JPS624893A - Electrocasting device - Google Patents

Electrocasting device

Info

Publication number
JPS624893A
JPS624893A JP14156485A JP14156485A JPS624893A JP S624893 A JPS624893 A JP S624893A JP 14156485 A JP14156485 A JP 14156485A JP 14156485 A JP14156485 A JP 14156485A JP S624893 A JPS624893 A JP S624893A
Authority
JP
Japan
Prior art keywords
anode
master
cathode
disk
outer periphery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14156485A
Other languages
Japanese (ja)
Inventor
Osamu Sasaki
修 佐々木
Takashi Koizumi
隆 小泉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP14156485A priority Critical patent/JPS624893A/en
Publication of JPS624893A publication Critical patent/JPS624893A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To make the thickness of an electrocast film and the thickness of a stamper uniform by providing a discoid anode wherein an electrode is not present at a part of the site corresponding to the peripheral edge part of a master disk to the titled electrocasting device. CONSTITUTION:An electrocasting device is furnished with a cathode 2 for holding a master disk 5 and an anode 3 which is set opposite to the master disk 5 held by the cathode 2 at a prescribed distance from the disk 5. The cathode 2 holding the master disk 5 is rotated by a motor 1 and relatively rotated at a prescribed distance from the anode 3 and electrocasting is carried out. The anode 3 is formed so that a part of the outer periphery of the anode 3 is positioned on the inside of the outer periphery of the master disk 5 in the direction of the rotation axis of the rotational motion and other parts of the anode 3 are placed at the same position as the outer periphery of the master disk 5 or on the outside of the disk 5.

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、電鋳装置に関し、更に詳しくは、原盤からの
微細パターンの転写性が良好で、かつ均一な膜厚のスタ
ンパを得ることを可能にした新規な構造の陽極を有する
電鋳装置に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an electroforming device, and more specifically, it is possible to obtain a stamper with good transferability of a fine pattern from a master and a uniform film thickness. The present invention relates to an electroforming device having an anode having a novel structure.

〔発明の技術的背景及びその問題点〕[Technical background of the invention and its problems]

レコード盤の製造の際には、通常、スタンパと呼ばれる
薄肉円盤状の金属板が用いられる。
When manufacturing records, a thin disc-shaped metal plate called a stamper is usually used.

このスタンパは、通常、次のような工程によって製造さ
れている。すなわち、ラッカー板に針を用いて溝状に記
録パターンを刻設して、まず原盤を作る。
This stamper is usually manufactured by the following process. That is, first, a master disc is created by carving a recording pattern in the form of grooves on a lacquer plate using a needle.

次に、この原盤上に銀鏡反応等により導電層を形成した
のち、ここに厚さ200〜300μmのニッケルめっき
膜を形成し、このニッケルめっき膜を原盤から剥離して
マスクとする。
Next, a conductive layer is formed on this master by silver mirror reaction or the like, and then a nickel plating film with a thickness of 200 to 300 μm is formed thereon, and this nickel plating film is peeled off from the master to form a mask.

次に、マスク表面に剥離処理を施した後、更にニッケル
めっき膜を形成し、これをマスクから剥離してマザーと
する。更に、マザー表面に剥離処理を施したのち、マザ
ー上にニッケルめっき膜を形成し、これをマザーから剥
離してマスクとするのである。
Next, after performing a peeling treatment on the mask surface, a nickel plating film is further formed, and this is peeled off from the mask to serve as a mother. Furthermore, after performing a peeling treatment on the mother surface, a nickel plating film is formed on the mother, and this is peeled off from the mother to serve as a mask.

上記工程は、通常のレコード製造の際に適用される工程
であるが、高密度記録されたディスクの場合は次のよう
に行われるのが通例である。ディスフの原盤の製造は、
例えば、ガラス基型上に感光性樹脂を塗布し、得られた
樹脂膜に光学的エツチングを施すことにより行われ、そ
の結果微細パターンが刻設された原盤が得られる。
The above process is a process applied during normal record manufacturing, but in the case of a high-density recorded disc, it is usually performed as follows. The production of disc master discs is
For example, this is carried out by applying a photosensitive resin onto a glass substrate and optically etching the resulting resin film, resulting in a master disk on which a fine pattern is engraved.

