JPS6297340A - Electrical connecting method for ic chip - Google Patents

Electrical connecting method for ic chip

Info

Publication number
JPS6297340A
JPS6297340A JP23666085A JP23666085A JPS6297340A JP S6297340 A JPS6297340 A JP S6297340A JP 23666085 A JP23666085 A JP 23666085A JP 23666085 A JP23666085 A JP 23666085A JP S6297340 A JPS6297340 A JP S6297340A
Authority
JP
Japan
Prior art keywords
chip
terminal electrode
conductive adhesive
photoresist
soluble polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23666085A
Other languages
Japanese (ja)
Inventor
Nobuyuki Oshima
尾島 信行
Yasuhiko Horio
泰彦 堀尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP23666085A priority Critical patent/JPS6297340A/en
Publication of JPS6297340A publication Critical patent/JPS6297340A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve reliability of dense micro-connection of multi-terminals, by arranging a photomask on a carrier film, positioning a conductive bonding agent surface, which is exposed by the removal of photoresist and water soluble polymer, and a transparent terminal electrode on a glass substrate, performing thermal compression, separating the carrier film, further positioning an IC chip and a pad, and performing thermal compression. CONSTITUTION:On one surface of a carrier film 2, a thermal reactivating conductive bonding agent 2, water soluble polymer 3 and photoresist 4 are formed. A photomask 5 is closely contacted and exposed. Then parts 5a and 5b are formed so that the pattern agrees with the pattern of a transparent terminal electrode 6, which is formed on a glass substrate 7. Then development and washing with water are performed. Then, the conductive bonding agent 2b is exposed. After the transparent terminal electrode 6 and the conductive bonding agent 2 are aligned, thermal compression is performed with thermal rolls 8. When the carrier film 1 is separated, the conductive bonding agent 2b is transferred only on the transparent terminal electrode 6. Then a bare IC chip 9 and an electrode pad 10 and the transparent terminal electrode 6 are aligned with each other. Thereafter, compression and heating are carried out.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、ICチップに代表されるチップ状の電子部品
を基板上の端子電極群に接続するICチップの電気的接
続方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an electrical connection method for an IC chip, which connects a chip-shaped electronic component, typified by an IC chip, to a group of terminal electrodes on a substrate.

従来の技術 従来、電子部品の接続端子と基板上の回路パターン端子
との接続には半田付けがよ(利用されていたが、近年例
えばICフラットパッケージ等の小型化と、接続端子の
増加により接続端子間、いわゆるピッチ間隔が次第に狭
くなり、従来の半田付は技術で対処することが次第に困
難になって来た。又、最近では、電卓、電子時計あるい
は液晶デバイス等にあっては、裸のICチップをガラス
基板上の電極にフェースダウンで直付けして実装面積の
効率的使用と配線の合理化を図ろうとする動きがあり、
半田付けに代わる存効かつ微細な電気的接続手段が望ま
れている。裸のICチップをガラス基板の透明電極に電
気的に接続する方法としては、例えば特公昭51−11
4439号公報に示されているように、粒径1粒子形状
配合量を適宜調節した種々の金属粉末を熱硬化性樹脂中
に均一に分散させて導電性接着剤を調製し、この導電性
接着剤をガラス電極上に一面に塗布したのち、ICチッ
プのバンプとガラス電極が一致するよう対向させたのち
ICチップをガラス電極に圧接して導電性接着剤を硬化
することにより、電極部分にのみ導電性を発現させる方
法が提案されている。
Conventional technology Traditionally, soldering was used to connect the connection terminals of electronic components and the circuit pattern terminals on the board, but in recent years, with the miniaturization of IC flat packages and the increase in the number of connection terminals, it has become difficult to connect. The so-called pitch between terminals has become progressively narrower, and conventional soldering has become increasingly difficult to handle with technology.In addition, recently, bare soldering has become increasingly difficult for calculators, electronic watches, and LCD devices. There is a movement to directly attach IC chips face-down to electrodes on glass substrates in order to use mounting area more efficiently and streamline wiring.
There is a need for effective and fine electrical connection means to replace soldering. As a method for electrically connecting a bare IC chip to a transparent electrode on a glass substrate, for example, Japanese Patent Publication No. 51-11
As shown in Japanese Patent No. 4439, a conductive adhesive is prepared by uniformly dispersing various metal powders in a thermosetting resin with a particle size and a particle shape with an appropriately adjusted amount. After coating the conductive adhesive all over the glass electrode, the bumps of the IC chip and the glass electrode are placed facing each other, and the IC chip is pressed against the glass electrode to harden the conductive adhesive. A method of developing conductivity has been proposed.

