JPS6252035B2 - - Google Patents

Info

Publication number
JPS6252035B2
JPS6252035B2 JP55126610A JP12661080A JPS6252035B2 JP S6252035 B2 JPS6252035 B2 JP S6252035B2 JP 55126610 A JP55126610 A JP 55126610A JP 12661080 A JP12661080 A JP 12661080A JP S6252035 B2 JPS6252035 B2 JP S6252035B2
Authority
JP
Japan
Prior art keywords
sulfonated
acid
compound
acetylene compound
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55126610A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5647583A (en
Inventor
Uiriamu Remuku Kenesu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Publication of JPS5647583A publication Critical patent/JPS5647583A/ja
Publication of JPS6252035B2 publication Critical patent/JPS6252035B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16Acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
JP12661080A 1979-09-13 1980-09-11 Nickel gloss plating Granted JPS5647583A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7495379A 1979-09-13 1979-09-13

Publications (2)

Publication Number Publication Date
JPS5647583A JPS5647583A (en) 1981-04-30
JPS6252035B2 true JPS6252035B2 (enrdf_load_stackoverflow) 1987-11-02

Family

ID=22122633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12661080A Granted JPS5647583A (en) 1979-09-13 1980-09-11 Nickel gloss plating

Country Status (11)

Country Link
EP (1) EP0025694B1 (enrdf_load_stackoverflow)
JP (1) JPS5647583A (enrdf_load_stackoverflow)
AT (1) ATE6873T1 (enrdf_load_stackoverflow)
AU (1) AU532948B2 (enrdf_load_stackoverflow)
BR (1) BR8005852A (enrdf_load_stackoverflow)
DE (1) DE3067275D1 (enrdf_load_stackoverflow)
ES (1) ES495007A0 (enrdf_load_stackoverflow)
HK (1) HK80384A (enrdf_load_stackoverflow)
MX (1) MX153967A (enrdf_load_stackoverflow)
NZ (1) NZ194923A (enrdf_load_stackoverflow)
ZA (1) ZA805658B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699696A (en) * 1986-04-15 1987-10-13 Omi International Corporation Zinc-nickel alloy electrolyte and process
DE3632514A1 (de) * 1986-09-22 1988-03-24 Schering Ag (alpha)-hydroxi propinsulfonsaeure und deren salze, saure nickelbaeder enthaltend diese verbindungen sowie verfahren zu ihrer herstellung
KR20190028708A (ko) 2016-07-18 2019-03-19 바스프 에스이 보이드 없는 서브미크론 피쳐 충전을 위한 첨가제를 포함하는 코발트 도금용 조성물
WO2019049834A1 (ja) * 2017-09-06 2019-03-14 関東電化工業株式会社 電極及びその製造方法並びに再生電極の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3719568A (en) * 1970-12-11 1973-03-06 Oxy Metal Finishing Corp Nickel electroplating composition and process
US3825478A (en) * 1972-10-30 1974-07-23 Oxy Metal Finishing Corp Electrolyte and method for electrodepositing microporous chromium-nickel composite coatings
US3884773A (en) * 1973-08-17 1975-05-20 Metalux Corp Electrodeposition of nickel
BR7410536D0 (pt) * 1973-12-27 1975-09-02 Du Pont Aditivo abrilhantador banho e processo de eletrodeposicao bem como processo para fabricar o referido aditivo
US4016051A (en) * 1975-05-02 1977-04-05 Starlite Chemicals, Inc. Additives for bright plating nickel, cobalt and nickel-cobalt alloys
CA1069850A (en) * 1975-12-04 1980-01-15 Mcgean Chemical Company Low temperature bright nickel and bright nickel alloy plating

Also Published As

Publication number Publication date
ES8205437A1 (es) 1982-06-01
AU532948B2 (en) 1983-10-20
JPS5647583A (en) 1981-04-30
HK80384A (en) 1984-11-02
EP0025694A1 (en) 1981-03-25
ATE6873T1 (de) 1984-04-15
MX153967A (es) 1987-03-03
EP0025694B1 (en) 1984-03-28
NZ194923A (en) 1982-05-25
ZA805658B (en) 1982-03-31
AU6236580A (en) 1981-03-19
ES495007A0 (es) 1982-06-01
DE3067275D1 (en) 1984-05-03
BR8005852A (pt) 1981-03-24

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