JPS6311941B2 - - Google Patents
Info
- Publication number
- JPS6311941B2 JPS6311941B2 JP17449780A JP17449780A JPS6311941B2 JP S6311941 B2 JPS6311941 B2 JP S6311941B2 JP 17449780 A JP17449780 A JP 17449780A JP 17449780 A JP17449780 A JP 17449780A JP S6311941 B2 JPS6311941 B2 JP S6311941B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- thin film
- magnetic
- overplate
- paint
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 24
- 239000010409 thin film Substances 0.000 claims description 13
- 239000003973 paint Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は薄膜形成技術に係り、特に基板上に均
一で塗布むらのない磁性薄膜を形成する方法に関
するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film forming technique, and more particularly to a method for forming a uniform magnetic thin film on a substrate without coating unevenness.
従来の磁性薄膜形成方法を第１図を参照して説
明する。チヤンバー５内にスピンドル４が設けら
れ、このスピンドル４に基板３が装着される。チ
ヤンバー５は透明なプラスチツク等で出来た蓋１
で密閉されている。スピンドル４により基板３は
低速回転（50〜250rpm）され、基板上に磁性塗
料が塗布される。磁性塗料が塗布された後、基板
３は高速回転（1000rpm）され、磁性塗料を振り
切り磁性薄膜が形成される。この方法によると、
基板の内周側で磁性膜が薄く、外周側で厚く形成
されてしまい、このような磁性膜は電気特性上不
利である。 A conventional method for forming a magnetic thin film will be explained with reference to FIG. A spindle 4 is provided within the chamber 5, and the substrate 3 is mounted on the spindle 4. Chamber 5 is a lid 1 made of transparent plastic, etc.
is sealed. The substrate 3 is rotated at low speed (50 to 250 rpm) by the spindle 4, and magnetic paint is applied onto the substrate. After the magnetic paint is applied, the substrate 3 is rotated at high speed (1000 rpm) to shake off the magnetic paint and form a magnetic thin film. According to this method,
The magnetic film is formed to be thin on the inner circumferential side of the substrate and thick on the outer circumferential side, and such a magnetic film is disadvantageous in terms of electrical characteristics.
この不都合を防ぐために、第１図に示される如
くオーバプレート２を蓋１に固定金具６を介して
設ける方法が知られているが、オーバプレート２
を用いても基板３の内外周での磁性膜の膜厚の差
は完全には防止できない。また、オーバプレート
２の内側の境で空気の流れに乱れを生じて塗膜に
むらが生じてしまう欠点を有する。 In order to prevent this inconvenience, a method is known in which the overplate 2 is attached to the lid 1 via a fixing fitting 6 as shown in FIG.
Even if this method is used, the difference in the thickness of the magnetic film between the inner and outer peripheries of the substrate 3 cannot be completely prevented. Furthermore, it has the disadvantage that air flow is disturbed at the inner border of the overplate 2, resulting in uneven coating.
本発明の目的は、形成される磁性膜の膜厚が、
基板上の内外周で均一でかつ塗布むらのない磁性
薄膜を形成する方法を提供することである。 An object of the present invention is to ensure that the thickness of the magnetic film to be formed is
It is an object of the present invention to provide a method for forming a magnetic thin film that is uniform on the inner and outer peripheries of a substrate and has no coating unevenness.
本発明の特徴とするところは、基板上の薄膜の
形成が、磁性塗料中の有機溶剤の蒸発速度に関係
し、蒸発速度の速い外周側で厚く、蒸発速度の遅
い内周側で薄くなることに着目し、基板の外周側
から内周側にかけて、基板からの距離が大きくな
るようなオーバプレートを設けるところにあり、
このようなオーバプレートを用いることにより基
板の外周側では磁性塗料中の有機溶剤の蒸発速度
が遅く、内周側では有機溶剤の蒸発速度が速くな
るように制御できるものである。 A feature of the present invention is that the formation of a thin film on the substrate is related to the evaporation rate of the organic solvent in the magnetic paint, and is thicker on the outer circumference side where the evaporation rate is faster and thinner on the inner circumference side where the evaporation rate is slower. Focusing on this, an overplate is provided so that the distance from the board increases from the outer circumference side to the inner circumference side of the board.
By using such an overplate, it is possible to control the evaporation rate of the organic solvent in the magnetic paint to be slow on the outer circumferential side of the substrate, and to increase the evaporation rate on the inner circumferential side.
以下第２図を参照して本発明の一実施例を詳細
に説明する。 An embodiment of the present invention will be described in detail below with reference to FIG.
第２図において第１図との違いは、オーバプレ
ート２′の形状である。オーバプレート２′は基板
３の表面に対して、基板３の外周部では近接し、
内周部に進むにつれて基板表面からの距離が大き
くなるような形状を有している。 The difference between FIG. 2 and FIG. 1 is the shape of the overplate 2'. The overplate 2' is close to the surface of the substrate 3 at the outer periphery of the substrate 3,
It has a shape in which the distance from the substrate surface increases toward the inner periphery.
