JPS6244426B2 - - Google Patents
Info
- Publication number
- JPS6244426B2 JPS6244426B2 JP57113137A JP11313782A JPS6244426B2 JP S6244426 B2 JPS6244426 B2 JP S6244426B2 JP 57113137 A JP57113137 A JP 57113137A JP 11313782 A JP11313782 A JP 11313782A JP S6244426 B2 JPS6244426 B2 JP S6244426B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- integrated circuit
- transistor
- diode
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/854—Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57113137A JPS594068A (ja) | 1982-06-30 | 1982-06-30 | 集積回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57113137A JPS594068A (ja) | 1982-06-30 | 1982-06-30 | 集積回路 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS594068A JPS594068A (ja) | 1984-01-10 |
| JPS6244426B2 true JPS6244426B2 (enExample) | 1987-09-21 |
Family
ID=14604490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57113137A Granted JPS594068A (ja) | 1982-06-30 | 1982-06-30 | 集積回路 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS594068A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6509585B2 (en) * | 2000-03-20 | 2003-01-21 | Winbond Electronics Corp. | Electrostatic discharge protective device incorporating silicon controlled rectifier devices |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5211880A (en) * | 1975-07-18 | 1977-01-29 | Toshiba Corp | Semiconductor integrated circuit device |
-
1982
- 1982-06-30 JP JP57113137A patent/JPS594068A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS594068A (ja) | 1984-01-10 |
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