JPH0451592A - Manufacture of copper through-hole printed wiring board - Google Patents
Manufacture of copper through-hole printed wiring boardInfo
- Publication number
- JPH0451592A JPH0451592A JP16243390A JP16243390A JPH0451592A JP H0451592 A JPH0451592 A JP H0451592A JP 16243390 A JP16243390 A JP 16243390A JP 16243390 A JP16243390 A JP 16243390A JP H0451592 A JPH0451592 A JP H0451592A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- clad laminate
- negative pattern
- alkylbenzimidazole
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 61
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 59
- 239000010949 copper Substances 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 44
- 238000005530 etching Methods 0.000 claims abstract description 28
- 150000001875 compounds Chemical class 0.000 claims abstract description 26
- 239000007864 aqueous solution Substances 0.000 claims abstract description 19
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 239000000126 substance Substances 0.000 claims description 24
- 239000000243 solution Substances 0.000 claims description 23
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 150000007522 mineralic acids Chemical class 0.000 claims description 4
- 150000007524 organic acids Chemical class 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 239000003513 alkali Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 13
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- 238000007747 plating Methods 0.000 description 8
- 238000007739 conversion coating Methods 0.000 description 6
- 238000011049 filling Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005755 formation reaction Methods 0.000 description 3
- -1 imidazole compound Chemical class 0.000 description 3
- FINXTJFVUXNTOQ-UHFFFAOYSA-N 2-hexyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCC)=NC2=C1 FINXTJFVUXNTOQ-UHFFFAOYSA-N 0.000 description 2
- YECSLYXTXWSKBO-UHFFFAOYSA-N 2-nonyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCC)=NC2=C1 YECSLYXTXWSKBO-UHFFFAOYSA-N 0.000 description 2
- IRMWQHINYNTMNS-UHFFFAOYSA-N 2-octyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCC)=NC2=C1 IRMWQHINYNTMNS-UHFFFAOYSA-N 0.000 description 2
- OYGJENONTDCXGW-UHFFFAOYSA-N 2-pentyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCC)=NC2=C1 OYGJENONTDCXGW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- HITWHALOZBMLHY-UHFFFAOYSA-N 2-Butyl-1H-benzimidazole Chemical compound C1=CC=C2NC(CCCC)=NC2=C1 HITWHALOZBMLHY-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- MJEUKYAKMPDPLE-UHFFFAOYSA-N 2-decyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCCC)=NC2=C1 MJEUKYAKMPDPLE-UHFFFAOYSA-N 0.000 description 1
- FBLJZPQLNMVEMR-UHFFFAOYSA-N 2-propyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCC)=NC2=C1 FBLJZPQLNMVEMR-UHFFFAOYSA-N 0.000 description 1
- GFKNPGTWLJFDKJ-UHFFFAOYSA-N 2-undecyl-1h-benzimidazole Chemical compound C1=CC=C2NC(CCCCCCCCCCC)=NC2=C1 GFKNPGTWLJFDKJ-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- OTLNPYWUJOZPPA-UHFFFAOYSA-N 4-nitrobenzoic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1 OTLNPYWUJOZPPA-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical compound [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 239000005750 Copper hydroxide Substances 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- RCCULWIHKBFZKF-UHFFFAOYSA-N [Cu].[Cl-].[NH4+].N Chemical class [Cu].[Cl-].[NH4+].N RCCULWIHKBFZKF-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- ODWXUNBKCRECNW-UHFFFAOYSA-M bromocopper(1+) Chemical compound Br[Cu+] ODWXUNBKCRECNW-UHFFFAOYSA-M 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 150000004699 copper complex Chemical class 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 235000011087 fumaric acid Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は銅スルーホールプリント配線板の製造方法に
関するものであり、特に短い時間で安価に且つ信軌性の
よい高密度プリント配線板を製造するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to a method for manufacturing copper through-hole printed wiring boards, particularly for manufacturing high-density printed wiring boards with good reliability in a short period of time and at low cost. It is.
従来の技術
従来量も広く行われてきた銅スルーホールプリント配線
板の製造方法としては、目詰め方法と呼ばれるものがあ
る。この方法はスルーホール内に目詰めインクを充填し
て孔を保護したのち、エツチングレジストを印刷する方
法であり、工程中で目詰めインクの溶媒が蒸発し、目詰
めインクが収縮を起こすため、エツチング液が孔の中に
入ってスルーホール内の銅メツキを溶かす惧れがあり、
また収縮によって目詰めインクの厚さが基板の厚さより
も薄くなりやすく、基板と孔との角の銅メツキが溶解し
て、いわゆるエツジ切れ現象を起こし易いので、信転性
の高い製品を与えることができなかった。BACKGROUND OF THE INVENTION A method for manufacturing copper through-hole printed wiring boards that has been widely used in the past includes a method called a packing method. This method involves filling the through holes with filling ink to protect the holes, and then printing an etching resist.During the process, the solvent of the filling ink evaporates, causing the filling ink to shrink. There is a risk that the etching solution will enter the hole and dissolve the copper plating inside the through hole.
In addition, the thickness of the plugging ink tends to become thinner than the thickness of the substrate due to shrinkage, and the copper plating at the corners of the substrate and the holes tends to dissolve, causing a so-called edge breakage phenomenon, which provides a product with high reliability. I couldn't.
また信頼性の高い製品を得る方法として電解半田メツキ
法(半田スルーホール法)が知られているが、この方法
は目詰め法に比べて信頼性の高い製品を与えることがで
きる反面、製造に多くの時間がかかり、且つコストが高
くなるなどの欠点があった。Additionally, the electrolytic solder plating method (solder through-hole method) is known as a method for obtaining highly reliable products, but while this method can provide more reliable products than the plugging method, it is difficult to manufacture. This method has drawbacks such as being time consuming and high in cost.
特公昭50−27033号及び同51−18896号公
報には、銅張積層板の表面に2位に長鎖アルキル基を有
するイミダゾール化合物またはその塩を含む溶液を直接
シルクスクリーン印刷し、自然乾燥して陽画のエツチン
グレジスト膜を形成し、酸性エツチング液に浸漬して不
要な胴部分を除去するプリント配線板の製造方法が開示
されているが、銅表面に形成したイミダゾール化合物か
らなるエツチングレジスト膜が塩基性物質であるため、
酸性エツチング液と接触した際にその一部が溶出し、回
路として保護すべき部分がエツチングされて多くの不良
品を伴うものであり、銅スルーホールプリント配線板を
製造する場合には、別途に銅メツキされた小さいスルー
ホール内の表面にイミダゾール化合物またはその塩を含
む溶液をコーティングする煩わしい作業を余儀なくされ
、工業的には実施し難いものであった。Japanese Patent Publications No. 50-27033 and No. 51-18896 disclose a method in which a solution containing an imidazole compound or its salt having a long-chain alkyl group at the 2-position is directly printed on the surface of a copper-clad laminate by silk screen printing, and then air-dried. A method for manufacturing a printed wiring board is disclosed in which a positive etching resist film is formed on the copper surface and unnecessary body portions are removed by immersing it in an acidic etching solution. Because it is a basic substance,
When it comes into contact with an acidic etching solution, a part of it is eluted, etching parts that should be protected as circuits, resulting in many defective products.When manufacturing copper through-hole printed wiring boards, a separate process is required. This method requires the troublesome work of coating the surface of a small copper-plated through hole with a solution containing an imidazole compound or its salt, which is difficult to implement industrially.
このような諸問題を解決した銅スルーホールプリント配
線板の製造法として特公昭64−1954号公報には、
アルキルイミダゾール化合物の塩を含む水溶液を陰画パ
ターンを形成した銅張積層板の表面に接触させて、銅張
積層板の銅表面にアルキルイミダゾール化合物からなる
エツチングレジスト膜を形成し、次いで前記銅張積層板
を加熱乾燥したのち、陰画パターンを除去し、アルカリ
性エツチング液に接触させる方法が開示されている。Japanese Patent Publication No. 64-1954 describes a manufacturing method for copper through-hole printed wiring boards that solves these problems.
An aqueous solution containing a salt of an alkylimidazole compound is brought into contact with the surface of the copper-clad laminate on which a negative pattern has been formed to form an etching resist film made of the alkylimidazole compound on the copper surface of the copper-clad laminate, and then the copper-clad laminate is A method is disclosed in which the plate is heated and dried, the negative pattern is removed, and the plate is brought into contact with an alkaline etching solution.
しかしながら、この方法によってビン間3本以上の高密
度パターンの銅スルーホールプリント配線板を製造する
場合には、アルキルイミダゾール化合物の膜の撥水性が
充分なものでないため、アルキルイミダゾール化合物の
化成被膜を形成したのち加熱乾燥する際に、膜が形成さ
れた銅表面に水滴が付着して残りやす(、このため乾燥
初期に化成被膜が溶解し、部分的にエツチングレジスト
膜の薄い箇所が発生するので、時として断線あるいは回
路の凹み等を引き起こす場合があった。However, when producing a copper through-hole printed wiring board with a high-density pattern of three or more bins by this method, the water repellency of the alkylimidazole compound film is not sufficient, so a chemical conversion coating of the alkylimidazole compound is used. When drying by heating after formation, water droplets tend to adhere to and remain on the copper surface on which the film is formed (for this reason, the chemical conversion film dissolves in the early stage of drying, resulting in thin areas of the etching resist film). , sometimes causing wire breaks or dents in the circuit.
またドライフィルム(以下、DFRという)を用いて陰
画パターンを形成した場合、銅表面にアルキルイミダゾ
ール化合物の膜を形成したのち陰画パターンを除去する
際、DFRの剥離残りが発生しやすく、剥離時間を延長
する必要があった。In addition, when a negative pattern is formed using a dry film (hereinafter referred to as DFR), when removing the negative pattern after forming a film of an alkylimidazole compound on the copper surface, the DFR is likely to remain peeled off, and the peeling time is increased. It needed to be extended.
高密度パターンの銅スルーホールプリント配線板の製造
においては、0.3閣φ以下のバイヤホール用のスルー
ホール等の小径孔内に化成被膜の剥離残りが起こりやす
く、剥離処理時間の延長、剥離処理液の液温アップ、剥
離処理液の高濃度化等を行う必要があった。In the production of copper through-hole printed wiring boards with high-density patterns, chemical conversion coatings tend to remain peeled off in small-diameter holes such as through-holes for via holes with a diameter of 0.3 mm or less, resulting in longer peeling processing times and peeling. It was necessary to increase the temperature of the processing solution and increase the concentration of the stripping solution.
発明が解決しようとする課題
最近プリント配線板の高密度化が進展するにつれ、従来
の目詰め法、半田メツキ法では信頼性あるいはコストの
点で問題があり、また前記のアルキルイミダゾール化合
物を用いる方法は安価な製造コストで、低・中密度のパ
ターンの場合は信頼性の高いプリント配線板が得られる
が、高密度のパターンの場合は未だ充分な信頼性が得ら
れるものでない。Problems to be Solved by the Invention Recently, as the density of printed wiring boards has progressed, conventional filling methods and solder plating methods have problems in terms of reliability and cost, and the method using the above-mentioned alkylimidazole compound Although it is possible to obtain a printed wiring board with low manufacturing cost and high reliability in the case of a pattern with a low or medium density, sufficient reliability cannot yet be obtained in the case of a pattern with a high density.
このように高密度のプリント配線板を製造するために、
現在行われている目詰め法、半田メツキ法等の方法と同
等あるいはそれ以上の高い信頼性が維持でき、処理時間
も短く、且つ製造コストが安価である方法の開発が望ま
れている。In order to manufacture such high-density printed wiring boards,
It is desired to develop a method that can maintain reliability as high as or better than the currently used methods such as plugging method and solder plating method, has a short processing time, and has a low manufacturing cost.
課題を解決するための手段
本発明者等はこのような事情に鑑み鋭意研究を重ねた結
果、高密度の銅スルーホールプリント配線板を製造する
ためには、アルカリ水溶液に可溶のレジストを用いて銅
張積層板の表面に必要な陰画パターンを形成し、ついで
前記銅張積層板を下記の一般式で示される2位アルキル
ベンズイミダゾール化合物の塩
を含む水溶液に接触させて、銅張積層板の銅表面に前記
2位アルキルベンズイミダゾール化合物からなるエツチ
ングレジスト膜を形成し、前記銅張積層板を加熱乾燥し
、銅張積層板表面の陰画パターン膜を除去したのち、ア
ルカリ性エツチング液に接触させ、次いでエツチングレ
ジスト膜を剥離することにより所期の目的が達成される
ことを見出し、本発明を完遂した。Means for Solving the Problems In view of the above circumstances, the inventors of the present invention have conducted intensive research and found that in order to manufacture a high-density copper through-hole printed wiring board, a resist that is soluble in an alkaline aqueous solution is used. to form a necessary negative pattern on the surface of the copper-clad laminate, and then bring the copper-clad laminate into contact with an aqueous solution containing a salt of a 2-position alkylbenzimidazole compound represented by the following general formula to form a copper-clad laminate. An etching resist film made of the 2-position alkylbenzimidazole compound is formed on the copper surface of the copper clad laminate, the copper clad laminate is heated and dried to remove the negative pattern film on the surface of the copper clad laminate, and then brought into contact with an alkaline etching solution. They have now found that the intended purpose can be achieved by subsequently peeling off the etching resist film, and have completed the present invention.
本発明方法の実施において用いられる2位アルキルベン
ズイミダゾール化合物の代表的なものとしては、2−プ
ロピルベンズイミダゾール、2−ブチルベンズイミダゾ
ール、2−ペンチルベンズイミダゾール、2〜ヘキシル
ベンズイミダゾール、2−へブチルベンズイミダゾール
、2−オクチルベンズイミダゾール、2−ノニルベンズ
イミダゾール、2−デシルベンズイミダゾール、2−ウ
ンデシルベンズイミダゾール及びこれらの塩があり、炭
素数が小さいアルキル基を有するベンズイミダゾールを
用いた場合、銅金属の表面に形成された化成被膜の一部
が水洗により溶出する傾向があり、また炭素数の大きい
アルキル基を有するベンズイミダゾールを使用すると、
ベンズイミダゾールを溶解して処理液を製造するに当た
り大量の有機または無機酸が必要になるため、2−ペン
チルベンズイミダゾール、2−へキシルベンズイミダゾ
ール、2−へブチルベンズイミダゾール、2オクチルベ
ンズイミダゾール、2−ノニルベンズイミダゾール及び
これらの塩が特に好適である。Representative examples of the 2-position alkylbenzimidazole compounds used in carrying out the method of the present invention include 2-propylbenzimidazole, 2-butylbenzimidazole, 2-pentylbenzimidazole, 2-hexylbenzimidazole, and 2-hebutylbenzimidazole. There are benzimidazole, 2-octylbenzimidazole, 2-nonylbenzimidazole, 2-decylbenzimidazole, 2-undecylbenzimidazole and their salts, and when benzimidazole having an alkyl group with a small number of carbon atoms is used, copper Part of the chemical conversion film formed on the surface of the metal tends to be eluted by washing with water, and when benzimidazole having an alkyl group with a large number of carbon atoms is used,
Since a large amount of organic or inorganic acid is required to dissolve benzimidazole and produce a treatment solution, 2-pentylbenzimidazole, 2-hexylbenzimidazole, 2-hebutylbenzimidazole, 2-octylbenzimidazole, 2 -nonylbenzimidazole and their salts are particularly preferred.
本発明方法の実施に当たっては、水に対してアルキルベ
ンズイミダゾール化合物を0.01〜5%の範囲、好ま
しくは0,1〜2%の割合で添加すればよい。In carrying out the method of the present invention, the alkylbenzimidazole compound may be added in a proportion of 0.01 to 5%, preferably 0.1 to 2%, based on water.
本発明方法の実施においては、アルキルベンズイミダゾ
ール化合物は水に対して難溶性であるため、アルキルベ
ンズイミダゾール化合物を有機または無機酸と反応させ
て、水に可溶の塩にすればよい。In carrying out the method of the present invention, the alkylbenzimidazole compound is poorly soluble in water, so the alkylbenzimidazole compound may be reacted with an organic or inorganic acid to form a water-soluble salt.
本発明方法の実施において用いられる有機あるいは無機
酸としては、蟻酸、酢酸、カプリン酸、プロピオン酸、
グリコール酸、アクリル酸、パラニトロ安息香酸、パラ
トルエンスルホン酸、ピクリン酸、サリチル酸、蓚酸、
コハク酸、マレイン酸、フマール酸、酒石酸、アジピン
酸、塩酸、硫酸、燐酸、乳酸、オレイン酸、フタル酸等
であり、水に対して0.01〜15%の範囲、好ましく
は0.2〜5%の割合で添加すればよい。Organic or inorganic acids used in carrying out the method of the invention include formic acid, acetic acid, capric acid, propionic acid,
Glycolic acid, acrylic acid, para-nitrobenzoic acid, para-toluenesulfonic acid, picric acid, salicylic acid, oxalic acid,
Succinic acid, maleic acid, fumaric acid, tartaric acid, adipic acid, hydrochloric acid, sulfuric acid, phosphoric acid, lactic acid, oleic acid, phthalic acid, etc., in the range of 0.01 to 15%, preferably 0.2 to 15%, based on water. It may be added at a rate of 5%.
また本発明方法の実施において、2位アルキルベンズイ
ミダゾール化合物に銅イオンを添加することにより、銅
表面の化成被膜の膜形成を促進することができ、その際
用いられる銅イオンを生じる物質の代表的なものとして
は、銅粉、塩化第一銅、塩化第二銅、水酸化銅、リン政
調、酢酸銅、硫酸銅、硝酸銅、臭化銅等である。Furthermore, in carrying out the method of the present invention, by adding copper ions to the 2-position alkylbenzimidazole compound, it is possible to promote the formation of a chemical conversion film on the copper surface. Examples include copper powder, cuprous chloride, cupric chloride, copper hydroxide, phosphorus, copper acetate, copper sulfate, copper nitrate, copper bromide, and the like.
この場合、アンモニアあるいはアミン類等の緩衝作用を
有する物質を添加して、溶液のpHを安定にするのが望
ましく、その際用いられるアミン類としては、メチルア
ミン、ジメチルアミン、エチルアミン、モノエタノール
アミン、ジェタノールアミン、トリエタノールアミン等
である。In this case, it is desirable to stabilize the pH of the solution by adding a buffering substance such as ammonia or amines, and the amines used in this case include methylamine, dimethylamine, ethylamine, monoethanolamine , jetanolamine, triethanolamine, etc.
本発明方法における銅張積層板の銅表面にアルキルベン
ズイミダゾール化合物の化成被膜を形成する処理の態様
について述べる。An aspect of the treatment for forming a chemical conversion film of an alkylbenzimidazole compound on the copper surface of a copper-clad laminate in the method of the present invention will be described.
銅の表面を研磨、脱脂、酸洗浄等によって仕上げ、引き
続きアルキルベンズイミダゾール化合物の塩を0.01
〜5%、好ましくは0.1〜2%含む水溶液に数秒ない
し数分の間浸漬する。この時の処理液の液温は0〜10
0°C1好ましくは30〜50°Cである。The copper surface is finished by polishing, degreasing, acid washing, etc., and then 0.01 of a salt of an alkylbenzimidazole compound is applied.
It is immersed in an aqueous solution containing ~5%, preferably 0.1-2%, for several seconds to several minutes. The temperature of the processing liquid at this time is 0 to 10
0°C, preferably 30 to 50°C.
アルキルベンズイミダゾール化合物の銅表面に対する付
着量は、液温か高いほどあるいは処理時間が長くなるほ
ど増加する。The amount of the alkylbenzimidazole compound attached to the copper surface increases as the liquid temperature increases or as the treatment time increases.
