JPS63121848A - Composition for peeling electrodeposited coating film - Google Patents

Composition for peeling electrodeposited coating film

Info

Publication number
JPS63121848A
JPS63121848A JP26839186A JP26839186A JPS63121848A JP S63121848 A JPS63121848 A JP S63121848A JP 26839186 A JP26839186 A JP 26839186A JP 26839186 A JP26839186 A JP 26839186A JP S63121848 A JPS63121848 A JP S63121848A
Authority
JP
Japan
Prior art keywords
composition
electrodeposition paint
paint film
amines
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26839186A
Other languages
Japanese (ja)
Inventor
Tsunetomo Nakano
中野 常朝
Shiro Sakatani
酒谷 史郎
Mitsushi Taguchi
三津志 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP26839186A priority Critical patent/JPS63121848A/en
Publication of JPS63121848A publication Critical patent/JPS63121848A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/34Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/346Imagewise removal by selective transfer, e.g. peeling away using photosensitive materials other than non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To enable an electrodeposited coating film to be peeled in a short time by using a peeling composition consisting of a kind of amine selected from tertiary amines, and mono-, di-, and trialkanol-amines, and an aqueous alkaline solution, and specifying the ratio of said amine to said solution. CONSTITUTION:The composition to be used for peeling the electrodeposited coating film contains a kind of amine selected from tertiary amines, preferably, the compound represented by formula (1), and mono-, di-, and trialkanol-amines, represented by formulae (2), (3), and (4), respectively, and the 1-10wt.% aqueous alkaline solution in an amine to solution weight ratio of 1/4-1/20. In these formulae, each of R1-R3 is CnH2n+1 (n=2-5); each of R4-R6 is CnH2n+1 (n=0-4), phenyl, or cyclohexyl; and m is 2, 3, or 4, thus permitting the electrodeposited coating film enhanced in surface hardness and adhesion to copper by heat treatment at high temperature or for lengthened time, or increase of an amount of a hardening component to be easily peeled in a short time.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、電着塗料膜の剥離用組成物、詳しくは、電着
塗装によって形成された、スルーホール及びパターン形
成用レジスト(電着塗料膜)の剥離に用いる組成物に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a composition for removing an electrodeposition paint film, and more specifically, a composition for removing an electrodeposition paint film, and more specifically, a resist for through holes and pattern formation formed by electrodeposition coating (electrodeposition paint film removal composition). The present invention relates to a composition used for peeling off a film.

〔従来の技術〕[Conventional technology]

スルーホールプリント配線板の製法としては、下記の如
き、スルーホール及びパターン形成用レジストを電着塗
装によって形成する方法が提案されている。
As a method for manufacturing through-hole printed wiring boards, the following method has been proposed in which through-holes and pattern-forming resists are formed by electrodeposition coating.

第1図(1)に示すように、所定箇所にスルーホール2
が形成された、両面に銅箔層1aを有する基板1にスル
ーホールメッキを施してメッキ銅層3を形成した後、第
1図(2)に示すように、上記メッキ銅層3の上に得よ
うとする回路パターンの逆パターンのレジスト被覆層4
を形成し、次いで、第1図(3)に示すように、上記メ
ッキ銅層3の露出部上に電着塗装によって電着塗料膜5
を形成し、次いで、第1図(4)に示すように、上記レ
ジスト被覆層4を剥離除去した後、第1図(5)に示す
ように、上記レジスト被覆層4の除去によって露出した
、回路に不要なメッキ銅層及び銅箔層を工・ノチング処
理して溶解除去し、然る後、上記電着塗料膜5を剥離剤
で剥離除去して、第1図(6)に示す如きスルーホール
プリント配線板を得る。
As shown in Figure 1 (1), there are through holes 2 in designated locations.
After forming a plated copper layer 3 by performing through-hole plating on the substrate 1 having copper foil layers 1a on both sides, as shown in FIG. Resist coating layer 4 with a pattern opposite to the circuit pattern to be obtained
Then, as shown in FIG. 1(3), an electrodeposition paint film 5 is formed on the exposed portion of the plated copper layer 3 by electrodeposition.
, and then, as shown in FIG. 1(4), the resist coating layer 4 is peeled off, and then, as shown in FIG. 1(5), the resist coating layer 4 exposed by the removal is removed. The plated copper layer and the copper foil layer that are unnecessary for the circuit are removed by processing and notching, and then the electrodeposited paint film 5 is peeled off with a release agent to form a structure as shown in FIG. 1 (6). Obtain a through-hole printed wiring board.

そして、上記電着塗料膜の剥離除去に用いる剥離剤とし
ては、例えばアニオン型電着塗料膜の剥離剤として次の
ものが知られている。
As a stripping agent used for removing the above-mentioned electrodeposition paint film, for example, the following are known as a stripping agent for anionic electrodeposition paint film.