上記した高密度記録ディスクの場合においても、原盤か
らスタンパを得る工程は、上記したレコードの場合と同
様である。
Even in the case of the above-mentioned high-density recording disk, the process of obtaining a stamper from the master disc is the same as in the case of the above-mentioned record.

しかしながら、この場合の原盤は微細パターンが形成さ
れている原盤であるがゆえに、ニッケル電鋳にソケルめ
っき)工程において、以下のような問題が生ずる。
However, since the master disc in this case is a master disc on which a fine pattern is formed, the following problems occur in the process of Sokel plating on nickel electroforming.

それは、電鋳工程において、陽極として熔解性ニッケル
からなる陽極を使用した場合、溶解させる金属にソケル
)が陽極近傍で酸化して不溶解性沈澱物のスライムを形
成したり、あるいは陽極表面に酸化物のスマットを生成
したりして、これらスライム、スマットがニッケル膜内
に取り込まれて微細パターンを損なうという問題である
。さらには、ニッケル陽極が溶けるにしたがって、陽極
と陰極との間の電極間距離が変化してニッケル膜厚が不
均一になるという問題である。
When an anode made of soluble nickel is used as an anode in the electroforming process, the melted metal (sokel) may oxidize near the anode, forming a slime of insoluble precipitates, or oxidize on the anode surface. The problem is that the slime and smut are incorporated into the nickel film and damage the fine pattern. Furthermore, as the nickel anode melts, the distance between the anode and the cathode changes, resulting in uneven nickel film thickness.

これらの問題点は、特開昭58−157984号公報に
開示されているように、陽極として不熔解陽極を使用す
れば解決することができる。
These problems can be solved by using an unmeltable anode as the anode, as disclosed in Japanese Patent Application Laid-Open No. 58-157984.

しかしながら、上記した不溶解陽極を用いたとしても、
更に次のような問題があった。通常、電鋳装置は、第9
図に示すように、モータ1と連結された回転可能な陰極
2と、該陰極2と対向した位置に不溶解陽極3とが電析
槽4内に設けられている。陰極2には円盤状の原盤5が
取り付けられる。そして、陽極3は、通常、円盤上の原
盤5と対応して円盤状に形成されている。
However, even if the above-mentioned insoluble anode is used,
Furthermore, there were the following problems. Usually, electroforming equipment is
As shown in the figure, a rotatable cathode 2 connected to a motor 1 and an insoluble anode 3 facing the cathode 2 are provided in an electrodeposition tank 4. A disc-shaped master 5 is attached to the cathode 2 . The anode 3 is usually formed into a disk shape corresponding to the disk-shaped master 5.

このよう、な電極構成の電鋳装置でニッケル電鋳を行う
際には、陰極に取り付けられた原盤を回転しなから電鋳
が行われる。その結果、原盤表面にニッケル膜が形成さ
れるものの、その膜厚は原盤の中心部と周縁部とでは異
なり、周縁部の方が厚くなる。したがって得られたスタ
ンパの厚み、さらにはこのスタンパを使用して得られた
ディスクの厚みが不均一になるという問題を生じていた
When performing nickel electroforming with an electroforming apparatus having such an electrode configuration, electroforming is performed without rotating the master plate attached to the cathode. As a result, although a nickel film is formed on the surface of the master, the thickness of the film differs between the center and the periphery of the master, being thicker at the periphery. Therefore, a problem has arisen in that the thickness of the obtained stamper, and furthermore the thickness of the disk obtained using this stamper, becomes non-uniform.

〔発明の目的] 本発明は、上記した問題点を解消して、微細パターンの
原盤からの転写性が良好で、かつ均一な膜厚のスタンパ
を得ることが可能な電鋳装置を提供することを目的とす
る。
[Object of the Invention] An object of the present invention is to solve the above problems and provide an electroforming apparatus that has good transferability of a fine pattern from a master and is capable of obtaining a stamper with a uniform film thickness. With the goal.

