JPS6244407B2 - - Google Patents

Info

Publication number
JPS6244407B2
JPS6244407B2 JP16245378A JP16245378A JPS6244407B2 JP S6244407 B2 JPS6244407 B2 JP S6244407B2 JP 16245378 A JP16245378 A JP 16245378A JP 16245378 A JP16245378 A JP 16245378A JP S6244407 B2 JPS6244407 B2 JP S6244407B2
Authority
JP
Japan
Prior art keywords
electron beam
rectangular
current value
exposure
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16245378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5588330A (en
Inventor
Junichi Kai
Nobuyuki Yasutake
Tooru Funayama
Takashi Yahano
Tadashi Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP16245378A priority Critical patent/JPS5588330A/ja
Publication of JPS5588330A publication Critical patent/JPS5588330A/ja
Publication of JPS6244407B2 publication Critical patent/JPS6244407B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP16245378A 1978-12-27 1978-12-27 Exposing method for electron beam Granted JPS5588330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16245378A JPS5588330A (en) 1978-12-27 1978-12-27 Exposing method for electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16245378A JPS5588330A (en) 1978-12-27 1978-12-27 Exposing method for electron beam

Publications (2)

Publication Number Publication Date
JPS5588330A JPS5588330A (en) 1980-07-04
JPS6244407B2 true JPS6244407B2 (zh) 1987-09-21

Family

ID=15754892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16245378A Granted JPS5588330A (en) 1978-12-27 1978-12-27 Exposing method for electron beam

Country Status (1)

Country Link
JP (1) JPS5588330A (zh)

Also Published As

Publication number Publication date
JPS5588330A (en) 1980-07-04

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