JPS63104441A - Storage system for semiconductor device - Google Patents
Storage system for semiconductor deviceInfo
- Publication number
- JPS63104441A JPS63104441A JP61252363A JP25236386A JPS63104441A JP S63104441 A JPS63104441 A JP S63104441A JP 61252363 A JP61252363 A JP 61252363A JP 25236386 A JP25236386 A JP 25236386A JP S63104441 A JPS63104441 A JP S63104441A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- vacuum chamber
- door
- semiconductor device
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 24
- 238000011109 contamination Methods 0.000 abstract description 2
- 239000000428 dust Substances 0.000 description 5
- 239000000969 carrier Substances 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Warehouses Or Storage Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体装置の保管に関し％特に半導体装置の
製造時において、各工程間で半導体装置全保管保管する
場合に使用する保管装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to the storage of semiconductor devices, and particularly relates to a storage device used for storing all semiconductor devices between each process during the manufacturing of semiconductor devices.
従来、この種の半導体装置の保管装置には、例えば第２
図に示す様なものがある。第２図に基づき簡単に説明全
行うと一時保管さｎる半導体装置１０１μキヤリア１０
２の中に納めらｎ１浮遊塵の付着防止の為、ストッカー
１０３の中に収納さｎる。Conventionally, this type of storage device for semiconductor devices includes, for example, a second storage device.
There are some as shown in the figure. Semiconductor device 101μ carrier 10 will be temporarily stored after a brief explanation based on Figure 2.
In order to prevent the adhesion of floating dust, it is stored in the stocker 103.
ストッカー１０３には、外部からの浮遊塵の進入防止の
為、シロッコファン１０５からフィルター１０４全通し
て強制的に空気又は、窒素ガス等が送風さｎる。In order to prevent floating dust from entering from outside, air or nitrogen gas is forced into the stocker 103 through the entire filter 104 from a sirocco fan 105.
しかしながら上述した従来の半導体装置の保管装置では
、ストッカー内で空気又は窒素ガスが乱流となる為に外
気の゛まき込み會生じ進入する浮遊塵全完全に防止小米
ないという欠点がある。また。However, the above-mentioned conventional semiconductor device storage apparatus has the disadvantage that the turbulent flow of air or nitrogen gas within the stocker causes outside air to be drawn in, and it is not possible to completely prevent all floating dust from entering. Also.
ストッカーに送風する空気または窒素ガスからの半導体
装置への汚染という欠点もある。Another drawback is that semiconductor devices are contaminated by air or nitrogen gas blown into the stocker.
本発明の半導体装置の保管装置は浮遊塵の付着全完全に
防止する為に半導体装置全保管するストッカ一部上完全
に真空状態に維持する機能を有すると共に、保管部の真
空状態全安定に保つ様に予備真空室會有し半導体装置の
出し入ｔＬｋ二段階に行なっている。The semiconductor device storage device of the present invention has a function of maintaining a part of the stocker where all the semiconductor devices are stored in a completely vacuum state in order to completely prevent the adhesion of floating dust, and also maintains a completely stable vacuum state in the storage section. Similarly, we have a preliminary vacuum chamber and carry out loading and unloading of semiconductor devices in two stages, tLk.
次に本発明について図面全参照して説明する。 Next, the present invention will be explained with reference to all the drawings.
第１図は本発明の一実施例の装置図である。第１図の様
に保管装置は予備真空室３とデ納めたキャリア２紮収納
する為の半導体装置１、ストッカー４？中に有する真空
室５から構成さ扛ており、真空室５はクライオポンプ７
にニジ常に真空に維持さｎ７、予備真空室３はクライオ
ポンプ８にニジ会費に応じて真空にさｎる。次にその作
用について説明ツーる。第１図（ａ）の様に半導体装置
１會納めたキャリア２會搬送系６の上に載せる。予備真
空室３葡パージし扉９を開は第１図（ｂ）の様にキャリ
ア２’ｙ搬送し扉９奮閉じる。クライオポンプ８に工り
予備真空室３ケ真空状態にした後、ｓ１ｏ全開き第１図
（ｃ）の様にキャリア２全搬送する。扉１０會閉じた後
、搬送系６にニジ第１図（ｄ）の様にキャリア２？スト
ツカー４に収納し保管する。キャリア２會搬出する場合
は、搬送系６にニジ第１図（ｅ）の様にキャリア２會ス
トツカー４↓り搬出する。FIG. 1 is a diagram of an apparatus according to an embodiment of the present invention. As shown in Fig. 1, the storage device consists of a preliminary vacuum chamber 3, a carrier 2, a semiconductor device 1 for storage, and a stocker 4. It consists of a vacuum chamber 5 having a cryopump 7 inside it.