本発明方法の実施においては、通常アルキルベンズイミ
ダゾール化合物の塩を含む水溶液中に、銅張積層板を浸
漬する方法が採られるが、特にこれに限定されるもので
はなく、任意の接触方法、たとえば処理液を銅張積層板
に沿って流下させるなどの方法も可能である。In carrying out the method of the present invention, a method of immersing a copper-clad laminate in an aqueous solution containing a salt of an alkylbenzimidazole compound is usually adopted, but the method is not particularly limited to this, and any contact method can be used, such as A method such as allowing the treatment liquid to flow down along the copper-clad laminate is also possible.
また銅張積層板の銅表面と処理液を十分に接触させるた
めに、処理液中で銅張積層板を振動させたり、あるいは
処理液に攪拌を与えることが好ましく、また超音波を作
用させて処理液に振動を与えることも、銅表面に気泡が
付着するのを阻止するために有効である。In addition, in order to bring the copper surface of the copper clad laminate into sufficient contact with the treatment solution, it is preferable to vibrate the copper clad laminate in the treatment solution or to stir the treatment solution, and also to apply ultrasonic waves. Applying vibration to the treatment solution is also effective in preventing air bubbles from adhering to the copper surface.
本発明方法の実施においては、銅張積層板をアルキルベ
ンズイミダゾール化合物の塩を含む水溶液に接触させて
銅表面に化成被膜を形成し、水洗して取り出たのち前記
の無色透明の化成被膜が褐色に変わるまで強制的に加熱
乾燥させるべきであり、この場合の加熱条件は通常80
〜150℃の温度範囲で数分ないし数十分間加熱するこ
とが望ましく、80°C以下の温度では加熱に長時間を
要し、また150°Cを超える場合は、短時間で均一に
加熱する装置を必要とする。In carrying out the method of the present invention, a copper-clad laminate is brought into contact with an aqueous solution containing a salt of an alkylbenzimidazole compound to form a chemical conversion film on the copper surface, and after being washed with water and taken out, the colorless and transparent chemical conversion film is removed. It should be forcibly dried by heating until it turns brown, and the heating conditions in this case are usually 80℃.
It is desirable to heat for a few minutes to several tens of minutes in the temperature range of ~150°C. If the temperature is below 80°C, it will take a long time to heat, and if it exceeds 150°C, it will be heated uniformly in a short time. Requires equipment to do this.
本発明方法の実施において、銅張積層板表面の陰画パタ
ーンを除去するには、水酸化ナトリウム、水酸化カリウ
ム等の強塩基性物質を含む水溶液に接触する方法が簡便
であり、またアルカリ性エツチング液としては、アンモ
ニウム複塩が一般的であり、特にアンモニア−塩化アン
モニウム−銅系のものが好適である。また銅表面のアル
キルベンズイミダゾールの化成被膜は、アルカリ水溶液
に溶けないので、アルカリ性エツチング液を用いること
により、容易に不要部分の銅をエツチングすることがで
きる。In carrying out the method of the present invention, in order to remove the negative pattern on the surface of a copper-clad laminate, it is convenient to contact it with an aqueous solution containing a strong basic substance such as sodium hydroxide or potassium hydroxide, or use an alkaline etching solution. Ammonium double salts are common, and ammonia-ammonium chloride-copper salts are particularly preferred. Furthermore, since the alkylbenzimidazole chemical conversion film on the copper surface is not soluble in an alkaline aqueous solution, unnecessary portions of the copper can be easily etched by using an alkaline etching solution.
作用
銅にアルキルベンズイミダゾール化合物の塩を含む水溶
液を接触させると、アルキルベンズイミダゾール化合物
と銅との錯体形成反応及びアルキルベンズイミダゾール
間の水素結合とファンデルワールス力の両作用により膜
が成長し、最終的にはアルキルベンズイミダゾール−銅
錯体と共役したベンゼン環を含む安定した化成被膜が銅
表面上に形成される。When copper is brought into contact with an aqueous solution containing a salt of an alkylbenzimidazole compound, a film grows due to the complex formation reaction between the alkylbenzimidazole compound and copper and the effects of hydrogen bonding between the alkylbenzimidazoles and van der Waals forces. Eventually, a stable chemical conversion film containing a benzene ring conjugated with an alkylbenzimidazole-copper complex is formed on the copper surface.
従って、銅張積層板をアルキルベンズイミダゾール化合
物の塩を含む水溶液に浸漬すると、陰画パターンが形成
されていない回路部分及びスルーホール内の銅表面にア
ルキルベンズイミダゾールの化成被膜を容易に形成する
ことができる。Therefore, when a copper-clad laminate is immersed in an aqueous solution containing a salt of an alkylbenzimidazole compound, a chemical conversion film of alkylbenzimidazole can be easily formed on the copper surface in the through-hole and the circuit portion where the negative pattern is not formed. can.