発明が解決しようとする問題点 しかしながら−斯かる方法にあっては電極が微細になり
又、電極密度が高くなればなる程、臨接する透明電極間
あるいはチップ上の電極間同志の電流リークが生じやす
いものであった。また、別の方法としては、従来技術の
スクリーン印刷法を用いて透明端子電極上に導電性接着
剤を選択的に印刷する方法が可能であれば、接続時の電
流リークはない、しかし、透明端子電極が微細に、かつ
密に形成されている現状では、従来の印刷技術では、選
択印刷が非常に困難であった。
Problems to be Solved by the Invention However, in such a method, as the electrodes become finer and the electrode density becomes higher, current leakage occurs between adjacent transparent electrodes or between electrodes on a chip. It was easy. Another method is to selectively print conductive adhesive on the transparent terminal electrodes using the prior art screen printing method.If possible, there will be no current leakage during connection, but the transparent In the current situation where terminal electrodes are formed finely and densely, selective printing is extremely difficult with conventional printing techniques.

本発明は上記の問題点に鑑みて発明されたもので、その
目的とするところはガラス基板上に微細かつ密に形成さ
れた端子電極群の上に信頼性よく導電性接着剤を形成し
て、ICチップの電極パッドとの電気的接続を行うこと
にある。
The present invention was invented in view of the above problems, and its purpose is to reliably form a conductive adhesive on a group of terminal electrodes formed finely and densely on a glass substrate. , to make an electrical connection with the electrode pads of the IC chip.

問題点を解決するための手段 本発明は上記の問題点を解決するために、先ずキャリア
フィルム上の一面に熱再活性導電性接着剤を塗布し、さ
らに、その上に水溶性ポリマーとフォトレジストを順次
塗布する9次いで所定のフォトマスクを配し露光したの
ち、所定の現像と水洗を行ない、フォトレジストと水溶
性ポリマーを除去する。除去により露光した導電性接着
剤面とガラス基板上の透明端子電極を位置合せしたのち
熱圧着する0次いでキャリアフィルムを剥離すると、ガ
ラス基板上の透明端子電極上にのみ導電性接着剤を転写
することができる。最後に得られた導電性接着剤付き透
明端子電極とICチップのパッドとの位置合せを行ない
熱圧着してICチップの各パッドとガラス基板上の各電
極を接続することを特徴としている。
Means for Solving the Problems In order to solve the above problems, the present invention first coats a heat-reactivated conductive adhesive on one side of a carrier film, and then coats a water-soluble polymer and a photoresist on it. 9. Next, a predetermined photomask is placed and exposed, followed by predetermined development and water washing to remove the photoresist and water-soluble polymer. After aligning the conductive adhesive surface exposed by removal with the transparent terminal electrode on the glass substrate, thermocompression bonding is performed.Next, when the carrier film is peeled off, the conductive adhesive is transferred only onto the transparent terminal electrode on the glass substrate. be able to. The method is characterized in that the finally obtained transparent terminal electrodes with conductive adhesive and the pads of the IC chip are aligned and thermocompression bonded to connect each pad of the IC chip and each electrode on the glass substrate.

作用 しかしで本発明の上記した方法によれば、現像と水洗後
に露出した導電性接着剤を透明端子電極上にのみ転写す
ることができ、また、透明端子雪掻以外には、フォトレ
ジストがマスク材として働き、導電性接着剤を付着させ
ないので、接続後において基板上の臨接する透明電極間
あるいはICチップの電極間で短絡することもない、さ
らには、転写される導電性接着剤の部分はフォトレジス
トを用いることにより微細にできるので、導電性接着剤
の微細な転写が可能となり、微細にして密な多端子マイ
クロ接続の信頼性が向上する。
However, according to the above-described method of the present invention, the conductive adhesive exposed after development and washing with water can be transferred only onto the transparent terminal electrode, and the photoresist is not used as a mask except for clearing the transparent terminal. Since it acts as a material and does not allow conductive adhesive to adhere, there will be no short circuit between adjacent transparent electrodes on the substrate or between electrodes of the IC chip after connection.Furthermore, the portion of the conductive adhesive that is transferred Since it can be made fine by using a photoresist, fine transfer of the conductive adhesive is possible, and the reliability of fine and dense multi-terminal micro-connections is improved.

実施例 以下に本発明方法を図面に基づいて詳細に説明する。Example The method of the present invention will be explained in detail below based on the drawings.

第1図乃至第8図は本発明のICチップの電気的接続方
法を説明する工程断面図であって、図において1はキャ
リアフィルム、2は熱再活性導電性接着剤、3は水溶性
ポリマー、4はフォトレジスト、5はフォトマスク、6
は透明端子電極、7はガラス基板、8は熱ロール、9は
裸ICチップ、10はICチップの電極バンドである。
1 to 8 are process cross-sectional views illustrating the method for electrically connecting an IC chip of the present invention, in which 1 is a carrier film, 2 is a heat-reactivated conductive adhesive, and 3 is a water-soluble polymer. , 4 is photoresist, 5 is photomask, 6
1 is a transparent terminal electrode, 7 is a glass substrate, 8 is a heat roll, 9 is a bare IC chip, and 10 is an electrode band of the IC chip.

本発明では、先ず第1図C示すようにキャリアフィルム
1の片面に熱再活性導電性接着剤2をスクリーン印刷、
ロール印刷等の方法で、20〜30μmの厚みに形成す
る。この時使用する熱再活性導電性接着剤2はエポキシ
樹脂やフェノール樹脂等をバインダー樹脂に用いた熱硬
化性導電性接着剤、あるいはアクリル系バインダーで代
表されるような紫外線硬化型の感光性の導電性接着剤で
もよい、尚、本実施例では感光性の導電性接着剤を用い
たが、これは、例えば昭和高分子製の商品名リポキシV
R−60(エポキシアクリレート)100重量部とイル
ガキュア651 (チバガイギー社製)3重量部および
銀、金、v4.クロム、鉛。
In the present invention, first, as shown in FIG.
It is formed to a thickness of 20 to 30 μm by a method such as roll printing. The heat-reactivated conductive adhesive 2 used at this time is a thermosetting conductive adhesive using epoxy resin, phenol resin, etc. as a binder resin, or an ultraviolet-curable photosensitive adhesive such as an acrylic binder. A conductive adhesive may also be used. In this example, a photosensitive conductive adhesive was used.
100 parts by weight of R-60 (epoxy acrylate), 3 parts by weight of Irgacure 651 (manufactured by Ciba Geigy), and silver, gold, v4. Chromium, lead.

錫、鉄、アルミあるいはそれらの合金等の微粉末を所望
の導電性を得るように適当量配合したものを適宜溶媒に
溶解して作成する。また、熱硬化を併用する場合には例
えば潜在性のエポキシ硬化剤ジメチルベンジルアミンあ
るいはラジカル重合剤ベンジルパーオキサイド等を適宜
、添加すればよい。
It is prepared by blending an appropriate amount of fine powder of tin, iron, aluminum, or an alloy thereof to obtain the desired conductivity, and dissolving it in an appropriate solvent. Further, when thermosetting is used in combination, for example, a latent epoxy curing agent dimethylbenzylamine or a radical polymerization agent benzyl peroxide may be appropriately added.

次いで第2図に示すように、熱再活性導電性接着剤2上
に水溶性ポリマー3をバーコーターを用いて塗布後乾燥
して2μm厚の層を形成した。尚、この時用いた水溶性
ポリマー液はゴーセノール172SS(日本合成化字型
のポリビニルアルコール)の5%水溶液であるが、水溶
性ポリマーであればこれに限定するものではない6次に
ネガ−ポジ型のフォトレジスト4を2〜5μ厚に塗布し
て乾燥した。用いたフォトレジスト4はナガセマイクロ
レジスト#752(製部産業製イソプレンゴム系)の5
〜15%溶液である。この溶液はキシレン系の溶媒を用
いており、水溶性ポリマー3層を侵さない、このように
水溶性ポリマーを侵さないフォトレジストであればフォ
トレジスト4の種類は限定しなくてもよい。
Next, as shown in FIG. 2, a water-soluble polymer 3 was coated on the heat-reactivated conductive adhesive 2 using a bar coater and dried to form a 2 μm thick layer. The water-soluble polymer liquid used at this time was a 5% aqueous solution of GOHSENOL 172SS (Nippon Gosei Kaji type polyvinyl alcohol), but it is not limited to this as long as it is a water-soluble polymer. A mold photoresist 4 was applied to a thickness of 2 to 5 μm and dried. The photoresist 4 used was Nagase Microresist #752 (isoprene rubber type manufactured by Seibu Sangyo) 5.
~15% solution. This solution uses a xylene-based solvent, and there is no need to limit the type of photoresist 4 as long as it does not attack the three water-soluble polymer layers.

次いで、第4図に示すようにフォトレジスト4面にフォ
トマスク5を密着させて露光する。この時、フォトマス
ク5のパターンは、後述するガラス基板7上に形成され
た透明端子電極6のパターンと一敗するように5a、5
bが形成されている。
Next, as shown in FIG. 4, a photomask 5 is brought into close contact with the photoresist 4 and exposed. At this time, the pattern of the photomask 5 is such that it is identical to the pattern of the transparent terminal electrode 6 formed on the glass substrate 7, which will be described later.
b is formed.

そして5bに対応する部分のフォトレジスト5は硬化し
、また紫外線硬化型の熱再活性導電性接着剤2の2aは
硬化し、もはや熱再活性でなくなるが、紫外線未照射部
の2bは熱再活性のままである。
The photoresist 5 in the portion corresponding to 5b is cured, and the ultraviolet-curable heat-reactivated conductive adhesive 2 2a is cured and is no longer heat-reactivable, but the portion 2b not irradiated with ultraviolet rays is heat-reactivable. Remains active.

次いで第5図のように現像と水洗を行なうと、2bが露
出する。この時、フォトレジスト4の現像はキシレンで
行なったが、下層の水溶性ポリマー3層は全く侵されな
い、その後水洗すると、現像でフォトレジスト4が除去
された部分に相当する水溶性ポリマーが除去される。こ
の時、導電性接着剤2は水には全く侵されない。
Next, as shown in FIG. 5, when development and washing are performed, the portion 2b is exposed. At this time, photoresist 4 was developed using xylene, but the three underlying water-soluble polymer layers were not attacked at all.When washed with water afterwards, the water-soluble polymer corresponding to the area where photoresist 4 was removed during development was removed. Ru. At this time, the conductive adhesive 2 is not affected by water at all.

次いで第6図に示すように、ガラス基板7上に100〜
200μmピッチ、50〜1100u口で多数個形成さ
れた透明端子電極6 (ここではITO電極)と、第5
図に示した露光した多数個の熱再活性導電性接着剤2の
面が一敗するように位置合せをしたのち、熱ロール8あ
るいは熱圧着機等の手段で熱圧接したのち、第7図に示
すようにキャリアフィルムlを剥すと、透明端子電極6
上のみに熱再活性導電性接着剤2bが転写され、その他
のガラス基板上へは転写されない。
Next, as shown in FIG.
A large number of transparent terminal electrodes 6 (ITO electrodes in this case) are formed with a pitch of 200 μm and 50 to 1100 μm, and a fifth
After aligning the exposed surfaces of a large number of heat-reactivated conductive adhesives 2 as shown in the figure so that they collapse once, they are heat-pressed by a means such as a heat roll 8 or a heat-press bonding machine, and then, as shown in FIG. When the carrier film l is peeled off as shown in the figure, the transparent terminal electrode 6
The thermally reactivated conductive adhesive 2b is transferred only to the top, and is not transferred to the other glass substrates.

次いで、第8図に示すように裸のICチップ9の電極パ
ッド10と、ガラス基板7上の透明端子;極6 (転写
された熱再活性導電性接着剤2b)とを位置合せしたの
ち、適当な加圧と加熱を行なうことにより、電気的接続
と接着が同時に行なわれる。この時、紫外線硬化型導電
性接着剤を用いたときは、さらにガラス基Fi7の裏面
から紫外線を照射し、熱硬化型の導電性接着剤を用いた
時は、さらに加熱硬化することにより電気的接続と接着
の信頼性を向上させることができる。
Next, as shown in FIG. 8, after aligning the electrode pads 10 of the bare IC chip 9 and the transparent terminals; poles 6 (transferred heat-reactivated conductive adhesive 2b) on the glass substrate 7, By applying appropriate pressure and heat, electrical connection and adhesion are achieved simultaneously. At this time, when an ultraviolet curing type conductive adhesive is used, ultraviolet rays are further irradiated from the back side of the glass base Fi7, and when a thermosetting type conductive adhesive is used, it is further heated and cured to create an electrical property. The reliability of connections and adhesion can be improved.