(1)石油系シンナー又は炭化水素系の溶媒。(1) Petroleum-based thinner or hydrocarbon-based solvent.

+21 2.5重量%以上の水酸化ナトリウム水溶液。+21 2.5% by weight or more of sodium hydroxide aqueous solution.

(3)上記の水酸化ナトリウム水溶液に下記■〜■のを
機溶媒を1〜30重量%、特に5〜25重量%含む混合
物。
(3) A mixture containing 1 to 30% by weight, particularly 5 to 25% by weight of the following organic solvents in the above sodium hydroxide aqueous solution.

■非プロトン系有機極性溶媒 N、N−ジメチルホルムアミド、N、N−ジメチルアセ
トアミド、N−メチル−2−ピロリドン等のアミド類;
及びジメチルスルホキシド、ジエチルスルホキシド等の
スルホキシド類。
■ Aprotic organic polar solvent Amides such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone;
and sulfoxides such as dimethyl sulfoxide and diethyl sulfoxide.

■グリコール類 エチレングリコール、ジエチレングリコール、トリエチ
レングリコール、テトラエチレングリコール、ポリエチ
レングリコール等のエチレングリコール単量体及び重合
体;及びエチレングリコール−モノエチルエーテル、−
モノメチルエーテル類等のエチレングリコール−モノア
ルキルエーテル、ポリエチレングリコールのモノ、ジア
ルキルエーテル等のエチレングリコール系化合物。
■Glycols Ethylene glycol monomers and polymers such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, and polyethylene glycol; and ethylene glycol monoethyl ether, -
Ethylene glycol compounds such as ethylene glycol-monoalkyl ethers such as monomethyl ethers, mono- and dialkyl ethers of polyethylene glycol.

■メタノール、エタノール、イソプロピルアルコール等
の一価の水溶性アルコール;及びペンタエリスリトール
、グリセリン等の多価アルコール系化合物。
■ Monohydric water-soluble alcohols such as methanol, ethanol, and isopropyl alcohol; and polyhydric alcohol compounds such as pentaerythritol and glycerin.

また、基板搬送時にロールに付着しているゴミ又はエツ
チング液の残香により電着塗料膜が傷つけられて回路パ
ターンが破損される惧れを防止するために、電着塗料膜
の表面硬度を向」ニさせる必要がある。また、逆パター
ンのレジスト被覆層の剥離をブラシや高温の高濃度アル
カリ水溶液を用いて行う場合に電着塗料膜が上記レジス
ト被覆層と共に剥離される惧れを防止するために、電着
塗料膜の銅との密着性を向上させる必要がある。
In addition, the surface hardness of the electrodeposited paint film is increased to prevent the risk of damage to the electrodeposition paint film and damage to the circuit pattern due to dirt adhering to the rolls or the residual smell of the etching solution during board transportation. It is necessary to In addition, in order to prevent the possibility that the electrodeposition paint film will be peeled off together with the resist coating layer when the resist coating layer of the reverse pattern is removed using a brush or a high-concentration alkaline aqueous solution at high temperature, the electrodeposition paint film It is necessary to improve the adhesion with copper.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

電着塗料膜の表面硬度、及び銅との密着性を向上させる
には、一般に、電着塗装後の塗膜の熱処理の温度を高く
するか若しくは熱処理の時間を長くする、又は電着塗料
の硬化成分を増量すれば良いが、このようにして表面硬
度及び銅との密着性を向上させた電着塗料膜は、前記の
従来の剥離剤では、剥離不能であるか、或いは剥離に長
時間を要する問題がある。
In order to improve the surface hardness of the electrodeposition paint film and its adhesion to copper, it is generally necessary to increase the temperature or lengthen the heat treatment time of the paint film after the electrodeposition coating, or to increase the heat treatment time of the electrodeposition paint film. The amount of the curing component can be increased, but the electrodeposited paint film, which has improved surface hardness and adhesion to copper, cannot be removed or takes a long time to remove with the conventional remover mentioned above. There is a problem that requires

従って、本発明の目的は、高温若しくは長時間の熱処理
又は硬化成分の増量により表面硬度及び銅との密着性を
向上させた電着塗料膜を、短時間で容易に剥離すること
のできる剥離用組成物を提供することにある。
Therefore, an object of the present invention is to provide a peeling method that can easily remove an electrodeposition paint film in a short period of time, which has improved surface hardness and adhesion to copper by heat treatment at high temperatures or for a long time or by increasing the amount of curing component. An object of the present invention is to provide a composition.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者等は、前記目的を達成すべく種々検討した結果
、特定のアミン類を水酸化ナトリウム水溶液に添加した
組成物を用いると、従来の剥離剤を用いた場合の1/2
〜115程度の時間で電着塗料膜を容易に剥離できるこ
とを知見した。
As a result of various studies to achieve the above object, the present inventors have found that when using a composition in which specific amines are added to an aqueous sodium hydroxide solution, the removal rate is 1/2 that of using a conventional stripping agent.
It has been found that the electrodeposition paint film can be easily peeled off in about 115 hours.

本発明は、上記知見に基づきなされたもので、三級アミ
ン、及びモノ、ジ、トリアルカノールアミンからなる群
から選択された少なくとも一種のアミン類と、1〜10
重量%のアルカリ性水溶液とからなり、上記アミン類と
上記アルカリ性水溶液との重量比(アミン類/アルカリ
性水溶液)が1/4′〜1/20である、電着塗料膜の
剥離用組成物を提供するものである。
The present invention has been made based on the above findings, and includes at least one amine selected from the group consisting of tertiary amines, mono-, di-, and trialkanolamines, and 1 to 10
% by weight of an alkaline aqueous solution, and the weight ratio of the amines to the alkaline aqueous solution (amines/alkaline aqueous solution) is from 1/4' to 1/20. It is something to do.

以下、本発明の電着塗料膜の剥離用組成物について詳述
する。
Hereinafter, the composition for stripping an electrodeposition paint film of the present invention will be described in detail.

本発明の組成物の構成成分であるアミン類において、好
ましい三級アミンとしては、下記の式(1)で表される
化合物が挙げられ、また、好ましいモノ、ジ、トリアル
カノールアミンとしては、下記の式(2)1式(3)9
式(4)でそれぞれ表される化合物が挙げられる。
Among the amines that are constituent components of the composition of the present invention, preferred tertiary amines include compounds represented by the following formula (1), and preferred mono-, di-, and trialkanolamines include the following: Equation (2) 1 Equation (3) 9
Examples include compounds represented by formula (4).

 R3 〔但し、R+ 、R2及びR3は各々C,H2,。R3 [However, R+, R2 and R3 are C, H2, respectively.

(n−2〜5)を示す。〕 〔但し、mは2〜4を示し、R4及びR5は各々CIl
 8211−1−1 (n = 0〜4) 、7xニル
基又ハシクロヘキシル基を示す。〕 〔但し、mは2〜4を示し、R6はC,、H211+1
(n−0〜4)、フェニル基又はシクロヘキシル基を示
す。〕 上記アミン類としては、特に、上記式(3)で表される
ジアルカノールアミンであって、R6がc2Hs −C
3R7、Ca Hq 、フェニル基又はシクロヘキシル
基である化合物が好ましい。
(n-2 to 5). ] [However, m represents 2 to 4, and R4 and R5 each
8211-1-1 (n = 0 to 4), represents a 7x nyl group or a hasycyclohexyl group. ] [However, m represents 2 to 4, R6 is C,, H211+1
(n-0 to 4) represents a phenyl group or a cyclohexyl group. ] The above-mentioned amines are particularly dialkanolamines represented by the above formula (3), in which R6 is c2Hs -C
Compounds that are 3R7, Ca Hq , phenyl group or cyclohexyl group are preferred.

また、本発明の組成物の構成成分である好ましいアルカ
リ性水溶液としては、水酸化ナトリウム水溶液、水酸化
カリウム水溶液等が挙げられる。
Preferred alkaline aqueous solutions that are constituents of the composition of the present invention include sodium hydroxide aqueous solutions, potassium hydroxide aqueous solutions, and the like.

上記アルカリ性水溶液としては、アルカリ濃度が1重量
%未満のものを用いると、剥離能力が不足したり、剥離
液の寿命が短く、また10重量%超のものを用いると、
銅表面の酸化による変色が      □起こるため、
上記濃度が1〜10重量%、好ましくは3〜8重景%の
ものが用いられる。
If the above-mentioned alkaline aqueous solution has an alkali concentration of less than 1% by weight, the stripping ability will be insufficient or the life of the stripping solution will be shortened, and if it exceeds 10% by weight,
Because discoloration occurs due to oxidation of the copper surface,
The concentration used is 1 to 10% by weight, preferably 3 to 8% by weight.

また、上記アミン類と、上記濃度の上記アルカリ性水溶
液との重量比(アミン頻/アルカリ性水溶液)は、1/
4〜1/20、好ましくは115〜1/10である。上
記重量比が1/4より太きいと、アルカリ性水溶液との
相溶性の低下及び銅の溶解が起こり、また1/20より
小さいと、剥離能力が不足する。
Furthermore, the weight ratio of the amines to the alkaline aqueous solution having the above concentration (amine ratio/alkaline aqueous solution) is 1/
It is 4 to 1/20, preferably 115 to 1/10. If the weight ratio is greater than 1/4, the compatibility with the alkaline aqueous solution will decrease and copper will dissolve, and if it is less than 1/20, the peeling ability will be insufficient.

