JPS6279465A - マスク白色欠陥修正方法 - Google Patents
マスク白色欠陥修正方法Info
- Publication number
- JPS6279465A JPS6279465A JP60219845A JP21984585A JPS6279465A JP S6279465 A JPS6279465 A JP S6279465A JP 60219845 A JP60219845 A JP 60219845A JP 21984585 A JP21984585 A JP 21984585A JP S6279465 A JPS6279465 A JP S6279465A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- ion beam
- white defect
- nozzle
- defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims description 12
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 43
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 11
- 230000001678 irradiating effect Effects 0.000 claims abstract description 6
- 239000002245 particle Substances 0.000 claims abstract description 5
- 239000007921 spray Substances 0.000 claims description 4
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 abstract description 10
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 abstract description 5
- 238000009826 distribution Methods 0.000 abstract description 4
- 229920000642 polymer Polymers 0.000 abstract description 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60219845A JPS6279465A (ja) | 1985-10-02 | 1985-10-02 | マスク白色欠陥修正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60219845A JPS6279465A (ja) | 1985-10-02 | 1985-10-02 | マスク白色欠陥修正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6279465A true JPS6279465A (ja) | 1987-04-11 |
| JPH0135342B2 JPH0135342B2 (enrdf_load_stackoverflow) | 1989-07-25 |
Family
ID=16741960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60219845A Granted JPS6279465A (ja) | 1985-10-02 | 1985-10-02 | マスク白色欠陥修正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6279465A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0218561A (ja) * | 1988-07-06 | 1990-01-22 | Seiko Instr Inc | 集束イオンビーム装置 |
| EP1079273A3 (en) * | 1999-08-27 | 2001-05-02 | Lucent Technologies Inc. | Mask repair |
| KR100700408B1 (ko) * | 1998-03-06 | 2007-03-27 | 에스아이아이 나노 테크놀로지 가부시키가이샤 | 집속 이온 빔 시스템 |
-
1985
- 1985-10-02 JP JP60219845A patent/JPS6279465A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0218561A (ja) * | 1988-07-06 | 1990-01-22 | Seiko Instr Inc | 集束イオンビーム装置 |
| KR100700408B1 (ko) * | 1998-03-06 | 2007-03-27 | 에스아이아이 나노 테크놀로지 가부시키가이샤 | 집속 이온 빔 시스템 |
| EP1079273A3 (en) * | 1999-08-27 | 2001-05-02 | Lucent Technologies Inc. | Mask repair |
| US6368753B1 (en) * | 1999-08-27 | 2002-04-09 | Agere Systems Guardian Corp. | Mask repair |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0135342B2 (enrdf_load_stackoverflow) | 1989-07-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |