JPH04302454A - Manufacturing apparatus for semiconductor device - Google Patents

Manufacturing apparatus for semiconductor device

Info

Publication number
JPH04302454A
JPH04302454A JP3093008A JP9300891A JPH04302454A JP H04302454 A JPH04302454 A JP H04302454A JP 3093008 A JP3093008 A JP 3093008A JP 9300891 A JP9300891 A JP 9300891A JP H04302454 A JPH04302454 A JP H04302454A
Authority
JP
Japan
Prior art keywords
cassette
wafer
semiconductor
semiconductor manufacturing
manufacturing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3093008A
Other languages
Japanese (ja)
Other versions
JP2695299B2 (en
Inventor
Koichi Hosoi
細井 功一
Yuichi Kato
雄一 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9300891A priority Critical patent/JP2695299B2/en
Publication of JPH04302454A publication Critical patent/JPH04302454A/en
Application granted granted Critical
Publication of JP2695299B2 publication Critical patent/JP2695299B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To provide a manufacturing apparatus for a semiconductor device which is capable of reducing the time required for the evacuation and restoration to the ambient pressure during the manufacturing process of a semiconductor device where vacuum processing of a wafer is required. CONSTITUTION:A cassette 2 with a closure 7, which can carry a wafer in an evacuated state, is inserted into the main unit 3 of a semiconductor manufacturing system through a cassette insert port 11 thereof. An opening/closing mechanism 9 for use with the closure of the cassette is hermetically sealed and evacuated, and the wafer 1 then undergoes processes with the closure 7 open. After the completion of the processes, air is introduced into the opening/closing mechanism 9 with the closure 7 closed, and the cassette 2 is transported. Thus, this arrangement requires only the evacuation of the closing/opening mechanism 9, so that the amount of dust attached to the wafer is reduced, since the wafer 1 is not exposed to the outside air.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、半導体製造装置に関
するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to semiconductor manufacturing equipment.

【0002】0002

【従来の技術】図2(a)は従来の半導体基板収納容器
を示す斜視図、図2(b)は従来の半導体製造装置を示
す断面図である。図において、1は半導体基板(以下「
ウエハ」と呼ぶ)、2は半導体収納容器(以下「カセッ
ト」と呼ぶ)、3は半導体製造装置本体、4は圧力調整
部、5は処理部、6は載置部である。
2. Description of the Related Art FIG. 2(a) is a perspective view of a conventional semiconductor substrate storage container, and FIG. 2(b) is a sectional view of a conventional semiconductor manufacturing apparatus. In the figure, 1 is a semiconductor substrate (hereinafter referred to as “
2 is a semiconductor storage container (hereinafter referred to as a "cassette"), 3 is a main body of the semiconductor manufacturing apparatus, 4 is a pressure adjustment section, 5 is a processing section, and 6 is a mounting section.

【0003】次に動作について説明する。ウエハ1の収
納されたカセット2は載置部6に運ばれてくる。枚葉式
ではウエハ1が圧力調整部4に一枚導入され真空排気が
行なわれる。その後ウエハ1は処理部5で処理され、そ
して再び圧力調整部4で大気圧に戻されカセット2に収
納される。従ってこの作業がウエハ1の枚数だけ繰り返
されることになる。バッチ処理では、ウエハ1をカセッ
ト2ごとまとめて真空排気し、処理を行なう。搬送中の
ウエハ1及び処理待ちのウエハ1はカセット2に納めら
れたまま外気にさらされている。
Next, the operation will be explained. The cassette 2 containing the wafers 1 is carried to the mounting section 6. In the single wafer type, one wafer 1 is introduced into the pressure adjustment section 4 and vacuum evacuation is performed. Thereafter, the wafer 1 is processed in the processing section 5, and then returned to atmospheric pressure in the pressure adjustment section 4 and stored in the cassette 2. Therefore, this operation is repeated for the number of wafers 1. In batch processing, the wafers 1 and the cassettes 2 are collectively evacuated and processed. The wafer 1 being transported and the wafer 1 waiting to be processed are exposed to the outside air while being housed in the cassette 2.

【0004】0004

【発明が解決しようとする課題】従来の半導体製造装置
は以上のように構成されているので、半導体製造装置本
体にウエハを導入する毎に、多大な真空排気時間が必要
で、処理時間が長くなるなどの問題点があった。また、
ウエハは直接外気にさらされているので、作業者がカセ
ットをハンドリングする場合や、装置またはマニュピレ
ータ等の駆動部分にウエハが近づいた場合には、ゴミな
どが付着しやすく、歩留りを低下させる要因になるなど
の問題点があった。
[Problems to be Solved by the Invention] Conventional semiconductor manufacturing equipment is configured as described above, so each time a wafer is introduced into the main body of the semiconductor manufacturing equipment, a large amount of evacuation time is required, resulting in a long processing time. There were some problems, such as: Also,
Since wafers are directly exposed to the outside air, when workers handle cassettes or when wafers come close to moving parts such as equipment or manipulators, dirt and other substances tend to adhere to them, which can reduce yields. There were some problems, such as:

【0005】この発明は上記のような問題点を解消する
ためになされたもので、真空排気を要する製造工程につ
いて、処理時間を短縮でき、さらにカセット搬送時のゴ
ミの付着を低減できる半導体製造装置を得ることを目的
とする。
The present invention has been made to solve the above-mentioned problems, and provides a semiconductor manufacturing apparatus that can shorten the processing time for manufacturing processes that require vacuum evacuation, and can also reduce the adhesion of dust during cassette transport. The purpose is to obtain.

【0006】[0006]

【課題を解決するための手段】この発明に係る半導体製
造装置は、半導体収納容器に開閉自在の蓋及びつば状の
突起を設けると共に、半導体収納容器の開口部及びつば
状の部分にパッキングを設置し、さらに半導体装置本体
にはつば状の突起を保持するための留め具を設けたもの
である。
[Means for Solving the Problems] A semiconductor manufacturing apparatus according to the present invention provides a semiconductor storage container with an openable/closable lid and a brim-like projection, and also provides packing at the opening and brim-like portion of the semiconductor storage container. Furthermore, the semiconductor device main body is provided with a fastener for holding the brim-like protrusion.

【0007】[0007]

【作用】この発明における半導体製造装置によれば、ウ
エハの雰囲気は常に真空状態に保たれているため、カセ
ットを半導体製造装置本体に投入した時の真空排気時間
、大気圧に戻す時間が短縮され、かつ搬送時等のゴミの
付着が軽減される。
[Function] According to the semiconductor manufacturing apparatus of the present invention, the atmosphere of the wafer is always kept in a vacuum state, so the evacuation time and the time for returning the cassette to atmospheric pressure when it is placed into the semiconductor manufacturing apparatus main body are shortened. , and the adhesion of dust during transportation is reduced.

【0008】[0008]

【実施例】以下、この発明の実施例を図について説明す
る。図1(a)はこの発明の実施例によるカセットを示
す斜視図、図1(b),(c)はそれぞれカセットを半
導体製造装置本体に取付けた状態を示す斜視図及び断面
図である。図において、従来装置と同一部分については
同一符号で示すものとする。7は開閉自在の蓋、8はカ
セット2内部と半導体製造装置本体3へのカセット2の
挿入時に、蓋開閉機構部9の真空状態を保つためのパッ
キング、10はカセット2に設けられたつば状の突起、
11はカセット2を挿入する挿入口、12はカセット2
に設けられたつば状の突起10を保持し、確実にカセッ
ト2を固着するための留め具である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention will be described below with reference to the drawings. FIG. 1(a) is a perspective view showing a cassette according to an embodiment of the present invention, and FIGS. 1(b) and 1(c) are a perspective view and a sectional view, respectively, showing the state in which the cassette is attached to a main body of a semiconductor manufacturing apparatus. In the figures, parts that are the same as those of the conventional device are designated by the same reference numerals. 7 is a lid that can be opened and closed; 8 is a packing for maintaining the vacuum state of the lid opening/closing mechanism section 9 when inserting the cassette 2 into the interior of the cassette 2 and into the semiconductor manufacturing equipment main body 3; and 10 is a flange-shaped lid provided on the cassette 2. protrusion,
11 is the insertion slot for inserting the cassette 2, 12 is the cassette 2
This is a fastener for holding the flange-shaped protrusion 10 provided on the cassette 2 and securely fixing the cassette 2.