発明の効果 以上に説明したように本発明のICチップの電気的接続
方法によれば、基板上の透明端子電極上に導電性接着剤
を転写により形成するので、従来、印刷では不可能だっ
た超微細で超密に形成された端子電極群上に選択的に精
度よく電気接続用の導電性接着剤を形成することができ
、ICチップのガラス基板上への搭載において効果があ
り、また他の電子部品の超微細接続にも効果を発揮する
ので、極めて実用価値が高い。
Effects of the Invention As explained above, according to the method for electrically connecting an IC chip of the present invention, a conductive adhesive is formed on a transparent terminal electrode on a substrate by transfer, which was previously impossible by printing. A conductive adhesive for electrical connection can be selectively and accurately formed on a group of ultra-fine and ultra-densely formed terminal electrodes, which is effective in mounting IC chips on a glass substrate, and is also effective in mounting IC chips on glass substrates. It is also effective in making ultra-fine connections in electronic components, so it has extremely high practical value.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第8図は本発明のrcチップの電気的接続方法
を説明するための工程を示す断面図である。 l・・・・・・キャリアフィルム、2・・・・・・熱再
活性導電性接着剤、3・・・・・・水溶性ポリマー、4
・・・・・・フォトレジスト、5・・・・・・フォトマ
スク、6・・・・・・透明端子電極、7・・・・・・ガ
ラス基板、8・・・・・・熱ロール、9・・・・・・裸
ICチップ、10・・・・・・ICチップの電極パッド
FIGS. 1 to 8 are cross-sectional views showing steps for explaining the method for electrically connecting an RC chip according to the present invention. l...Carrier film, 2...Heat-reactivated conductive adhesive, 3...Water-soluble polymer, 4
... Photoresist, 5 ... Photomask, 6 ... Transparent terminal electrode, 7 ... Glass substrate, 8 ... Heat roll, 9... Bare IC chip, 10... Electrode pad of IC chip.

Claims (1)

【特許請求の範囲】[Claims] (1)キャリアフィルムの一面に熱再活性導電性接着剤
を塗布する工程と、前記熱再活性導電性接着剤上に水溶
性ポリマーを塗布する工程と、前記水溶性ポリマー上に
フォトレジスト層を形成する工程と、前記フォトレジス
ト面に所定のフォトマスクを密着させて露光する工程と
、未露光部の前記フォトレジストと水溶性ポリマーを現
像除去する工程と、前記現像除去して露光した導電性接
着剤部とガラス基板上の透明端子電極を位置合せしたの
ち、熱圧着する工程と、キャリアフィルムを剥離して、
導電性接着剤を前記透明端子電極上にのみ転写する工程
と、得られた導電性接着剤付き透明端子電極とICチッ
プのパッドとの位置合せを行ない、熱圧着してICチッ
プの各パッドとガラス基板の各電極を接続する工程とを
含むことを特徴とするICチップの電気的接続方法。
(1) Coating a heat-reactivated conductive adhesive on one side of a carrier film, coating a water-soluble polymer on the heat-reactivated conductive adhesive, and forming a photoresist layer on the water-soluble polymer. a step of exposing the photoresist surface with a predetermined photomask in close contact with the photoresist surface; a step of developing and removing the photoresist and water-soluble polymer in the unexposed area; and a step of removing the photoresist and the water-soluble polymer by developing the exposed conductive material. After aligning the adhesive part and the transparent terminal electrode on the glass substrate, there is a process of thermocompression bonding and peeling off the carrier film.
A process of transferring the conductive adhesive only onto the transparent terminal electrode, aligning the obtained transparent terminal electrode with the conductive adhesive with the pads of the IC chip, and bonding them by thermocompression to each pad of the IC chip. 1. A method for electrically connecting an IC chip, the method comprising: connecting each electrode of a glass substrate.
JP23666085A 1985-10-23 1985-10-23 Electrical connecting method for ic chip Pending JPS6297340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23666085A JPS6297340A (en) 1985-10-23 1985-10-23 Electrical connecting method for ic chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23666085A JPS6297340A (en) 1985-10-23 1985-10-23 Electrical connecting method for ic chip

Publications (1)

Publication Number Publication Date
JPS6297340A true JPS6297340A (en) 1987-05-06

Family

ID=17003899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23666085A Pending JPS6297340A (en) 1985-10-23 1985-10-23 Electrical connecting method for ic chip

Country Status (1)

Country Link
JP (1) JPS6297340A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01232735A (en) * 1988-03-11 1989-09-18 Matsushita Electric Ind Co Ltd Semiconductor device
JPH02163950A (en) * 1988-12-16 1990-06-25 Matsushita Electric Ind Co Ltd Mounting of semiconductor device
US8119449B2 (en) 2006-03-14 2012-02-21 Panasonic Corporation Method of manufacturing an electronic part mounting structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01232735A (en) * 1988-03-11 1989-09-18 Matsushita Electric Ind Co Ltd Semiconductor device
JPH02163950A (en) * 1988-12-16 1990-06-25 Matsushita Electric Ind Co Ltd Mounting of semiconductor device
JPH0666355B2 (en) * 1988-12-16 1994-08-24 松下電器産業株式会社 Semiconductor device mounting body and mounting method thereof
US8119449B2 (en) 2006-03-14 2012-02-21 Panasonic Corporation Method of manufacturing an electronic part mounting structure

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