JPS6262207A - パタ−ン測長方法 - Google Patents

パタ−ン測長方法

Info

Publication number
JPS6262207A
JPS6262207A JP60202415A JP20241585A JPS6262207A JP S6262207 A JPS6262207 A JP S6262207A JP 60202415 A JP60202415 A JP 60202415A JP 20241585 A JP20241585 A JP 20241585A JP S6262207 A JPS6262207 A JP S6262207A
Authority
JP
Japan
Prior art keywords
pattern
scanning
center
coordinates
charged particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60202415A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0445083B2 (enrdf_load_stackoverflow
Inventor
Akira Toyama
晃 遠山
Eiji Chiyomaru
千代丸 栄治
Hiroshi Shimada
宏 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP60202415A priority Critical patent/JPS6262207A/ja
Publication of JPS6262207A publication Critical patent/JPS6262207A/ja
Publication of JPH0445083B2 publication Critical patent/JPH0445083B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Closed-Circuit Television Systems (AREA)
JP60202415A 1985-09-12 1985-09-12 パタ−ン測長方法 Granted JPS6262207A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60202415A JPS6262207A (ja) 1985-09-12 1985-09-12 パタ−ン測長方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60202415A JPS6262207A (ja) 1985-09-12 1985-09-12 パタ−ン測長方法

Publications (2)

Publication Number Publication Date
JPS6262207A true JPS6262207A (ja) 1987-03-18
JPH0445083B2 JPH0445083B2 (enrdf_load_stackoverflow) 1992-07-23

Family

ID=16457125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60202415A Granted JPS6262207A (ja) 1985-09-12 1985-09-12 パタ−ン測長方法

Country Status (1)

Country Link
JP (1) JPS6262207A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011247603A (ja) * 2010-05-24 2011-12-08 Hitachi High-Technologies Corp 荷電粒子線を用いた試料検査方法および検査装置ならびに欠陥レビュー装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106162A (en) * 1977-02-28 1978-09-14 Toshiba Corp Electron beam meter

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106162A (en) * 1977-02-28 1978-09-14 Toshiba Corp Electron beam meter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011247603A (ja) * 2010-05-24 2011-12-08 Hitachi High-Technologies Corp 荷電粒子線を用いた試料検査方法および検査装置ならびに欠陥レビュー装置

Also Published As

Publication number Publication date
JPH0445083B2 (enrdf_load_stackoverflow) 1992-07-23

Similar Documents

Publication Publication Date Title
EP0110301B1 (en) Method and apparatus for measuring dimension of secondary electron emission object
US7292327B2 (en) Circuit-pattern inspection apparatus
US3922546A (en) Electron beam pattern generator
US4413186A (en) Method for detecting a position of a micro-mark on a substrate by using an electron beam
JPH0220921B2 (enrdf_load_stackoverflow)
JPH0513037A (ja) 荷電粒子ビーム装置及びその制御方法
US4937458A (en) Electron beam lithography apparatus including a beam blanking device utilizing a reference comparator
JP2003229462A (ja) 回路パターンの検査装置
US4152599A (en) Method for positioning a workpiece relative to a scanning field or a mask in a charged-particle beam apparatus
JPS6262207A (ja) パタ−ン測長方法
JPS58117404A (ja) パタ−ン測定法
JPH0375046B2 (enrdf_load_stackoverflow)
US5013914A (en) Method and apparatus for generating electron channeling patterns
JPS63266747A (ja) 試料像表示装置
JP3065472B2 (ja) 荷電粒子ビーム描画装置における矩形ビームのサイズ及び位置決め調整方法
JPS642201B2 (enrdf_load_stackoverflow)
JPS57204406A (en) Measuring method of length using scanning-type electronic microscope and its device
JPS63187627A (ja) 荷電粒子線露光装置における自動焦点合せ方法
JPS5848042B2 (ja) 電子線と材料の移動方向とのずれを検出する方法
JPH0372923B2 (enrdf_load_stackoverflow)
JPS6312146A (ja) パタ−ン寸法計測方法
JPS6237123Y2 (enrdf_load_stackoverflow)
JPH034884Y2 (enrdf_load_stackoverflow)
JPH0125004B2 (enrdf_load_stackoverflow)
JPS635856B2 (enrdf_load_stackoverflow)