JPS6310402B2 - - Google Patents
Info
- Publication number
- JPS6310402B2 JPS6310402B2 JP4134384A JP4134384A JPS6310402B2 JP S6310402 B2 JPS6310402 B2 JP S6310402B2 JP 4134384 A JP4134384 A JP 4134384A JP 4134384 A JP4134384 A JP 4134384A JP S6310402 B2 JPS6310402 B2 JP S6310402B2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- substrate
- grating
- processed
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 34
- 238000009826 distribution Methods 0.000 claims description 19
- 230000000737 periodic effect Effects 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 12
- 238000000992 sputter etching Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000001816 cooling Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4134384A JPS60186806A (ja) | 1984-03-06 | 1984-03-06 | ブレ−ズド格子の製作方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4134384A JPS60186806A (ja) | 1984-03-06 | 1984-03-06 | ブレ−ズド格子の製作方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60186806A JPS60186806A (ja) | 1985-09-24 |
| JPS6310402B2 true JPS6310402B2 (enrdf_load_stackoverflow) | 1988-03-07 |
Family
ID=12605871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4134384A Granted JPS60186806A (ja) | 1984-03-06 | 1984-03-06 | ブレ−ズド格子の製作方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60186806A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0823601B2 (ja) * | 1989-01-30 | 1996-03-06 | 松下電器産業株式会社 | 回折格子の作製方法 |
| JPH0823602B2 (ja) * | 1989-01-30 | 1996-03-06 | 松下電器産業株式会社 | 回折格子のプレス成形用金型の作製方法および回折格子の作製方法 |
| JP2007047695A (ja) * | 2005-08-12 | 2007-02-22 | Shimadzu Corp | 回折格子 |
-
1984
- 1984-03-06 JP JP4134384A patent/JPS60186806A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60186806A (ja) | 1985-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4514479A (en) | Method of making near infrared polarizers | |
| US5080465A (en) | Diffraction grating and method of making | |
| CN114185122B (zh) | 一种闪耀光栅的制备方法 | |
| CN114397717B (zh) | 一种多维度双矢量光束聚焦的光学超表面 | |
| CN101799569A (zh) | 一种制作凸面双闪耀光栅的方法 | |
| CN110244395B (zh) | 一种平面双角闪耀光栅的制作方法 | |
| KR20200071590A (ko) | 회절 광학 소자, 이의 제조 방법 및 이를 포함하는 광학 장치 | |
| JPS6310402B2 (enrdf_load_stackoverflow) | ||
| JP3434907B2 (ja) | 凹面エシェレットグレーティングの製造方法 | |
| Veldkamp et al. | High efficiency binary lenses | |
| CN102323635A (zh) | 一种全息双闪耀光栅的制作方法 | |
| JPS6033504A (ja) | ブレ−ズド格子の製造方法 | |
| JPS6127505A (ja) | プレ−ズ光学素子の製造方法 | |
| CN108802881B (zh) | 一种高衍射效率光栅结构和制备方法 | |
| JP2982832B2 (ja) | ブレーズ反射回折格子製作方法 | |
| CN102540301A (zh) | 一种凸面双闪耀光栅的制作方法 | |
| WO2013120428A1 (zh) | 一种凸面双闪耀光栅的制备方法 | |
| Garvin et al. | Ion-etched gratings for laser applications | |
| JPH0318681B2 (enrdf_load_stackoverflow) | ||
| JPH0374362B2 (enrdf_load_stackoverflow) | ||
| JPS63187202A (ja) | ブレ−ズドホログラフイツク回折格子 | |
| Xu et al. | VUV and soft x-ray diffraction grating fabrication by holographic ion beam etching | |
| JP2001066442A (ja) | グレーティング加工装置 | |
| JPH07101302B2 (ja) | 回折格子の作製方法及びそれに用いるオートマスク | |
| JPH0456284B2 (enrdf_load_stackoverflow) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |