JPS629213B2 - - Google Patents
Info
- Publication number
- JPS629213B2 JPS629213B2 JP56162712A JP16271281A JPS629213B2 JP S629213 B2 JPS629213 B2 JP S629213B2 JP 56162712 A JP56162712 A JP 56162712A JP 16271281 A JP16271281 A JP 16271281A JP S629213 B2 JPS629213 B2 JP S629213B2
- Authority
- JP
- Japan
- Prior art keywords
- film forming
- control signal
- film
- processing chamber
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16271281A JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16271281A JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5864021A JPS5864021A (ja) | 1983-04-16 |
| JPS629213B2 true JPS629213B2 (cs) | 1987-02-27 |
Family
ID=15759852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16271281A Granted JPS5864021A (ja) | 1981-10-14 | 1981-10-14 | 連続製膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5864021A (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0428601U (cs) * | 1990-07-04 | 1992-03-06 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50125451U (cs) * | 1974-03-29 | 1975-10-15 | ||
| JPS5120356A (en) * | 1974-08-08 | 1976-02-18 | Mitsubishi Heavy Ind Ltd | Fuookurifutono tentoboshisochi |
| JPS5314439A (en) * | 1976-06-30 | 1978-02-09 | Hitachi Heating Appliance Co Ltd | Power supply of microwave oven |
| JPS53153039U (cs) * | 1977-05-09 | 1978-12-01 |
-
1981
- 1981-10-14 JP JP16271281A patent/JPS5864021A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0428601U (cs) * | 1990-07-04 | 1992-03-06 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5864021A (ja) | 1983-04-16 |
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