上記アミン類と上記アルカリ性水溶液とからなる本発明
の組成物は、50〜80°Cに加熱した際に懸濁するこ
とがあり、この懸濁状態で使用しても効果はあるが、こ
の場合、アルコール類を添加することにより均一化する
ことができる。かかるアルコール類としては、エチレン
グリコール若しくはジエチレングリコール又はそれらの
アルキルエーテル類等が挙げられ、これらのアルコール
類は上記アミン類と同量程度添加することができる。
The composition of the present invention comprising the above-mentioned amines and the above-mentioned alkaline aqueous solution may become suspended when heated to 50 to 80°C, and although it is effective even when used in this suspended state, in this case , can be made uniform by adding alcohols. Examples of such alcohols include ethylene glycol, diethylene glycol, and alkyl ethers thereof, and these alcohols can be added in about the same amount as the above-mentioned amines.

本発明の組成物による電着塗料膜の剥離は、本発明の組
成物中に電着塗料膜の形成されている基板を浸漬する、
又は本発明の組成物を上記電着塗料膜に噴射する等の従
来の剥離剤の使用法と同様な手段で行うことができる。
Peeling of the electrodeposition paint film using the composition of the present invention involves immersing the substrate on which the electrodeposition paint film is formed in the composition of the present invention.
Alternatively, the composition of the present invention may be sprayed onto the electrodeposited paint film in a manner similar to the conventional method of using a stripping agent.

〔実施例〕〔Example〕

以下に、本発明の実施例を比較例と共に挙げる。 Examples of the present invention are listed below along with comparative examples.

実施例1 4%水酸化ナトリウム水溶液80重量部にN−n−ブチ
ルイミノジエタノール20重量部を添加混合して本発明
の剥離用組成物を調製した。
Example 1 A stripping composition of the present invention was prepared by adding and mixing 20 parts by weight of N-n-butyliminodiethanol to 80 parts by weight of a 4% aqueous sodium hydroxide solution.

この剥離用組成物を電着塗料膜の剥離剤として用い、且
つ下記の如くして調製したアニオン型電着塗料を用いて
、下記の如くしてスルーホールプリント配線板を製造し
、本発明の剥離用組成物の効果を観察した。
Using this stripping composition as a stripping agent for the electrodeposition paint film and the anionic electrodeposition paint prepared as described below, a through-hole printed wiring board was manufactured as described below, and a through-hole printed wiring board was manufactured as described below. The effect of the stripping composition was observed.

〔アニオン型電着塗料の調製〕[Preparation of anionic electrodeposition paint]

アルキド横行溶液の調製 大豆油脂肪酸(酸価155)620g、ロジン(酸価1
70)500g、トール油脂肪酸(酸価170)600
g、リノール酸140g、リルン酸140g及び無水マ
レイン酸300gを200℃、窒素雰囲気下で3時間反
応させた後、100°C迄冷却し、この反応液にキシレ
ン150ml。
Preparation of alkyd running solution 620 g of soybean oil fatty acid (acid value 155), rosin (acid value 1
70) 500g, tall oil fatty acid (acid value 170) 600
After reacting 140 g of linoleic acid, 140 g of linoleic acid, and 300 g of maleic anhydride at 200°C under a nitrogen atmosphere for 3 hours, the mixture was cooled to 100°C, and 150 ml of xylene was added to the reaction solution.

ペンタエリスリトール1000g及び無水トリメリット
酸900gを加え、再び150℃迄加熱し、酸価が10
0となった時点で反応を停止して冷却した。この間キシ
レンは減圧で除去した。次いで、70℃迄冷却したら、
イソプロピルアルコール680g及びトリエチルアミン
500gを加え溶解させ、固形分約70重量%の変性ア
ルキド樹脂溶液を得た。
Add 1000 g of pentaerythritol and 900 g of trimellitic anhydride and heat to 150°C again until the acid value reaches 10.
When the temperature reached 0, the reaction was stopped and cooled. During this time, xylene was removed under reduced pressure. Then, after cooling to 70℃,
680 g of isopropyl alcohol and 500 g of triethylamine were added and dissolved to obtain a modified alkyd resin solution with a solid content of about 70% by weight.

電着塗料の建浴 上記の変性アルギド樹脂溶液120gに水溶性メラミン
樹脂〔■サンワケミカル製、ニカラ・ツクMX706 
 (固形分70%))140gを加えてよく混合した後
、不揮発分15%となるように水を加えて分散させた。
Preparation of electrodeposition paint Add 120 g of the above modified algide resin solution to water-soluble melamine resin [■ Sanwa Chemical, Nikara Tsuku MX706
(solid content 70%)) After adding 140 g and mixing well, water was added and dispersed so that the nonvolatile content was 15%.

次いで、pt+が8.2となるようにトリエチルアミン
を加え、アニオン型電着塗料を得た。
Next, triethylamine was added so that pt+ was 8.2 to obtain an anionic electrodeposition paint.

