JPS628027B2 - - Google Patents

Info

Publication number
JPS628027B2
JPS628027B2 JP55156140A JP15614080A JPS628027B2 JP S628027 B2 JPS628027 B2 JP S628027B2 JP 55156140 A JP55156140 A JP 55156140A JP 15614080 A JP15614080 A JP 15614080A JP S628027 B2 JPS628027 B2 JP S628027B2
Authority
JP
Japan
Prior art keywords
oxidation
oxide film
substrate
material layer
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55156140A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5779638A (en
Inventor
Hisahiro Matsukawa
Hiroshi Nozawa
Junichi Matsunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP55156140A priority Critical patent/JPS5779638A/ja
Priority to EP81305215A priority patent/EP0051488B1/en
Priority to DE8181305215T priority patent/DE3168688D1/de
Priority to US06/317,616 priority patent/US4459325A/en
Publication of JPS5779638A publication Critical patent/JPS5779638A/ja
Publication of JPS628027B2 publication Critical patent/JPS628027B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Drying Of Semiconductors (AREA)
  • Element Separation (AREA)
JP55156140A 1980-11-06 1980-11-06 Manufacture of semiconductor device Granted JPS5779638A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP55156140A JPS5779638A (en) 1980-11-06 1980-11-06 Manufacture of semiconductor device
EP81305215A EP0051488B1 (en) 1980-11-06 1981-11-02 Method for manufacturing a semiconductor device
DE8181305215T DE3168688D1 (en) 1980-11-06 1981-11-02 Method for manufacturing a semiconductor device
US06/317,616 US4459325A (en) 1980-11-06 1981-11-03 Semiconductor device and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55156140A JPS5779638A (en) 1980-11-06 1980-11-06 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5779638A JPS5779638A (en) 1982-05-18
JPS628027B2 true JPS628027B2 (cs) 1987-02-20

Family

ID=15621193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55156140A Granted JPS5779638A (en) 1980-11-06 1980-11-06 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5779638A (cs)

Also Published As

Publication number Publication date
JPS5779638A (en) 1982-05-18

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