JPS6241200B2 - - Google Patents
Info
- Publication number
- JPS6241200B2 JPS6241200B2 JP58057925A JP5792583A JPS6241200B2 JP S6241200 B2 JPS6241200 B2 JP S6241200B2 JP 58057925 A JP58057925 A JP 58057925A JP 5792583 A JP5792583 A JP 5792583A JP S6241200 B2 JPS6241200 B2 JP S6241200B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- temperature
- melt
- raw material
- seed crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/28—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using weight changes of the crystal or the melt, e.g. flotation methods
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
| GB08408563A GB2140704B (en) | 1983-04-04 | 1984-04-03 | Control of crystal pulling |
| US06/596,705 US4586979A (en) | 1983-04-04 | 1984-04-04 | Method for manufacture of III-V group compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5792583A JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59184795A JPS59184795A (ja) | 1984-10-20 |
| JPS6241200B2 true JPS6241200B2 (https=) | 1987-09-01 |
Family
ID=13069577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5792583A Granted JPS59184795A (ja) | 1983-04-04 | 1983-04-04 | 3−5族化合物半導体単結晶の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59184795A (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61136989A (ja) * | 1984-12-05 | 1986-06-24 | Toshiba Ceramics Co Ltd | 引上げ法における単結晶育成時の形状制御方法 |
| CN107075718B (zh) | 2014-09-29 | 2019-08-13 | 信越半导体株式会社 | 半导体单晶的再熔融方法 |
| JP6387907B2 (ja) * | 2015-06-18 | 2018-09-12 | 住友金属鉱山株式会社 | 単結晶の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5144475A (ja) * | 1974-10-14 | 1976-04-16 | Hitachi Ltd | Tanketsushoikuseisochi |
| JPS5641896A (en) * | 1979-09-14 | 1981-04-18 | Toshiba Corp | Manufacture of single crystal |
-
1983
- 1983-04-04 JP JP5792583A patent/JPS59184795A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59184795A (ja) | 1984-10-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5167651B2 (ja) | 遮熱部材下端面と原料融液面との間の距離の測定方法、及びその距離の制御方法 | |
| US5408952A (en) | Single crystal growth method | |
| US4586979A (en) | Method for manufacture of III-V group compound semiconductor single crystal | |
| US8885915B2 (en) | Method for measuring and controlling distance between lower end surface of heat shielding member and surface of raw material melt and method for manufacturing silicon single crystal | |
| JPH0416435B2 (https=) | ||
| JPH10152389A (ja) | 半導体単結晶の製造装置および製造方法 | |
| KR102241325B1 (ko) | 반도체 단결정 인상장치 및 이것을 이용한 반도체 단결정의 재용융방법 | |
| US8343275B2 (en) | Single crystal growth method and single crystal pulling apparatus for improving yield and productivity of single crystal | |
| JPS6241200B2 (https=) | ||
| US5762704A (en) | Method of fabricating a silicon single-crystal ingot | |
| WO2023051346A1 (zh) | 用于制造氮掺杂的单晶硅的方法 | |
| KR101679071B1 (ko) | 멜트갭 제어 시스템, 이를 포함하는 단결정 성장방법 | |
| KR101266643B1 (ko) | 단결정 성장 온도측정 시스템 및 단결정성장 온도제어방법 | |
| US12571124B2 (en) | Method for measuring distance between lower end surface of heat shielding member and surface of raw material melt, method for controlling distance between lower end surface of heat shielding member and surface of raw material melt and method for manufacturing silicon single crystal | |
| TWI613334B (zh) | 提高長晶成功率的自動長晶方法 | |
| JPH0952788A (ja) | 単結晶の製造方法及び製造装置 | |
| CN115044967A (zh) | 单晶硅拉晶控制方法及装置、单晶硅拉晶炉 | |
| JP2010018499A (ja) | 単結晶の製造方法 | |
| JPS61261288A (ja) | シリコン単結晶引上装置 | |
| JPH07133187A (ja) | 半導体単結晶の育成方法 | |
| JPH06305877A (ja) | 単結晶成長方法および単結晶成長装置 | |
| JPS6243959B2 (https=) | ||
| JPS6339557B2 (https=) | ||
| JPH04325488A (ja) | 液面温度制御方法 | |
| JP2720274B2 (ja) | 単結晶引上げ方法 |