さらに銅表面のアルキルベンズイミダゾールの化成被膜
は加熱乾燥させると、アルキルベンズイミダゾール・銅
錯体にある種の重合反応が起こり、エツチングの際に優
れたレジスト作用を有する硬い化成被膜を生じ、エツチ
ング工程における不良率が著しく低下される。Furthermore, when the alkylbenzimidazole chemical conversion film on the copper surface is heated and dried, a certain polymerization reaction occurs in the alkylbenzimidazole/copper complex, producing a hard chemical conversion film with excellent resisting properties during etching. The defective rate is significantly reduced.
銅表面のアルキルベンズイミダゾールの化成被膜は、緻
密で均一な被膜が形成されるので水に対する撥水性が良
好であり、被膜形成ののち部分的な溶出が発生しにくく
、均一な膜厚を持つ化成被膜が得られ、エツチング処理
をしたのち銅回路の凹みあるいは断線が起こりにくい。The chemical conversion film of alkylbenzimidazole on the copper surface forms a dense and uniform film, so it has good water repellency. After the coating is obtained and etched, the copper circuit is less likely to be dented or disconnected.
また化成被膜が加熱乾燥による変質を受けにくいので、
エツチング後の化成被膜の剥離も酸性水溶液を用いるこ
とにより容易に行える。In addition, since the chemical conversion coating is less susceptible to deterioration due to heat drying,
The chemical conversion film after etching can also be easily peeled off using an acidic aqueous solution.
陰画パターンを形成するために用いるDFRに対しては
、アルキルベンズイミダゾールは塩基性が低いので吸着
しにく(、DFRの剥離性が低下しないものと考えられ
る。Since alkylbenzimidazole has low basicity, it is difficult to adsorb to DFR used to form a negative pattern (it is thought that the releasability of DFR does not deteriorate).
実施例1〜9
1.6mm厚のガラスエポキシ両面銅張積層板〔FR−
4、商品名: R−1705(松下電工■製)]に小孔
をあけ、無電解銅メツキをし次いで電解銅メツキをして
、孔の内部及び両面に20〜30μの銅メツキを形成し
た。Examples 1 to 9 1.6 mm thick glass epoxy double-sided copper clad laminate [FR-
4. A small hole was made in the product name: R-1705 (Made by Matsushita Electric Works ■), and electroless copper plating was then applied to electrolytic copper plating to form a 20-30 μm copper plating inside the hole and on both sides. .
次にアルカリ可溶のレジストインク〔商品名二KM−1
0(太陽インキ製造■製)〕を用いスクリーン印刷によ
り、厚さ20μ程度の陰画パターン塗膜を形成し、80
℃の温度で10分間乾燥した。Next, alkali-soluble resist ink [product name 2KM-1]
0 (manufactured by Taiyo Ink Manufacturing Co., Ltd.)] by screen printing to form a negative pattern coating film with a thickness of about 20 μm.
It was dried for 10 minutes at a temperature of .degree.
さらに前記基板を5%塩酸水溶液に浸漬後水洗し、銅表
面を清浄した後、表1に示すとおりの組成からなる処理
液を同表に示す処理条件で処理したところ、銅張積層板
の同表面上に付着したアルキルベンズイミダゾールの化
成被膜の厚みは表1に示すとおりであった。Furthermore, the substrate was immersed in a 5% hydrochloric acid aqueous solution and washed with water to clean the copper surface. After that, the copper clad laminate was treated with a treatment solution having the composition shown in Table 1 under the treatment conditions shown in the table. The thickness of the alkylbenzimidazole chemical conversion coating deposited on the surface was as shown in Table 1.
前記基板と同様の処理を行って得られた銅張積層板のレ
ジストインクを3%水酸化ナトリウム水溶液を用いて除
去し、120’Cの温度で10分間加熱乾燥させた。次
いでアルカリ性エツチング剤〔アンモニア−塩化アンモ
ニウム−銅L 比重1.1〜1.2、商品名:A−プロ
セス(メルテックス製)〕を用い、50°Cの温度で前
記化成被膜を形成した基板に夫々スプレーしてエツチン
グを行い、その後3.5%塩酸水溶液に浸漬して回路上
のエツチングレジスト膜を溶解除去し、銅スルーホール
プリント配線板を製造した。The resist ink on the copper-clad laminate obtained by performing the same treatment as the substrate was removed using a 3% aqueous sodium hydroxide solution, and the resulting board was dried by heating at a temperature of 120'C for 10 minutes. Next, using an alkaline etching agent [ammonia-ammonium chloride-copper L, specific gravity 1.1-1.2, trade name: A-Process (manufactured by Meltex]], the substrate on which the chemical conversion film was formed was etched at a temperature of 50°C. Each was sprayed for etching, and then immersed in a 3.5% aqueous hydrochloric acid solution to dissolve and remove the etching resist film on the circuit, producing a copper through-hole printed wiring board.
いずれの基板も銅回路の断線及び凹み等の発生がないも
のであった。None of the substrates had any disconnections or dents in the copper circuits.