〔発明の概要〕[Summary of the invention]

本発明者らは、上記した目的を達成すべく鋭意研究を重
ねた結果、上述したようなニッケル膜の膜厚の不均一、
特に、中心部より周縁部の方の膜厚が大きくなる現象の
原因を究明したところ、このような現象は原盤(陰極側
)周縁部に陽極側からの電流が過大に流れるいわゆるエ
ツジ効果によるものであるとの知見を得た。
As a result of extensive research to achieve the above-mentioned object, the present inventors have found that the unevenness of the thickness of the nickel film as described above,
In particular, we investigated the cause of the phenomenon in which the film thickness is larger at the periphery than at the center, and found that this phenomenon is due to the so-called edge effect, in which an excessive amount of current flows from the anode side to the periphery of the master (cathode side). We obtained the knowledge that

そこで、電鋳装置の円盤状の陽極を、原盤周縁部と対応
する箇所の一部に電極が存在しない構造にすれば、原盤
が回転した際に、原盤の周縁部は電極の存在部(陽極)
と電極の存在しない部分とに交互に対向することになり
、その結果、原盤周縁部への電流集中が緩和され、した
がって電鋳膜の膜厚さらにはスタンパの厚みを均一にす
ることができるという着想を得、本発明を完成するに至
った。
Therefore, if the disk-shaped anode of the electroforming device is constructed so that no electrode is present in a part of the area corresponding to the peripheral edge of the master, when the master rotates, the peripheral edge of the master will be removed from the area where the electrode is present (the anode )
As a result, the concentration of current on the peripheral edge of the master is alleviated, and the thickness of the electroformed film and the thickness of the stamper can therefore be made uniform. The idea was obtained and the present invention was completed.

すなわち、本発明の電鋳装置は、原盤を保持する陰極と
、前記陰極に保持された原盤と所定の間隔を保って対向
して設けられた陽極と、前記原盤が保持された陰極及び
陽極を所定の間隔を保ったまま相対的に回転運動させる
ための回転手段とを備えた電鋳装置において、前記回転
運動の回転軸方向からみた前記陽極の形状が、前記陽極
の外周の一部が前記原盤の外周より内側にあり、さらに
前記陽極の外周の他の一部が前記原盤の外周と同じ位置
もしくはそれより外側にあるような形状であることを特
徴とする。
That is, the electroforming apparatus of the present invention includes a cathode that holds a master disc, an anode that is provided facing the master disc held by the cathode at a predetermined distance, and a cathode and an anode that hold the master disc. In the electroforming apparatus, the shape of the anode viewed from the direction of the axis of rotation of the rotary motion is such that a part of the outer periphery of the anode is The anode is characterized in that it is located inside the outer periphery of the master disc, and another part of the outer periphery of the anode is located at the same position as the outer periphery of the master disc or outside of it.

このような陽極としては、第1図に示す如く、直径が例
えば、原盤と同じ大きさの円盤に切欠部を設けた構造の
陽極6、第7図に示す如く、対角線の長さが例えば原盤
の直径と同じ大きさの正方形状の陽極23、第8図に示
す如く、長軸の長さが例えば原盤の直径と同じ大きさの
楕円状の陽極24、などがあげられる。これらの陽極の
うちで、円盤に切欠部を設けた構造の陽極が好ましい。
As shown in FIG. 1, such an anode includes an anode 6 having a structure in which a notch is provided in a disk whose diameter is, for example, the same size as the original disk, and an anode 6 whose diagonal length is, for example, the same size as the original disk, as shown in FIG. Examples include a square anode 23 having the same size as the diameter of the master disc, and an elliptical anode 24 having a long axis having the same length as the diameter of the original disc, as shown in FIG. Among these anodes, an anode having a structure in which a notch is provided in a disk is preferred.

以下、切欠部を有する陽極について説明する。Hereinafter, an anode having a notch will be explained.

円盤状の陽極に切欠部を有している構造の陽極は、第1
図に示す如く、円盤状の陽極6の外縁部から中心0方向
に向かって所定膨軟の切欠き7が設けられている構造で
ある。
The anode has a structure in which a disc-shaped anode has a notch.
As shown in the figure, the anode 6 has a structure in which a notch 7 with a predetermined expansion and softness is provided from the outer edge of the disk-shaped anode 6 toward the center.

本発明においては、その切欠きの大きさ、形状。In the present invention, the size and shape of the notch.

個数等は特に限定されるものではない。例えば、第1図
に示す例は、扇形状の切欠き7であり、陽極6の切り込
み線6aは円盤の中心まで設けられている。それに対し
て、第2図に示す例は、扇形状の切欠き9であるが、陽
極8の切り込み線8aは円盤の中心Oまで達しておらず
扇形の角度も第1図に示す場合よりも広角である。また
、第3図に示す例は扇形状の切欠きではなく、半円状の
切欠き11である。そして、第4図に示す例は、扇形状
の切欠き13が複数個設けられている例である。
The number etc. are not particularly limited. For example, the example shown in FIG. 1 is a fan-shaped notch 7, and the cut line 6a of the anode 6 extends to the center of the disk. On the other hand, the example shown in FIG. 2 has a fan-shaped cutout 9, but the cut line 8a of the anode 8 does not reach the center O of the disk, and the angle of the fan shape is also smaller than that shown in FIG. It has a wide angle. Further, the example shown in FIG. 3 is not a fan-shaped cutout but a semicircular cutout 11. The example shown in FIG. 4 is an example in which a plurality of fan-shaped notches 13 are provided.

以上、述べた例は、陽極における切欠きが固定された例
であるが、実用上は電鋳膜周縁部の膜厚を、状況に応じ
て変化させたい場合があるので、このような場合にも対
応するためには、切欠きの形状や面積が変化可能な陽極
構造にするとよい。
The example described above is an example in which the notch in the anode is fixed, but in practice there are cases where it is desired to change the film thickness at the peripheral edge of the electroformed film depending on the situation. In order to cope with this problem, it is preferable to use an anode structure in which the shape and area of the notch can be changed.

例えば、第5図及び第6図に示す如く、予め所定の切欠
きが設けられた第1陽極14の裏側に、例えば扇形状の
第2陽極15を密着させ、かつ中心0を回転中心として
回転可能に取り付けた構造にするとよい。このように第
1陽極14に対して第2陽極15が可動な構造にすると
、第1陽極14と第2陽極15とにより構成される切欠
き部16の形状や面積を変化させることが可能になって
有用である。例えば、電鋳膜の周縁部から中心部にかけ
て広域に電流集中を緩和させる場合には、第2陽極15
の位置を切欠き16が大きな形状となるように設定すれ
ばよく、電流集中緩和を原盤の周縁部付近のみに作用さ
せる場合には、第2陽極15の位置を第6図のようにし
て、その切欠き17を周縁部のみに形成すればよい。
For example, as shown in FIGS. 5 and 6, a fan-shaped second anode 15 is brought into close contact with the back side of the first anode 14 in which a predetermined notch is provided, and the second anode 15 is rotated about the center 0. It is better to have a structure where it can be attached. By making the second anode 15 movable with respect to the first anode 14 in this way, it is possible to change the shape and area of the notch 16 formed by the first anode 14 and the second anode 15. It is useful. For example, when reducing current concentration in a wide area from the periphery to the center of the electroformed film, the second anode 15
The position of the second anode 15 may be set so that the notch 16 has a large shape.If the current concentrated relaxation is to be applied only to the vicinity of the periphery of the master, the position of the second anode 15 may be set as shown in FIG. The notch 17 may be formed only on the peripheral edge.

また、切込み線に関しては、第1図の切込み線6aのよ
うに直線ではなく、第5図の第2陽掻15の切り込み線
に相当する線15aのように曲線にすることが好ましい
Further, regarding the score line, it is preferable to make it not a straight line like the score line 6a in FIG. 1, but a curve like the line 15a corresponding to the score line of the second diagonal 15 in FIG. 5.