〔スルーホールプリント配線板の製造〕所定箇所に30
0μm孔径のスルーホール2が形成された、両面に銅箔
層1aを有する基板(ガラスエポキシ両面銅箔張積層板
)1に銅メッキを施して、第1図(1)に示すようにス
ルーホール2の孔壁部及び上記基板1の両面の銅箔層1
a上にメッキ銅層3を形成した後、上記基板1の両面の
上記メッキ銅層3上にエツチングレジストインク(山栄
化学■製、エツチングレジスト5ER−420C)をス
クリーン印刷し、得ようとする回路パターンの逆パター
ンのレジスト被覆層4を形成して、第1図(2)に示す
ように上記メッキ銅層3の回路パターン部分が露出し且
つ上記メッキ銅層3の回路不要部分が上記レジスト被覆
層4で被覆された基板を得た。
[Manufacture of through-hole printed wiring boards] 30
A substrate (glass epoxy double-sided copper foil-clad laminate) 1 having copper foil layers 1a on both sides in which through holes 2 with a hole diameter of 0 μm are formed is plated with copper, and through holes are formed as shown in FIG. 1 (1). 2 and the copper foil layer 1 on both sides of the substrate 1.
After forming the plated copper layer 3 on both sides of the substrate 1, an etching resist ink (manufactured by Sanei Kagaku ■, etching resist 5ER-420C) is screen printed on the plated copper layer 3 on both sides of the substrate 1. A resist coating layer 4 with a reverse pattern of the circuit pattern is formed so that the circuit pattern portion of the plated copper layer 3 is exposed and the circuit unnecessary portion of the plated copper layer 3 is covered with the resist as shown in FIG. 1(2). A substrate coated with coating layer 4 was obtained.

このようにして得られた、逆パターンのレジスト被覆層
4の形成された基板を、前述の如くして調製したアニオ
ン型電着塗料中に浸漬し、上記基板の銅露出部を陽極と
し、上記電着塗料中に浸漬したステンレス板を陰極とし
て、100■で1分間直流電流を印加して電着塗装を行
い、上記基板の銅露出部(上記レジスト被覆層4の形成
されていない部分)に塗膜を形成した。次いで、基板を
1分間水洗して、付着している電着塗装されていない電
着塗料を洗い流し、水切り後、上記塗膜を、熱風乾燥器
を用い150°Cで20分間熱処理して硬化させ、第1
図(3)に示すように電着塗料膜5が形成された基板を
得た。次いで、この基板を冷却後、40°Cの2%水酸
化ナトリウム水溶液中に2分間浸漬して上記レジスト被
覆層4を剥離除去し、第1図(4)に示すように一ト記
メッキ銅層3の回路不要部分が露出した基板を得た。次
いで、この基板を水洗、水切り後、50℃の40ボーメ
塩化第2鉄水溶液中に10分間浸漬してエツチング処理
し、第1図(5)に示すように上記レジスト被覆層4の
剥離除去によって露出したメッキ銅層の回路不要部分及
びその下の銅箔層の回路不要部分が溶解除去された基板
を得た。
The thus obtained substrate on which the resist coating layer 4 of the reverse pattern was formed was immersed in the anionic electrodeposition paint prepared as described above, the exposed copper part of the substrate was used as an anode, and the Using a stainless steel plate immersed in the electrodeposition paint as a cathode, a DC current of 100 μm is applied for 1 minute to perform electrodeposition coating on the exposed copper portion of the substrate (the portion where the resist coating layer 4 is not formed). A coating film was formed. Next, the substrate was washed with water for 1 minute to wash away the adhering electrocoating paint that had not been electrocoated, and after draining, the coating film was cured by heat treatment at 150 ° C. for 20 minutes using a hot air dryer. , 1st
A substrate on which an electrodeposition paint film 5 was formed as shown in FIG. 3 was obtained. Next, after cooling this substrate, it was immersed in a 2% sodium hydroxide aqueous solution at 40° C. for 2 minutes to peel off the resist coating layer 4, and as shown in FIG. 1 (4), the plated copper was removed. A substrate was obtained in which the unnecessary portion of layer 3 was exposed. Next, this substrate was washed with water, drained, and etched by immersing it in a 40 Baume ferric chloride aqueous solution at 50° C. for 10 minutes, and as shown in FIG. 1 (5), the resist coating layer 4 was peeled off and removed. A substrate was obtained in which the exposed portion of the plated copper layer that did not require a circuit and the portion of the copper foil layer below that that did not require a circuit were dissolved and removed.

然る後、上記のエツチング処理した基板を水洗、水切り
後、50℃に加温した前述の本発明の剥離用組成物中に
浸漬して上記電着塗料膜5を剥離除去し、第1図(6)
に示す如きスルーホールプリント配線板を得た。この際
、上記電着塗料膜5の剥離に要した時間(剥離所要時間
)は2分であった。
Thereafter, the above-mentioned etched substrate was washed with water, drained, and then immersed in the above-mentioned stripping composition of the present invention heated to 50°C to peel off the electrodeposited paint film 5, as shown in FIG. (6)
A through-hole printed wiring board as shown in Figure 1 was obtained. At this time, the time required to peel off the electrodeposited paint film 5 (required time for peeling) was 2 minutes.

