JPS6244426B2 - - Google Patents

Info

Publication number
JPS6244426B2
JPS6244426B2 JP57113137A JP11313782A JPS6244426B2 JP S6244426 B2 JPS6244426 B2 JP S6244426B2 JP 57113137 A JP57113137 A JP 57113137A JP 11313782 A JP11313782 A JP 11313782A JP S6244426 B2 JPS6244426 B2 JP S6244426B2
Authority
JP
Japan
Prior art keywords
region
integrated circuit
transistor
diode
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57113137A
Other languages
English (en)
Japanese (ja)
Other versions
JPS594068A (ja
Inventor
Kunihiko Goto
Tadahiro Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57113137A priority Critical patent/JPS594068A/ja
Publication of JPS594068A publication Critical patent/JPS594068A/ja
Publication of JPS6244426B2 publication Critical patent/JPS6244426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/854Complementary IGFETs, e.g. CMOS comprising arrangements for preventing bipolar actions between the different IGFET regions, e.g. arrangements for latchup prevention

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP57113137A 1982-06-30 1982-06-30 集積回路 Granted JPS594068A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57113137A JPS594068A (ja) 1982-06-30 1982-06-30 集積回路

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57113137A JPS594068A (ja) 1982-06-30 1982-06-30 集積回路

Publications (2)

Publication Number Publication Date
JPS594068A JPS594068A (ja) 1984-01-10
JPS6244426B2 true JPS6244426B2 (enExample) 1987-09-21

Family

ID=14604490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57113137A Granted JPS594068A (ja) 1982-06-30 1982-06-30 集積回路

Country Status (1)

Country Link
JP (1) JPS594068A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6509585B2 (en) * 2000-03-20 2003-01-21 Winbond Electronics Corp. Electrostatic discharge protective device incorporating silicon controlled rectifier devices

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5211880A (en) * 1975-07-18 1977-01-29 Toshiba Corp Semiconductor integrated circuit device

Also Published As

Publication number Publication date
JPS594068A (ja) 1984-01-10

Similar Documents

Publication Publication Date Title
JP3246807B2 (ja) 半導体集積回路装置
US5376816A (en) Bi-cmos integrated circuit device having buried region use in common for bipolar and mos transistors
US4300152A (en) Complementary field-effect transistor integrated circuit device
KR890004472B1 (ko) Cmos 집적회호
US4491746A (en) Self-substrate-bias circuit device
JP2528794B2 (ja) ラツチアツプ保護回路付き集積回路
JPH051621B2 (enExample)
US5045716A (en) Integrated circuit in complementary circuit technology comprising a substrate bias voltage generator
US4622573A (en) CMOS contacting structure having degeneratively doped regions for the prevention of latch-up
CA1275457C (en) Integrated circuit in complementary circuit technology comprising a substrate bias generator
JPH06105785B2 (ja) 逆電圧保護回路を具えたパワー半導体装置
US4689653A (en) Complementary MOS integrated circuit including lock-up prevention parasitic transistors
US4807010A (en) Integrated circuit in complementary circuit technology comprising a substrate bias voltage generator and a Schottky diode
US5126816A (en) Integrated circuit with anti latch-up circuit in complementary MOS circuit technology
US5488247A (en) MOS-type semiconductor clamping circuit
US5892263A (en) CMOS device connected to at least three power supplies for preventing latch-up
JPS6244426B2 (enExample)
JPH044755B2 (enExample)
EP0121096B1 (en) Semiconductor contact structure
US5227657A (en) Base-emitter reverse bias protection for bicmos ic
GB2210197A (en) Latchup and electrostatic discharge protection structure
EP0198569A1 (en) Monolithic integrated circuits having protection against latch-up
JPS6050062B2 (ja) 半導体集積回路装置
KR890004426B1 (ko) 씨 모오스 입력 보호회로
JP3070095B2 (ja) 入出力保護回路