JPS6288558A - Working system - Google Patents

Working system

Info

Publication number
JPS6288558A
JPS6288558A JP60227686A JP22768685A JPS6288558A JP S6288558 A JPS6288558 A JP S6288558A JP 60227686 A JP60227686 A JP 60227686A JP 22768685 A JP22768685 A JP 22768685A JP S6288558 A JPS6288558 A JP S6288558A
Authority
JP
Japan
Prior art keywords
wafer
time
control section
diffusing
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60227686A
Other languages
Japanese (ja)
Inventor
Yasuhiro Tsuji
辻 康紘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP60227686A priority Critical patent/JPS6288558A/en
Publication of JPS6288558A publication Critical patent/JPS6288558A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Landscapes

  • Multi-Process Working Machines And Systems (AREA)
  • General Factory Administration (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)

Abstract

PURPOSE:To maximize the efficiency of operation and improve the efficiency of production by providing a management control section for controlling the shift of workpieces to each working process according to a process time of each working process and process proceeding situation and a production plan calculation controlling section connected to said management control section. CONSTITUTION:While a diffusing process of a wafer proceeds in a diffusing furnace 1A, the proceeding condition is monitored through a transmission circuit 3A by a diffusing chamber management control section 3 to control a next wafer putting time tN from preset wafer diffusing process time, pretreatment time and time of putting wafer into the diffusing furnace. And at the time tN, the next process wafer is searched from a group of wafers which are given data such as types, process methods, required production date when the wafer is received from a production plan calculation control section 4 to a diffusing chamber 5 so that pretreatment is indicated. Next, at the diffusing process completing time, the next process wafer pretreated and transferred stands by and immediately receives the next process. Further, actual result data are transmitted from the management control section 3 to the calculation control section 4 to review the production plan for attaining the high efficiency of operation.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は多くの加工工程を必要とする部品の行う加工シ
ステムに関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a processing system for parts that require many processing steps.

〔発明の技術的背景〕[Technical background of the invention]

例えば、半導体工場においてクエへの加工は多数の処理
工程に対応した処理装置で次々に行われる。通常生産計
画は各処理装置の生産能力を考慮しである品種の製品を
何日までに何個作るということで作成される。この場合
の各処理装置の生産能力は稼動率が高い程大きいことK
なる。いかく各処理装置の稼動率を上げるかが半導体工
場の生産性を左右することKなり、このため稼動率向上
のための加工システムが必要とされる。
For example, in a semiconductor factory, processing into squares is performed one after another using processing equipment that is compatible with a large number of processing steps. Normally, a production plan is created by considering the production capacity of each processing device and determining how many products of a certain type to be produced by how many days. In this case, the production capacity of each processing device increases as the operating rate increases.
Become. The productivity of a semiconductor factory is determined by how much the operating rate of each processing device can be increased, and therefore a processing system for improving the operating rate is required.

〔背景技術の問題点〕[Problems with background technology]

しかし従来は各処理装置の台数と平均稼動率とにより生
産能力を算定していた。この生産能力算定データをベー
スに生産計画が立てられ、クエへの工程投入、処理計画
が指示されてい九〇これでは実際の処理装置には必ずし
もタイムリー、にウニ八が供給されるとは限らず、処理
装置の実際の稼動率が向上しないなどの問題があった0 〔発明の目的〕 本発明は前記したような欠点を解決し、処理装置の稼動
率を向上させる加工システムを提供するものである。
However, conventionally, production capacity has been calculated based on the number of processing devices and the average operating rate. A production plan is established based on this production capacity calculation data, and instructions are given for process input and processing plans for sea urchins. First, there was a problem that the actual operating rate of the processing equipment did not improve.0 [Object of the Invention] The present invention solves the above-mentioned drawbacks and provides a processing system that improves the operating ratio of the processing equipment. It is.

〔発明の概要〕[Summary of the invention]

本発明は複数の加工工程からなる加エシステムにおいて
、前記各加工工程の処理時間、処理進行状況より前記各
加工工程への被加工品の移動を制御する管理制御部と、
この管理制御部に接続される生産計画演算制御部とから
成ることを特徴とする。
The present invention provides a processing system comprising a plurality of processing steps, including a management control unit that controls movement of a workpiece to each processing step based on the processing time and processing progress status of each processing step;
It is characterized by comprising a production planning calculation control section connected to this management control section.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を図面を参照しながら説明する
。例えば半導体工場の拡散工程におけるウェハ処理製造
システムを例にとって図面を参照して説明する。
An embodiment of the present invention will be described below with reference to the drawings. For example, a wafer processing and manufacturing system used in a diffusion process in a semiconductor factory will be explained with reference to the drawings.

