JPS6259458B2 - - Google Patents
Info
- Publication number
- JPS6259458B2 JPS6259458B2 JP55135847A JP13584780A JPS6259458B2 JP S6259458 B2 JPS6259458 B2 JP S6259458B2 JP 55135847 A JP55135847 A JP 55135847A JP 13584780 A JP13584780 A JP 13584780A JP S6259458 B2 JPS6259458 B2 JP S6259458B2
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- charged particle
- magnetic field
- apertures
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002245 particle Substances 0.000 claims description 35
- 230000003287 optical effect Effects 0.000 claims description 22
- 238000007493 shaping process Methods 0.000 claims description 12
- 238000010586 diagram Methods 0.000 description 9
- 238000009826 distribution Methods 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 5
- 230000004075 alteration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000008602 contraction Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13584780A JPS5762000A (en) | 1980-10-01 | 1980-10-01 | Optical device for shaping charged particle beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13584780A JPS5762000A (en) | 1980-10-01 | 1980-10-01 | Optical device for shaping charged particle beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5762000A JPS5762000A (en) | 1982-04-14 |
| JPS6259458B2 true JPS6259458B2 (ru) | 1987-12-11 |
Family
ID=15161147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13584780A Granted JPS5762000A (en) | 1980-10-01 | 1980-10-01 | Optical device for shaping charged particle beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5762000A (ru) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410679A (en) * | 1977-06-25 | 1979-01-26 | Rikagaku Kenkyusho | Method of and device for projecting charged particle beam |
| JPS5752133A (en) * | 1980-09-16 | 1982-03-27 | Toshiba Corp | Electron beam exposure apparatus |
-
1980
- 1980-10-01 JP JP13584780A patent/JPS5762000A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410679A (en) * | 1977-06-25 | 1979-01-26 | Rikagaku Kenkyusho | Method of and device for projecting charged particle beam |
| JPS5752133A (en) * | 1980-09-16 | 1982-03-27 | Toshiba Corp | Electron beam exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5762000A (en) | 1982-04-14 |
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