッキを施すことを特徴とする真空蒸着方法における前処
理方法。
A pretreatment method for a vacuum vapor deposition method, which comprises degreasing the strip, acid-washing the strip, and then electroplating the strip thinly using a metal that is compatible with the vapor-deposited metal as an anode.
JP28589886A 1986-12-02 1986-12-02 Pretreatment for vacuum deposition of strip Pending JPS63140074A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28589886A JPS63140074A (en) 1986-12-02 1986-12-02 Pretreatment for vacuum deposition of strip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28589886A JPS63140074A (en) 1986-12-02 1986-12-02 Pretreatment for vacuum deposition of strip

Publications (1)

Publication Number Publication Date
JPS63140074A true JPS63140074A (en) 1988-06-11

Family

ID=17697448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28589886A Pending JPS63140074A (en) 1986-12-02 1986-12-02 Pretreatment for vacuum deposition of strip

Country Status (1)

Country Link
JP (1) JPS63140074A (en)

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