The preliminary vacuum chamber 3 is kept in a vacuum at all times, and the cryopump 8 is evacuated according to the fee. Next, I will explain its effect. As shown in FIG. 1(a), two carriers containing one semiconductor device are placed on the transport system 6. The preliminary vacuum chamber 3 is purged, the door 9 is opened, the carrier 2'y is transported as shown in FIG. 1(b), and the door 9 is closed. After making the cryopump 8 into a vacuum state in the three preliminary vacuum chambers, s1o is fully opened and the entire carrier 2 is transported as shown in FIG. 1(c). After the door 10 is closed, the carrier 2 is placed in the transport system 6 as shown in Figure 1(d). Store it in stocker 4. When carrying out two carriers, the two carriers are transferred to the transport system 6 by the stocker 4↓ as shown in FIG. 1(e).
扉」０勿開き第１図（ｂ）の徐にキャリア２會搬送する
。扉１０？閉じた後、予備真空室３ｔパージし、扉９全
開いて第１図（ａ）の様にキャリア２′ｆｃ搬出する。The door "0" will not open and the two carriers are gradually transported as shown in FIG. 1(b). Door 10? After closing, the preliminary vacuum chamber 3t is purged, the door 9 is fully opened, and the carrier 2'fc is carried out as shown in FIG. 1(a).
Ｊ＄９’！ｒ：閉じてクライオポンプ８に↓す予備真空
室３を真空に維持する０
〔発明の効果〕
以上説明した様に本発明は、半導体装置の保管ケ真空中
で行うことにより、浮遊塵の半導体装置への付着會防止
すると共にその他の汚染源から半導体装置ケ保護する効
果がある。J$9'! r: Close the preliminary vacuum chamber 3 to be transferred to the cryopump 8 and maintain it in a vacuum 0 [Effects of the Invention] As explained above, the present invention allows storage of semiconductor devices to be carried out in a vacuum, thereby removing floating dust from semiconductors. This has the effect of preventing adhesion to the device and protecting the semiconductor device from other sources of contamination.
第１図は本発明の一実施例金示す装置図である。
第２図は従来の方法による例の装置図である。
１・−・・・・半導体装置、２・・・・・・キャリア、
３−・・・・・予備真空室、４・・・・・・ストッカー
、５・−・・・・真空室、６・・・・・・搬送系、７
、８・・・・・・クライオポンプ、９，１０・・・・・
・扉、１０１・・・・・・半導体装置、１０２・・・・
・・キャリア、１０３・・・・・・ストッカー、１０４
・・・・・・フィルター、１０５・・・・・・シロッコ
ファン。
寸 喝
ｏ 。
手続補正書（自発）FIG. 1 is a diagram of an apparatus showing one embodiment of the present invention. FIG. 2 is a diagram illustrating an example of a conventional method. 1... Semiconductor device, 2... Carrier,
3-...Preliminary vacuum chamber, 4...Stocker, 5--Vacuum chamber, 6...Transfer system, 7
, 8... Cryopump, 9, 10...
・Door, 101...Semiconductor device, 102...
...Carrier, 103...Stocker, 104
...Filter, 105...Sirocco fan. Excuse me. Procedural amendment (voluntary)
Claims (1)
真空中にて行う半導体装置の保管装置。A semiconductor device storage device that has a preliminary vacuum chamber and a vacuum storage chamber and stores semiconductor devices in a vacuum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61252363A JPS63104441A (en) | 1986-10-22 | 1986-10-22 | Storage system for semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61252363A JPS63104441A (en) | 1986-10-22 | 1986-10-22 | Storage system for semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63104441A true JPS63104441A (en) | 1988-05-09 |
| JPH0563016B2 JPH0563016B2 (en) | 1993-09-09 |
Family
ID=17236250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61252363A Granted JPS63104441A (en) | 1986-10-22 | 1986-10-22 | Storage system for semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63104441A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011228391A (en) * | 2010-04-16 | 2011-11-10 | Dan-Takuma Technologies Inc | Storage system and storing method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57156903A (en) * | 1981-03-23 | 1982-09-28 | Hitachi Ltd | Automatic stockpiler for products |
| JPS6228359A (en) * | 1985-07-17 | 1987-02-06 | 株式会社 和広武 | Vacuum container |
| JPS62169347A (en) * | 1985-10-24 | 1987-07-25 | テキサス インスツルメンツ インコ−ポレイテツド | Integrated circuit wafer carrier |
-
1986
- 1986-10-22 JP JP61252363A patent/JPS63104441A/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57156903A (en) * | 1981-03-23 | 1982-09-28 | Hitachi Ltd | Automatic stockpiler for products |
| JPS6228359A (en) * | 1985-07-17 | 1987-02-06 | 株式会社 和広武 | Vacuum container |
| JPS62169347A (en) * | 1985-10-24 | 1987-07-25 | テキサス インスツルメンツ インコ−ポレイテツド | Integrated circuit wafer carrier |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011228391A (en) * | 2010-04-16 | 2011-11-10 | Dan-Takuma Technologies Inc | Storage system and storing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0563016B2 (en) | 1993-09-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |