JPS6310402B2 - - Google Patents

Info

Publication number
JPS6310402B2
JPS6310402B2 JP4134384A JP4134384A JPS6310402B2 JP S6310402 B2 JPS6310402 B2 JP S6310402B2 JP 4134384 A JP4134384 A JP 4134384A JP 4134384 A JP4134384 A JP 4134384A JP S6310402 B2 JPS6310402 B2 JP S6310402B2
Authority
JP
Japan
Prior art keywords
ion beam
substrate
grating
processed
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4134384A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60186806A (ja
Inventor
Kazuhiro Kosuge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP4134384A priority Critical patent/JPS60186806A/ja
Publication of JPS60186806A publication Critical patent/JPS60186806A/ja
Publication of JPS6310402B2 publication Critical patent/JPS6310402B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/32Holograms used as optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • G02B5/1847Manufacturing methods
    • G02B5/1857Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Drying Of Semiconductors (AREA)
JP4134384A 1984-03-06 1984-03-06 ブレ−ズド格子の製作方法 Granted JPS60186806A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4134384A JPS60186806A (ja) 1984-03-06 1984-03-06 ブレ−ズド格子の製作方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4134384A JPS60186806A (ja) 1984-03-06 1984-03-06 ブレ−ズド格子の製作方法

Publications (2)

Publication Number Publication Date
JPS60186806A JPS60186806A (ja) 1985-09-24
JPS6310402B2 true JPS6310402B2 (enrdf_load_stackoverflow) 1988-03-07

Family

ID=12605871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4134384A Granted JPS60186806A (ja) 1984-03-06 1984-03-06 ブレ−ズド格子の製作方法

Country Status (1)

Country Link
JP (1) JPS60186806A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0823601B2 (ja) * 1989-01-30 1996-03-06 松下電器産業株式会社 回折格子の作製方法
JPH0823602B2 (ja) * 1989-01-30 1996-03-06 松下電器産業株式会社 回折格子のプレス成形用金型の作製方法および回折格子の作製方法
JP2007047695A (ja) * 2005-08-12 2007-02-22 Shimadzu Corp 回折格子

Also Published As

Publication number Publication date
JPS60186806A (ja) 1985-09-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term