なお、アルキルベンズイミダゾールの化成被膜の厚みは
、所定の大きさの試験片を0.5%塩酸水溶液に浸漬し
、溶解したイミダゾール類の濃度を紫外線分光光度計を
用いて測定し、化成被膜の厚みに換算したものである。The thickness of the alkylbenzimidazole chemical conversion coating is determined by immersing a test piece of a predetermined size in a 0.5% hydrochloric acid aqueous solution and measuring the concentration of dissolved imidazoles using an ultraviolet spectrophotometer. This is converted into thickness.
実施例10〜14及び比較例
実施例1で用いたのと同様の電解銅メツキを施した銅張
積層板に、水溶性のDFR(商品名:5ES−105、
(三菱レイヨン■製)〕を用いて、高密度の陰画パター
ンを形成した。Examples 10 to 14 and Comparative Examples Water-soluble DFR (trade name: 5ES-105,
(manufactured by Mitsubishi Rayon ■)] to form a high-density negative pattern.
さらに前記基板を5%塩酸水溶液に浸漬後水洗し、銅表
面を清浄した後、表2に示すとおりの組成からなる処理
液を同表に示す処理条件で処理したところ、銅表面の水
洗後の撥水性(目視)、DFRへのイミダゾール類の吸
着炭(銅面上のイミダゾール量を100とした場合のD
FR上のイミダゾール量)、DFRの剥離時間(120
”Cの温度で10分間加熱乾燥後、3%Naoh水溶液
を液温50℃でスプレーし、完全に剥離するまでに要す
る時間)及び化成被膜の剥離時間(120°Cの温度で
10分間加熱乾燥後、3.5%HCI水溶液を液温50
℃でスプレーし、0.3 amφの小径孔内の化成被膜
が完全に剥離するまでに要する時間)は表2に示すとお
りの結果であった。Further, the substrate was immersed in a 5% hydrochloric acid aqueous solution and washed with water to clean the copper surface. After the copper surface was treated with a treatment solution having the composition shown in Table 2 under the treatment conditions shown in the same table, the results were as follows: Water repellency (visual), imidazole adsorption carbon on DFR (D when the amount of imidazole on the copper surface is taken as 100)
amount of imidazole on FR), peeling time of DFR (120
``After heating and drying at a temperature of 120°C for 10 minutes, spray a 3% NaOH aqueous solution at a liquid temperature of 50°C.The time required to completely peel off the chemical conversion film. After that, add a 3.5% HCI aqueous solution to a liquid temperature of 50°C.
The results are shown in Table 2 (the time required for the chemical conversion coating in the small diameter hole of 0.3 amφ to be completely peeled off by spraying at 0.3° C.).
前記基板と同様の処理を行って得られた銅張積層板を夫
々120°Cの温度で約10分間加熱乾燥し、次いで実
施例1で用いたのと同様のアルカリ性エツチング剤を用
いてエツチング処理を行い、その後3.5%塩酸水溶液
に浸漬して回路上のエツチングレジスト膜を溶解除去し
、高密度の銅スルーホールプリント配線板を製造した。Copper-clad laminates obtained by the same treatment as the substrate were each heated and dried at a temperature of 120°C for about 10 minutes, and then etched using the same alkaline etching agent as used in Example 1. Thereafter, the etching resist film on the circuit was dissolved and removed by immersion in a 3.5% aqueous hydrochloric acid solution to produce a high-density copper through-hole printed wiring board.
アルキルベンズイミダゾールを用いた基板はいずれも断
線及び銅回路の凹み等の発生がなかったが、比較例のア
ルキルイミダゾールを用いた基板は、一部銅回路に凹み
が発生した。None of the substrates using alkylbenzimidazole had wire breakage or dents in the copper circuits, but the substrates using alkylimidazole in the comparative example had some dents in the copper circuits.
発明の効果
本発明方法によれば、安価なコストで、且つ不良率の発
注が極めて低く信顧性に冨む高密度の銅スルーホールプ
リント配線板を製造することが可能であり、実践面にお
ける効果は顕著である。Effects of the Invention According to the method of the present invention, it is possible to manufacture high-density copper through-hole printed wiring boards that are inexpensive, have an extremely low defective rate, and are highly reliable. The effect is remarkable.
手続補正書
平成2年7月19日
平成2年特許願第162433号
2、 発明の名称
銅スルーホールプリント配線板の製造方法3、補正をす
る者
事件との関係:特許出願人
4、拒絶理由通知の日付
自 発
5、補正の対象
明細書の発明の詳細な説明の欄
6、補正の内容
(1)明細書17頁下から8行目のr Naoh 」を
[水酸化Procedural amendment July 19, 1990 1990 Patent Application No. 162433 2, Name of invention Method for manufacturing copper through-hole printed wiring board 3, Person making the amendment Relationship to the case: Patent applicant 4, Reasons for refusal Date of notification Issue 5, Detailed explanation of the invention column 6 of the specification to be amended, Contents of the amendment (1) ``r Naoh'' in line 8 from the bottom of page 17 of the specification.
