JPS6274081A - 薄膜製造方法とその装置 - Google Patents

薄膜製造方法とその装置

Info

Publication number
JPS6274081A
JPS6274081A JP21365785A JP21365785A JPS6274081A JP S6274081 A JPS6274081 A JP S6274081A JP 21365785 A JP21365785 A JP 21365785A JP 21365785 A JP21365785 A JP 21365785A JP S6274081 A JPS6274081 A JP S6274081A
Authority
JP
Japan
Prior art keywords
substrate
film
rays
reaction
teflon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21365785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257145B2 (enExample
Inventor
Osamu Tabata
田畑　収
Saburo Kimura
三郎 木村
Kiyoshi Ogino
荻納　淑
Seiki Okino
沖野　誠機
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Central Glass Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP21365785A priority Critical patent/JPS6274081A/ja
Publication of JPS6274081A publication Critical patent/JPS6274081A/ja
Publication of JPH0257145B2 publication Critical patent/JPH0257145B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/488—Protection of windows for introduction of radiation into the coating chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP21365785A 1985-09-28 1985-09-28 薄膜製造方法とその装置 Granted JPS6274081A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21365785A JPS6274081A (ja) 1985-09-28 1985-09-28 薄膜製造方法とその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21365785A JPS6274081A (ja) 1985-09-28 1985-09-28 薄膜製造方法とその装置

Publications (2)

Publication Number Publication Date
JPS6274081A true JPS6274081A (ja) 1987-04-04
JPH0257145B2 JPH0257145B2 (enExample) 1990-12-04

Family

ID=16642793

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21365785A Granted JPS6274081A (ja) 1985-09-28 1985-09-28 薄膜製造方法とその装置

Country Status (1)

Country Link
JP (1) JPS6274081A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189135A (ja) * 1988-01-25 1989-07-28 Fujitsu Ltd 気相成長法
JP2010084218A (ja) * 2008-10-02 2010-04-15 Asahi Glass Co Ltd 光励起性物質の形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021381A (ja) * 1983-07-12 1985-02-02 Kokusai Electric Co Ltd 光ｃｖｄ装置の薄膜生成反応炉

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6021381A (ja) * 1983-07-12 1985-02-02 Kokusai Electric Co Ltd 光ｃｖｄ装置の薄膜生成反応炉

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01189135A (ja) * 1988-01-25 1989-07-28 Fujitsu Ltd 気相成長法
JP2010084218A (ja) * 2008-10-02 2010-04-15 Asahi Glass Co Ltd 光励起性物質の形成方法

Also Published As

Publication number Publication date
JPH0257145B2 (enExample) 1990-12-04

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term