これは、切込線を直線にした場合には、中心部と周縁部
に挟まれた領域の電鋳膜膜厚が中心部や周縁部の膜厚よ
り小さくなるという傾向があり、曲線にした場合にはこ
のような膜厚の不均一が発生しなくなるためである。
This is because when the score line is straight, the thickness of the electroformed film in the area sandwiched between the center and the periphery tends to be smaller than that at the center and the periphery; This is because, in such a case, such non-uniformity in film thickness will not occur.

また、本発明で用いられる不溶解陽極の材料に関しては
、ニッケル板に金又は白金を被覆したもの、あるいはチ
タン板に金又は白金を被覆したものを不溶解陽極として
用いるとよい。
Regarding the material of the insoluble anode used in the present invention, it is preferable to use a nickel plate coated with gold or platinum, or a titanium plate coated with gold or platinum.

上記したような陽極が組込まれる電鋳装置は、通常、次
のように構成されている。第9図に示す如く、電析槽4
内にめっき液18が満たされ、このめっき液内にモータ
1と連結されて回転可能な陰極2と、電源19と接続さ
れた陽極3とが配設されている。そして、めっき液18
は電析槽4内と溶解槽20内とを循環ポンプ21によっ
て循環される構成になっており、電析槽4内には濾過フ
ィルター22を経て清浄なめっき液が供給される構成と
なっている。なお、本発明は、原盤を固定して陽極を回
転させる構成の装置にも通用可能なものである。更には
、陽極に対して原盤が相対的に回転する場合であれば、
原盤及び陽極の双方を回転させる構成の装置にも通用可
能なものである。
An electroforming device incorporating the above-mentioned anode is usually configured as follows. As shown in FIG. 9, the electrodeposition tank 4
A plating solution 18 is filled within the plating solution, and a cathode 2 that is rotatable by being connected to the motor 1 and an anode 3 that is connected to a power source 19 are disposed within the plating solution. And plating solution 18
is configured to be circulated between the electrodeposition tank 4 and the dissolution tank 20 by a circulation pump 21, and a clean plating solution is supplied into the electrodeposition tank 4 through a filtration filter 22. There is. It should be noted that the present invention is also applicable to an apparatus in which the master is fixed and the anode is rotated. Furthermore, if the master rotates relative to the anode,
It is also applicable to an apparatus configured to rotate both the master disk and the anode.

このような電鋳装置において、電鋳を行う際には、陰極
2に微細パターンが形成された原盤5が取り付けられて
、この原盤5をモータ1によって回転させなから電鋳が
行われる。このとき、陽極3として、上記したような本
発明の陽極を用いれば、原盤5が回転することによって
、原盤5の周縁部は陽極の存在する部分と存在しない部
分とに交互に対向することになり、その結果、原盤周縁
部への電流集中が緩和されることになる。
In such an electroforming apparatus, when performing electroforming, a master disk 5 on which a fine pattern is formed is attached to the cathode 2, and the master disk 5 is rotated by the motor 1 before electroforming is performed. At this time, if the anode of the present invention as described above is used as the anode 3, as the master 5 rotates, the peripheral edge of the master 5 will alternately face the part where the anode is present and the part where the anode is not present. As a result, the concentration of current on the peripheral edge of the master is alleviated.

〔発明の実施例〕[Embodiments of the invention]

実施例 第9図に示した構成の電鋳装置を用いて以下の条件でニ
ッケルめっきを行った。
EXAMPLE Nickel plating was carried out under the following conditions using an electroforming apparatus having the configuration shown in FIG.

まず、原盤として、ガラス慇に感光性樹脂を塗布し、得
られた樹脂膜に光学エツチングを施して微細パターンを
形成し、ついで、この上に導電性付与のため膜厚300
〜1000人の金蒸着膜を形成した原盤を用意した。
First, a photosensitive resin is coated on a glass plate as a master, and the resulting resin film is optically etched to form a fine pattern, and then a film with a thickness of 300 mm is applied on top of this to impart conductivity.
~1000 master discs on which gold evaporated films were formed were prepared.

上記原盤の微細パターンが形成されている面を陽極側に
対向させて、原盤を陰極に取り付けた。
The master disc was attached to the cathode with the surface of the master disc on which the fine pattern was formed facing the anode side.

陽極としては、チタン板を白金で被覆した不溶解陽極を
用い、その構造は第5図に示すような第1陽極14と第
2陽極15とからなる陽極とした。
As the anode, an insoluble anode made of a titanium plate coated with platinum was used, and its structure consisted of a first anode 14 and a second anode 15 as shown in FIG.

すなわち、第1陽極14は、直径360mmとし、切欠
き部分(第1陽極のみで形成される切欠き部)は中心0
から90度の角度を有する扇形状とした。
That is, the first anode 14 has a diameter of 360 mm, and the notch portion (the notch portion formed only by the first anode) is centered at 0.
It was made into a fan shape having an angle of 90 degrees.

第2陽極15は角度120°の扇形状とした。そして、
第2陽極15の第1陽極14と重なる部分15bは角度
60°とした。なお、第2陽極15の切込み線に相当す
る線15aは曲率半径180mmの曲線とした。
The second anode 15 had a fan shape with an angle of 120°. and,
A portion 15b of the second anode 15 overlapping with the first anode 14 was set at an angle of 60°. Note that the line 15a corresponding to the incision line of the second anode 15 was a curved line with a radius of curvature of 180 mm.

上記した陽極を第1陽極と陰極間の極間距離を40mm
に設定して、原盤5と対向させてセットし、モータ1に
より原盤5を1100rpで回転させてニッケル電鋳を
行った。このとき使用しためっき液は、スルファミン酸
ニッケル600 g /β、ホウ酸40g/Cビット防
止剤(商品名ナイスター806:上材工業(株)製)1
mj!/lとをもって建浴とした。
The distance between the first anode and the cathode is 40 mm.
was set to face the master disc 5, and the master disc 5 was rotated at 1100 rpm by the motor 1 to perform nickel electroforming. The plating solution used at this time was 600 g of nickel sulfamate/β, 40 g of boric acid/C bit inhibitor (trade name Nystar 806, manufactured by Uezai Kogyo Co., Ltd.) 1
mj! /l was considered to be a bath.

また、めっき浴の温度45°C2電流密度12A/al
、めっき浴のpH4,2±0.2の条件下で、厚さ25
0μmのニッケル電鋳膜が得られるまで電鋳を行った。
In addition, plating bath temperature: 45°C2 current density: 12A/al
, under the condition of plating bath pH 4.2 ± 0.2, thickness 25
Electroforming was performed until a 0 μm nickel electroformed film was obtained.

また、めっき浴中のニッケル濃度の減少及びpHの低下
を防止するため、溶解槽20内に炭酸ニッケル(NiC
O9・ 2Ni (OH)2・4H20)を添加して、
めっき浴のニッケル濃度及びpHが初期設定時の値に保
持されるようにした。
In addition, in order to prevent a decrease in nickel concentration and pH in the plating bath, nickel carbonate (NiC
By adding O9・2Ni (OH)2・4H20),
The nickel concentration and pH of the plating bath were maintained at the initial values.

電鋳終了後、原盤から電鋳膜を剥離すると、表面に金が
付着しているニッケル電鋳膜が得られた。
After the electroforming was completed, the electroformed film was peeled off from the master, and a nickel electroformed film with gold attached to the surface was obtained.

得られたニッケル電鋳膜を光学ディスク形成用スタンパ
とした。
The obtained nickel electroformed film was used as a stamper for forming an optical disc.

このニッケル電鋳膜スタンパの膜厚をスタンパ中心部か
ら周縁部方向に向かって測定し、その結果を第10図に
曲線aとして示した。
The film thickness of this nickel electroformed film stamper was measured from the center of the stamper toward the peripheral edge, and the results are shown as curve a in FIG. 10.

なお、比較例として、陽極の構造が単なる円盤(直径3
60mm)であるものを用いたほかは、実施例と同様に
してニッケル電鋳を行った。実施例と同様に膜厚を測定
し、その結果を第10図に曲線すとして示した。
As a comparative example, the structure of the anode was a simple disk (diameter 3
Nickel electroforming was performed in the same manner as in the example except that a material having a diameter of 60 mm) was used. The film thickness was measured in the same manner as in the example, and the results are shown as a curve in FIG.

