JPS6276529U - - Google Patents

Info

Publication number
JPS6276529U
JPS6276529U JP16666585U JP16666585U JPS6276529U JP S6276529 U JPS6276529 U JP S6276529U JP 16666585 U JP16666585 U JP 16666585U JP 16666585 U JP16666585 U JP 16666585U JP S6276529 U JPS6276529 U JP S6276529U
Authority
JP
Japan
Prior art keywords
nozzle
gas flow
reactor
gas outflow
pressure cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16666585U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16666585U priority Critical patent/JPS6276529U/ja
Publication of JPS6276529U publication Critical patent/JPS6276529U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP16666585U 1985-10-31 1985-10-31 Pending JPS6276529U (es)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16666585U JPS6276529U (es) 1985-10-31 1985-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16666585U JPS6276529U (es) 1985-10-31 1985-10-31

Publications (1)

Publication Number Publication Date
JPS6276529U true JPS6276529U (es) 1987-05-16

Family

ID=31097859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16666585U Pending JPS6276529U (es) 1985-10-31 1985-10-31

Country Status (1)

Country Link
JP (1) JPS6276529U (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01109714A (ja) * 1987-10-22 1989-04-26 Nec Corp 気相成長装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021528A (ja) * 1983-07-15 1985-02-02 Hitachi Ltd プラズマ気相反応装置
JPS6063368A (ja) * 1983-09-14 1985-04-11 Hitachi Ltd 膜形成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021528A (ja) * 1983-07-15 1985-02-02 Hitachi Ltd プラズマ気相反応装置
JPS6063368A (ja) * 1983-09-14 1985-04-11 Hitachi Ltd 膜形成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01109714A (ja) * 1987-10-22 1989-04-26 Nec Corp 気相成長装置

Similar Documents

Publication Publication Date Title
JPS6276529U (es)
JPS6181139U (es)
JPS62199122U (es)
JPS61826U (ja) 流量調節ノズル式アンモニアガス注入装置
JPS6095928U (ja) 脱硝装置
JPH0472620U (es)
JPS62175311U (es)
JPS6116366U (ja) 気相成長用ノズル
JPS62107233U (es)
JPS6444627U (es)
JPS633594U (es)
JPS6030314U (ja) モノリス触媒コンバ−タ
JPS58193630U (ja) Ｃｖｄ装置
JPS62132166U (es)
JPH03128439U (es)
JPH0195523U (es)
JPH0253967U (es)
JPS6179188U (es)
JPS59186630U (ja) バ−ナ装置
JPH01120942U (es)
JPS61135181U (es)
JPS6326714U (es)
JPS6457636U (es)
JPS63128720U (es)
JPH0353835U (es)