1A〜INは拡散炉であり拡散工程における主処理装置
であり、2A〜2Nは洗浄機であり拡散工程における前
処理装置である0ある拡散炉、例えば1人であるウェハ
の拡散処理が進行中にその拡散処理の進行状況を拡散室
管理制御部3で伝送回線3人を通じて監視している。予
め与えられているクエへの拡散処理時間T、  と、前
処理時間T!および拡散炉ウェア1投入時刻t。
1A to IN are diffusion furnaces, which are the main processing equipment in the diffusion process, and 2A to 2N are cleaning machines, which are pretreatment equipment in the diffusion process. The progress of the diffusion process is monitored by the diffusion chamber management control section 3 through a transmission line. Diffusion processing time T for a given query, and preprocessing time T! and diffusion furnace ware 1 input time t.

から次ウェハ投入時刻tN  を制御している。Then, the next wafer loading time tN is controlled.

ts ” tll + T、−(’r、+a )ここで
、αは搬送、クエへ取扱い時間等時刻tN  になった
時点で次に処゛理すべきウェハを生産計画演算制御部4
より拡散室5にウェハを受入れた時点に品種、処理方法
、R造要末日などのデータが与えられているウェハ群の
中から検索し、前処理指示を行う。(クエ・1群は他の
処理工程より送られて来ておりストッカ6にためられて
いる) 拡散処理完了時刻t、 = t、 + T、  には前
処理および搬送等が処理した次に処理すべきウェハが待
機しており直ぐに次の処理が行える。更に処理実績デー
タを拡散室管理制御部より生産計画演算制御部に伝送す
ることにより生産計画の見直しを行い、生産能力を平均
稼動率を基に算定していたものを実際の稼動率で修正し
高い稼動率での生産計画を立案することができる。
ts '' tll + T, - ('r, +a) Here, α is the transport, handling time, etc. At time tN, the next wafer to be processed is transferred to the production planning calculation control unit 4.
When a wafer is received into the diffusion chamber 5, it is searched among a group of wafers to which data such as product type, processing method, and end date of R manufacturing are given, and preprocessing instructions are given. (The Queue 1 group has been sent from another processing process and is stored in the stocker 6.) At the completion time t, = t, + T, of the diffusion process, the pre-processing, transportation, etc. The wafer to be processed is waiting and can be processed immediately. Furthermore, the production plan is reviewed by transmitting the processing performance data from the diffusion chamber management control unit to the production planning calculation control unit, and the production capacity calculated based on the average operating rate is corrected based on the actual operating rate. It is possible to create a production plan with a high operating rate.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれ゛ば処理装置の稼動
率を最大にして処理を行い生産効率の高い加工システム
の実現が可能である0
As explained above, according to the present invention, it is possible to realize a processing system that performs processing by maximizing the operating rate of processing equipment and has high production efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示す加工システムの構成図
、第2図は処理装置配置図である3゜ZA〜IN・・拡
散炉、2A〜2N・・・洗浄機、3A〜3K・・・伝送
回線、3・・・拡散室管理制御部、4・・・生産計画演
算制御部、5・・・拡散室、6・・・ストッカ。 代理人 弁理士  則 近 憲 佑 同  三俣弘文 第1図 第2図
Figure 1 is a block diagram of a processing system showing an embodiment of the present invention, and Figure 2 is a layout diagram of processing equipment. ...Transmission line, 3. Diffusion chamber management control section, 4. Production planning calculation control section, 5. Diffusion chamber, 6. Stocker. Agent Patent Attorney Noriyuki Chika Yudo Hirofumi Mitsumata Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 複数の加工工程からなる加工システムにおいて、前記各
加工工程の処理時間、処理進行状況より前記各加工工程
への被加工品の移動を制御する管理制御部と、この管理
制御部に接続される生産計画演算制御部とから成ること
を特徴とする加工システム。
In a processing system consisting of a plurality of processing steps, there is a management control section that controls the movement of the workpiece to each processing step based on the processing time and processing progress status of each processing step, and a production system connected to this management control section. A processing system comprising a planning calculation control section.
JP60227686A 1985-10-15 1985-10-15 Working system Pending JPS6288558A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60227686A JPS6288558A (en) 1985-10-15 1985-10-15 Working system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60227686A JPS6288558A (en) 1985-10-15 1985-10-15 Working system

Publications (1)

Publication Number Publication Date
JPS6288558A true JPS6288558A (en) 1987-04-23

Family

ID=16864742

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60227686A Pending JPS6288558A (en) 1985-10-15 1985-10-15 Working system

Country Status (1)

Country Link
JP (1) JPS6288558A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0435852A (en) * 1990-05-30 1992-02-06 Mitsubishi Electric Corp Method and device for production control
JPH0785161A (en) * 1993-09-10 1995-03-31 Nec Corp Production line process arrival control method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0435852A (en) * 1990-05-30 1992-02-06 Mitsubishi Electric Corp Method and device for production control
JPH0785161A (en) * 1993-09-10 1995-03-31 Nec Corp Production line process arrival control method

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