以上の結果から、本発明の陽極を用いた場合にはくスタ
ンパの膜厚がスタンパ周縁部近傍にあってもそれぼど大
きく変化せず、スタンパ全体の膜厚が均一となる。それ
に対して、比較例つまり従来構造の陽極を用いた場合に
は、スタンパの膜厚が周縁部とそれ以外とでは大巾に異
なり例えば最大70μmも異なり、膜厚の不均一が認め
られた。
From the above results, when the anode of the present invention is used, the thickness of the stamper does not change significantly even near the peripheral edge of the stamper, and the thickness of the stamper as a whole becomes uniform. On the other hand, in a comparative example, that is, when an anode having a conventional structure was used, the film thickness of the stamper differed widely between the peripheral portion and the rest, for example, by a maximum of 70 μm, and non-uniformity in film thickness was observed.

〔発明の効果〕〔Effect of the invention〕

以上、詳述した如く、新規な構造の陽極を有する本発明
の電鋳装置を用いれば、均一な膜厚のスタンパが得られ
、したがって、微細パターンの転写性も良好なスタンパ
が得られ、その工業的価値は大である。
As described in detail above, by using the electroforming apparatus of the present invention having an anode with a novel structure, a stamper with a uniform film thickness can be obtained, and therefore a stamper with good transferability of fine patterns can be obtained. The industrial value is great.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第8図は、本発明電鋳装置に用いる陽極の例を
示す模式図、第9図は本発明電鋳装置全体を示す模式図
、第10図は得られたスタンパの膜厚とスタンパ半径と
の関係を示すグラフ図である。 3.6.8,10,12,23,24:陽極14:第1
陽極    15:第2陽極7.9,11,13,16
,17:切欠き2:陰極 5:原盤 第4図 第7図 第8図 第9図 第10図
Figures 1 to 8 are schematic diagrams showing examples of anodes used in the electroforming apparatus of the present invention, Figure 9 is a schematic diagram showing the entire electroforming apparatus of the present invention, and Figure 10 is the film thickness of the obtained stamper. FIG. 3 is a graph diagram showing the relationship between the stamper radius and the stamper radius. 3.6.8, 10, 12, 23, 24: Anode 14: 1st
Anode 15: Second anode 7.9, 11, 13, 16
, 17: Notch 2: Cathode 5: Master Figure 4 Figure 7 Figure 8 Figure 9 Figure 10

Claims (1)

【特許請求の範囲】[Claims] 原盤を保持する陰極と、前記陰極に保持された原盤と所
定の間隔を保って対向して設けられた陽極と、前記原盤
が保持された陰極及び陽極を所定の間隔を保ったまま相
対的に回転運動させるための回転手段とを備えた電鋳装
置において、前記回転運動の回転軸方向からみた前記陽
極の形状が、前記陽極の外周の一部が前記原盤の外周よ
り内側にあり、さらに前記陽極の外周の他の一部が前記
原盤の外周と同じ位置もしくはそれより外側にあるよう
な形状であることを特徴とする電鋳装置。
A cathode that holds a master disc, an anode that is provided facing the master disc held by the cathode at a predetermined distance, and a cathode and anode that hold the master disc relative to each other while maintaining a predetermined interval. In the electroforming apparatus, the shape of the anode viewed from the direction of the axis of rotation of the rotary motion is such that a part of the outer periphery of the anode is inside the outer periphery of the master, and An electroforming device characterized in that the other part of the outer periphery of the anode is in a shape such that it is located at the same position as the outer periphery of the master or outside of it.
JP14156485A 1985-06-29 1985-06-29 Electrocasting device Pending JPS624893A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14156485A JPS624893A (en) 1985-06-29 1985-06-29 Electrocasting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14156485A JPS624893A (en) 1985-06-29 1985-06-29 Electrocasting device

Publications (1)

Publication Number Publication Date
JPS624893A true JPS624893A (en) 1987-01-10

Family

ID=15294904

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14156485A Pending JPS624893A (en) 1985-06-29 1985-06-29 Electrocasting device

Country Status (1)

Country Link
JP (1) JPS624893A (en)

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