【0009】次に動作について説明する。真空引きされ
たカセット2の中にウエハ1を収納する。カセット2の
開口部には、パッキング8が取り付けられているうえ、
蓋7は大気圧によって押されているので、真空状態が保
たれ、ウエハ1は外気にさらされない。また、作業ミス
等でカセット2が転倒してもウエハ1が脱落することは
ない。このカセット2を図1(b)のように、半導体製
造装置本体3の挿入口11へ挿入し、カセット2のつば
状の突起10を留め具12により固着する。つば状の突
起10にもパッキング8が取り付けられているため、カ
セット蓋開閉機構部9は密閉され、ウエハ1の処理前に
はカセット蓋開閉機構部9だけを真空排気してやればよ
い。 真空排気後は、カセット2内外の圧力差が小さいため、
簡単に蓋7を開くことができるので、ウエハ1を順次取
り出して、処理部5で処理し、カセット2に戻す。処理
終了後は蓋7を閉じ、カセット蓋開閉機構部9だけをリ
ークすれば、カセット2内部は真空状態に保たれ、カセ
ット2を半導体製造装置5から取り外し搬送する。
Next, the operation will be explained. A wafer 1 is stored in a evacuated cassette 2. A packing 8 is attached to the opening of the cassette 2, and
Since the lid 7 is pressed by atmospheric pressure, a vacuum state is maintained and the wafer 1 is not exposed to the outside air. Moreover, even if the cassette 2 falls down due to a work error or the like, the wafer 1 will not fall off. This cassette 2 is inserted into the insertion opening 11 of the semiconductor manufacturing apparatus main body 3 as shown in FIG. Since the packing 8 is also attached to the brim-shaped projection 10, the cassette lid opening/closing mechanism section 9 is sealed, and only the cassette lid opening/closing mechanism section 9 needs to be evacuated before processing the wafer 1. After evacuation, the pressure difference between the inside and outside of the cassette 2 is small, so
Since the lid 7 can be easily opened, the wafers 1 are taken out one by one, processed in the processing section 5, and returned to the cassette 2. After the processing is completed, the lid 7 is closed and only the cassette lid opening/closing mechanism 9 is leaked, so that the inside of the cassette 2 is maintained in a vacuum state, and the cassette 2 is removed from the semiconductor manufacturing apparatus 5 and transported.

【0010】0010

【発明の効果】以上のようにこの発明によれば、カセッ
トに真空封止可能な蓋を設けるとともに、カセットを挿
入することにより半導体製造装置内部を真空封止できる
ようにしたので、半導体製品の製造過程で、極めて頻度
の高い真空排気を要する半導体製造装置の処理時間を短
縮することができ、カセットの搬送時等にはウエハへの
ゴミの付着が少なくなるため、品質を高める効果がある
[Effects of the Invention] As described above, according to the present invention, the cassette is provided with a vacuum-sealable lid, and the inside of the semiconductor manufacturing equipment can be vacuum-sealed by inserting the cassette. The processing time of semiconductor manufacturing equipment, which requires extremely frequent evacuation during the manufacturing process, can be shortened, and there is less dust adhering to wafers during cassette transport, which has the effect of improving quality.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】この発明の一実施例を示すカセットの斜視図a
と半導体製造装置本体にカセットが挿入されている様子
を示す斜視図b及び断面図cである。
FIG. 1 is a perspective view a of a cassette showing an embodiment of the present invention.
FIG. 3 is a perspective view b and a cross-sectional view c showing the cassette being inserted into the main body of the semiconductor manufacturing apparatus.

【図2】従来のカセットを示す斜視図aと半導体製造装
置の断面図bである。
FIG. 2 is a perspective view a showing a conventional cassette and a cross-sectional view b of a semiconductor manufacturing apparatus.