スピンドル４に基板３を装着し、基板３を低速
回転（50〜250rpm）させながら磁性塗料を塗布
し、この後高速回転（1000rpm程度）させるので
あるが、このとき、基板３の外周部の空間はオー
バプレート２′が接近しているため、オーバプレ
ートがないときに比べて磁性塗料中の有機溶剤の
蒸発による蒸気圧の飽和を生じ易く、有機溶剤の
蒸発が抑えられ、塗料粘度の増大が緩慢になる。
その結果、磁性塗料が遠心力によつて振り切られ
る量が増大し、膜厚は薄くなる傾向を示す。 The substrate 3 is mounted on the spindle 4, and magnetic paint is applied while rotating the substrate 3 at low speed (50 to 250 rpm), and then at high speed (about 1000 rpm). At this time, the space around the outer periphery of the substrate 3 is Since the overplate 2' is close to each other, the vapor pressure is more likely to be saturated due to the evaporation of the organic solvent in the magnetic paint than when there is no overplate, and the evaporation of the organic solvent is suppressed and the increase in paint viscosity is suppressed. Becomes slow.
As a result, the amount of magnetic paint that is shaken off by centrifugal force increases, and the film thickness tends to become thinner.
これに対して基板３の内周部は、オーバプレー
ト２′が離れているため、空間の飽和に時間を要
し、有機溶剤の蒸発が促進され、塗料粘度の増大
をもたらす。そのため振り切りの遠心力に勝つて
膜厚は厚くなる傾向を示す。 On the other hand, since the overplate 2' is far away from the inner circumference of the substrate 3, it takes time to saturate the space, promoting evaporation of the organic solvent and increasing the viscosity of the paint. Therefore, the film thickness tends to increase as it overcomes the centrifugal force of shaking off.
このように本発明によれば、基板の内周側と外
周側で形成される薄膜の膜厚差を縮小できる。さ
らに本発明のオーバプレートを用いることにより
空気の流れが滑らかとなり、塗膜むらのない均一
な薄膜が形成できる。 As described above, according to the present invention, it is possible to reduce the difference in film thickness between the thin films formed on the inner circumferential side and the outer circumferential side of the substrate. Furthermore, by using the overplate of the present invention, air flow becomes smooth, and a uniform thin film without coating unevenness can be formed.
第１図は従来の薄膜形成装置を示す図で平面図
と縦断面図を示す。第２図は本発明の一実施例に
よる薄膜形成装置の平面図と縦断面図である。
１……蓋、２′……オーバプレート、３……基
板、４……スピンドル、５……チヤンバー、６…
…固定金具。
FIG. 1 is a diagram showing a conventional thin film forming apparatus, showing a plan view and a longitudinal sectional view. FIG. 2 is a plan view and a longitudinal sectional view of a thin film forming apparatus according to an embodiment of the present invention. 1...Lid, 2'...Overplate, 3...Substrate, 4...Spindle, 5...Chamber, 6...
…securing bracket.
Claims (1)
し、次に基板を高速回転させて磁性塗料を振り切
り基板上に磁性薄膜を形成する方法において、基
板の表面に対向して設けられ、基板の外周部にお
いて近接し、内周部に進むにつれて基板表面から
の距離が大きくなるオーバプレートを設けること
により磁性薄膜の膜厚を均一に制御することを特
徴とする磁性薄膜形成方法。1 In a method of applying magnetic paint while rotating the substrate at low speed and then rotating the substrate at high speed to shake off the magnetic paint and form a magnetic thin film on the substrate, A method for forming a magnetic thin film, characterized in that the thickness of the magnetic thin film is controlled uniformly by providing an overplate which is close to the substrate surface and whose distance from the substrate surface increases toward the inner periphery.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17449780A JPS5799372A (en) | 1980-12-12 | 1980-12-12 | Formation of thin magnetic film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17449780A JPS5799372A (en) | 1980-12-12 | 1980-12-12 | Formation of thin magnetic film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5799372A JPS5799372A (en) | 1982-06-21 |
| JPS6311941B2 true JPS6311941B2 (en) | 1988-03-16 |
Family
ID=15979518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17449780A Granted JPS5799372A (en) | 1980-12-12 | 1980-12-12 | Formation of thin magnetic film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5799372A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005161245A (en) * | 2003-12-04 | 2005-06-23 | Hitachi Ltd | Film forming method, film forming apparatus, and element |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61291072A (en) * | 1985-06-20 | 1986-12-20 | Matsushita Electric Ind Co Ltd | Spin coating method |
-
1980
- 1980-12-12 JP JP17449780A patent/JPS5799372A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005161245A (en) * | 2003-12-04 | 2005-06-23 | Hitachi Ltd | Film forming method, film forming apparatus, and element |
| JP4495955B2 (en) * | 2003-12-04 | 2010-07-07 | 株式会社 日立ディスプレイズ | Film forming method, film forming apparatus and element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5799372A (en) | 1982-06-21 |
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