Claims (1)
層板の表面に必要な陰画パターンを形成し、ついで前記
銅張積層板を下記の一般式で示される2位アルキルベン
ズイミダゾール化合物の塩 一般式 ▲数式、化学式、表等があります▼ (但し、式中Rは炭素数3以上のアルキル基、HAは有
機または無機の酸を表わす。) を含む水溶液に接触させて、銅張積層板の銅表面に前記
2位アルキルベンズイミダゾール化合物からなるエッチ
ングレジスト膜を形成し、前記銅張積層板を加熱乾燥し
、銅張積層板表面の陰画パターン膜を除去したのち、ア
ルカリ性エツチング液に接触させ、次いでエッチングレ
ジスト膜を剥離することを特徴とする銅スルーホールプ
リント配線板の製造方法。(1) A necessary negative pattern is formed on the surface of the copper-clad laminate using a resist soluble in an alkaline aqueous solution, and then the copper-clad laminate is coated with a salt of a 2-position alkylbenzimidazole compound represented by the following general formula. General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (However, in the formula, R represents an alkyl group with 3 or more carbon atoms, and HA represents an organic or inorganic acid.) An etching resist film made of the 2-position alkylbenzimidazole compound is formed on the copper surface of the copper clad laminate, the copper clad laminate is heated and dried to remove the negative pattern film on the surface of the copper clad laminate, and then brought into contact with an alkaline etching solution. 1. A method for manufacturing a copper through-hole printed wiring board, the method comprising: then peeling off an etching resist film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16243390A JPH0451592A (en) | 1990-06-19 | 1990-06-19 | Manufacture of copper through-hole printed wiring board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16243390A JPH0451592A (en) | 1990-06-19 | 1990-06-19 | Manufacture of copper through-hole printed wiring board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0451592A true JPH0451592A (en) | 1992-02-20 |
Family
ID=15754522
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16243390A Pending JPH0451592A (en) | 1990-06-19 | 1990-06-19 | Manufacture of copper through-hole printed wiring board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0451592A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5275694A (en) * | 1992-03-24 | 1994-01-04 | Sanwa Laboratory Ltd. | Process for production of copper through-hole printed wiring boards |
JP2010287834A (en) * | 2009-06-15 | 2010-12-24 | Sumitomo Electric Ind Ltd | Electrode connection method, electrode connection structure, conductive adhesive used for them, and electronic device |
US8470438B2 (en) | 2009-06-15 | 2013-06-25 | Sumitomo Electric Industries, Ltd. | Electrode-connecting structure, conductive adhesive used for the same, and electronic apparatus |
-
1990
- 1990-06-19 JP JP16243390A patent/JPH0451592A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5275694A (en) * | 1992-03-24 | 1994-01-04 | Sanwa Laboratory Ltd. | Process for production of copper through-hole printed wiring boards |
JP2010287834A (en) * | 2009-06-15 | 2010-12-24 | Sumitomo Electric Ind Ltd | Electrode connection method, electrode connection structure, conductive adhesive used for them, and electronic device |
US8470438B2 (en) | 2009-06-15 | 2013-06-25 | Sumitomo Electric Industries, Ltd. | Electrode-connecting structure, conductive adhesive used for the same, and electronic apparatus |
US9226406B2 (en) | 2009-06-15 | 2015-12-29 | Sumitomo Electric Industries, Ltd. | Electrode connection method, electrode connection structure, conductive adhesive used therefor, and electronic device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2740768B2 (en) | Copper coating | |
JP3314966B2 (en) | Complexing agent for displacement tin plating | |
US5788830A (en) | Electroplating process | |
JP5472950B2 (en) | Masking agent and method for producing surface-treated substrate | |
KR900001089B1 (en) | Process for producing coppor through - hole printed circuit board | |
EP0066330B1 (en) | Method of producing printed circuit boards | |
JP5599506B2 (en) | Compositions and methods for microetching of copper and copper alloys | |
JP2002503040A (en) | Solutions and methods for pretreating copper surfaces | |
JP2000297387A (en) | Surface treating agent for copper and copper alloy | |
EP0364132A1 (en) | Method for forming conversion coating on surface of copper or copper alloy | |
JPH0451592A (en) | Manufacture of copper through-hole printed wiring board | |
JPH04162693A (en) | Manufacture of copper plated through hole printed wiring board | |
JPS63168077A (en) | Manufacture of printed wiring board | |
JPS61502262A (en) | Solution and method for conditioning the surface of plastic substrates before metal plating | |
JPH04159794A (en) | Manufacture of copper through hole printed wiring board | |
US11499233B2 (en) | Plated laminate and printed circuit board | |
JPH0569914B2 (en) | ||
JPS63129692A (en) | Manufacture of printed wiring board | |
JP3465594B2 (en) | Plating method inside micro holes | |
JPH04231473A (en) | Preliminary treatment composition and method for tin-lead immersion plating | |
JPH03235395A (en) | Manufacture of copper through hole printed wiring board | |
JP3342852B2 (en) | Pretreatment method for catalyzing treatment and throwing improver used therefor | |
JPS62149884A (en) | Pretreatment for electroless copper plating | |
JPS6312191A (en) | Manufacture of copper through-hole printed wiring board | |
JPH0222477A (en) | Pretreatment for electroless plating |