JPS6312347B2 - - Google Patents
Info
- Publication number
- JPS6312347B2 JPS6312347B2 JP56031333A JP3133381A JPS6312347B2 JP S6312347 B2 JPS6312347 B2 JP S6312347B2 JP 56031333 A JP56031333 A JP 56031333A JP 3133381 A JP3133381 A JP 3133381A JP S6312347 B2 JPS6312347 B2 JP S6312347B2
- Authority
- JP
- Japan
- Prior art keywords
- deflection
- aberration
- compensation
- deflector
- 2gδφ
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000004075 alteration Effects 0.000 claims description 75
- 201000009310 astigmatism Diseases 0.000 claims description 33
- 101100042630 Caenorhabditis elegans sin-3 gene Proteins 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 6
- 238000000034 method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000010894 electron beam technology Methods 0.000 description 9
- 238000004904 shortening Methods 0.000 description 3
- 241000226585 Antennaria plantaginifolia Species 0.000 description 1
- 206010010071 Coma Diseases 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56031333A JPS57147856A (en) | 1981-03-06 | 1981-03-06 | Deflecting device of automatic astigmation compensation type |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56031333A JPS57147856A (en) | 1981-03-06 | 1981-03-06 | Deflecting device of automatic astigmation compensation type |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57147856A JPS57147856A (en) | 1982-09-11 |
JPS6312347B2 true JPS6312347B2 (enrdf_load_stackoverflow) | 1988-03-18 |
Family
ID=12328322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56031333A Granted JPS57147856A (en) | 1981-03-06 | 1981-03-06 | Deflecting device of automatic astigmation compensation type |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57147856A (enrdf_load_stackoverflow) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2571994B1 (fr) * | 1984-10-22 | 1986-12-26 | Soudure Autogene Francaise | Machine pour le soudage interne de tubes bout a bout, par faisceau d'electrons |
JPS6288247A (ja) * | 1985-10-14 | 1987-04-22 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JP2580114B2 (ja) * | 1985-12-17 | 1997-02-12 | 株式会社日立製作所 | 偏向回路 |
JPH01296552A (ja) * | 1988-05-24 | 1989-11-29 | Hitachi Ltd | イオンおよび電子ビーム複合装置 |
EP1120809B1 (en) * | 2000-01-27 | 2012-02-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Objective lens for a charged particle beam device |
JP6009981B2 (ja) * | 2013-03-28 | 2016-10-19 | 日本電子株式会社 | 荷電粒子ビーム偏向装置 |
JP7155393B2 (ja) * | 2019-03-08 | 2022-10-18 | 株式会社日立ハイテク | 荷電粒子ビーム装置 |
-
1981
- 1981-03-06 JP JP56031333A patent/JPS57147856A/ja active Granted
Non-Patent Citations (1)
Title |
---|
JOURRAL.OF.PHYSICS.E.SCIENTIFIC.LNSTRUNENTS.VOL.13=1980 * |
Also Published As
Publication number | Publication date |
---|---|
JPS57147856A (en) | 1982-09-11 |
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