JPS63112331U - - Google Patents
Info
- Publication number
- JPS63112331U JPS63112331U JP370287U JP370287U JPS63112331U JP S63112331 U JPS63112331 U JP S63112331U JP 370287 U JP370287 U JP 370287U JP 370287 U JP370287 U JP 370287U JP S63112331 U JPS63112331 U JP S63112331U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle
- susceptor
- base plate
- varying
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims description 2
- 239000012495 reaction gas Substances 0.000 claims description 2
- 238000001947 vapour-phase growth Methods 0.000 claims description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Description
第１図Ａは本考案の一実施例の一部を示す断面
図、第１図Ｂは本考案の他の実施例の一部を示す
断面図、第２図は従来例の断面図、第３図は一般
の気相成長装置を示す断面図である。
１…ベースプレート、２…石英ベルジヤー、３
…ステンレス製ベルジヤー、４…Ｏ―リング、５
…ウエハー、６…サセプター、７…高周波誘導加
熱コイル、８…コイルカバー、９…モーター、１
０…反応ガス、１１…ノズル、１２…排気口、１
３…コイル内ガスパージ、１４…ベルジヤー止め
具、１５…回転プーリー、１６…サセプター保持
台、１７…スペーサーリング、１８…シヤフトシ
ール受け、１９…ノズル高さ調整用スペーサ、２
０…ノズル高さ調整固定ネジ、２１…補強板、２
２…ノズルサセプター高さ調整用リングネジ、２
３…ノズルサセプター上下機構、２４…廻り止め
、２５…ベアリング、２６…回転部本体、２７…
ノズルホルダー。
FIG. 1A is a sectional view showing a part of an embodiment of the present invention, FIG. 1B is a sectional view showing a part of another embodiment of the invention, FIG. 2 is a sectional view of a conventional example, and FIG. FIG. 3 is a sectional view showing a general vapor phase growth apparatus. 1... Base plate, 2... Quartz bell gear, 3
...Stainless steel bell gear, 4...O-ring, 5
...Wafer, 6...Susceptor, 7...High frequency induction heating coil, 8...Coil cover, 9...Motor, 1
0... Reaction gas, 11... Nozzle, 12... Exhaust port, 1
3... Gas purge in coil, 14... Belgear stopper, 15... Rotating pulley, 16... Susceptor holding stand, 17... Spacer ring, 18... Shaft seal receiver, 19... Spacer for nozzle height adjustment, 2
0... Nozzle height adjustment fixing screw, 21... Reinforcement plate, 2
2... Ring screw for nozzle susceptor height adjustment, 2
3... Nozzle susceptor vertical mechanism, 24... Rotation stopper, 25... Bearing, 26... Rotating part main body, 27...
nozzle holder.
Claims (1)
ガスを導入するノズルと、前記気密空間内に設け
られ、ウエハーを載置する円板型のサセプターと
、高周波誘導により加熱された前記ウエハーを加
熱する加熱手段と、前記サセプターを回転する手
段と、前記ノズルの前記ベースプレートからの距
離を可変する手段とを具備する気相成長装置にお
いて、前記ノズルおよびサセプターを同時に同一
方向に移動して前記加熱手段からの距離を可変す
る手段を具備することを特徴とする気相成長装置
。 A nozzle that introduces a reaction gas into an airtight space formed on a base plate, a disk-shaped susceptor provided in the airtight space on which a wafer is placed, and a heating means that heats the wafer heated by high-frequency induction. and a means for rotating the susceptor, and a means for varying the distance of the nozzle from the base plate, wherein the nozzle and the susceptor are simultaneously moved in the same direction to change the distance from the heating means. A vapor phase growth apparatus characterized by comprising means for varying the.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP370287U JPS63112331U (en) | 1987-01-13 | 1987-01-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP370287U JPS63112331U (en) | 1987-01-13 | 1987-01-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63112331U true JPS63112331U (en) | 1988-07-19 |
Family
ID=30783702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP370287U Pending JPS63112331U (en) | 1987-01-13 | 1987-01-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63112331U (en) |
-
1987
- 1987-01-13 JP JP370287U patent/JPS63112331U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1281539A (en) | Semiconductor processing reactors | |
| JPS63112331U (en) | ||
| JPS58169906A (en) | Vapor growth device | |
| JPS6445767U (en) | ||
| JPH0321844U (en) | ||
| JPS5518054A (en) | Fabricating method of semiconductor device | |
| JPS63124731U (en) | ||
| JPH0350325U (en) | ||
| JPH037752B2 (en) | ||
| JPS6311575U (en) | ||
| JPH0455132U (en) | ||
| JPS61251125A (en) | Heating process device | |
| JPH01136180U (en) | ||
| JPH0627947Y2 (en) | Thermocouple support device in thin film vapor phase epitaxy system | |
| JPH02132935U (en) | ||
| JPS63102769U (en) | ||
| JPS6221528U (en) | ||
| JPS6092820U (en) | Semiconductor vapor phase growth equipment | |
| JPS61164279U (en) | ||
| JPS6346836U (en) | ||
| JPS62180933U (en) | ||
| GB991681A (en) | Formulation of pyrolytic graphite articles | |
| JPH0320434U (en) | ||
| JP2730155B2 (en) | Vapor phase growth equipment | |
| JPH0158930U (en) |