JPS6310900B2 - - Google Patents

Info

Publication number
JPS6310900B2
JPS6310900B2 JP55044604A JP4460480A JPS6310900B2 JP S6310900 B2 JPS6310900 B2 JP S6310900B2 JP 55044604 A JP55044604 A JP 55044604A JP 4460480 A JP4460480 A JP 4460480A JP S6310900 B2 JPS6310900 B2 JP S6310900B2
Authority
JP
Japan
Prior art keywords
region
type
channel stopper
electric field
impurity concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55044604A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56142649A (en
Inventor
Toshikatsu Shirasawa
Kyoshi Tsukuda
Yoshitaka Sugawara
Yoshikazu Hosokawa
Tatsuya Kamei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP4460480A priority Critical patent/JPS56142649A/ja
Publication of JPS56142649A publication Critical patent/JPS56142649A/ja
Publication of JPS6310900B2 publication Critical patent/JPS6310900B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Element Separation (AREA)
JP4460480A 1980-04-07 1980-04-07 Semiconductor device Granted JPS56142649A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4460480A JPS56142649A (en) 1980-04-07 1980-04-07 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4460480A JPS56142649A (en) 1980-04-07 1980-04-07 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS56142649A JPS56142649A (en) 1981-11-07
JPS6310900B2 true JPS6310900B2 (enrdf_load_stackoverflow) 1988-03-10

Family

ID=12696045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4460480A Granted JPS56142649A (en) 1980-04-07 1980-04-07 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS56142649A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06151573A (ja) * 1992-11-06 1994-05-31 Hitachi Ltd 半導体集積回路装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947471B2 (ja) * 1974-12-03 1984-11-19 日本電気株式会社 絶縁ゲ−ト型電界効果半導体装置の製造方法

Also Published As

Publication number Publication date
JPS56142649A (en) 1981-11-07

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