JPS6240845B2 - - Google Patents

Info

Publication number

JPS6240845B2

JPS6240845B2 JP1168378A JP1168378A JPS6240845B2 JP S6240845 B2 JPS6240845 B2 JP S6240845B2 JP 1168378 A JP1168378 A JP 1168378A JP 1168378 A JP1168378 A JP 1168378A JP S6240845 B2 JPS6240845 B2 JP S6240845B2

Authority

JP

Japan

Prior art keywords

vacuum chamber

vacuum

group

thin film

substrate

Prior art date

1978-02-03

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 239000000758 substrate Substances 0.000 claims description 20
• 238000000034 method Methods 0.000 claims description 15
• 239000010409 thin film Substances 0.000 claims description 10
• 239000000463 material Substances 0.000 claims description 7
• 150000001875 compounds Chemical class 0.000 claims description 6
• 239000007787 solid Substances 0.000 claims description 3
• 238000001704 evaporation Methods 0.000 claims description 2
• 230000008020 evaporation Effects 0.000 claims description 2
• 238000000151 deposition Methods 0.000 claims 1
• 239000013078 crystal Substances 0.000 description 38
• 238000001451 molecular beam epitaxy Methods 0.000 description 13
• IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
• 239000000126 substance Substances 0.000 description 10
• 230000005855 radiation Effects 0.000 description 9
• 238000001816 cooling Methods 0.000 description 8
• 230000000694 effects Effects 0.000 description 8
• 239000007788 liquid Substances 0.000 description 8
• 229910052785 arsenic Inorganic materials 0.000 description 7
• 229910052757 nitrogen Inorganic materials 0.000 description 6
• 239000004065 semiconductor Substances 0.000 description 6
• OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 5
• RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 5
• 239000000356 contaminant Substances 0.000 description 5
• NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
• 238000011109 contamination Methods 0.000 description 4
• 229910021478 group 5 element Inorganic materials 0.000 description 4
• 229910052760 oxygen Inorganic materials 0.000 description 4
• 108010083687 Ion Pumps Proteins 0.000 description 3
• 229910052787 antimony Inorganic materials 0.000 description 3
• 238000010586 diagram Methods 0.000 description 3
• 239000007789 gas Substances 0.000 description 3
• 239000000203 mixture Substances 0.000 description 3
• 229910052698 phosphorus Inorganic materials 0.000 description 3
• 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
• RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
• 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
• WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
• 239000003344 environmental pollutant Substances 0.000 description 2
• 239000012535 impurity Substances 0.000 description 2
• 230000001678 irradiating effect Effects 0.000 description 2
• 239000011574 phosphorus Substances 0.000 description 2
• 231100000614 poison Toxicity 0.000 description 2
• 231100000719 pollutant Toxicity 0.000 description 2
• 238000005086 pumping Methods 0.000 description 2
• OBSZRRSYVTXPNB-UHFFFAOYSA-N tetraphosphorus Chemical compound P12P3P1P32 OBSZRRSYVTXPNB-UHFFFAOYSA-N 0.000 description 2
• 229910052719 titanium Inorganic materials 0.000 description 2
• 239000010936 titanium Substances 0.000 description 2
• 239000003440 toxic substance Substances 0.000 description 2
• LULLIKNODDLMDQ-UHFFFAOYSA-N arsenic(3+) Chemical compound [As+3] LULLIKNODDLMDQ-UHFFFAOYSA-N 0.000 description 1
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
• 230000015572 biosynthetic process Effects 0.000 description 1
• 238000004140 cleaning Methods 0.000 description 1
• 230000003749 cleanliness Effects 0.000 description 1
• 230000003247 decreasing effect Effects 0.000 description 1
• 230000002349 favourable effect Effects 0.000 description 1
• 239000010408 film Substances 0.000 description 1
• 238000010438 heat treatment Methods 0.000 description 1
• 229930195733 hydrocarbon Natural products 0.000 description 1
• 150000002430 hydrocarbons Chemical class 0.000 description 1
• 238000004519 manufacturing process Methods 0.000 description 1
• 239000013307 optical fiber Substances 0.000 description 1
• 239000001301 oxygen Substances 0.000 description 1
• 230000002265 prevention Effects 0.000 description 1
• 239000010453 quartz Substances 0.000 description 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
• 229910001220 stainless steel Inorganic materials 0.000 description 1
• 239000010935 stainless steel Substances 0.000 description 1
• 231100000331 toxic Toxicity 0.000 description 1
• 230000002588 toxic effect Effects 0.000 description 1
• XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1