NZ194923A - Nickel-plating composition containing a sulphonated acetylenic compound - Google Patents

Nickel-plating composition containing a sulphonated acetylenic compound

Info

Publication number
NZ194923A
NZ194923A NZ194923A NZ19492380A NZ194923A NZ 194923 A NZ194923 A NZ 194923A NZ 194923 A NZ194923 A NZ 194923A NZ 19492380 A NZ19492380 A NZ 19492380A NZ 194923 A NZ194923 A NZ 194923A
Authority
NZ
New Zealand
Prior art keywords
bath
nickel
acetylenic compound
compound
sulphonated
Prior art date
Application number
NZ194923A
Other languages
English (en)
Inventor
K Lemke
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of NZ194923A publication Critical patent/NZ194923A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16Acetylenic compounds
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
NZ194923A 1979-09-13 1980-09-11 Nickel-plating composition containing a sulphonated acetylenic compound NZ194923A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7495379A 1979-09-13 1979-09-13

Publications (1)

Publication Number Publication Date
NZ194923A true NZ194923A (en) 1982-05-25

Family

ID=22122633

Family Applications (1)

Application Number Title Priority Date Filing Date
NZ194923A NZ194923A (en) 1979-09-13 1980-09-11 Nickel-plating composition containing a sulphonated acetylenic compound

Country Status (11)

Country Link
EP (1) EP0025694B1 (enrdf_load_stackoverflow)
JP (1) JPS5647583A (enrdf_load_stackoverflow)
AT (1) ATE6873T1 (enrdf_load_stackoverflow)
AU (1) AU532948B2 (enrdf_load_stackoverflow)
BR (1) BR8005852A (enrdf_load_stackoverflow)
DE (1) DE3067275D1 (enrdf_load_stackoverflow)
ES (1) ES495007A0 (enrdf_load_stackoverflow)
HK (1) HK80384A (enrdf_load_stackoverflow)
MX (1) MX153967A (enrdf_load_stackoverflow)
NZ (1) NZ194923A (enrdf_load_stackoverflow)
ZA (1) ZA805658B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4699696A (en) * 1986-04-15 1987-10-13 Omi International Corporation Zinc-nickel alloy electrolyte and process
DE3632514A1 (de) * 1986-09-22 1988-03-24 Schering Ag (alpha)-hydroxi propinsulfonsaeure und deren salze, saure nickelbaeder enthaltend diese verbindungen sowie verfahren zu ihrer herstellung
EP3485069B1 (en) 2016-07-18 2021-04-28 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
KR102614534B1 (ko) 2017-09-06 2023-12-14 칸토 덴카 코교 가부시키가이샤 전극 및 그의 제조 방법 그리고 재생 전극의 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3719568A (en) * 1970-12-11 1973-03-06 Oxy Metal Finishing Corp Nickel electroplating composition and process
US3825478A (en) * 1972-10-30 1974-07-23 Oxy Metal Finishing Corp Electrolyte and method for electrodepositing microporous chromium-nickel composite coatings
US3884773A (en) * 1973-08-17 1975-05-20 Metalux Corp Electrodeposition of nickel
BR7410536D0 (pt) * 1973-12-27 1975-09-02 Du Pont Aditivo abrilhantador banho e processo de eletrodeposicao bem como processo para fabricar o referido aditivo
US4016051A (en) * 1975-05-02 1977-04-05 Starlite Chemicals, Inc. Additives for bright plating nickel, cobalt and nickel-cobalt alloys
CA1069850A (en) * 1975-12-04 1980-01-15 Mcgean Chemical Company Low temperature bright nickel and bright nickel alloy plating

Also Published As

Publication number Publication date
AU6236580A (en) 1981-03-19
HK80384A (en) 1984-11-02
AU532948B2 (en) 1983-10-20
EP0025694A1 (en) 1981-03-25
ES8205437A1 (es) 1982-06-01
ES495007A0 (es) 1982-06-01
JPS5647583A (en) 1981-04-30
EP0025694B1 (en) 1984-03-28
ZA805658B (en) 1982-03-31
JPS6252035B2 (enrdf_load_stackoverflow) 1987-11-02
DE3067275D1 (en) 1984-05-03
MX153967A (es) 1987-03-03
BR8005852A (pt) 1981-03-24
ATE6873T1 (de) 1984-04-15

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