JPS63140074A - Pretreatment for vacuum deposition of strip - Google Patents
Pretreatment for vacuum deposition of stripInfo
- Publication number
- JPS63140074A JPS63140074A JP28589886A JP28589886A JPS63140074A JP S63140074 A JPS63140074 A JP S63140074A JP 28589886 A JP28589886 A JP 28589886A JP 28589886 A JP28589886 A JP 28589886A JP S63140074 A JPS63140074 A JP S63140074A
- Authority
- JP
- Japan
- Prior art keywords
- strip
- tank
- vacuum deposition
- passed
- rinsed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 11
- 238000005238 degreasing Methods 0.000 claims abstract description 10
- 238000009713 electroplating Methods 0.000 claims abstract description 8
- 239000002184 metal Substances 0.000 claims abstract description 8
- 229910052751 metal Inorganic materials 0.000 claims abstract description 8
- 238000002203 pretreatment Methods 0.000 claims description 6
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 abstract description 11
- 238000005554 pickling Methods 0.000 abstract description 9
- 239000010409 thin film Substances 0.000 abstract description 6
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 238000004140 cleaning Methods 0.000 abstract description 3
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 230000005611 electricity Effects 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000010849 ion bombardment Methods 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010405 reoxidation reaction Methods 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ストリップ(帯鋼板)の真空蒸着における前
処理方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a pretreatment method for vacuum deposition of a strip (steel sheet).
周知のように、ストリップの表面に薄膜を形成する方法
に電気メツキ方法があるが、最近、電気メツキ方法に代
り、真空蒸着や陰極スパッタリングなどの技術が使用さ
れるようになってきた。この真空蒸着方法は、高真空雰
囲気内で金M(例えば亜鉛)・絶縁物などを加熱蒸発さ
せ、その蒸発分子を基板であるストリップ表面に凝固さ
せる方法であることから、その前処理として当該ストリ
ップ表面の洗浄処理は最も重要な処理とされている。前
処理如何によっては、形成された薄膜の強度、ピンホー
ルグレード、薄膜の物理的特性などに大きな影響を与え
る。As is well known, electroplating is a method for forming a thin film on the surface of a strip, but recently, techniques such as vacuum evaporation and cathode sputtering have been used instead of electroplating. This vacuum evaporation method heats and evaporates gold M (e.g. zinc), an insulator, etc. in a high vacuum atmosphere, and solidifies the evaporated molecules on the surface of the strip, which is the substrate. Surface cleaning treatment is considered the most important treatment. Depending on the pretreatment, the strength of the formed thin film, the pinhole grade, the physical properties of the thin film, etc. are greatly affected.
そのため、従来の真空蒸着の前処理方法は、ノウハウが
多いが、超洗浄面を得る方法としての不純物の除去には
、1)機械的研削、2)イオン衝撃、3)電界蒸発、4
)高温加熱、5)レーザ照射などが試みられている。Therefore, conventional pretreatment methods for vacuum evaporation require a lot of know-how, but methods for removing impurities to obtain an ultra-clean surface include 1) mechanical grinding, 2) ion bombardment, 3) electric field evaporation, and 4.
) high-temperature heating, and (5) laser irradiation have been attempted.
ところで、ストリップに対する従来の真空蒸着の前処理
方法としては、脱脂および酸化膜の除去が必要であって
、後者については現在、酸化膜の還元(高温加熱)、お
よびスパッタリング(イオン輿撃)または放電(イオン
衝撃)などの方法がとられている。しかしながら、酸化
膜のかかる除去方法では、時間がかかるとか、ストリッ
プを高温にして機械的性質の変化を生ぜしめて好ましく
ないとか、更には連続的に低温でストリップの酸化膜を
除去するには適していない、とかの問題がある、また、
酸化膜の他の除去方法に機械的研削方法が考えられるが
、かかる方法では、真空蒸着における真空雰囲気が酸素
を含む場合、基板であるストリップの再酸化を伴う問題
がある。By the way, conventional vacuum deposition pretreatment methods for strips require degreasing and removal of oxide films, and the latter is currently achieved by reducing oxide films (high temperature heating) and sputtering (ion bombardment) or electric discharge. (ion bombardment) and other methods are used. However, such methods for removing the oxide film are time-consuming, undesirable as they cause changes in mechanical properties due to the high temperature of the strip, and are not suitable for continuously removing the oxide film from the strip at low temperatures. There is a problem that there is no, or
Mechanical grinding may be considered as another method for removing the oxide film, but such a method has the problem of reoxidation of the strip, which is the substrate, if the vacuum atmosphere during vacuum deposition contains oxygen.
なお、前処理として、酸洗も当然行われており、かかる
酸洗後は大気中で乾燥させるため、ストリップの表面に
酸化膜が再度形成されることから蒸発分子の凝固・密着
性が低下する問題がある。Note that pickling is naturally performed as a pre-treatment, and since the strip is dried in the air after pickling, an oxide film is formed on the surface of the strip again, which reduces the coagulation and adhesion of evaporated molecules. There's a problem.
そこで本発明は、ストリップの真空薄着の前処理のかか
る問題点を解消するため創作されたもので、殊に、薄膜
の凝固における密着性を向上させることを目的として、
ストリップを脱脂し、酸洗を行った後、蒸着金属となじ
みの良好な金属をストリップ上に薄く電気メッキを施す
ことを特徴とする真空蒸着方法における前処理方法を提
供することにある。Therefore, the present invention was created in order to solve such problems in the pretreatment of vacuum thinning of strips, and in particular, with the purpose of improving the adhesion during solidification of thin films.
To provide a pretreatment method for a vacuum vapor deposition method, which comprises degreasing the strip, pickling it, and then electroplating the strip with a thin layer of metal that is compatible with the vapor-deposited metal.
本発明の構成を作用とともに、添付図面に示す実施例に
より詳細に説明する。添付図面は本発明の実施例の概略
図で、ペイオフリール1からまき出されたストリップ2
は、タンク3により予備洗浄される。この予備洗浄には
温水を用いた0次いで、電解脱脂タンク4で電解脱脂を
行い、ストリップ2の表面の油膜を除去する。4’ 、
4”は陽極を示す0次いでタンク5を通すことにより、
ストリップ2の表面に付着した電解脱脂液をリンスする
。DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure and operation of the present invention will be explained in detail with reference to embodiments shown in the accompanying drawings. The accompanying drawing is a schematic illustration of an embodiment of the invention, showing a strip 2 unwound from a payoff reel 1.
is pre-cleaned in tank 3. For this preliminary cleaning, hot water is used.Next, electrolytic degreasing is performed in an electrolytic degreasing tank 4 to remove the oil film on the surface of the strip 2. 4',
4" indicates the anode 0 Then by passing through the tank 5,
The electrolytic degreasing liquid adhering to the surface of the strip 2 is rinsed.
その後、ストリップ2は酸洗タンク6を通過させること
で酸化膜を除去し、リンスタンク7にて水洗する。水洗
後はストリップ2上に水膜をつけたまま電気メンキタン
ク8に導入し、数百オングストローム程度電気メッキ1
を施す。電気メッキされたストリップ2は再度リンスタ
ンク9を通り、過熱装置10にて乾燥し、真空蒸着のた
め真空中に導かれる。電気メツキタンク8内の陽極11
は、例えば亜鉛をストリップ2で蒸着する場合には、そ
れと同一の金属としている。Thereafter, the strip 2 is passed through a pickling tank 6 to remove the oxide film, and then washed in a rinsing tank 7 with water. After washing with water, the strip 2 is introduced into the electroplating tank 8 with a water film on it, and the electroplating layer 1 is coated with water of about several hundred angstroms.
administer. The electroplated strip 2 passes through the rinsing tank 9 again, is dried in the heating device 10 and is led into a vacuum for vacuum deposition. Anode 11 in electroplated tank 8
For example, when zinc is vapor-deposited in strip 2, it is the same metal as that.
なお、本実施例の電気メッキ金属の厚さは、数百オング
ストロームとしたが、要はストリップ2の表面の酸化を
抑制できる範囲内とすればよい。The thickness of the electroplated metal in this embodiment was several hundred angstroms, but it should be within a range that can suppress oxidation of the surface of the strip 2.
以上要するに本発明は、特許請求の範囲に記載された構
成を採択したので次の効果を奏する。In summary, the present invention has the following effects by adopting the configuration described in the claims.
従来技術における問題点を解決することができる。すな
わち、ストリップの脱脂・酸洗の後、真空蒸着させる前
に、ストリップに電気メッキを施すので、低温前処理で
、かつ、短時間に、再酸化抑制膜を形成させるので、ス
トリップに対する真空蒸着前処理が能率よく行われると
ともに、電気メツキ金属が真空蒸着金泥となじみが良好
であるので、凝固による密着性が向上し、とか(真空蒸
着方法は他の方法、例えば陰極スパンタリンク法、イオ
ン化静電メッキ法に比べ密着性が劣るといわれているが
、本発明によればかかる点をも克服できるものである。Problems in the prior art can be solved. That is, since the strip is electroplated after degreasing and pickling and before vacuum deposition, a reoxidation-inhibiting film is formed in a short period of time with low-temperature pretreatment. In addition to efficient processing, the electroplated metal has good compatibility with the vacuum-deposited gold slurry, which improves adhesion through solidification. Although it is said that the adhesion is inferior to that of electroplating, the present invention can overcome this problem.
添付図面は本発明の実施例の概略図を示す。
2・・・ストリップ、4・・・電解脱脂タンク、6・・
・酸洗タンク、8・・・電気メツキタンク。The accompanying drawings show schematic illustrations of embodiments of the invention. 2... Strip, 4... Electrolytic degreasing tank, 6...
- Pickling tank, 8... Electroplated tank.
Claims (1)
みの良好な金属を陽極としてストリップ上に薄く電気メ
ッキを施すことを特徴とする真空蒸着方法における前処
理方法。A pretreatment method for a vacuum vapor deposition method, which comprises degreasing the strip, acid-washing the strip, and then electroplating the strip thinly using a metal that is compatible with the vapor-deposited metal as an anode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28589886A JPS63140074A (en) | 1986-12-02 | 1986-12-02 | Pretreatment for vacuum deposition of strip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28589886A JPS63140074A (en) | 1986-12-02 | 1986-12-02 | Pretreatment for vacuum deposition of strip |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63140074A true JPS63140074A (en) | 1988-06-11 |
Family
ID=17697448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28589886A Pending JPS63140074A (en) | 1986-12-02 | 1986-12-02 | Pretreatment for vacuum deposition of strip |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63140074A (en) |
-
1986
- 1986-12-02 JP JP28589886A patent/JPS63140074A/en active Pending
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