JPS6243331B2 - - Google Patents

Info

Publication number
JPS6243331B2
JPS6243331B2 JP56020125A JP2012581A JPS6243331B2 JP S6243331 B2 JPS6243331 B2 JP S6243331B2 JP 56020125 A JP56020125 A JP 56020125A JP 2012581 A JP2012581 A JP 2012581A JP S6243331 B2 JPS6243331 B2 JP S6243331B2
Authority
JP
Japan
Prior art keywords
quartz
bell gear
plasma
high frequency
gear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56020125A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57134925A (en
Inventor
Junichi Suzuki
Harushige Kurokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Kokusai Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Co Ltd filed Critical Kokusai Electric Co Ltd
Priority to JP56020125A priority Critical patent/JPS57134925A/ja
Publication of JPS57134925A publication Critical patent/JPS57134925A/ja
Publication of JPS6243331B2 publication Critical patent/JPS6243331B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • H10P14/24—
    • H10P14/3408—
    • H10P14/3411—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
JP56020125A 1981-02-16 1981-02-16 Plasma cvd film producer Granted JPS57134925A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56020125A JPS57134925A (en) 1981-02-16 1981-02-16 Plasma cvd film producer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56020125A JPS57134925A (en) 1981-02-16 1981-02-16 Plasma cvd film producer

Publications (2)

Publication Number Publication Date
JPS57134925A JPS57134925A (en) 1982-08-20
JPS6243331B2 true JPS6243331B2 (show.php) 1987-09-12

Family

ID=12018394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56020125A Granted JPS57134925A (en) 1981-02-16 1981-02-16 Plasma cvd film producer

Country Status (1)

Country Link
JP (1) JPS57134925A (show.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348832A (ja) * 1986-08-19 1988-03-01 Tokyo Electron Ltd Ｃｖｄ装置
JPS63129630A (ja) * 1986-11-20 1988-06-02 Fuji Electric Co Ltd プラズマｃｖｄ薄膜形成法
JP2662688B2 (ja) * 1987-10-16 1997-10-15 株式会社 半導体エネルギー研究所 被膜作製方法
JPH01115235U (show.php) * 1988-01-29 1989-08-03

Also Published As

Publication number Publication date
JPS57134925A (en) 1982-08-20

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