【符号の説明】[Explanation of symbols]

1      ウエハ 2      カセット 3      半導体製造装置本体 5      処理部 7      蓋 8      パッキング 10    つば状の突起 12    留め具 1 Wafer 2 Cassette 3 Semiconductor manufacturing equipment body 5 Processing section 7 Lid 8 Packing 10   Brim-shaped protrusion 12 Fastener

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  半導体基板を収容した半導体基板収容
容器を半導体製造装置本体に取付け、上記半導体基板を
処理部に搬送し、真空状態で半導体基板を処理する半導
体製造装置において、半導体収納容器に開閉自在の蓋及
びつば状の突起を設けると共に、当該半導体収納容器の
開口部及びつば状の突起にパッキングを設置し、さらに
半導体製造装置本体には上記つば状の突起を保持し、上
記半導体収納容器を確実に固着するための留め具を設け
たことを特徴とする半導体製造装置。
Claim 1: In a semiconductor manufacturing apparatus in which a semiconductor substrate storage container containing a semiconductor substrate is attached to a semiconductor manufacturing equipment main body, the semiconductor substrate is transported to a processing section, and the semiconductor substrate is processed in a vacuum state, the semiconductor storage container is opened and closed. In addition to providing a freely movable lid and a brim-like protrusion, packing is installed on the opening and the brim-like protrusion of the semiconductor storage container, and the semiconductor manufacturing equipment main body holds the brim-like protrusion, and the semiconductor storage container 1. Semiconductor manufacturing equipment characterized by having a fastener for securely fixing.
JP9300891A 1991-03-29 1991-03-29 Semiconductor manufacturing equipment Expired - Fee Related JP2695299B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9300891A JP2695299B2 (en) 1991-03-29 1991-03-29 Semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9300891A JP2695299B2 (en) 1991-03-29 1991-03-29 Semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JPH04302454A true JPH04302454A (en) 1992-10-26
JP2695299B2 JP2695299B2 (en) 1997-12-24

Family

ID=14070373

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9300891A Expired - Fee Related JP2695299B2 (en) 1991-03-29 1991-03-29 Semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JP2695299B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08279546A (en) * 1995-03-28 1996-10-22 Jenoptik Ag Station for loading and unloading for semiconductor processing device
US6729823B2 (en) 2000-08-23 2004-05-04 Tokyo Electron Limited Processing system for object to be processed
US6869263B2 (en) 2002-07-22 2005-03-22 Brooks Automation, Inc. Substrate loading and unloading station with buffer
US7677859B2 (en) 2002-07-22 2010-03-16 Brooks Automation, Inc. Substrate loading and uploading station with buffer

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08279546A (en) * 1995-03-28 1996-10-22 Jenoptik Ag Station for loading and unloading for semiconductor processing device
US6071059A (en) * 1995-03-28 2000-06-06 Brooks Automation Gmbh Loading and unloading station for semiconductor processing installations
US6375403B1 (en) 1995-03-28 2002-04-23 Brooks Automation, Gmbh Loading and unloading station for semiconductor processing installations
US6461094B1 (en) 1995-03-28 2002-10-08 Jenoptik Ag Loading and unloading station for semiconductor processing installations
US6837663B2 (en) 1995-03-28 2005-01-04 Brooks Automation, Inc. Loading and unloading station for semiconductor processing installations
US6729823B2 (en) 2000-08-23 2004-05-04 Tokyo Electron Limited Processing system for object to be processed
US6869263B2 (en) 2002-07-22 2005-03-22 Brooks Automation, Inc. Substrate loading and unloading station with buffer
US7677859B2 (en) 2002-07-22 2010-03-16 Brooks Automation, Inc. Substrate loading and uploading station with buffer
US8454293B2 (en) 2002-07-22 2013-06-04 Brooks Automation, Inc. Substrate loading and unloading station with buffer
US9670010B2 (en) 2002-07-22 2017-06-06 Brooks Automation, Inc. Substrate loading and unloading station with buffer

Also Published As

Publication number Publication date
JP2695299B2 (en) 1997-12-24

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