比較例1 本発明の剥離用組成物の代わりに、4%水酸化ナトリウ
ム水溶液80重量部とジエチレングリコール20重量部
とからなる剥離剤を用いた以外は、全て実施例1と同一
条件でスルーホールプリント配線板を製造した。この際
、電着塗料膜の剥離所要時間は10分以上で、しかもス
ルーホール孔壁部には、電着塗料膜の一部が残留してい
た。
Comparative Example 1 Through-hole printing was carried out under the same conditions as in Example 1, except that a release agent consisting of 80 parts by weight of a 4% aqueous sodium hydroxide solution and 20 parts by weight of diethylene glycol was used instead of the release composition of the present invention. Manufactured a wiring board. At this time, the time required to remove the electrodeposition paint film was 10 minutes or more, and a portion of the electrodeposition paint film remained on the wall of the through hole.

比較例2 塗膜の熱処理条件を130℃、10分間とした以外は、
全て比較例1と同一条件でスルーホールプリント配線板
を製造した。この際、電着塗料膜の剥離所要時間は2分
であったが、得られたスルーホールプリント配線板は、
塗膜の熱処理が不充分であったために電着塗料膜の表面
硬度及び銅との密着性が不足し、そのため一部で回路パ
ターンの破損が認められた。
Comparative Example 2 Except that the heat treatment conditions for the coating film were 130°C and 10 minutes,
A through-hole printed wiring board was manufactured under the same conditions as in Comparative Example 1. At this time, the time required to peel off the electrodeposition paint film was 2 minutes, but the resulting through-hole printed wiring board was
Because the heat treatment of the coating film was insufficient, the surface hardness of the electrodeposition coating film and its adhesion to copper were insufficient, and as a result, damage to the circuit pattern was observed in some areas.

上記の実施例1、比較例1及び比較例2における、塗膜
の熱処理条件、使用した剥離剤の組成、剥離所要時間、
及び剥離温度を下記表−1にまとめて示した。
In the above Example 1, Comparative Example 1 and Comparative Example 2, the heat treatment conditions of the coating film, the composition of the release agent used, the time required for removal,
and peeling temperature are summarized in Table 1 below.

表−1 実施例2 実施例1で用いた本発明の剥離用組成物を電着塗料膜の
剥離剤として用い、且つ下記の如くして調製したアニオ
ン型電着塗料を用いて、塗膜の熱処理条件を130℃、
25分間とした以外は、全〈実施例1と同一条件でスル
ーホールプリント配線板を製造した。この際、電着塗料
膜の剥離所要時間は1.5分であった。
Table 1 Example 2 The stripping composition of the present invention used in Example 1 was used as a stripping agent for the electrodeposition paint film, and the anionic electrodeposition paint prepared as follows was used to remove the coating film. The heat treatment conditions were 130℃,
A through-hole printed wiring board was manufactured under the same conditions as in Example 1 except that the heating time was 25 minutes. At this time, the time required to peel off the electrodeposition paint film was 1.5 minutes.

〔アニオン型電着塗料の調製〕[Preparation of anionic electrodeposition paint]

実施例1で得られた変性アルキド樹脂溶液120gに水
溶性メラミン樹脂〔三井すイアナミツド■製、サイメル
254B (不揮発分80%)〕を21g加えてよく混
合した後、不揮発分15%となるように水を加えて分散
させた。次いで、pHが8.2となるようにトリエチル
アミンを加え、アニオン型電着塗料を得た。
To 120 g of the modified alkyd resin solution obtained in Example 1, 21 g of water-soluble melamine resin [Cymel 254B (non-volatile content: 80%), manufactured by Mitsui Sui Anamitsu ■] was added and mixed well, and then the non-volatile content was adjusted to 15%. Add water to disperse. Next, triethylamine was added to adjust the pH to 8.2 to obtain an anionic electrodeposition paint.

比較例3 本発明の剥離用組成物の代わりに、4%水酸化ナトリウ
ム水溶液80重量部とジエチレングリコール20重量部
とからなる剥離剤を用いた以外は、全て実施例2と同一
条件でスルーホールプリント配線板を製造した。この際
、電着塗料膜の剥離所要時間は10分であった。
Comparative Example 3 Through-hole printing was performed under the same conditions as in Example 2, except that a release agent consisting of 80 parts by weight of a 4% aqueous sodium hydroxide solution and 20 parts by weight of diethylene glycol was used instead of the release composition of the present invention. Manufactured a wiring board. At this time, the time required to peel off the electrodeposition paint film was 10 minutes.

比較例4 水溶性メラミン樹脂からなる硬化成分の添加量を7.3
5 gとした電着塗料を用いた以外は、全く比較例3と
同一条件でスルーホールプリント配線板を製造した。こ
の際、電着塗料膜の剥離所要時間は2分であったが、得
られたスルーホールプリント配線板は、電着塗料の硬化
成分量が少なかったために電着塗料膜の表面硬度及び銅
との密着性が不足し、そのため一部で回路パターンの破
損が認められた。
Comparative Example 4 The amount of curing component made of water-soluble melamine resin was 7.3
A through-hole printed wiring board was manufactured under the same conditions as in Comparative Example 3, except that 5 g of electrodeposition paint was used. At this time, the time required to peel off the electrodeposited paint film was 2 minutes, but the resulting through-hole printed wiring board had a small amount of curing component in the electrodeposition paint, so the surface hardness of the electrodeposition paint film and the copper Adhesion was insufficient, and damage to the circuit pattern was observed in some areas.

上記の実施例2、比較例3及び比較例4における、使用
した電着塗料のメラミン樹脂とアルキド樹脂との重量比
、使用した剥離剤の組成、剥離所要時間、及び剥離温度
を下記表−2にまとめて示した。
Table 2 below shows the weight ratio of the melamine resin and alkyd resin of the electrodeposition paint used, the composition of the stripping agent used, the required stripping time, and the stripping temperature in the above Example 2, Comparative Example 3, and Comparative Example 4. are summarized in the following.

表−2 註〕*1 電着塗料のメラミン樹脂とアルキド樹脂との
重量比(メラミン樹脂/アルキド樹脂)実施例3〜6 下記表−3に示す組成からなる本発明の剥離用組成物を
電着塗料膜の剥離剤としてそれぞれ用いた以外は、全〈
実施例1と同一条件でスルーホールプリント配線板をそ
れぞれ製造した。この際の電着塗料膜の剥離所要時間を
下記表−3に示す。
Table 2 Note] *1 Weight ratio of melamine resin and alkyd resin in electrodeposition paint (melamine resin/alkyd resin) Examples 3 to 6 The stripping composition of the present invention having the composition shown in Table 3 below was All except that they were used as removers for painted paint films
Through-hole printed wiring boards were manufactured under the same conditions as in Example 1. The time required to peel off the electrodeposition paint film at this time is shown in Table 3 below.

表−3 註〕 *1 トリブチルアミン *2 モノエタノールアミン *3 トリエタノールアミン *4N−シクロヘキシルイミノジエタノール*5 ジエ
チレングリコール 〔発明の効果〕 本発明の電着塗料膜の剥離用組成物によれば、高温若し
くは長時間の熱処理又は硬化成分の増量により表面硬度
及び銅との密着性を向上させた電着塗料膜を、短時間で
容易に剥離することができる。
Table 3 Notes] *1 Tributylamine *2 Monoethanolamine *3 Triethanolamine *4 N-cyclohexyliminodiethanol *5 Diethylene glycol [Effects of the Invention] According to the composition for removing electrodeposition paint films of the present invention, high temperature Alternatively, an electrodeposition paint film whose surface hardness and adhesion to copper have been improved by long-term heat treatment or by increasing the amount of curing component can be easily peeled off in a short time.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の剥離用組成物を電着塗料膜の剥離剤
として用いる、スルーホールメッキ配線板の製法を模式
的に示す概略図である。 1・・基板、1a・・銅箔層、2・・スルーホール、3
・・メッキ銅層、4・・レジスト被覆層、5・・電着塗
料膜
FIG. 1 is a schematic view schematically showing a method for manufacturing a through-hole plated wiring board using the stripping composition of the present invention as a stripping agent for an electrodeposition paint film. 1... Board, 1a... Copper foil layer, 2... Through hole, 3
...Plated copper layer, 4.Resist coating layer, 5.Electrodeposition paint film

Claims (7)

【特許請求の範囲】[Claims] (1)三級アミン、及びモノ、ジ、トリアルカノールア
ミンからなる群から選択された少なくとも一種のアミン
類と、1〜10重量%のアルカリ性水溶液とからなり、
上記アミン類と上記アルカリ性水溶液との重量比(アミ
ン類/アルカリ性水溶液)が1/4〜1/20である、
電着塗料膜の剥離用組成物。
(1) consisting of at least one amine selected from the group consisting of tertiary amines and mono-, di-, and trialkanolamines, and an alkaline aqueous solution of 1 to 10% by weight;
The weight ratio of the amines and the alkaline aqueous solution (amines/alkaline aqueous solution) is 1/4 to 1/20;
A composition for removing electrodeposited paint films.
(2)三級アミンが、下記式(1)で表される化合物で
ある、特許請求の範囲第(1)項記載の電着塗料膜の剥
離用組成物。 式(1)▲数式、化学式、表等があります▼ 〔但し、R_1、R_2及びR_3は各々C_nH_2
_n_+_1(n=2〜5)を示す。〕
(2) The composition for removing an electrodeposition paint film according to claim (1), wherein the tertiary amine is a compound represented by the following formula (1). Formula (1) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [However, R_1, R_2 and R_3 are each C_nH_2
_n_+_1 (n=2 to 5) is shown. ]
(3)モノアルカノールアミンが、下記式(2)で表さ
れる化合物である、特許請求の範囲第(1)項記載の電
着塗料膜の剥離用組成物。 式(2)▲数式、化学式、表等があります▼ 〔但し、mは2〜4を示し、R_4及びR_5は各々C
_nH_2_n_+_1(n=0〜4)、フェニル基又
はシクロヘキシル基を示す。〕
(3) The composition for removing an electrodeposition paint film according to claim (1), wherein the monoalkanolamine is a compound represented by the following formula (2). Formula (2) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [However, m represents 2 to 4, and R_4 and R_5 each represent C
_nH_2_n_+_1 (n=0 to 4) represents a phenyl group or a cyclohexyl group. ]
(4)ジアルカノールアミンが、下記式(3)で表され
る化合物である、特許請求の範囲第(1)項記載の電着
塗料膜の剥離用組成物。 式(3)▲数式、化学式、表等があります▼ 〔但し、mは2〜4を示し、R_6はC_nH_2_n
_+_1(n=0〜4)、フェニル基又はシクロヘキシ
ル基を示す。〕
(4) The composition for removing an electrodeposition paint film according to claim (1), wherein the dialkanolamine is a compound represented by the following formula (3). Formula (3) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [However, m indicates 2 to 4, and R_6 is C_nH_2_n
_+_1 (n=0-4) represents a phenyl group or a cyclohexyl group. ]
(5)トリアルカノールアミンが、下記式(4)で表さ
れる化合物である、特許請求の範囲第(1)項記載の電
着塗料膜の剥離用組成物。 式(4)▲数式、化学式、表等があります▼ 〔但し、mは2〜4を示す。〕
(5) The composition for removing an electrodeposition paint film according to claim (1), wherein the trialkanolamine is a compound represented by the following formula (4). Formula (4) ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [However, m indicates 2 to 4. ]
(6)アルコール類を含む、特許請求の範囲第(1)項
記載の電着塗料膜の剥離用組成物。
(6) The composition for removing an electrodeposition paint film according to claim (1), which contains an alcohol.
(7)アルコール類が、エチレングリコール若しくはジ
エチレングリコール又はそれらのアルキルエーテル類で
ある、特許請求の範囲第(7)項記載の電着塗料膜の剥
離用組成物。
(7) The composition for removing an electrodeposition paint film according to claim (7), wherein the alcohol is ethylene glycol, diethylene glycol, or an alkyl ether thereof.
JP26839186A 1986-11-11 1986-11-11 Composition for peeling electrodeposited coating film Pending JPS63121848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26839186A JPS63121848A (en) 1986-11-11 1986-11-11 Composition for peeling electrodeposited coating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26839186A JPS63121848A (en) 1986-11-11 1986-11-11 Composition for peeling electrodeposited coating film

Publications (1)

Publication Number Publication Date
JPS63121848A true JPS63121848A (en) 1988-05-25

Family

ID=17457821

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26839186A Pending JPS63121848A (en) 1986-11-11 1986-11-11 Composition for peeling electrodeposited coating film

Country Status (1)

Country Link
JP (1) JPS63121848A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5633175A (en) * 1991-12-19 1997-05-27 Hitachi, Ltd. Process for stripping photoresist while producing liquid crystal display device
US5916735A (en) * 1996-11-21 1999-06-29 Matsushita Electric Industrial Co., Ltd. Method for manufacturing fine pattern
US6162569A (en) * 1996-11-21 2000-12-19 Matsushita Electric Industrial Co., Ltd. Method for manufacturing fine pattern, and color filter, shading pattern filter and color LCD element formed and printed board by using the same
JP2019117331A (en) * 2017-12-27 2019-07-18 花王株式会社 Detergent composition for releasing resin mask

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5633175A (en) * 1991-12-19 1997-05-27 Hitachi, Ltd. Process for stripping photoresist while producing liquid crystal display device
US5916735A (en) * 1996-11-21 1999-06-29 Matsushita Electric Industrial Co., Ltd. Method for manufacturing fine pattern
US6162569A (en) * 1996-11-21 2000-12-19 Matsushita Electric Industrial Co., Ltd. Method for manufacturing fine pattern, and color filter, shading pattern filter and color LCD element formed and printed board by using the same
JP2019117331A (en) * 2017-12-27 2019-07-18 花王株式会社 Detergent composition for releasing resin mask

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